WO2006036562A3 - Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor - Google Patents

Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor Download PDF

Info

Publication number
WO2006036562A3
WO2006036562A3 PCT/US2005/032804 US2005032804W WO2006036562A3 WO 2006036562 A3 WO2006036562 A3 WO 2006036562A3 US 2005032804 W US2005032804 W US 2005032804W WO 2006036562 A3 WO2006036562 A3 WO 2006036562A3
Authority
WO
WIPO (PCT)
Prior art keywords
solidification
liquids
polymerizable liquid
polymerization technique
oxygen inhibition
Prior art date
Application number
PCT/US2005/032804
Other languages
French (fr)
Other versions
WO2006036562A2 (en
Inventor
Frank Y Xu
Edward B Fletcher
Pankaj B Lad
Michael P C Watts
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Priority to DE602005024589T priority Critical patent/DE602005024589D1/en
Priority to EP05815380A priority patent/EP1796851B1/en
Priority to AT05815380T priority patent/ATE486666T1/en
Priority to JP2007532433A priority patent/JP4942657B2/en
Priority to KR1020077006501A priority patent/KR101219354B1/en
Publication of WO2006036562A2 publication Critical patent/WO2006036562A2/en
Publication of WO2006036562A3 publication Critical patent/WO2006036562A3/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/02Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a matt or rough surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P31/00Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
    • A61P31/04Antibacterial agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures

Abstract

The present invention includes a method of solidifying a polymerizable liquid to form a film (200) on a substrate surface (36) that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerization process.
PCT/US2005/032804 2004-09-23 2005-09-13 Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor WO2006036562A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE602005024589T DE602005024589D1 (en) 2004-09-23 2005-09-13 POLYMERIZATION PROCEDURE FOR CONTROLLING THE OXYGEN INHIBITION IN THE FURTHER PROTECTION OF LIQUIDS
EP05815380A EP1796851B1 (en) 2004-09-23 2005-09-13 Polymerization technique to attenuate oxygen inhibition of solidification of liquids
AT05815380T ATE486666T1 (en) 2004-09-23 2005-09-13 POLYMERIZATION PROCESS FOR DAMPING OXYGEN INHIBITION DURING THE SOLIDIATION OF LIQUIDS
JP2007532433A JP4942657B2 (en) 2004-09-23 2005-09-13 Polymerization techniques to attenuate oxygen inhibition of liquid coagulation and compositions therefor
KR1020077006501A KR101219354B1 (en) 2004-09-23 2005-09-13 Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/948,511 US20060062922A1 (en) 2004-09-23 2004-09-23 Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US10/948,511 2004-09-23

Publications (2)

Publication Number Publication Date
WO2006036562A2 WO2006036562A2 (en) 2006-04-06
WO2006036562A3 true WO2006036562A3 (en) 2007-03-29

Family

ID=36074353

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/032804 WO2006036562A2 (en) 2004-09-23 2005-09-13 Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor

Country Status (9)

