WO2005113257A3 - Compliant hard template for uv imprinting - Google Patents

Compliant hard template for uv imprinting Download PDF

Info

Publication number
WO2005113257A3
WO2005113257A3 PCT/US2005/013502 US2005013502W WO2005113257A3 WO 2005113257 A3 WO2005113257 A3 WO 2005113257A3 US 2005013502 W US2005013502 W US 2005013502W WO 2005113257 A3 WO2005113257 A3 WO 2005113257A3
Authority
WO
WIPO (PCT)
Prior art keywords
template
compliant
imprinting
relief image
imprinting layer
Prior art date
Application number
PCT/US2005/013502
Other languages
French (fr)
Other versions
WO2005113257A2 (en
WO2005113257A9 (en
Inventor
Michael P C Watts
Ronald D Voisin
Sidlgata V Sreenivasan
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Priority to CN2005800133464A priority Critical patent/CN1960855B/en
Priority to JP2007510799A priority patent/JP2007535172A/en
Priority to EP05779337A priority patent/EP1740373A4/en
Publication of WO2005113257A2 publication Critical patent/WO2005113257A2/en
Publication of WO2005113257A9 publication Critical patent/WO2005113257A9/en
Publication of WO2005113257A3 publication Critical patent/WO2005113257A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning

Abstract

Disclosed is a compliant UV imprint lithography template (10), which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image (20) and an elastomer (22) adapted to adjust the relief image. In an embodiment, the relief image (20) is arranged in a compliant imprinting layer (12) where the elastomer is arranged between the imprinting layer (12) and a rigid transparent substrate (24). In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer (22) and an imprinting layer (12) on a substrate (24) and patterning a relief image (20) into the imprinting layer (12) form the template (10).
PCT/US2005/013502 2004-04-27 2005-04-19 Compliant hard template for uv imprinting WO2005113257A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2005800133464A CN1960855B (en) 2004-04-27 2005-04-19 Compliant hard template for UV imprinting
JP2007510799A JP2007535172A (en) 2004-04-27 2005-04-19 Compliant hard template for UV imprinting
EP05779337A EP1740373A4 (en) 2004-04-27 2005-04-19 Compliant template for uv imprinting

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/833,240 US7140861B2 (en) 2004-04-27 2004-04-27 Compliant hard template for UV imprinting
US10/833,240 2004-04-27

Publications (3)

Publication Number Publication Date
WO2005113257A2 WO2005113257A2 (en) 2005-12-01
WO2005113257A9 WO2005113257A9 (en) 2006-04-06
WO2005113257A3 true WO2005113257A3 (en) 2006-07-13

Family

ID=35135388

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/013502 WO2005113257A2 (en) 2004-04-27 2005-04-19 Compliant hard template for uv imprinting

Country Status (7)

