WO2006023406A3 - Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry - Google Patents
Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry Download PDFInfo
- Publication number
- WO2006023406A3 WO2006023406A3 PCT/US2005/028852 US2005028852W WO2006023406A3 WO 2006023406 A3 WO2006023406 A3 WO 2006023406A3 US 2005028852 W US2005028852 W US 2005028852W WO 2006023406 A3 WO2006023406 A3 WO 2006023406A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- measurement
- pulses
- pulse
- scattered
- sequence
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
- G01B9/02014—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation by using pulsed light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
- G01B9/02068—Auto-alignment of optical elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02078—Caused by ambiguity
- G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60204604P | 2004-08-16 | 2004-08-16 | |
US60/602,046 | 2004-08-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006023406A2 WO2006023406A2 (en) | 2006-03-02 |
WO2006023406A3 true WO2006023406A3 (en) | 2006-12-21 |
Family
ID=35968079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/028852 WO2006023406A2 (en) | 2004-08-16 | 2005-08-16 | Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry |
Country Status (3)
Country | Link |
---|---|
US (1) | US7161680B2 (en) |
TW (1) | TW200607991A (en) |
WO (1) | WO2006023406A2 (en) |
Families Citing this family (10)
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US7355722B2 (en) * | 2003-09-10 | 2008-04-08 | Zetetic Institute | Catoptric and catadioptric imaging systems with adaptive catoptric surfaces |
WO2005031397A2 (en) * | 2003-09-26 | 2005-04-07 | Zetetic Institute | Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces |
WO2007008265A2 (en) * | 2005-04-11 | 2007-01-18 | Zetetic Institute | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
US7428058B2 (en) * | 2005-05-18 | 2008-09-23 | Zetetic Institute | Apparatus and method for in situ and ex situ measurements of optical system flare |
US7405832B2 (en) * | 2005-08-08 | 2008-07-29 | Zetetic Institute | Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry |
JP4732832B2 (en) * | 2005-08-17 | 2011-07-27 | 株式会社日立製作所 | Displacement measuring method and apparatus, stage apparatus and probe microscope |
US7460245B2 (en) | 2005-08-26 | 2008-12-02 | Zetetic Institute | Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry |
TW200728685A (en) * | 2005-11-15 | 2007-08-01 | Zetetic Inst | Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry |
WO2011022829A1 (en) * | 2009-08-27 | 2011-03-03 | University Of New Brunswick | System and method for brillouin analysis |
KR20240018583A (en) * | 2021-06-03 | 2024-02-13 | 노바 엘티디. | Time-domain optical metrology and inspection of semiconductor devices |
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-
2005
- 2005-08-16 TW TW094127853A patent/TW200607991A/en unknown
- 2005-08-16 WO PCT/US2005/028852 patent/WO2006023406A2/en active Application Filing
- 2005-08-16 US US11/204,758 patent/US7161680B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6108087A (en) * | 1998-02-24 | 2000-08-22 | Kla-Tencor Corporation | Non-contact system for measuring film thickness |
US6252222B1 (en) * | 2000-01-13 | 2001-06-26 | Schlumberger Technologies, Inc. | Differential pulsed laser beam probing of integrated circuits |
Also Published As
Publication number | Publication date |
---|---|
TW200607991A (en) | 2006-03-01 |
WO2006023406A2 (en) | 2006-03-02 |
US20060033924A1 (en) | 2006-02-16 |
US7161680B2 (en) | 2007-01-09 |
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