WO2006023406A3 - Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry - Google Patents

Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry Download PDF

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Publication number
WO2006023406A3
WO2006023406A3 PCT/US2005/028852 US2005028852W WO2006023406A3 WO 2006023406 A3 WO2006023406 A3 WO 2006023406A3 US 2005028852 W US2005028852 W US 2005028852W WO 2006023406 A3 WO2006023406 A3 WO 2006023406A3
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WO
WIPO (PCT)
Prior art keywords
measurement
pulses
pulse
scattered
sequence
Prior art date
Application number
PCT/US2005/028852
Other languages
French (fr)
Other versions
WO2006023406A2 (en
Inventor
Henry A Hill
Original Assignee
Zetetic Inst
Henry A Hill
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Publication date
Application filed by Zetetic Inst, Henry A Hill filed Critical Zetetic Inst
Publication of WO2006023406A2 publication Critical patent/WO2006023406A2/en
Publication of WO2006023406A3 publication Critical patent/WO2006023406A3/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02022Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02012Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
    • G01B9/02014Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation by using pulsed light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062Active error reduction, i.e. varying with time
    • G01B9/02067Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
    • G01B9/02068Auto-alignment of optical elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078Caused by ambiguity
    • G01B9/02079Quadrature detection, i.e. detecting relatively phase-shifted signals
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70Using polarization in the interferometer

Abstract

A method of interferometrically obtaining measurements for properties associated with a spot on or in an object, the method involving: receiving a sequence of M optical pulses separated in time; from each pulse in the sequence of M optical pulses, generating an n-tuplet of measurement pulses, and an n-tuplet of reference pulses, wherein each measurement pulse has a corresponding reference pulse aligned with it in time; from each pulse of each n-tuplet of reference pulses for the sequence of M optical pulses, generating a reference beam; from each pulse of each n-tuplet of measurement pulses for the sequence of M optical pulses, (a) generating a measurement beam; (b) directing the measurement beam onto the spot to thereby produce a return measurement beam from the spot; and (c) combining the return measurement beam with the corresponding reference beam that was derived from the reference pulse corresponding to that measurement pulse to generate an interference beam, wherein the sequence of M n-tuplets of measurement pulses forms n interleaved sequences of M measurement pulses, and wherein the method further involves, for each of the n interleaved sequences of M measurement pulses, introducing a combination of phase shifts between the measurement beams and corresponding reference beams.
PCT/US2005/028852 2004-08-16 2005-08-16 Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry WO2006023406A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60204604P 2004-08-16 2004-08-16
US60/602,046 2004-08-16

Publications (2)

Publication Number Publication Date
WO2006023406A2 WO2006023406A2 (en) 2006-03-02
WO2006023406A3 true WO2006023406A3 (en) 2006-12-21

Family

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PCT/US2005/028852 WO2006023406A2 (en) 2004-08-16 2005-08-16 Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry

Country Status (3)

Country Link
US (1) US7161680B2 (en)
TW (1) TW200607991A (en)
WO (1) WO2006023406A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7355722B2 (en) * 2003-09-10 2008-04-08 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
WO2005031397A2 (en) * 2003-09-26 2005-04-07 Zetetic Institute Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
WO2007008265A2 (en) * 2005-04-11 2007-01-18 Zetetic Institute Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
US7428058B2 (en) * 2005-05-18 2008-09-23 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
US7405832B2 (en) * 2005-08-08 2008-07-29 Zetetic Institute Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
JP4732832B2 (en) * 2005-08-17 2011-07-27 株式会社日立製作所 Displacement measuring method and apparatus, stage apparatus and probe microscope
US7460245B2 (en) 2005-08-26 2008-12-02 Zetetic Institute Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
TW200728685A (en) * 2005-11-15 2007-08-01 Zetetic Inst Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
WO2011022829A1 (en) * 2009-08-27 2011-03-03 University Of New Brunswick System and method for brillouin analysis
KR20240018583A (en) * 2021-06-03 2024-02-13 노바 엘티디. Time-domain optical metrology and inspection of semiconductor devices

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6108087A (en) * 1998-02-24 2000-08-22 Kla-Tencor Corporation Non-contact system for measuring film thickness
US6252222B1 (en) * 2000-01-13 2001-06-26 Schlumberger Technologies, Inc. Differential pulsed laser beam probing of integrated circuits

