WO2005057285A1 - Thermal curable one-liquid type epoxy resin composition for over-coat - Google Patents

Thermal curable one-liquid type epoxy resin composition for over-coat Download PDF

Info

Publication number
WO2005057285A1
WO2005057285A1 PCT/KR2004/003221 KR2004003221W WO2005057285A1 WO 2005057285 A1 WO2005057285 A1 WO 2005057285A1 KR 2004003221 W KR2004003221 W KR 2004003221W WO 2005057285 A1 WO2005057285 A1 WO 2005057285A1
Authority
WO
WIPO (PCT)
Prior art keywords
formula
group
compound
resin composition
epoxy resin
Prior art date
Application number
PCT/KR2004/003221
Other languages
French (fr)
Inventor
You-Lee Pae
Young-Keun Kim
Suk-Young Choi
Hyuk-Jin Cha
Jae-Hwan Lee
Mi-Sun Ryu
Seung-Woo Woo
Kwon-Yil Yoo
Su-Hyun Lee
Yong-Man Jeong
Bum-Young Choi
Cheol Han
Woong Kim
Nak-Chil Jung
Min-Ji Kim
Young-Soo Choi
Sang-Hyup Jung
Jae-Lok Choi
Original Assignee
Samyangems Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samyangems Co., Ltd. filed Critical Samyangems Co., Ltd.
Publication of WO2005057285A1 publication Critical patent/WO2005057285A1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • G03F7/425Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Definitions

  • composition which is used to form an overcoat of a color filter used for a thin film
  • TFT-LCD transistor-liquid crystal display
  • TFT-LCD thin film transistor-liquid crystal display
  • a large glass plate should be used and a large glass plate
  • color filter layer should be planarized on the glass plate.
  • materials of forming an overcoat to planarize the color filter layer.
  • Materials of an overcoat are usually either UV curable or thermal curable.
  • thermal curable overcoats are more needed.
  • conventional thermal curable overcoats are two-liquid epoxy type and have low storage
  • the present invention is designed to solve the problems of the prior art, and therefore it is an object of the present invention to provide a thermal curable one-liquid
  • TFT-LCD transistor-liquid crystal display
  • the present invention provides a thermal
  • curable one-liquid type epoxy resin composition for overcoat comprising: 100 parts by
  • At least one latent curing agent selected from the group consisting of a compound having
  • A is a monomer having epoxy group, for example, but not
  • glycidyl acrylate glycidyl methacrylate
  • glycidyl- ⁇ -ethyl acrylate glycidyl- ⁇ -ethyl acrylate
  • B is a monomer having carboxylic group and selected from acrylic acid and methacrylic acid.
  • C is styrene or an acryl or methacryl monomer having 1-14 carbon atoms, for example, but not limited to, styrene, methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, cyclohexyl methacrylate, methyl acrylate, ethyl acrylate, cyclohexyl acrylate, isobornyl methacrylate, isobornyl acrylate, hydroxyethyl methacrylate, dimethylamino ethyl methacrylate, acryl amide, or the like.
  • 1, m, and n means molar numbers of A, B and C, which are 0.1-90mol%, 0-70mol%, and 0.1-90mol%
  • Rj is alkyl group or ⁇ ryl group.
  • R 2 is alkyl group or aryl group
  • R 3 and ⁇ are independently aryl group, and ⁇ is one
  • R 5 , Re and R 7 are independently aryl group or substituted aryl group, and ⁇ is one selected from the group consisting of ⁇ ' 3° ⁇ 3 5 r 4 ,
  • R 8 , R 9 , R 10 , and R ⁇ are independently alkyl group or aryl group, and is one selected from the group consisting of ⁇ 4 , 6 .
  • Rj 2 and R 13 are independently alkyl group or aryl group.
  • the compound having the formula 2 can be at least one compound selected from phthalic anhydride, tetrahydrophthalic anhydride, hexa-hydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endomethylene tetra-hydrophthalic anhydride, hexachloroendomethylene tetra-hydrophthalic anhydride, dodecyl succinic anhydride, trimellitic anhydride, and the like.
  • the compound having the formula 3 can be at least one compound selected from pyromellitic dianhydride and benzophenone tetra-carboxylic acid dianhydride.