Country Link
US (3) US20060062922A1 (en)
EP (2) EP1796851B1 (en)
JP (1) JP4942657B2 (en)
KR (1) KR101219354B1 (en)
CN (1) CN101022894A (en)
AT (1) ATE486666T1 (en)
DE (1) DE602005024589D1 (en)
TW (1) TWI319349B (en)
WO (1) WO2006036562A2 (en)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US20060108710A1 (en) * 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7939131B2 (en) * 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US8721952B2 (en) * 2004-11-16 2014-05-13 International Business Machines Corporation Pneumatic method and apparatus for nano imprint lithography having a conforming mask
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US8846195B2 (en) * 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
US8557351B2 (en) * 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US7759407B2 (en) * 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8142703B2 (en) * 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
MY144847A (en) 2005-12-08 2011-11-30 Molecular Imprints Inc Method and system for double-sided patterning of substrates
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US8012395B2 (en) 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
US20080110557A1 (en) * 2006-11-15 2008-05-15 Molecular Imprints, Inc. Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces
WO2008082650A1 (en) * 2006-12-29 2008-07-10 Molecular Imprints, Inc. Imprint fluid control
US20090014917A1 (en) * 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
US8119052B2 (en) * 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
US20090148619A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Controlling Thickness of Residual Layer
US9323143B2 (en) * 2008-02-05 2016-04-26 Canon Nanotechnologies, Inc. Controlling template surface composition in nano-imprint lithography
US8361371B2 (en) * 2008-02-08 2013-01-29 Molecular Imprints, Inc. Extrusion reduction in imprint lithography
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
US20100096764A1 (en) * 2008-10-20 2010-04-22 Molecular Imprints, Inc. Gas Environment for Imprint Lithography
US8512797B2 (en) * 2008-10-21 2013-08-20 Molecular Imprints, Inc. Drop pattern generation with edge weighting
US8586126B2 (en) 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
US8361546B2 (en) * 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
US20100112220A1 (en) * 2008-11-03 2010-05-06 Molecular Imprints, Inc. Dispense system set-up and characterization
US20100109195A1 (en) 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
CN102438841A (en) 2009-03-23 2012-05-02 因特瓦克公司 A process for optimization of island to trench ratio in patterned media
JP5397054B2 (en) * 2009-07-08 2014-01-22 大日本印刷株式会社 Nanoimprint method and nanoimprint apparatus
WO2011066450A2 (en) * 2009-11-24 2011-06-03 Molecular Imprints, Inc. Adhesion layers in nanoimprint lithography
JP5002695B2 (en) 2010-09-24 2012-08-15 株式会社東芝 Micromachining method, micromachining apparatus, and micromachining program
JP6012344B2 (en) * 2011-10-24 2016-10-25 キヤノン株式会社 Method for forming film
FR2998793B1 (en) 2012-11-30 2014-11-28 Oreal COSMETIC COMPOSITION IN THE FORM OF OIL-IN-WATER EMULSION
JP5644906B2 (en) * 2013-07-18 2014-12-24 大日本印刷株式会社 Nanoimprint method
US9550845B2 (en) 2014-04-08 2017-01-24 The Board Of Trustees Of The University Of Illinois Multiple stage curable polymer with controlled transitions
WO2016048053A1 (en) * 2014-09-26 2016-03-31 한국기계연구원 Substrate on which multiple nanogaps are formed, and manufacturing method therefor
JP6363473B2 (en) * 2014-11-17 2018-07-25 株式会社トクヤマ Photo-curable composition for imprint, and method for producing resist laminate using the composition
US10120276B2 (en) * 2015-03-31 2018-11-06 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and method of manufacturing article
JP7397721B2 (en) 2020-03-06 2023-12-13 キヤノン株式会社 Determination method, imprint method, imprint device, article manufacturing method and program
JPWO2022107888A1 (en) * 2020-11-19 2022-05-27

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6063888A (en) * 1996-04-09 2000-05-16 Dsm N.V. Liquid curable resin composition