Country Link
US (2) US7140861B2 (en)
EP (1) EP1740373A4 (en)
JP (1) JP2007535172A (en)
KR (1) KR20070002066A (en)
CN (1) CN1960855B (en)
TW (1) TWI279830B (en)
WO (1) WO2005113257A2 (en)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6696220B2 (en) * 2000-10-12 2004-02-24 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro-and nano-imprint lithography
WO2002006902A2 (en) 2000-07-17 2002-01-24 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US20050064344A1 (en) * 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
GB0227902D0 (en) * 2002-11-29 2003-01-08 Ingenia Holdings Ltd Template
CA2549341C (en) 2003-12-19 2014-06-10 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7939131B2 (en) 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
EP1853967A4 (en) * 2005-02-03 2009-11-11 Univ North Carolina Low surface energy polymeric material for use in liquid crystal displays
US8357616B2 (en) * 2005-04-14 2013-01-22 President And Fellows Of Harvard College Adjustable solubility in sacrificial layers for microfabrication
JP4700996B2 (en) * 2005-04-19 2011-06-15 東芝機械株式会社 Transfer device
US7648354B2 (en) * 2005-04-28 2010-01-19 Toshiba Kikai Kabushiki Kaisha Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus
JP4729338B2 (en) * 2005-05-10 2011-07-20 東芝機械株式会社 Transfer device
JP4701008B2 (en) * 2005-05-25 2011-06-15 東芝機械株式会社 Transfer device with gimbal mechanism
US7927089B2 (en) * 2005-06-08 2011-04-19 Canon Kabushiki Kaisha Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method
US7771917B2 (en) * 2005-06-17 2010-08-10 Micron Technology, Inc. Methods of making templates for use in imprint lithography
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
US8850980B2 (en) * 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US20080181958A1 (en) * 2006-06-19 2008-07-31 Rothrock Ginger D Nanoparticle fabrication methods, systems, and materials
KR100785035B1 (en) 2006-12-11 2007-12-12 삼성전자주식회사 Nano imprint master and manufacturing method thereof
US7968253B2 (en) 2006-06-20 2011-06-28 Samsung Electronics Co., Ltd. Nano imprint master and method of manufacturing the same
KR100889814B1 (en) 2006-07-25 2009-03-20 삼성전자주식회사 A stamper and Production method thereof and Imprinting process of substrate using the stamper
KR100831046B1 (en) * 2006-09-13 2008-05-21 삼성전자주식회사 Mold for nano-imprinting and method of manufacturing the mold
US20100151031A1 (en) * 2007-03-23 2010-06-17 Desimone Joseph M Discrete size and shape specific organic nanoparticles designed to elicit an immune response
WO2008150499A1 (en) * 2007-05-30 2008-12-11 Molecular Imprints, Inc. Template having a silicon nitride, silicon carbide, or silicon oxynitride film
US20080309900A1 (en) * 2007-06-12 2008-12-18 Micron Technology, Inc. Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure
US20110105366A1 (en) * 2007-06-18 2011-05-05 Illumina, Inc. Microfabrication methods for the optimal patterning of substrates
US7906274B2 (en) * 2007-11-21 2011-03-15 Molecular Imprints, Inc. Method of creating a template employing a lift-off process
US20090148619A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Controlling Thickness of Residual Layer
NL1036215A1 (en) * 2007-12-11 2009-06-15 Asml Netherlands Bv Lithographic method and carrier substrate.
US8012394B2 (en) * 2007-12-28 2011-09-06 Molecular Imprints, Inc. Template pattern density doubling
US8114331B2 (en) 2008-01-02 2012-02-14 International Business Machines Corporation Amorphous oxide release layers for imprint lithography, and method of use
US8029716B2 (en) * 2008-02-01 2011-10-04 International Business Machines Corporation Amorphous nitride release layers for imprint lithography, and method of use
US8361371B2 (en) * 2008-02-08 2013-01-29 Molecular Imprints, Inc. Extrusion reduction in imprint lithography
JP5327421B2 (en) * 2008-03-14 2013-10-30 大日本印刷株式会社 Stamper for imprint
NL1036623A1 (en) * 2008-03-26 2009-09-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US20090263729A1 (en) * 2008-04-21 2009-10-22 Micron Technology, Inc. Templates for imprint lithography and methods of fabricating and using such templates
US7920329B2 (en) * 2008-06-20 2011-04-05 Aptina Imaging Corporation Embedded lens for achromatic wafer-level optical module and methods of forming the same