  • Each of the compounds having the formulas 4 to 7 can be selected from diphenyl iodonium trifluoromethane sulfonate, diphenyl iodonium nonafluorobutane sulfonate, di-(4-t-butylbenzene)iodonium trifluoromethane sulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium nonafluorobutanesulfonate, diphenyl 4-methylphenyl sulfonium
  • FIG. 1 is a schematic view of a color filter for a thin film transistor-liquid crystal
  • FIG. 2 is a graph showing thermogravimetric decomposition of the thermal curable one-liquid type epoxy resin composition prepared in Example 1, after thermal
  • FIG. 3 is a graph showing transparency of the thermal curable one-liquid type
  • a thermal curable one-liquid type epoxy resin composition for overcoat according to the present invention includes binder resin having the formula 1 described
  • the binder resin having the formula
  • 1 has an average molecular weight of 2,000-100,000, a dispersity of 1.0-5.0, and an acid
  • the binder resin having the formula 1 has
  • thermo curable one-liquid type epoxy resin composition of the present invention is thermo curable one-liquid type epoxy resin composition of the present invention
  • invention includes 0.1-100 parts by weight of at least one latent curing agent selected
  • the compound having the formula 2 is dicarboxylic acid cyclic anhydride and itsexamples include, but not limited to, phthalic anhydride, tetrahydrophthalic anhydride, hexa-hydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endomethylene tetra-hydrophthalic anhydride, hexachloroendomethylene tetra-hydrophthalic anhydride, dodecyl s ⁇ ccinic anhydride, trimellitic anhydride, and the like.
  • the compound having the formula 3 is tetracarboxylic acid dianhydride and its examples include, but not limited to, pyromellitic dianhydride, benzophenone tetra-carboxylic acid dianhydride, and the like. Both the compound having the formula 2 and the compound having the formula 3 are nonionic-type latent curing agents.
  • the compounds having formulas 4 to 7 are acid generator-type latent curing agents and their examples include, but not limited to, diphenyl iodonium trifluoromethane sulfonate, diphenyl iodonium nonafluorobutane sulfonate, di-(4-t-butylbenzene)iodonium trifluoromethane sulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium nonafluorobutanesulfonate, diphenyl 4-methylphenyl sulfonium trifluoromethanesulfonate, S-(2-naphthalenecarbonylmethyl) tetrahydrothiophenium trifluoromethanesulfonate, dimethyl(4-naphthol)sulfonium trifluoromethanesulfonate, N-succinimidyl
  • the overcoat can have desired physical properties.
  • thermo curable one-liquid type epoxy resin composition of the present invention is thermo curable one-liquid type epoxy resin composition of the present invention
  • invention includes 0.1-100 parts by weight of silicon-based compound having epoxy
  • the silicon-based compound increases adhesion of the composition and heat resistance after curing.
  • the silicon-based compound increases adhesion of the composition and heat resistance after curing.
  • silicon-based compound having epoxy group is, but not limited to,
  • compositional components are added to a solvent, thus obtaining the above compositional components
  • the solvent is an organic solvent which is highly organic solvent
  • the solvent can be, but not limited to, at least one solvent selected from ethyl
  • propylene glycol propyl ether methyl cellosolve acetate, ethyl cellosolve acetate,
  • NMP N-methyl-2-pyrrolidone
  • ⁇ -butyrolactone diethyl ether
  • diethyl ether diethyl ether
  • ether diglyme, tetrahydrofuran (THF), methanol, ethanol, propanol, iso-propanol, methyl(or ethyl) cellosolve, diethylene glycol methyl(or ethyl) ether, dipropylene glycol
  • thermo curable one-liquid type epoxy resin composition it is preferable that the thermal curable one-liquid type epoxy resin composition
  • the composition has a viscosity of 10-15 cps.
  • present invention may further include conventional levelling agent, defoaming agent, etc. in appropriate amounts, and if necessary, any additive which is compatible with the
  • a surfactant such as, a stabilizer, a sensitizer, an anti-striation agent,
  • silane-based epoxy compound and the additives for the total mass of the composition to be 1 kg.
  • the latent curing agents I through XXIII represent phthalic
  • compositions were prepared in the same manner as in the Examples, except
  • n 1-10.