Family Cites Families (229)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1720535A1 (en) 1967-02-23 1971-07-08 Dow Chemical Co Polymerization of acrylic monomers
US3810874A (en) 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
US3844916A (en) * 1972-09-18 1974-10-29 Desoto Inc Radiation curable non-gelled michael addition reaction products
US3919351A (en) 1973-08-29 1975-11-11 Ppg Industries Inc Composition useful in making extensible films
US4118235A (en) * 1975-09-18 1978-10-03 Daikin Kogyo Co., Ltd. Mold release agent
US4058656A (en) 1976-04-05 1977-11-15 Ici United States Inc. Free radical polymerization process employing substituted amino acetic acid derivatives
JPS573875A (en) * 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition
US4617238A (en) 1982-04-01 1986-10-14 General Electric Company Vinyloxy-functional organopolysiloxane compositions
US4544572A (en) 1982-09-07 1985-10-01 Minnesota Mining And Manufacturing Company Coated ophthalmic lenses and method for coating the same
US4514439A (en) * 1983-09-16 1985-04-30 Rohm And Haas Company Dust cover
DE3345103A1 (en) 1983-12-13 1985-06-13 Bayer Ag, 5090 Leverkusen NEW AMINES, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE IN RADICALLY POLYMERIZABLE MEASURES
US4512848A (en) * 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US4517337A (en) * 1984-02-24 1985-05-14 General Electric Company Room temperature vulcanizable organopolysiloxane compositions and method for making
US4552833A (en) 1984-05-14 1985-11-12 International Business Machines Corporation Radiation sensitive and oxygen plasma developable resist
US4614667A (en) 1984-05-21 1986-09-30 Minnesota Mining And Manufacturing Company Composite low surface energy liner of perfluoropolyether
EP0166363B1 (en) * 1984-06-26 1991-08-07 Asahi Glass Company Ltd. Low reflectance transparent material having antisoiling properties
JPS61116358A (en) * 1984-11-09 1986-06-03 Mitsubishi Electric Corp Photomask material
US4707432A (en) 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
EP0255303B1 (en) * 1986-07-25 1989-10-11 Oki Electric Industry Company, Limited Negative resist material, method for its manufacture and method for using it
FR2604553A1 (en) 1986-09-29 1988-04-01 Rhone Poulenc Chimie RIGID POLYMER SUBSTRATE FOR OPTICAL DISC AND OPTICAL DISCS OBTAINED FROM THE SUBSTRATE
US4931351A (en) * 1987-01-12 1990-06-05 Eastman Kodak Company Bilayer lithographic process
US4731155A (en) * 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US4808511A (en) * 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process
US5180757A (en) * 1987-12-16 1993-01-19 Michael Lucey Photopolymerizable compositions used in electronics
JPH01163027A (en) * 1987-12-21 1989-06-27 Matsushita Electric Ind Co Ltd Method and device for molding optical element
US5028366A (en) * 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
US5108875A (en) * 1988-07-29 1992-04-28 Shipley Company Inc. Photoresist pattern fabrication employing chemically amplified metalized material
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US5169494A (en) 1989-03-27 1992-12-08 Matsushita Electric Industrial Co., Ltd. Fine pattern forming method
JP3001607B2 (en) * 1989-04-24 2000-01-24 シーメンス、アクチエンゲゼルシヤフト Dimensionally stable structure transfer method in two-layer method
US5110514A (en) 1989-05-01 1992-05-05 Soane Technologies, Inc. Controlled casting of a shrinkable material
US5028511A (en) 1989-05-30 1991-07-02 E. I. Du Pont De Nemours And Company Process for preparing a precolored image using photosensitive reproduction element containing a photorelease layer
US5139925A (en) * 1989-10-18 1992-08-18 Massachusetts Institute Of Technology Surface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laser
US5204381A (en) * 1990-02-13 1993-04-20 The United States Of America As Represented By The United States Department Of Energy Hybrid sol-gel optical materials
JP2586692B2 (en) * 1990-05-24 1997-03-05 松下電器産業株式会社 Pattern forming material and pattern forming method
US5170182A (en) 1990-08-23 1992-12-08 Management Graphics, Inc. Apparatus and method for registering an image on a recording medium
DE4029912A1 (en) 1990-09-21 1992-03-26 Philips Patentverwaltung METHOD FOR FORMING AT LEAST ONE TRENCH IN A SUBSTRATE LAYER
US5170192A (en) 1990-11-29 1992-12-08 Pilkington Visioncare, Inc. Oxygen permeable bifocal contact lenses and their manufacture
EP0492830B1 (en) * 1990-12-28 1996-07-17 Dow Corning Corporation Method of indicating a cure point for ultraviolet radiation curing compositions by color change
US6174931B1 (en) * 1991-02-28 2001-01-16 3M Innovative Properties Company Multi-stage irradiation process for production of acrylic based compositions and compositions made thereby
DE69217574T2 (en) * 1991-05-17 1997-06-12 Asahi Glass Co Ltd Surface treated substrate
US5206983A (en) * 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
JPH0538797A (en) * 1991-07-15 1993-02-19 Sekisui Chem Co Ltd Manufacture of coated material and sheet for coating
US5242711A (en) 1991-08-16 1993-09-07 Rockwell International Corp. Nucleation control of diamond films by microlithographic patterning
DE4228853C2 (en) 1991-09-18 1993-10-21 Schott Glaswerke Optical waveguide with a planar or only slightly curved substrate and method for its preparation and use of such
