WO2006017793A3 - Moat system for an imprint lithography template - Google Patents

Moat system for an imprint lithography template Download PDF

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Publication number
WO2006017793A3
WO2006017793A3 PCT/US2005/028008 US2005028008W WO2006017793A3 WO 2006017793 A3 WO2006017793 A3 WO 2006017793A3 US 2005028008 W US2005028008 W US 2005028008W WO 2006017793 A3 WO2006017793 A3 WO 2006017793A3
Authority
WO
WIPO (PCT)
Prior art keywords
imprint lithography
lithography template
recess
moat
moat system
Prior art date
Application number
PCT/US2005/028008
Other languages
French (fr)
Other versions
WO2006017793A2 (en
Inventor
Ian M Mcmackin
Pankaj B Lad
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Priority to JP2007525691A priority Critical patent/JP2008509825A/en
Priority to EP05807754A priority patent/EP1778409A2/en
Publication of WO2006017793A2 publication Critical patent/WO2006017793A2/en
Publication of WO2006017793A3 publication Critical patent/WO2006017793A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S425/00—Plastic article or earthenware shaping or treating: apparatus
    • Y10S425/81—Sound record

Abstract

The present invention is directed to a body (90) having a first area and a second area separated by a recess (102, 104, 106, 108, 110). The recess (102, 104, 106, 108) is dimensioned to reduce, if not prevent a liquid moving along a surface of the body (90) from travelling between the first and second areas. One or more alignment marks (84, 136) may be positioned within one of the first and the second areas. In this manner, the recess functions as a moat (100) by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks (84, 136).
PCT/US2005/028008 2004-08-13 2005-08-05 Moat system for an imprint lithography template WO2006017793A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007525691A JP2008509825A (en) 2004-08-13 2005-08-05 Template moat system in imprint lithography
EP05807754A EP1778409A2 (en) 2004-08-13 2005-08-05 Moat system for an imprint lithography template

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/917,761 2004-08-13
US10/917,761 US7309225B2 (en) 2004-08-13 2004-08-13 Moat system for an imprint lithography template

Publications (2)

Publication Number Publication Date
WO2006017793A2 WO2006017793A2 (en) 2006-02-16
WO2006017793A3 true WO2006017793A3 (en) 2007-09-27

Family

ID=35798793

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/028008 WO2006017793A2 (en) 2004-08-13 2005-08-05 Moat system for an imprint lithography template

Country Status (6)

Country Link
US (1) US7309225B2 (en)
EP (1) EP1778409A2 (en)
JP (1) JP2008509825A (en)
KR (1) KR20070041585A (en)
TW (1) TWI266686B (en)
WO (1) WO2006017793A2 (en)

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