  • Examples were performed on a substrate such as a silicon wafer or a glass substrate.
  • TGA based on an initial decomposition temperature, in which 5% of the initial weight is lost.
  • the viscosity change is at least 5 cps, the storage stability was rated as "bad".
  • the adhesion was rated as "good. If the pattern was peeled off, the adhesion
  • FIG. 1 is a schematic view of a color filter layer for a TFT-LCD, the color filter having an overcoat formed thereon.
  • FIG. 2 is a graph showing thermogravimetric decomposition of the overcoat resist prepared from the composition of Example 1 , after
  • FIG. 3 is a graph showing thermogravimetric decomposition of the thermal curable
  • Example 1 exhibits high
  • thermal stability and has a transmittance of 98% or more at 400 nm after thermal curing.
  • the overcoat can have desired physical properties.
  • TFT-LCD thin film transistor-liquid crystal display

Abstract

Provided is a thermal curable one-liquid type epoxy resin composition for overcoat. The composition includes 100 parts by weight of binder resin, 0.1-100 parts by weight of latent curing agent, and 0.1-100 parts by weight of silicon-based compound having epoxy group. The composition has high heat resistance, transparency, film retention, degree of planarization, and adhesion, as well as high storage stability, and thus, can be useful as an overcoat of a color filter used for a thin film transistor-liquid crystal display (TFT-LCD).

Description

THERMAL CURABLE ONE-LIQUID TYPE EPOXY RESIN COMPOSITION FOR OVER-COAT
TECHNICAL FIELD The present invention relates to a thermal curable one-liquid type epoxy resin
composition which is used to form an overcoat of a color filter used for a thin film
transistor-liquid crystal display (TFT-LCD), etc.
BACKGROUND ART A thin film transistor-liquid crystal display (TFT-LCD) is one of the most
rapidly developing flat display devices and expected to lead the market for display
devices. To manufacture large TFT-LCDs, a large glass plate should be used and a
color filter layer should be planarized on the glass plate. Thus, there is a need to develop materials of forming an overcoat to planarize the color filter layer. Materials of an overcoat are usually either UV curable or thermal curable. As
the glass plate is larger, it is more difficult to expose the entire surface of the overcoat to UV light at once. Thus, thermal curable overcoats are more needed. However, as conventional thermal curable overcoats are two-liquid epoxy type and have low storage
stability, a mixture of a binder solution with a hardner solution must be used within
several hours after mixing, which is disadvantageous in view of efficiency of
manufacturing processes.
DISCLOSURE OF INVENTION
The present invention is designed to solve the problems of the prior art, and therefore it is an object of the present invention to provide a thermal curable one-liquid
type epoxy resin composition for overcoat, which has high heat resistance, transparency,
film retention, degree of planarization, and adhesion, as well as high storage stability,
and thus, can be useful as an overcoat of a color filter used for a thin film
transistor-liquid crystal display (TFT-LCD), etc.
To achieve the above mentioned object, the present invention provides a thermal
curable one-liquid type epoxy resin composition for overcoat, comprising: 100 parts by
weight of a binder resin having the following formula 1; 0.1-1 OO parts by weight of at
least one latent curing agent selected from the group consisting of a compound having
the following formula 2, a compound having the following formula 3, a compound
having the following fomiula 4, a compound having the following formula 5, a compound having the following formula 6, and a compound having the following
formula 7; and 0.1-100 parts by weight of a silicon-based compound having epoxy
group.
<Formula 1>
,(A)^(B^(C)r Γ
In the formula 1, A is a monomer having epoxy group, for example, but not
limited to, glycidyl acrylate, glycidyl methacrylate, glycidyl-α-ethyl acrylate,
glycidyl-α-n-propylacrylate, glycidyl-α-butylacrylate, 3,4-epoxybutyl methacrylate,
3,4-epoxybutyl acrylate, 6,7-epoxyheptyl methacrylate, 6,7-epoxyheptyl acrylate,
6,7-epoxyheptyl-α -ethylacrylate, or the like. B is a monomer having carboxylic group and selected from acrylic acid and methacrylic acid. C is styrene or an acryl or methacryl monomer having 1-14 carbon atoms, for example, but not limited to, styrene, methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, cyclohexyl methacrylate, methyl acrylate, ethyl acrylate, cyclohexyl acrylate, isobornyl methacrylate, isobornyl acrylate, hydroxyethyl methacrylate, dimethylamino ethyl methacrylate, acryl amide, or the like. 1, m, and n means molar numbers of A, B and C, which are 0.1-90mol%, 0-70mol%, and 0.1-90mol% respectively.