JPH0580530A (en) 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
US5331020A (en) * 1991-11-14 1994-07-19 Dow Corning Limited Organosilicon compounds and compositions containing them
US5545367A (en) * 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
JP3123195B2 (en) 1992-04-15 2001-01-09 ミノルタ株式会社 Inkjet recording liquid
FR2693727B1 (en) 1992-07-20 1994-08-19 Ceramiques Tech Soc D Organo-mineral polycondensate and process for obtaining it.
US5601641A (en) * 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
US5298556A (en) * 1992-07-21 1994-03-29 Tse Industries, Inc. Mold release composition and method coating a mold core
DE69405451T2 (en) * 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Method and device for producing a structured relief image from cross-linked photoresist on a flat substrate surface
EP0624404B1 (en) * 1993-05-14 1998-08-05 Asahi Glass Company Ltd. Surface-treated substrate and process for its production
US5861467A (en) * 1993-05-18 1999-01-19 Dow Corning Corporation Radiation curable siloxane compositions containing vinyl ether functionality and methods for their preparation
US5594042A (en) * 1993-05-18 1997-01-14 Dow Corning Corporation Radiation curable compositions containing vinyl ether functional polyorganosiloxanes
JP2837063B2 (en) 1993-06-04 1998-12-14 シャープ株式会社 Method of forming resist pattern
US5389696A (en) 1993-09-17 1995-02-14 Miles Inc. Process for the production of molded products using internal mold release agents
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5776748A (en) * 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US6776094B1 (en) * 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US5462700A (en) 1993-11-08 1995-10-31 Alliedsignal Inc. Process for making an array of tapered photopolymerized waveguides
JPH07238106A (en) * 1994-03-02 1995-09-12 Japan Synthetic Rubber Co Ltd Photocurable composition for forming three-dimensional molding and method of accelerating photocuring
US5417802A (en) * 1994-03-18 1995-05-23 At&T Corp. Integrated circuit manufacturing
US5542978A (en) 1994-06-10 1996-08-06 Johnson & Johnson Vision Products, Inc. Apparatus for applying a surfactant to mold surfaces
US5837314A (en) 1994-06-10 1998-11-17 Johnson & Johnson Vision Products, Inc. Method and apparatus for applying a surfactant to mold surfaces
US5523878A (en) * 1994-06-30 1996-06-04 Texas Instruments Incorporated Self-assembled monolayer coating for micro-mechanical devices
US5459198A (en) 1994-07-29 1995-10-17 E. I. Du Pont De Nemours And Company Fluoroinfused composites, articles of manufacture formed therefrom, and processes for the preparation thereof
JP3278306B2 (en) 1994-10-31 2002-04-30 富士写真フイルム株式会社 Positive photoresist composition
US5868966A (en) * 1995-03-30 1999-02-09 Drexel University Electroactive inorganic organic hybrid materials
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
GB9509487D0 (en) 1995-05-10 1995-07-05 Ici Plc Micro relief element & preparation thereof
US5820769A (en) 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
WO1997007429A1 (en) * 1995-08-18 1997-02-27 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US6468642B1 (en) 1995-10-03 2002-10-22 N.V. Bekaert S.A. Fluorine-doped diamond-like coatings
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US7758794B2 (en) * 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US5684066A (en) * 1995-12-04 1997-11-04 H.B. Fuller Licensing & Financing, Inc. Protective coatings having enhanced properties
US5669303A (en) 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US5725788A (en) * 1996-03-04 1998-03-10 Motorola Apparatus and method for patterning a surface
US6355198B1 (en) * 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
WO1997036210A1 (en) * 1996-03-28 1997-10-02 Minnesota Mining And Manufacturing Company Perfluoroether release coatings for organic photoreceptors
US5942443A (en) 1996-06-28 1999-08-24 Caliper Technologies Corporation High throughput screening assay systems in microscale fluidic devices
US5888650A (en) 1996-06-03 1999-03-30 Minnesota Mining And Manufacturing Company Temperature-responsive adhesive article
US6074827A (en) 1996-07-30 2000-06-13 Aclara Biosciences, Inc. Microfluidic method for nucleic acid purification and processing
US6204343B1 (en) 1996-12-11 2001-03-20 3M Innovative Properties Company Room temperature curable resin
US5895263A (en) 1996-12-19 1999-04-20 International Business Machines Corporation Process for manufacture of integrated circuit device
US5792821A (en) * 1997-01-06 1998-08-11 American Dental Association Health Foundation Polymerizable cyclodextrin derivatives
US6335149B1 (en) * 1997-04-08 2002-01-01 Corning Incorporated High performance acrylate materials for optical interconnects
US5948470A (en) 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
US6093455A (en) * 1997-05-23 2000-07-25 Deco Patents, Inc. Method and compositions for decorating glass
US6132632A (en) 1997-09-11 2000-10-17 International Business Machines Corporation Method and apparatus for achieving etch rate uniformity in a reactive ion etcher
US6475704B1 (en) 1997-09-12 2002-11-05 Canon Kabushiki Kaisha Method for forming fine structure
US6117708A (en) 1998-02-05 2000-09-12 Micron Technology, Inc. Use of residual organic compounds to facilitate gate break on a carrier substrate for a semiconductor device
