WO2006067730A3 - Device and method for holding a substrate - Google Patents

Device and method for holding a substrate Download PDF

Info

Publication number
WO2006067730A3
WO2006067730A3 PCT/IB2005/054315 IB2005054315W WO2006067730A3 WO 2006067730 A3 WO2006067730 A3 WO 2006067730A3 IB 2005054315 W IB2005054315 W IB 2005054315W WO 2006067730 A3 WO2006067730 A3 WO 2006067730A3
Authority
WO
WIPO (PCT)
Prior art keywords
holding
substrate
box
substrate holder
gettering
Prior art date
Application number
PCT/IB2005/054315
Other languages
French (fr)
Other versions
WO2006067730A2 (en
Inventor
Dirk M Knotter
Abbas Rastegar
Original Assignee
Koninkl Philips Electronics Nv
Dirk M Knotter
Abbas Rastegar
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Dirk M Knotter, Abbas Rastegar filed Critical Koninkl Philips Electronics Nv
Publication of WO2006067730A2 publication Critical patent/WO2006067730A2/en
Publication of WO2006067730A3 publication Critical patent/WO2006067730A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

Device (1) for holding a substrate, comprising a box (2) and a substrate holder (4). The box (2) is arranged for holding the substrate holder (4), and the substrate holder (4) is arranged for holding the substrate (3). The box (2) comprises a gettering device (5) for gettering an impurity possibly being present within the box (2).
PCT/IB2005/054315 2004-12-22 2005-12-19 Device and method for holding a substrate WO2006067730A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63936904P 2004-12-22 2004-12-22
US60/639,369 2004-12-22

Publications (2)

Publication Number Publication Date
WO2006067730A2 WO2006067730A2 (en) 2006-06-29
WO2006067730A3 true WO2006067730A3 (en) 2007-03-15

Family

ID=36165375

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2005/054315 WO2006067730A2 (en) 2004-12-22 2005-12-19 Device and method for holding a substrate

Country Status (2)

Country Link
TW (1) TW200626447A (en)
WO (1) WO2006067730A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7473908B2 (en) 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4630095A (en) * 1980-03-31 1986-12-16 Vlsi Technology Research Association Packaged semiconductor device structure including getter material for decreasing gas from a protective organic covering
US5921461A (en) * 1997-06-11 1999-07-13 Raytheon Company Vacuum package having vacuum-deposited local getter and its preparation
WO1999057607A1 (en) * 1998-04-30 1999-11-11 Euv Limited Liability Corporation Protection of lithographic components from particle contamination
US20010005944A1 (en) * 1999-12-30 2001-07-05 Dao Giang T. Reduced particle contamination manufacturing and packaging for reticles
WO2004040374A2 (en) * 2002-10-29 2004-05-13 Dupont Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4630095A (en) * 1980-03-31 1986-12-16 Vlsi Technology Research Association Packaged semiconductor device structure including getter material for decreasing gas from a protective organic covering
US5921461A (en) * 1997-06-11 1999-07-13 Raytheon Company Vacuum package having vacuum-deposited local getter and its preparation
WO1999057607A1 (en) * 1998-04-30 1999-11-11 Euv Limited Liability Corporation Protection of lithographic components from particle contamination
US20010005944A1 (en) * 1999-12-30 2001-07-05 Dao Giang T. Reduced particle contamination manufacturing and packaging for reticles
WO2004040374A2 (en) * 2002-10-29 2004-05-13 Dupont Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
J. STRONG: "evaporated aluminum films for astronomical mirrors", PUBLICATIONS OF THE ASTRONOMICAL SOCIETY OF THE PACIFIC, vol. 46, 1934, pages 18 - 26, XP002405450 *

Also Published As

Publication number Publication date
WO2006067730A2 (en) 2006-06-29
TW200626447A (en) 2006-08-01

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