<Formula 2>
Figure imgf000005_0001
In the formula 2, Rj is alkyl group or εryl group.
<Formula 3>
Figure imgf000005_0002
In the formula 3, R2 is alkyl group or aryl group, <Formula 4>
ΘΘ R3R4IX
In the formula 4, R3 and } are independently aryl group, and ^ is one
selected from the group consisting of
Figure imgf000006_0001
6 } and
SbF6 Θ
<Formula 5>
R5 RΘ R75X
In the formula 5, R5, Re and R7 are independently aryl group or substituted aryl group, and Λ is one selected from the group consisting of ^' 3° ^3 5 r4 ,
PF? , AsF? , md SbFβ Θ
<Formula 6>
Figure imgf000006_0002
In the formula 6, R8, R9, R10, and Rπ are independently alkyl group or aryl group,
Figure imgf000007_0001
and is one selected from the group consisting of ^ 4 , 6 .
AsF^ and SbF^
<Formula 7>
Figure imgf000007_0002
In the formula 7, Rj2 and R13 are independently alkyl group or aryl group. In the thermal curable one-liquid type epoxy resin composition for overcoat according to the present invention, the compound having the formula 2 can be at least one compound selected from phthalic anhydride, tetrahydrophthalic anhydride, hexa-hydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endomethylene tetra-hydrophthalic anhydride, hexachloroendomethylene tetra-hydrophthalic anhydride, dodecyl succinic anhydride, trimellitic anhydride, and the like. The compound having the formula 3 can be at least one compound selected from pyromellitic dianhydride and benzophenone tetra-carboxylic acid dianhydride. Each of the compounds having the formulas 4 to 7 can be selected from diphenyl iodonium trifluoromethane sulfonate, diphenyl iodonium nonafluorobutane sulfonate, di-(4-t-butylbenzene)iodonium trifluoromethane sulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium nonafluorobutanesulfonate, diphenyl 4-methylphenyl sulfonium
trifluoromethanesulfonate, S-(2-naphthalenecarbonylmethyl) tetrahydrothiophenium
trifluoromethanesulfonate, dimethyl(4-naphthol)sulfonium trifluoromethanesulfonate,
N-succinimidyl 10-camphorsulfonate,
N-( 1 ,2,4,6-tetrahydrophthalimidyl)-P-toluenesulfonate,
N-( 1 ,8-naphthalenedicarboximidyl)- 10-camphorsulfonate, N-(l,8-naphthalenecarboximidyl)-ρ-toluenesulfonate, and the like.
BRIEF DESCRIPTION OF THE DRAWINGS Other objects and aspects of the present invention will become apparent from the
following description of embodiments with reference to the accompanying drawing in
which:
FIG. 1 is a schematic view of a color filter for a thin film transistor-liquid crystal
display (TFT-LCD), the color filter having an overcoat formed thereon; FIG. 2 is a graph showing thermogravimetric decomposition of the thermal curable one-liquid type epoxy resin composition prepared in Example 1, after thermal
curing; and FIG. 3 is a graph showing transparency of the thermal curable one-liquid type
epoxy resin composition prepared in Example 1, after thermal curing.
BEST MODES FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described in more detail.
A thermal curable one-liquid type epoxy resin composition for overcoat according to the present invention includes binder resin having the formula 1 described
above. In the formula 1, monomer A increases adhesion of the composition, monomer
B aids to cure an epoxy, thereby decreasing a curing time, and monomer C increases
durability of a film formed of the composition. The copolymer having the formula 1
can be produced by a radical polymerization reaction in the presence of a radical
polymerization initiator and a solvent. Preferably, the binder resin having the formula
1 has an average molecular weight of 2,000-100,000, a dispersity of 1.0-5.0, and an acid
value of 0-400 KOHmg/g. More preferably, the binder resin having the formula 1 has
an average molecular weight of 5,000-60,000, a dispersity of 1.6-3.0, and an acid value of 0-150 KOHmg/g.