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
JP5383110B2 (en) * 2008-07-25 2014-01-08 株式会社東芝 Imprint device
JP4609562B2 (en) * 2008-09-10 2011-01-12 日立電線株式会社 Stamper for fine structure transfer and manufacturing method thereof
US20100095862A1 (en) * 2008-10-22 2010-04-22 Molecular Imprints, Inc. Double Sidewall Angle Nano-Imprint Template
CN102438841A (en) * 2009-03-23 2012-05-02 因特瓦克公司 A process for optimization of island to trench ratio in patterned media
JP2010267357A (en) * 2009-05-18 2010-11-25 Hitachi High-Technologies Corp Method and device for manufacturing patterned medium
FR2955520B1 (en) * 2010-01-28 2012-08-31 Commissariat Energie Atomique MOLD FOR NANO-PRINTING LITHOGRAPHY AND METHODS OF MAKING SAME
JP5722445B2 (en) * 2010-08-16 2015-05-20 エーエスエムエル ネザーランズ ビー．ブイ． Inspection method for imprint lithography and apparatus therefor
JP5637785B2 (en) 2010-09-06 2014-12-10 キヤノン株式会社 Original plate and method of manufacturing article using the same
EP2718465B1 (en) 2011-06-09 2022-04-13 Illumina, Inc. Method of making an analyte array
JP5328869B2 (en) * 2011-10-21 2013-10-30 東芝機械株式会社 Method of manufacturing a mold for transfer
US8778849B2 (en) 2011-10-28 2014-07-15 Illumina, Inc. Microarray fabrication system and method
JP5821909B2 (en) * 2013-07-30 2015-11-24 大日本印刷株式会社 Optical imprint mold and manufacturing method thereof
US9513543B2 (en) 2013-11-20 2016-12-06 Eastman Kodak Company Method for forming a non-deformable patterned template
CA3168318A1 (en) 2014-09-29 2016-04-07 Magic Leap, Inc. Architectures and methods for outputting different wavelength light out of waveguides
NZ773847A (en) 2015-03-16 2022-07-01 Magic Leap Inc Methods and systems for diagnosing and treating health ailments
CN107924085B (en) 2015-06-15 2022-09-02 奇跃公司 Virtual and augmented reality systems and methods
NZ747005A (en) 2016-04-08 2020-04-24 Magic Leap Inc Augmented reality systems and methods with variable focus lens elements
CN113219579A (en) 2016-05-12 2021-08-06 奇跃公司 Distributed light manipulation on an imaging waveguide
WO2018094093A1 (en) 2016-11-18 2018-05-24 Magic Leap, Inc. Waveguide light multiplexer using crossed gratings
IL303676B1 (en) 2016-11-18 2024-02-01 Magic Leap Inc Spatially variable liquid crystal diffraction gratings
KR102639600B1 (en) 2016-11-18 2024-02-21 매직 립, 인코포레이티드 Multilayer liquid crystal diffractive gratings for redirecting light of wide incident angle ranges
US11067860B2 (en) 2016-11-18 2021-07-20 Magic Leap, Inc. Liquid crystal diffractive devices with nano-scale pattern and methods of manufacturing the same
CA3045663A1 (en) 2016-12-08 2018-06-14 Magic Leap, Inc. Diffractive devices based on cholesteric liquid crystal
KR102550742B1 (en) 2016-12-14 2023-06-30 매직 립, 인코포레이티드 Patterning of liquid crystals using soft-imprint replication of surface alignment patterns
US10371896B2 (en) 2016-12-22 2019-08-06 Magic Leap, Inc. Color separation in planar waveguides using dichroic filters
AU2018210527B2 (en) 2017-01-23 2022-12-01 Magic Leap, Inc. Eyepiece for virtual, augmented, or mixed reality systems
JP7158395B2 (en) 2017-02-23 2022-10-21 マジック リープ， インコーポレイテッド Variable focus imaging device based on polarization conversion
IL303471A (en) 2017-03-21 2023-08-01 Magic Leap Inc Eye-imaging apparatus using diffractive optical elements
JP7280250B2 (en) 2017-09-21 2023-05-23 マジック リープ， インコーポレイテッド Augmented reality display with waveguide configured to capture images of the eye and/or environment
CN111683584A (en) 2017-12-15 2020-09-18 奇跃公司 Eyepiece for augmented reality display system
CN113168089A (en) * 2018-10-12 2021-07-23 莫福托尼克斯控股有限公司 Flexible stamp with tunable high dimensional stability
WO2020106824A1 (en) 2018-11-20 2020-05-28 Magic Leap, Inc. Eyepieces for augmented reality display system
US11650423B2 (en) 2019-06-20 2023-05-16 Magic Leap, Inc. Eyepieces for augmented reality display system
CN113204169A (en) * 2021-04-12 2021-08-03 新沂崚峻光电科技有限公司 Preparation method of novel embossing film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677178A (en) * 1965-10-11 1972-07-18 Scott Paper Co Dry planographic plates and methods, production and use
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique

