WO2006058197B1 - Photomask container - Google Patents

Photomask container

Info

Publication number
WO2006058197B1
WO2006058197B1 PCT/US2005/042710 US2005042710W WO2006058197B1 WO 2006058197 B1 WO2006058197 B1 WO 2006058197B1 US 2005042710 W US2005042710 W US 2005042710W WO 2006058197 B1 WO2006058197 B1 WO 2006058197B1
Authority
WO
WIPO (PCT)
Prior art keywords
container
photomask
exterior surface
mold
pair
Prior art date
Application number
PCT/US2005/042710
Other languages
French (fr)
Other versions
WO2006058197A2 (en
WO2006058197A3 (en
Inventor
Michael L Johnson
Barry L Rauworth
Original Assignee
Entegris Inc
Michael L Johnson
Barry L Rauworth
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc, Michael L Johnson, Barry L Rauworth filed Critical Entegris Inc
Priority to EP05852173A priority Critical patent/EP1817245A2/en
Priority to JP2007543514A priority patent/JP2008522414A/en
Publication of WO2006058197A2 publication Critical patent/WO2006058197A2/en
Publication of WO2006058197A3 publication Critical patent/WO2006058197A3/en
Publication of WO2006058197B1 publication Critical patent/WO2006058197B1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D65/00—Wrappers or flexible covers; Packaging materials of special type or form
    • B65D65/38—Packaging materials of special type or form
    • B65D65/44—Applications of resilient shock-absorbing materials, e.g. foamed plastics material, honeycomb material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67396—Closed carriers characterised by the presence of antistatic elements

Abstract

A container suitable for storing and transporting photomasks and including a container body, a cover, first and second cushions and left and right channels disposed in slots formed in the container body. In one embodiment, the container of this invention is formed in a one-piece design by rotomolding. The cover is subsequently separated from the body and machined so as to provide a slidingly sufficient seal and disposed therein.

Claims

AMENDED CLAIMS received by the International Bureau on 23 April 2007 (23.04.2007)
1. A container for transporting photomasks in combination with a photomask, the photomask being generally rectangular and planar and having two ends, two sides, and a thickness, the container comprising: an elongate polymer container portion having a closed top wall with an exterior surface, a closed bottom wall with a exterior surface, a closed end and an open front, a pair of opposite side walls each with an exterior surface, each of the pair of sidewalls comprising an elongate polymer insert with an channel extending lengthwise and secured into the sidewall by weldments, each of the elongate polymer inserts formed of a polymer different than that of the side into which each of said inserts is secured by the weldments, the inserts integral with the sidewalls into which they were inserted, the photomask positioned in the channels, a cover closing the open end and partially extending over and engaging the exterior surface of the top wall, the exterior surface of the bottom wall, and the exterior surfaces of the two sidewalls, and a pair of end supports positioned at each end of the photomask in the container, the end supports engaging and securing the photomask in position when the cover closes the open end.
2. The combination of claim 1 wherein the container portion and .the side wall inserts are comprised of polyethelene.
3. The combination of claim 1 wherein the end supports are comprised of a foamed polymer.
4. The combination of claim 1 wherein the photomask has a length of at least 24 inches.
5. A container for transporting photomasks, the photomask being generally rectangular and planar and having two ends, two sides, and a thickness, the container comprising: an elongate polymer container portion having a closed top wall with an exterior surface, a closed bottom wall with a exterior surface, a closed end and an open front, a pair of opposite side walls each with an exterior surface, each of the pair of sidewalls comprising an elongate polymer insert with an channel extending lengthwise and secured into the sidewall by weldments, the photomask positioned in the channels, a cover closing the open end and partially extending over and engaging the exterior surface of the top wall, the exterior surface of the bottom wall, and the exterior surfaces of the two sidewalls, and a pair of end supports positioned at each end of the photomask in the container, the end supports engaging and securing the photomask in position when the cover closes the open end.
6. The container of claim 1 wherein the container portion and the side wall inserts are comprised of polyethelene.
7. The container of claim 1 wherein the end supports are comprised of a foamed polymer.
8. The container of claim 1 wherein the photomask has a length of at least 24 inches.
9.. A method of manufacturing containers of a length, a width and of a selectable height for substrates including photomasks, the container having a top wall, a bottom wall, a pair of side walls, a closed end, and open end, and a cover to extend over the open end, the method comprising the steps of: a) providing a rotational mold with inside surfaces defining a mold cavity with end cavity portions larger than an adjacent cavity midportion, the end cavity portion for forming an end portion on the body preform, the cavity midportion for forming a midportion on the body preform; b) molding the body preform by: i) insertion of resin into the mold; ii) heating the mold to melt the resin; iii) rotating the mold to disperse the molten resin along the inside surfaces; iv) allowing the molten resin to harden into the body preform with an end portion having a height and width greater that an adjacent midportion; v) removing the body preform from the mold; c) cutting through the body preform thereby severing at least a portion of the end portion; d) removal of elongate portions of each of the sidewalls to create apertures therein; and e) welding plastic inserts in said apertures.
10. The method of claim 9 further comprising the step of providing resin of sufficient quantity that body preform will have a substantially uniform thickness wall and said inside depth and width of the end portion is sized to slidingly engage the outside surface of the midportion.
11. (Cancelled).
12. The method of claim 11 further comprising the step of inserting a graphic on a substrate into the mold on a surface therein before heating the mold.
13. A method for making a container for a photomask, comprising: forming a unitary container body having a top, a bottom, a fronts a back and two sides; removing portions of the container body from the two sides to define side slots; inserting channels into the side slots; welding plastic inserts in said side slots; and forming a cover, the cover fitting the container.
14. The method of claim 13, in which the container body is formed by one of injection molding, blow molding, and rotation molding.
15. The method of claim 13, in which the container body is formed from a synthetic resin.
16. The method of claim 13, in which the container body is formed from polyethylene.
17. The method of claim 13, in which the container body is formed from polyethylene, an electrical conductor dispersed in the polyethylene.
18. The method of claim 13, in which portions of the container body are removed by machining.
PCT/US2005/042710 2004-11-24 2005-11-25 Photomask container WO2006058197A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP05852173A EP1817245A2 (en) 2004-11-24 2005-11-25 Photomask container
JP2007543514A JP2008522414A (en) 2004-11-24 2005-11-25 Photomask container