The thermal curable one-liquid type epoxy resin composition of the present
invention includes 0.1-100 parts by weight of at least one latent curing agent selected
from a compound having the formula 2, a compound having the formula 3, a compound
having the formula 4, a compound having the formula 5, a compound having the
formula 6, and a compound having the formula 7, based on a total solid content of the resins.
The compound having the formula 2 is dicarboxylic acid cyclic anhydride and itsexamples include, but not limited to, phthalic anhydride, tetrahydrophthalic anhydride, hexa-hydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endomethylene tetra-hydrophthalic anhydride, hexachloroendomethylene tetra-hydrophthalic anhydride, dodecyl sαccinic anhydride, trimellitic anhydride, and the like. The compound having the formula 3 is tetracarboxylic acid dianhydride and its examples include, but not limited to, pyromellitic dianhydride, benzophenone tetra-carboxylic acid dianhydride, and the like. Both the compound having the formula 2 and the compound having the formula 3 are nonionic-type latent curing agents.
The compounds having formulas 4 to 7 are acid generator-type latent curing agents and their examples include, but not limited to, diphenyl iodonium trifluoromethane sulfonate, diphenyl iodonium nonafluorobutane sulfonate, di-(4-t-butylbenzene)iodonium trifluoromethane sulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium nonafluorobutanesulfonate, diphenyl 4-methylphenyl sulfonium trifluoromethanesulfonate, S-(2-naphthalenecarbonylmethyl) tetrahydrothiophenium trifluoromethanesulfonate, dimethyl(4-naphthol)sulfonium trifluoromethanesulfonate, N-succinimidyl
10-camphorsulfonate, N-( 1 ,2,4,6-tetrahydrophthalimidyl)-P-toluenesulfonate,
N-(l,8-naphthalenedicarboximidyl)-10-camphorsulfonate,
N-(l,8-naphthalenecarboximidyl)-p-toluenesulfonate, and the like. By changing the types and compositions of the binder resin having the formula 1, the nonionic-type latent curing agents, and the acid generator-type latent curing agents, the overcoat can have desired physical properties.
The thermal curable one-liquid type epoxy resin composition of the present
invention includes 0.1-100 parts by weight of silicon-based compound having epoxy
group, based on a total solid content of the resins. The silicon-based compound increases adhesion of the composition and heat resistance after curing. Preferably the
silicon-based compound having epoxy group is, but not limited to,
(3-glycidoxypropyl)trimethoxy(ethoxy)silane, (3-glycidoxypropyl)methyldimethoxy(ethoxy)silane, (3-glycidoxypropyl)
dimethylmethoxy(ethoxy)silane, 3,4-epoxybutyltrimethoxy(ethoxy)silane,
2-(3,4-epoxycyclohexyl)ethyltrimethoxy(ethoxy)silane, or the like.
The above compositional components are added to a solvent, thus obtaining the
composition. Advantageously, the solvent is an organic solvent which is highly
compatible with the binder resin, the latent curing agent, and other additives. For this
purpose, the solvent can be, but not limited to, at least one solvent selected from ethyl
acetate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate (EEP), ethyl
lactate, propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether,
propylene glycol propyl ether, methyl cellosolve acetate, ethyl cellosolve acetate,
diethylene glycol methyl(or ethyl) acetate, acetone, methyl isobutyl ketone,
cyclohexanone, dimethylformamide (DMF), N,N-dimethylacetamide (DMAc),
N-methyl-2-pyrrolidone (NMP), γ-butyrolactone, diethyl ether, ethylene glycol dimethyl
ether, diglyme, tetrahydrofuran (THF), methanol, ethanol, propanol, iso-propanol, methyl(or ethyl) cellosolve, diethylene glycol methyl(or ethyl) ether, dipropylene glycol
methyl ether, toluene, xylene, hexane, heptane, octane, and the like.
It is preferable that the thermal curable one-liquid type epoxy resin composition
has a viscosity of 2-20 cps so as to control its coating property and solid content.