US6114404A (en) 1998-03-23 2000-09-05 Corning Incorporated Radiation curable ink compositions and flat panel color filters made using same
KR20010013818A (en) 1998-04-15 2001-02-26 게스레이 마크 Photoresist developer and method of development
JP3931936B2 (en) * 1998-05-11 2007-06-20 セイコーエプソン株式会社 Microlens array substrate, method for manufacturing the same, and display device
JP3780700B2 (en) 1998-05-26 2006-05-31 セイコーエプソン株式会社 Pattern forming method, pattern forming apparatus, pattern forming plate, pattern forming plate manufacturing method, color filter manufacturing method, conductive film manufacturing method, and liquid crystal panel manufacturing method
DE19828969A1 (en) 1998-06-29 1999-12-30 Siemens Ag Manufacturing integrated semiconductor components
US6523803B1 (en) 1998-09-03 2003-02-25 Micron Technology, Inc. Mold apparatus used during semiconductor device fabrication
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6261469B1 (en) * 1998-10-13 2001-07-17 Honeywell International Inc. Three dimensionally periodic structural assemblies on nanometer and longer scales
US6218316B1 (en) * 1998-10-22 2001-04-17 Micron Technology, Inc. Planarization of non-planar surfaces in device fabrication
US6274294B1 (en) 1999-02-03 2001-08-14 Electroformed Stents, Inc. Cylindrical photolithography exposure process and apparatus
US6238798B1 (en) 1999-02-22 2001-05-29 3M Innovative Properties Company Ceramer composition and composite comprising free radically curable fluorochemical component
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US6342097B1 (en) * 1999-04-23 2002-01-29 Sdc Coatings, Inc. Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability
CA2280378C (en) * 1999-04-29 2009-05-26 S&C Electric Company Arrangements to detect and respond to disturbances in electrical power systems
WO2000076738A1 (en) 1999-06-11 2000-12-21 Bausch & Lomb Incorporated Lens molds with protective coatings for production of contact lenses and other ophthalmic products
US6344105B1 (en) * 1999-06-30 2002-02-05 Lam Research Corporation Techniques for improving etch rate uniformity
US6190929B1 (en) * 1999-07-23 2001-02-20 Micron Technology, Inc. Methods of forming semiconductor devices and methods of forming field emission displays
AU7361200A (en) 1999-09-10 2001-04-10 Nano-Tex, Llc Water-repellent and soil-resistant finish for textiles
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
CA2395760A1 (en) * 1999-12-23 2001-06-28 University Of Massachusetts Methods and apparatus for forming submicron patterns on films
US6696157B1 (en) * 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
JP4789329B2 (en) * 2000-04-03 2011-10-12 Jsr株式会社 Double layer film
US6306557B1 (en) * 2000-04-20 2001-10-23 Industrial Technology Research Foundation Process for preparing water dispersible negative-type photosensitive compositions
EP1150165A1 (en) 2000-04-25 2001-10-31 JSR Corporation Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element
US6774183B1 (en) 2000-04-27 2004-08-10 Bostik, Inc. Copolyesters having improved retained adhesion
US6262464B1 (en) 2000-06-19 2001-07-17 International Business Machines Corporation Encapsulated MEMS brand-pass filter for integrated circuits
EP1303792B1 (en) 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System High-resolution overlay alignement methods and systems for imprint lithography
EP2270592B1 (en) 2000-07-17 2015-09-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
US7211214B2 (en) * 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US20050037143A1 (en) * 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US6326627B1 (en) 2000-08-02 2001-12-04 Archimedes Technology Group, Inc. Mass filtering sputtered ion source
US6531407B1 (en) * 2000-08-31 2003-03-11 Micron Technology, Inc. Method, structure and process flow to reduce line-line capacitance with low-K material
US6448301B1 (en) 2000-09-08 2002-09-10 3M Innovative Properties Company Crosslinkable polymeric compositions and use thereof
JP2004523906A (en) * 2000-10-12 2004-08-05 ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム Templates for room-temperature and low-pressure micro and nano-transfer lithography
US6503914B1 (en) 2000-10-23 2003-01-07 Board Of Regents, The University Of Texas System Thienopyrimidine-based inhibitors of the Src family
GB0101070D0 (en) * 2001-01-16 2001-02-28 Reddiplex Group Plc Display stands
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6664026B2 (en) 2001-03-22 2003-12-16 International Business Machines Corporation Method of manufacturing high aspect ratio photolithographic features
US6517977B2 (en) 2001-03-28 2003-02-11 Motorola, Inc. Lithographic template and method of formation and use
US6541356B2 (en) * 2001-05-21 2003-04-01 International Business Machines Corporation Ultimate SIMOX
US6737489B2 (en) 2001-05-21 2004-05-18 3M Innovative Properties Company Polymers containing perfluorovinyl ethers and applications for such polymers
US6736857B2 (en) 2001-05-25 2004-05-18 3M Innovative Properties Company Method for imparting soil and stain resistance to carpet
US7141188B2 (en) 2001-05-30 2006-11-28 Honeywell International Inc. Organic compositions
CA2454570C (en) 2001-07-25 2016-12-20 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
JP2003161802A (en) * 2001-09-14 2003-06-06 Dainippon Printing Co Ltd Light-curing resin composite, sheet, transfer foil, minute project and recessed pattern forming method and optical component