Family Cites Families (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3628027A (en) * 1969-12-17 1971-12-14 Sulzer Ag Beam deflecting and focusing means for photoelectric monitoring, counting or control apparatus
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US4011011A (en) * 1973-03-09 1977-03-08 The Perkin-Elmer Corporation Optical projection apparatus
US4272684A (en) * 1978-10-06 1981-06-09 Xerox Corporation Optical beam-splitting arrangements on object side of a lens
US4226501A (en) * 1978-10-12 1980-10-07 The Perkin-Elmer Corporation Four mirror unobscurred anastigmatic telescope with all spherical surfaces
US4408884A (en) * 1981-06-29 1983-10-11 Rca Corporation Optical measurements of fine line parameters in integrated circuit processes
US4672196A (en) * 1984-02-02 1987-06-09 Canino Lawrence S Method and apparatus for measuring properties of thin materials using polarized light
US4685803A (en) * 1986-01-23 1987-08-11 Zygo Corporation Method and apparatus for the measurement of the refractive index of a gas
US4733967A (en) * 1987-03-19 1988-03-29 Zygo Corporation Apparatus for the measurement of the refractive index of a gas
US5241423A (en) * 1990-07-11 1993-08-31 International Business Machines Corporation High resolution reduction catadioptric relay lens
US5220403A (en) * 1991-03-11 1993-06-15 International Business Machines Corporation Apparatus and a method for high numerical aperture microscopic examination of materials
DE69121201D1 (en) * 1991-08-27 1996-09-05 Ibm Method and device for generating high-resolution optical images
JPH0797018B2 (en) * 1992-05-13 1995-10-18 インターナショナル・ビジネス・マシーンズ・コーポレイション Depth measuring method and device
US5392118A (en) * 1992-05-13 1995-02-21 International Business Machines Corporation Method for measuring a trench depth parameter of a material
IT1265106B1 (en) * 1993-07-23 1996-10-30 Solari Udine Spa OPTICAL SYSTEM FOR LIGHT-EMITTING DIODES
KR950704670A (en) * 1993-09-30 1995-11-20 가따다 데쯔야 Confocal Optics
US5614763A (en) * 1995-03-13 1997-03-25 Zetetic Institute Methods for improving performance and temperature robustness of optical coupling between solid state light sensors and optical systems
US5699201A (en) * 1995-03-27 1997-12-16 Hewlett-Packard Co. Low-profile, high-gain, wide-field-of-view, non-imaging optics
US5633972A (en) * 1995-11-29 1997-05-27 Trustees Of Tufts College Superresolution imaging fiber for subwavelength light energy generation and near-field optical microscopy
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
US5894195A (en) * 1996-05-03 1999-04-13 Mcdermott; Kevin Elliptical axial lighting device
US5915048A (en) * 1996-06-05 1999-06-22 Zetetic Institute Method and apparatus for discriminating in-focus images from out-of-focus light signals from background and foreground light sources
DE19734983A1 (en) * 1996-09-04 1998-03-05 Zeiss Carl Fa Optical arrangement of mirrors
US5923423A (en) * 1996-09-12 1999-07-13 Sentec Corporation Heterodyne scatterometer for detecting and analyzing wafer surface defects
US5757493A (en) * 1996-10-16 1998-05-26 Tropel Corporation Interferometer with catadioptric imaging system having expanded range of numerical aperture
US6018391A (en) * 1997-01-28 2000-01-25 Advantest Corporation Method and apparatus for inspecting foreign matter by examining frequency differences between probing light beam and reference light beam
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
US6480285B1 (en) * 1997-01-28 2002-11-12 Zetetic Institute Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation
US5828455A (en) * 1997-03-07 1998-10-27 Litel Instruments Apparatus, method of measurement, and method of data analysis for correction of optical system
US6124931A (en) * 1997-10-02 2000-09-26 Zygo Corporation Apparatus and methods for measuring intrinsic optical properties of a gas
US6330065B1 (en) * 1997-10-02 2001-12-11 Zygo Corporation Gas insensitive interferometric apparatus and methods
US6052231A (en) * 1998-01-21 2000-04-18 International Business Machines Corporation Beam dividing elements permitting projection of an image with high contrast
JP3697919B2 (en) * 1998-12-18 2005-09-21 コニカミノルタホールディングス株式会社 Video display device using reflective display element