When the composition has a viscosity of 2-20 cps, pinholes are not generated in the thin
film formed after coating and a thickness of the thin film can be more easily controlled. More preferably, the composition has a viscosity of 10-15 cps. The thermal curable one-liquid type epoxy resin composition according to the
present invention may further include conventional levelling agent, defoaming agent, etc. in appropriate amounts, and if necessary, any additive which is compatible with the
other components, such as, a surfactant, a stabilizer, a sensitizer, an anti-striation agent,
a plasticizer, etc.
Hereinafter, the present invention will be described in more details. However,
it should be understood that the detailed description and a specific example, while
indicating preferred embodiments of the invention, are given by way of illustration only,
since various changes and modifications within the spirit and scope of the invention will
become apparent to those skilled in the art from this detailed description.
Examples
According to the components and compositions listed in Tables 1-5, a binder
resin solution having the formula 1 (A = glycidyl methacrylate, B = methacrylic acid, C
= methyl methacrylate, average molecular weight = 50,000, dispersity = 2.5), a latent
curing agent, a silicon-based compound having epoxy group, other additives, and then, a
solvent were added sequentially to a reactor equipped with a stirrer, and then stirred at room temperature. A viscosity of the resist composition was adjusted to 10-15 cps using the solvent. The term "balance" in Tables refers to an amount of the solvent
(expressed in parts) which must be added to the binder resin, the latent curing agent, the
silane-based epoxy compound, and the additives for the total mass of the composition to be 1 kg.
In Examples, the latent curing agents I through XXIII represent phthalic
anhydride(I), tetrahydrophthalic anhydride(II), hexa-hydrophthalic anhydride(III), methyltetrahydrophthalic anhydride(IV), methylhexahydrophthalic anhydride(V), methyl endomethylene tetra-hydrophthalic anhydride(VI), hexachloroendomethylene
tetra-hydrophthalic anhydride(VII), dodecyl succinic anhydride(VIII), trimellitic
anhydride(IX), pyromellitic dianhydride(X), benzophenone tetra-carboxylic acid
dianhydride(XI), diphenyl iodonium trifluoromethane sulfonate(XII), diphenyl iodonium
nonafluorobutane sulfonate(XIII), di-(4-t-butylbenzene)iodonium trifluoromethane
sulfonate(XIV), triphenylsulfonium trifluoromethanesulfonate(XV), triphenylsulfonium
nonafluorobutanesulfonate(XVI), diphenyl 4-methylphenyl sulfonium
trifluoromethanesulfonate(XVII), S-(2-naphthalenecarbonylmethyl)
tetrahydrothiophenium trifluoromethanesulfonate(XVIII),
dimethyl(4-naphthol)sulfonium trifluoromethanesulfonate(XIX), N-succinimidyl
10-camphorsulfonate(XX), N-( 1 ,2,4,6-tetrahydrophthalimidyl)
-P-toluenesulfonate(XXI),
N-(l,8-naphthalenedicarboximidyl)-10-camphorsulfonate(XXII), and
N-(l ,8-naphthalenecarboximidyl)-p-toluenesulfonate (XXIII), respectively.
Comparative Examples
The compositions were prepared in the same manner as in the Examples, except
that the binder resin having the following formula 8 was used in place of the binder
resin having the formula 1 and the components and compositions listed in Table 6 were used.
<Formula 8>
Figure imgf000014_0001
In the formula 8, n is 1-10.
Evaluations of the resist compositions prepared in Examples and Comparative
Examples were performed on a substrate such as a silicon wafer or a glass substrate.
Thermal property, UV transmittance, film retention, storage stability, and adhesion of
the compositions were tested as follows. The results are shown in Table 7.
(1) Thermal property
To evaluate the thermal properties of the compositions, thermal decomposition
temperatures of the compositions were measured using thermogravimetric analysis
(TGA) based on an initial decomposition temperature, in which 5% of the initial weight is lost.
(2) UV transmittance Each of the compositions was applied on a substrate using a spin coater at 500
rpm for 20 seconds, pre-baked at 90 °C for 5 minutes, and then, post-baked at 220 °C for
60 minutes to form a resist layer. Next, UV was transmitted and then UV
transmittance was measured.