Family Cites Families (105)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4201800A (en) 1978-04-28 1980-05-06 International Business Machines Corp. Hardened photoresist master image mask process
US4512848A (en) 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
JPS61116358A (en) 1984-11-09 1986-06-03 Mitsubishi Electric Corp Photomask material
FR2604553A1 (en) 1986-09-29 1988-04-01 Rhone Poulenc Chimie RIGID POLYMER SUBSTRATE FOR OPTICAL DISC AND OPTICAL DISCS OBTAINED FROM THE SUBSTRATE
US4731155A (en) 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5028366A (en) 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
JPH02305612A (en) * 1989-03-13 1990-12-19 Nippon Sheet Glass Co Ltd Manufacture of board with fine pattern
US5206983A (en) 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
JPH0553289A (en) 1991-08-22 1993-03-05 Nec Corp Production of phase shift reticle
JPH0580530A (en) 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
US5545367A (en) 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
US5601641A (en) 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
DE69405451T2 (en) 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Method and device for producing a structured relief image from cross-linked photoresist on a flat substrate surface
US5348616A (en) 1993-05-03 1994-09-20 Motorola, Inc. Method for patterning a mold
US5776748A (en) 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US5512131A (en) 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US6776094B1 (en) 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
AUPM897594A0 (en) * 1994-10-25 1994-11-17 Daratech Pty Ltd Controlled release container
US5477058A (en) 1994-11-09 1995-12-19 Kabushiki Kaisha Toshiba Attenuated phase-shifting mask with opaque reticle alignment marks
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
US5820769A (en) 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
JP3372258B2 (en) * 1995-08-04 2003-01-27 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Stamps for lithography processes
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US20040036201A1 (en) 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US20040137734A1 (en) 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US7758794B2 (en) 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US5669303A (en) 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6355198B1 (en) 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
US5817376A (en) 1996-03-26 1998-10-06 Minnesota Mining And Manufacturing Company Free-radically polymerizable compositions capable of being coated by electrostatic assistance
US5853446A (en) 1996-04-16 1998-12-29 Corning Incorporated Method for forming glass rib structures
US6753131B1 (en) 1996-07-22 2004-06-22 President And Fellows Of Harvard College Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
US5948470A (en) 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
US5937758A (en) 1997-11-26 1999-08-17 Motorola, Inc. Micro-contact printing stamp
US6117708A (en) 1998-02-05 2000-09-12 Micron Technology, Inc. Use of residual organic compounds to facilitate gate break on a carrier substrate for a semiconductor device
TW352421B (en) 1998-04-27 1999-02-11 United Microelectronics Corp Method and process of phase shifting mask
JP3780700B2 (en) 1998-05-26 2006-05-31 セイコーエプソン株式会社 Pattern forming method, pattern forming apparatus, pattern forming plate, pattern forming plate manufacturing method, color filter manufacturing method, conductive film manufacturing method, and liquid crystal panel manufacturing method
JP2000011858A (en) * 1998-06-22 2000-01-14 Yamaha Corp Manufacture of field emission type element
US6523803B1 (en) 1998-09-03 2003-02-25 Micron Technology, Inc. Mold apparatus used during semiconductor device fabrication
US6713238B1 (en) 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6261469B1 (en) 1998-10-13 2001-07-17 Honeywell International Inc. Three dimensionally periodic structural assemblies on nanometer and longer scales
US6218316B1 (en) 1998-10-22 2001-04-17 Micron Technology, Inc. Planarization of non-planar surfaces in device fabrication
US6251207B1 (en) 1998-12-31 2001-06-26 Kimberly-Clark Worldwide, Inc. Embossing and laminating irregular bonding patterns
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US6190929B1 (en) 1999-07-23 2001-02-20 Micron Technology, Inc. Methods of forming semiconductor devices and methods of forming field emission displays
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
AU779699B2 (en) 1999-12-23 2005-02-10 Universitat Konstanz Methods and apparatus for forming submicron patterns on films
US6165911A (en) 1999-12-29 2000-12-26 Calveley; Peter Braden Method of patterning a metal layer
TW562755B (en) * 1999-12-31 2003-11-21 Ibm Stamp device for printing a pattern on a surface of a substrate
