WO2005104313A3 - Gas discharge laser chamber improvements - Google Patents

Gas discharge laser chamber improvements Download PDF

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Publication number
WO2005104313A3
WO2005104313A3 PCT/US2005/007168 US2005007168W WO2005104313A3 WO 2005104313 A3 WO2005104313 A3 WO 2005104313A3 US 2005007168 W US2005007168 W US 2005007168W WO 2005104313 A3 WO2005104313 A3 WO 2005104313A3
Authority
WO
WIPO (PCT)
Prior art keywords
chamber
interior wall
preionization
wall
gauge
Prior art date
Application number
PCT/US2005/007168
Other languages
French (fr)
Other versions
WO2005104313A2 (en
Inventor
William N Partlo
Yoshiho Amada
James A Carmichael
Timothy S Dyer
Walter D Gillespie
Bryan G Moosman
Curtis L Rettig
Brian D Strate
Thomas D Steiger
Fedor B Trintchouk
Richard C Ujazdowski
Original Assignee
Cymer Inc
William N Partlo
Yoshiho Amada
James A Carmichael
Timothy S Dyer
Walter D Gillespie
Bryan G Moosman
Curtis L Rettig
Brian D Strate
Thomas D Steiger
Fedor B Trintchouk
Richard C Ujazdowski
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc, William N Partlo, Yoshiho Amada, James A Carmichael, Timothy S Dyer, Walter D Gillespie, Bryan G Moosman, Curtis L Rettig, Brian D Strate, Thomas D Steiger, Fedor B Trintchouk, Richard C Ujazdowski filed Critical Cymer Inc
Priority to JP2007506189A priority Critical patent/JP5063341B2/en
Priority to EP05733083A priority patent/EP1754291B1/en
Priority to KR1020067020097A priority patent/KR101204694B1/en
Priority to DE602005024387T priority patent/DE602005024387D1/en
Publication of WO2005104313A2 publication Critical patent/WO2005104313A2/en
Publication of WO2005104313A3 publication Critical patent/WO2005104313A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers

Abstract

A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
PCT/US2005/007168 2004-03-31 2005-03-03 Gas discharge laser chamber improvements WO2005104313A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007506189A JP5063341B2 (en) 2004-03-31 2005-03-03 Gas discharge laser chamber improvement
EP05733083A EP1754291B1 (en) 2004-03-31 2005-03-03 Gas discharge laser chamber improvements
KR1020067020097A KR101204694B1 (en) 2004-03-31 2005-03-03 Gas discharge laser chamber improvements
DE602005024387T DE602005024387D1 (en) 2004-03-31 2005-03-03 IMPROVEMENTS OF GAS DISCHARGE LASER CHAMBERS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/815,387 2004-03-31
US10/815,387 US7522650B2 (en) 2004-03-31 2004-03-31 Gas discharge laser chamber improvements

Publications (2)

Publication Number Publication Date
WO2005104313A2 WO2005104313A2 (en) 2005-11-03
WO2005104313A3 true WO2005104313A3 (en) 2007-02-01

Family

ID=35060497

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/007168 WO2005104313A2 (en) 2004-03-31 2005-03-03 Gas discharge laser chamber improvements

Country Status (6)

Country Link
US (1) US7522650B2 (en)
EP (1) EP1754291B1 (en)
JP (1) JP5063341B2 (en)
KR (1) KR101204694B1 (en)
DE (1) DE602005024387D1 (en)
WO (1) WO2005104313A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
US7848835B2 (en) * 2006-06-02 2010-12-07 Cymer, Inc. High power laser flat panel workpiece treatment system controller
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7995637B2 (en) * 2008-10-21 2011-08-09 Cymer, Inc. Gas discharge laser chamber
US7819945B2 (en) * 2008-10-30 2010-10-26 Cymer, Inc. Metal fluoride trap
JP7065186B2 (en) * 2017-12-05 2022-05-11 サイマー リミテッド ライアビリティ カンパニー Non-woven screen for dust capture in laser discharge chamber

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4295104A (en) * 1979-11-14 1981-10-13 The United States Of America As Represented By The Secretary Of The Navy Laser having simultaneous ultraviolet and visible wavelengths
US20010028670A1 (en) * 2000-03-31 2001-10-11 Motohide Tamura Laser oscillator
US20040047386A1 (en) * 1998-07-18 2004-03-11 Das Palash P. High repetition rate gas discharge laser with precise pulse timing control

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60187073A (en) * 1984-03-07 1985-09-24 Toshiba Corp Gas laser oscillator
JPS60197073A (en) * 1984-03-21 1985-10-05 Sony Corp Color designation processing unit of color picture
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US5018161A (en) 1988-01-15 1991-05-21 Cymer Laser Technologies Compact excimer laser
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
JPH0341790A (en) * 1989-07-10 1991-02-22 Nikon Corp Gas laser
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
JPH03255680A (en) * 1990-03-05 1991-11-14 Nec Corp Oscillation device of excimer laser
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
JPH04288887A (en) * 1991-03-07 1992-10-13 Mitsubishi Electric Corp Excimer laser device
US5373523A (en) * 1992-10-15 1994-12-13 Kabushiki Kaisha Komatsu Seisakusho Excimer laser apparatus
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US5863017A (en) 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5991324A (en) 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6094448A (en) 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6192064B1 (en) 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6317447B1 (en) 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US6151349A (en) 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
US5978406A (en) 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
US5978405A (en) 1998-03-06 1999-11-02 Cymer, Inc. Laser chamber with minimized acoustic and shock wave disturbances
US6016325A (en) 1998-04-27 2000-01-18 Cymer, Inc. Magnetic modulator voltage and temperature timing compensation circuit
US6477193B2 (en) 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6208675B1 (en) 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6567450B2 (en) 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
US6212211B1 (en) 1998-10-09 2001-04-03 Cymer, Inc. Shock wave dissipating laser chamber
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6104735A (en) 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6549551B2 (en) 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6414979B2 (en) 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6535531B1 (en) 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6693939B2 (en) 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6570899B1 (en) 2000-08-28 2003-05-27 Komatsu Ltd. Gas laser device
JP2002119816A (en) * 2000-10-16 2002-04-23 Sumitomo Heavy Ind Ltd Contaminant collecting device
US6704339B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
US6690704B2 (en) 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
DE20218254U1 (en) 2002-11-25 2003-02-27 Lambda Physik Ag Gas discharge laser particularly excimer laser and F2 laser with dust removal feature

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4295104A (en) * 1979-11-14 1981-10-13 The United States Of America As Represented By The Secretary Of The Navy Laser having simultaneous ultraviolet and visible wavelengths
US20040047386A1 (en) * 1998-07-18 2004-03-11 Das Palash P. High repetition rate gas discharge laser with precise pulse timing control
US20010028670A1 (en) * 2000-03-31 2001-10-11 Motohide Tamura Laser oscillator

Also Published As

Publication number Publication date
EP1754291A4 (en) 2008-04-09
US20050226301A1 (en) 2005-10-13
EP1754291B1 (en) 2010-10-27
KR101204694B1 (en) 2012-11-26
WO2005104313A2 (en) 2005-11-03
KR20060132967A (en) 2006-12-22
JP2007531312A (en) 2007-11-01
JP5063341B2 (en) 2012-10-31
EP1754291A2 (en) 2007-02-21
US7522650B2 (en) 2009-04-21
DE602005024387D1 (en) 2010-12-09

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