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US63090704P 2004-11-24 2004-11-24
US60/630,907 2004-11-24
US11/286,696 US7309460B2 (en) 2004-11-24 2005-11-23 Photomask container
US11/286,696 2005-11-23

Publications (3)

Publication Number Publication Date
WO2006058197A2 WO2006058197A2 (en) 2006-06-01
WO2006058197A3 WO2006058197A3 (en) 2007-04-12
WO2006058197B1 true WO2006058197B1 (en) 2007-06-21

Family

ID=36459965

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/042710 WO2006058197A2 (en) 2004-11-24 2005-11-25 Photomask container

Country Status (5)

Country Link
US (2) US7309460B2 (en)
EP (1) EP1817245A2 (en)
JP (1) JP2008522414A (en)
KR (1) KR20070084503A (en)
WO (1) WO2006058197A2 (en)

Families Citing this family (5)

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Publication number Priority date Publication date Assignee Title
KR101532893B1 (en) * 2005-09-27 2015-07-02 엔테그리스, 아이엔씨. Reticle Pod
JP4726867B2 (en) * 2007-07-11 2011-07-20 信越ポリマー株式会社 Substrate storage container and manufacturing method thereof
US10100402B2 (en) * 2011-10-07 2018-10-16 International Business Machines Corporation Substrate holder for graphene film synthesis
JP2014088184A (en) * 2012-10-29 2014-05-15 Nitto Denko Corp Encapsulating sheet container
TW202212460A (en) 2020-08-21 2022-04-01 日商積水成型工業股份有限公司 photomask container

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Also Published As

Publication number Publication date
KR20070084503A (en) 2007-08-24
WO2006058197A2 (en) 2006-06-01
WO2006058197A3 (en) 2007-04-12
EP1817245A2 (en) 2007-08-15
US7309460B2 (en) 2007-12-18
JP2008522414A (en) 2008-06-26
US20080093256A1 (en) 2008-04-24
US20060108250A1 (en) 2006-05-25

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