US6262464B1 (en) 2000-06-19 2001-07-17 International Business Machines Corporation Encapsulated MEMS brand-pass filter for integrated circuits
US6696220B2 (en) 2000-10-12 2004-02-24 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro-and nano-imprint lithography
CN100504598C (en) 2000-07-16 2009-06-24 得克萨斯州大学系统董事会 High-resolution overlay alignment methods and systems for imprint lithography
US20050037143A1 (en) * 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7635262B2 (en) 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US6783719B2 (en) 2001-01-19 2004-08-31 Korry Electronics, Co. Mold with metal oxide surface compatible with ionic release agents
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6664026B2 (en) 2001-03-22 2003-12-16 International Business Machines Corporation Method of manufacturing high aspect ratio photolithographic features
US6517977B2 (en) 2001-03-28 2003-02-11 Motorola, Inc. Lithographic template and method of formation and use
JP2002353102A (en) 2001-05-23 2002-12-06 Hitachi Ltd Method of manufacturing semiconductor device
KR100479600B1 (en) * 2001-06-28 2005-04-06 주식회사 하이닉스반도체 A forming method of contact
US20050064344A1 (en) * 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
EP1417474B1 (en) 2001-07-25 2021-12-29 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
CN100347608C (en) 2001-09-25 2007-11-07 米卢塔技术株式会社 Method for forming a micro-pattern on a substrate by using capillary force
US20030080472A1 (en) 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method with bonded release layer for molding small patterns
TWI276153B (en) * 2001-11-12 2007-03-11 Hynix Semiconductor Inc Method for fabricating semiconductor device
US6890688B2 (en) 2001-12-18 2005-05-10 Freescale Semiconductor, Inc. Lithographic template and method of formation and use
US6605849B1 (en) 2002-02-14 2003-08-12 Symmetricom, Inc. MEMS analog frequency divider
DE10307518B4 (en) 2002-02-22 2011-04-14 Hoya Corp. Halftone phase shift mask blank, halftone phase shift mask and method of making the same
US6716754B2 (en) 2002-03-12 2004-04-06 Micron Technology, Inc. Methods of forming patterns and molds for semiconductor constructions
US6881366B2 (en) 2002-04-22 2005-04-19 International Business Machines Corporation Process of fabricating a precision microcontact printing stamp
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US6849558B2 (en) 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
JP2004034300A (en) * 2002-06-28 2004-02-05 Elionix Kk Micro-extruder
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
JP4333274B2 (en) * 2002-08-29 2009-09-16 凸版印刷株式会社 Pattern forming apparatus and method
WO2004027843A1 (en) * 2002-09-18 2004-04-01 Tokyo University Of Science Surface processing method
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US8222072B2 (en) * 2002-12-20 2012-07-17 The Trustees Of Princeton University Methods of fabricating devices by low pressure cold welding
JP4340086B2 (en) * 2003-03-20 2009-10-07 株式会社日立製作所 Nanoprinting stamper and fine structure transfer method
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
US20040202865A1 (en) 2003-04-08 2004-10-14 Andrew Homola Release coating for stamper
US7070406B2 (en) 2003-04-29 2006-07-04 Hewlett-Packard Development Company, L.P. Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
US6808646B1 (en) * 2003-04-29 2004-10-26 Hewlett-Packard Development Company, L.P. Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size
TWI228638B (en) 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US6908851B2 (en) * 2003-06-17 2005-06-21 Texas Instruments Incorporated Corrosion resistance for copper interconnects
US6852358B1 (en) 2003-08-28 2005-02-08 Chang Chun Plastics Co., Ltd. Process for preparing an optical waveguide component from acrylate/titanium alkoxide composite material and the prepared optical waveguide component
US7136150B2 (en) * 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US7122482B2 (en) * 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
US20050098534A1 (en) * 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
KR100566700B1 (en) * 2004-01-15 2006-04-03 삼성전자주식회사 Method for forming mask pattern, template for forming mask pattern and method for forming template
US20050230882A1 (en) * 2004-04-19 2005-10-20 Molecular Imprints, Inc. Method of forming a deep-featured template employed in imprint lithography
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677178A (en) * 1965-10-11 1972-07-18 Scott Paper Co Dry planographic plates and methods, production and use
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique

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US7140861B2 (en) 2006-11-28
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US20060096949A1 (en) 2006-05-11
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