US6271923B1 (en) * 1999-05-05 2001-08-07 Zygo Corporation Interferometry system having a dynamic beam steering assembly for measuring angle and distance
DE60030978T2 (en) * 1999-07-05 2007-06-14 Novartis Ag METHOD FOR USING A SENSOR UNIT
ATE285081T1 (en) * 1999-08-02 2005-01-15 Zetetic Inst INTERFEROMETRIC CONFOCAL NEAR FIELD SCANNING MICROSCOPY
US6469788B2 (en) * 2000-03-27 2002-10-22 California Institute Of Technology Coherent gradient sensing ellipsometer
US6917726B2 (en) * 2001-09-27 2005-07-12 Cornell Research Foundation, Inc. Zero-mode clad waveguides for performing spectroscopy with confined effective observation volumes
JP2004505256A (en) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート Multiple light source array with light transmission function enhanced by resonator
JP2004505257A (en) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート Multiple source arrays for confocal and near-field microscopy
AU2001281361A1 (en) * 2000-07-27 2002-02-13 Zetetic Institute Differential interferometric scanning near-field confocal microscopy
AU2001279047A1 (en) * 2000-07-27 2002-02-13 Zetetic Institute Control of position and orientation of sub-wavelength aperture array in near-field microscopy
WO2002010832A2 (en) * 2000-07-27 2002-02-07 Zetetic Institute Scanning interferometric near-field confocal microscopy with background amplitude reduction and compensation
US6597721B1 (en) * 2000-09-21 2003-07-22 Ut-Battelle, Llc Micro-laser
EP1336095B1 (en) * 2000-11-22 2006-10-18 Koninklijke Philips Electronics N.V. Measurement of surface defects
JP4195292B2 (en) * 2000-12-21 2008-12-10 ゼテティック・インスティチュート Imaging system using catadioptric system and catadioptric system
KR100649555B1 (en) * 2001-03-27 2006-11-24 삼성에스디아이 주식회사 Projection screen and projection system using it
US6847452B2 (en) * 2001-08-02 2005-01-25 Zygo Corporation Passive zero shear interferometers
US6771374B1 (en) * 2002-01-16 2004-08-03 Advanced Micro Devices, Inc. Scatterometry based measurements of a rotating substrate
US7084983B2 (en) * 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
KR20050114611A (en) * 2003-01-27 2005-12-06 제테틱 인스티튜트 Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry
JP2006516766A (en) * 2003-02-04 2006-07-06 ゼテテック インスティテュート Compensation for refractive index mismatch effects at the substrate-medium interface caused by non-confocal, confocal, and interferometric confocal microscopy
US7263259B2 (en) * 2003-02-07 2007-08-28 Zetetic Institute Multiple-source arrays fed by guided-wave structures and resonant guided-wave structure cavities
US6717736B1 (en) * 2003-02-13 2004-04-06 Zetetic Institute Catoptric and catadioptric imaging systems
US7046372B2 (en) * 2003-02-13 2006-05-16 Zetetic Institute Transverse differential interferometric confocal microscopy
WO2004074881A2 (en) * 2003-02-19 2004-09-02 Zetetic Institute Method and apparatus for dark field interferometric confocal microscopy
KR20050098952A (en) * 2003-02-19 2005-10-12 제테틱 인스티튜트 Longitudinal differential interferometric confocal microscopy
JP2006522339A (en) * 2003-04-01 2006-09-28 ゼテテック インスティテュート Apparatus and method for simultaneous measurement of orthogonally polarized beam fields scattered / reflected or transmitted by interferometric objects
WO2004090582A2 (en) * 2003-04-01 2004-10-21 Zetetic Institute Method for constructing a catadioptric lens system
EP1608933A4 (en) * 2003-04-03 2007-03-21 Zetetic Inst Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry
US7324209B2 (en) * 2003-07-07 2008-01-29 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
US7084984B2 (en) * 2003-07-07 2006-08-01 Zetetic Institute Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
WO2005031397A2 (en) * 2003-09-26 2005-04-07 Zetetic Institute Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6108087A (en) * 1998-02-24 2000-08-22 Kla-Tencor Corporation Non-contact system for measuring film thickness
US6252222B1 (en) * 2000-01-13 2001-06-26 Schlumberger Technologies, Inc. Differential pulsed laser beam probing of integrated circuits

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Publication number Publication date
TW200607991A (en) 2006-03-01
WO2006023406A2 (en) 2006-03-02
US20060033924A1 (en) 2006-02-16
US7161680B2 (en) 2007-01-09

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