WO2006093693A3 - Method and apparatus for euv plasma source target delivery - Google Patents

Method and apparatus for euv plasma source target delivery Download PDF

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Publication number
WO2006093693A3
WO2006093693A3 PCT/US2006/005647 US2006005647W WO2006093693A3 WO 2006093693 A3 WO2006093693 A3 WO 2006093693A3 US 2006005647 W US2006005647 W US 2006005647W WO 2006093693 A3 WO2006093693 A3 WO 2006093693A3
Authority
WO
WIPO (PCT)
Prior art keywords
output orifice
liquid
droplet
delivery
liquid target
Prior art date
Application number
PCT/US2006/005647
Other languages
French (fr)
Other versions
WO2006093693A2 (en
Inventor
John Martin Algots
Igor V Fomenkov
Alexander I Ershov
William N Partlo
Richard L Sandstrom
Oscar Hemberg
Alexander N Bykanov
Dennis W Cobb
Original Assignee
Cymer Inc
John Martin Algots
Igor V Fomenkov
Alexander I Ershov
William N Partlo
Richard L Sandstrom
Oscar Hemberg
Alexander N Bykanov
Dennis W Cobb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc, John Martin Algots, Igor V Fomenkov, Alexander I Ershov, William N Partlo, Richard L Sandstrom, Oscar Hemberg, Alexander N Bykanov, Dennis W Cobb filed Critical Cymer Inc
Priority to JP2007557068A priority Critical patent/JP5455308B2/en
Priority to KR1020077021532A priority patent/KR101235023B1/en
Priority to EP06720851.2A priority patent/EP1867218B1/en
Publication of WO2006093693A2 publication Critical patent/WO2006093693A2/en
Publication of WO2006093693A3 publication Critical patent/WO2006093693A3/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle

Abstract

An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
PCT/US2006/005647 2005-02-25 2006-02-17 Method and apparatus for euv plasma source target delivery WO2006093693A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007557068A JP5455308B2 (en) 2005-02-25 2006-02-17 EUV plasma source target supply method and apparatus
KR1020077021532A KR101235023B1 (en) 2005-02-25 2006-02-17 Method and apparatus for euv plasma source target delivery
EP06720851.2A EP1867218B1 (en) 2005-02-25 2006-02-17 Apparatus for euv plasma source target delivery

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/067,124 2005-02-25
US11/067,124 US7405416B2 (en) 2005-02-25 2005-02-25 Method and apparatus for EUV plasma source target delivery

Publications (2)

Publication Number Publication Date
WO2006093693A2 WO2006093693A2 (en) 2006-09-08
WO2006093693A3 true WO2006093693A3 (en) 2009-04-16

Family

ID=36931245

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/005647 WO2006093693A2 (en) 2005-02-25 2006-02-17 Method and apparatus for euv plasma source target delivery

Country Status (5)

Country Link
US (3) US7405416B2 (en)
EP (1) EP1867218B1 (en)
JP (3) JP5455308B2 (en)
KR (1) KR101235023B1 (en)
WO (1) WO2006093693A2 (en)

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