WO2005101925A3 - Apparatus, system, and method for optical pulse gain enhancement for high-finesse external cavity - Google Patents
Apparatus, system, and method for optical pulse gain enhancement for high-finesse external cavity Download PDFInfo
- Publication number
- WO2005101925A3 WO2005101925A3 PCT/US2005/011850 US2005011850W WO2005101925A3 WO 2005101925 A3 WO2005101925 A3 WO 2005101925A3 US 2005011850 W US2005011850 W US 2005011850W WO 2005101925 A3 WO2005101925 A3 WO 2005101925A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical
- optical pulse
- external cavity
- gain enhancement
- pulse gain
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/06—Two-beam arrangements; Multi-beam arrangements storage rings; Electron rings
Abstract
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56084904P | 2004-04-09 | 2004-04-09 | |
US56086404P | 2004-04-09 | 2004-04-09 | |
US56101404P | 2004-04-09 | 2004-04-09 | |
US56084804P | 2004-04-09 | 2004-04-09 | |
US56084504P | 2004-04-09 | 2004-04-09 | |
US60/560,849 | 2004-04-09 | ||
US60/560,864 | 2004-04-09 | ||
US60/560,848 | 2004-04-09 | ||
US60/561,014 | 2004-04-09 | ||
US60/560,845 | 2004-04-09 | ||
US11/077,524 US7277526B2 (en) | 2004-04-09 | 2005-03-09 | Apparatus, system, and method for high flux, compact compton x-ray source |
US11/077,524 | 2005-03-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005101925A2 WO2005101925A2 (en) | 2005-10-27 |
WO2005101925A3 true WO2005101925A3 (en) | 2007-04-05 |
Family
ID=35060543
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/012043 WO2005101926A2 (en) | 2004-04-09 | 2005-04-08 | Apparatus, system, and method for high flux, compact compton x-ray source |
PCT/US2005/011916 WO2005112525A2 (en) | 2004-04-09 | 2005-04-08 | Apparatus, system, and method for frequency stabilized mode-locked laser |
PCT/US2005/011850 WO2005101925A2 (en) | 2004-04-09 | 2005-04-08 | Apparatus, system, and method for optical pulse gain enhancement for high-finesse external cavity |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/012043 WO2005101926A2 (en) | 2004-04-09 | 2005-04-08 | Apparatus, system, and method for high flux, compact compton x-ray source |
PCT/US2005/011916 WO2005112525A2 (en) | 2004-04-09 | 2005-04-08 | Apparatus, system, and method for frequency stabilized mode-locked laser |
Country Status (6)
Country | Link |
---|---|
US (7) | US7277526B2 (en) |
EP (1) | EP1745682B1 (en) |
JP (1) | JP5030772B2 (en) |
DK (1) | DK1745682T3 (en) |
HK (1) | HK1100117A1 (en) |
WO (3) | WO2005101926A2 (en) |
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- 2005-04-08 DK DK05744868.0T patent/DK1745682T3/en active
- 2005-04-08 US US11/102,597 patent/US20050254535A1/en not_active Abandoned
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2007
- 2007-05-21 US US11/751,545 patent/US7443956B2/en not_active Expired - Fee Related
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- 2007-09-17 US US11/856,282 patent/US7596208B2/en active Active
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Also Published As
Publication number | Publication date |
---|---|
US20050226383A1 (en) | 2005-10-13 |
EP1745682A2 (en) | 2007-01-24 |
US7242748B2 (en) | 2007-07-10 |
WO2005101926A2 (en) | 2005-10-27 |
US20050254535A1 (en) | 2005-11-17 |
WO2005101925A2 (en) | 2005-10-27 |
US20050254534A1 (en) | 2005-11-17 |
US20050243966A1 (en) | 2005-11-03 |
US20080002813A1 (en) | 2008-01-03 |
WO2005101926A3 (en) | 2006-11-02 |
DK1745682T3 (en) | 2013-01-21 |
US7443956B2 (en) | 2008-10-28 |
EP1745682A4 (en) | 2010-08-18 |
EP1745682B1 (en) | 2012-10-17 |
US7277526B2 (en) | 2007-10-02 |
JP5030772B2 (en) | 2012-09-19 |
US20080031420A1 (en) | 2008-02-07 |
US7301972B2 (en) | 2007-11-27 |
WO2005112525A2 (en) | 2005-11-24 |
JP2007533081A (en) | 2007-11-15 |
HK1100117A1 (en) | 2007-09-07 |
US7596208B2 (en) | 2009-09-29 |
US7295653B2 (en) | 2007-11-13 |
WO2005112525A3 (en) | 2007-03-29 |
US20050271185A1 (en) | 2005-12-08 |
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