US20030054115A1 (en) 2001-09-14 2003-03-20 Ralph Albano Ultraviolet curing process for porous low-K materials
US6721529B2 (en) 2001-09-21 2004-04-13 Nexpress Solutions Llc Release agent donor member having fluorocarbon thermoplastic random copolymer overcoat
CN100347608C (en) * 2001-09-25 2007-11-07 米卢塔技术株式会社 Method for forming a micro-pattern on a substrate by using capillary force
US6790905B2 (en) 2001-10-09 2004-09-14 E. I. Du Pont De Nemours And Company Highly repellent carpet protectants
US20030080472A1 (en) * 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method with bonded release layer for molding small patterns
US6716767B2 (en) * 2001-10-31 2004-04-06 Brewer Science, Inc. Contact planarization materials that generate no volatile byproducts or residue during curing
WO2003064495A2 (en) 2001-11-07 2003-08-07 Dow Global Technologies Inc. Planarized microelectronic substrates
US6649272B2 (en) 2001-11-08 2003-11-18 3M Innovative Properties Company Coating composition comprising fluorochemical polyether silane polycondensate and use thereof
US6605849B1 (en) 2002-02-14 2003-08-12 Symmetricom, Inc. MEMS analog frequency divider
TWI339680B (en) 2002-02-19 2011-04-01 Kanto Kagaku Washing liquid composition for semiconductor substrate
US7309560B2 (en) * 2002-02-19 2007-12-18 Nissan Chemical Industries, Ltd. Composition for forming anti-reflective coating
US7060774B2 (en) 2002-02-28 2006-06-13 Merck Patent Gesellschaft Prepolymer material, polymer material, imprinting process and their use
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US6849558B2 (en) * 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
US20030235787A1 (en) 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
WO2004009505A1 (en) 2002-07-23 2004-01-29 Shell Internationale Research Maatschappij B.V. Hydrophobic surface treatment composition and method of making and using same
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
AU2003261317A1 (en) * 2002-08-01 2004-02-23 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7750059B2 (en) * 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
CN1519260A (en) 2003-01-20 2004-08-11 上海华谊(集团)公司 Method of controllable free radical polymerization by using sulfid of amino thiocarbonyl as chain transfer agent
TWI230832B (en) * 2003-01-24 2005-04-11 Sipix Imaging Inc Novel adhesive and sealing layers for electrophoretic displays
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US6830819B2 (en) 2003-03-18 2004-12-14 Xerox Corporation Fluorosilicone release agent for fluoroelastomer fuser members
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
TWI228638B (en) 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US20060108710A1 (en) 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US7122482B2 (en) * 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
US20050098534A1 (en) 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
US20050106321A1 (en) 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050276919A1 (en) 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
US20050270516A1 (en) 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
KR101193918B1 (en) 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 Fluid dispensing and drop-on-demand dispensing for nano-scale menufacturing
US20070228593A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
US7309225B2 (en) 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7939131B2 (en) 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US7282550B2 (en) 2004-08-16 2007-10-16 Molecular Imprints, Inc. Composition to provide a layer with uniform etch characteristics
JP4904742B2 (en) * 2004-09-16 2012-03-28 旭硝子株式会社 Pattern forming method and article having pattern
US7547504B2 (en) 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
KR20070086766A (en) 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 Methods of exposure for the purpose of thermal management for imprint lithography processes
US7811505B2 (en) 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
US20060145398A1 (en) 2004-12-30 2006-07-06 Board Of Regents, The University Of Texas System Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
US20060177532A1 (en) 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US20060177535A1 (en) 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US20070228608A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Preserving Filled Features when Vacuum Wiping
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US7670534B2 (en) 2005-09-21 2010-03-02 Molecular Imprints, Inc. Method to control an atmosphere between a body and a substrate
US7906058B2 (en) 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
MY144847A (en) 2005-12-08 2011-11-30 Molecular Imprints Inc Method and system for double-sided patterning of substrates
US7360851B1 (en) 2006-02-15 2008-04-22 Kla-Tencor Technologies Corporation Automated pattern recognition of imprint technology
ATE513625T1 (en) 2006-04-03 2011-07-15 Molecular Imprints Inc LITHOGRAPH PRINTING SYSTEM
JP5306989B2 (en) 2006-04-03 2013-10-02 モレキュラー・インプリンツ・インコーポレーテッド Method for simultaneously patterning a substrate having a plurality of fields and alignment marks
WO2008082650A1 (en) 2006-12-29 2008-07-10 Molecular Imprints, Inc. Imprint fluid control

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6063888A (en) * 1996-04-09 2000-05-16 Dsm N.V. Liquid curable resin composition

Also Published As

Publication number Publication date
US20070141271A1 (en) 2007-06-21
KR20070085233A (en) 2007-08-27
EP1796851B1 (en) 2010-11-03
WO2006036562A2 (en) 2006-04-06
DE602005024589D1 (en) 2010-12-16
TWI319349B (en) 2010-01-11
ATE486666T1 (en) 2010-11-15
US7845931B2 (en) 2010-12-07
JP2008513577A (en) 2008-05-01
KR101219354B1 (en) 2013-01-18
US7981481B2 (en) 2011-07-19
US20060062922A1 (en) 2006-03-23
TW200613898A (en) 2006-05-01
US20080085465A1 (en) 2008-04-10
EP1796851A4 (en) 2009-05-06
EP1796851A2 (en) 2007-06-20
EP2272594A1 (en) 2011-01-12
CN101022894A (en) 2007-08-22
JP4942657B2 (en) 2012-05-30

Similar Documents

Publication Publication Date Title
WO2006036562A3 (en) Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
TW200500150A (en) Method of applying and drying liquid
WO2005064405A3 (en) Lithographic apparatus and device manufacturing method
TW200510957A (en) Lithographic apparatus and device munufacturing method
WO2005003864A3 (en) Apparatus and method for providing a confined liquid for immersion lithography
TW200627083A (en) Lithographic apparatus and device manufacturing method
WO2006062930A3 (en) Method and system for fast filling of templates for imprint lithography using on template dispense
WO2005024325A3 (en) Method and system for drying a substrate
WO2005118160A3 (en) Droplet dispensing in imprint lithography
WO2005069729A3 (en) A device method and system for the application of content on to the surface of a beverage
TW200644075A (en) Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus background of the invention
WO2006039225A3 (en) Proximity head substrate meniscus flow modulation
EP2620523A3 (en) Method of forming a microstructure
WO2004024805A8 (en) Method for reducing boundary surface reflection of plastic substrates and substrate modified in such a manner and use thereof
GB0329493D0 (en) Rotator wheel
WO2008070573A3 (en) Non-wetting coating on a fluid ejector
WO2010047755A3 (en) Gas environment for imprint lithography
AU2003219295A1 (en) Method and apparatus for the formation of hydrophobic surfaces
WO2006079541A3 (en) Solid separating apparatus, compact assembly, and separating method
WO2007145725A3 (en) Immersion lithography system and method having an immersion fluid confinement plate for submerging the substrate
TW200636859A (en) Ultralow dielectric constant layer with controlled biaxial stress
DE602006011542D1 (en) Silica organosol and process for its preparation
MX2007006628A (en) Preserved and enhanced holographic and optically variable devices and method for making the same.
SG132647A1 (en) Lithographic apparatus and device manufacturing method
TW200612492A (en) Method and composition to provide a layer with uniform etch characteristics

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2007532433

Country of ref document: JP

Ref document number: 200580031403.1

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 1020077006501

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2005815380

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 2005815380

Country of ref document: EP