(3) Film retention Each of the compositions was spin-coated on a substrate. The thickness ratio
(%) between layers formed by pre-baking and post-baking, respectively, was measured.
(4) Storage stability After the compositions were stored at room temperature for 1 month, a viscosity
change between before and after the storage was measured for each of the compositions. If the viscosity change is less than 5 cps, the storage stability was rated as "good". If
the viscosity change is at least 5 cps, the storage stability was rated as "bad".
(5) Adhesion
Film formed on a silicon wafer using each of the compositions was divided into
100 equal parts of line pattern using cross-cut blades. Tape was applied on the film, and then pulled off from the substrate in upward direction. If the pattern was not
peeled off, the adhesion was rated as "good. If the pattern was peeled off, the adhesion
was rated as "bad".
Table 1
Figure imgf000016_0001
Table 2
Figure imgf000016_0002
Table 3
Figure imgf000016_0003
Table 4
Figure imgf000016_0004
Figure imgf000017_0001
Table 5
Figure imgf000017_0002
Table 6
Figure imgf000017_0003
Table 7
Figure imgf000017_0004
Figure imgf000018_0001
As shown in the table 7, it was confirmed that the thermal curable one-liquid
type epoxy resin compositions according to the present invention including the binder
resin having the formula 1 and at least one latent heat curing agents selected from the
compounds having the fonnulas 2 to 7 had higher storage stability, heat resistance, transparency, film retention, degree of planarization, and adhesion to a glass surface.
FIG. 1 is a schematic view of a color filter layer for a TFT-LCD, the color filter having an overcoat formed thereon. FIG. 2 is a graph showing thermogravimetric decomposition of the overcoat resist prepared from the composition of Example 1 , after
thermal curing. Refening to FIG. 2, it exhibits a stable thermal property up to 325 °C .
FIG. 3 is a graph showing thermogravimetric decomposition of the thermal curable
one-liquid type epoxy resin composition prepared in Example 1, after thermal curing.
Referring to FIGS. 2 and 3, the composition prepared in Example 1 exhibits high
thermal stability and has a transmittance of 98% or more at 400 nm after thermal curing.
INDUSTRIAL APPLICABILITY As described above, a thermal curable one-liquid type epoxy resin composition
for overcoat according to the present invention has high heat resistance, transparency,
film retention, degree of planarization, and adhesion, as well as high storage stability.
Further, by changing a structure of a binder resin or the type or compositional ratio of a latent curing agent, the overcoat can have desired physical properties. Thus, the
thermal curable one-liquid type epoxy resin composition according to the present
invention can be useful as an overcoat of a color filter used for a thin film transistor-liquid crystal display (TFT-LCD).

Claims

What is claimed is:
1. A thermal curable one-liquid type epoxy resin composition for overcoat,
comprising: 100 parts by weight of a binder resin having the following formula 1 ;
0.1-100 parts by weight of at least one latent curing agent selected from the
group consisting of a compound having the following formula 2, a compound having the
following formula 3, a compound having the following formula 4, a compound having
the following formula 5, a compound having the following formula 6, and a compound
having the following formula 7; and
0.1-100 parts by weight of a silicon-based compound having epoxy group;
<Formula 1>
<A <BkA
wherein A is a monomer having epoxy group,
B is a monomer having carboxylic group, which is acrylic acid or methacrylic
acid, C is styrene or an acryl or methacryl monomer having 1-14 carbon atoms, and 1, m, and n are molar numbers of A, B and C , which are 0.1-90mol%, 0-70mol%,
and 0.1-90mol% respectively;
<Formula 2>
Figure imgf000021_0001
wherein Rj is alkyl group or aryl group;
<Formula 3>
Figure imgf000021_0002
wherein R2 is alkyl group or aryl group;
<Formula 4>
©Θ R3R4IX
wherein R3 and 1^ are independently aryl group, and
Figure imgf000021_0003
, PF6 AsF6 and SbF6 Θ
<Formula 5>
Figure imgf000022_0001
wherein R5, R^ and R7 are independently aryl group or substituted aryl group, and is one selected from the group consisting of ^' S^1^ ; t ι~4 ,
Figure imgf000022_0002
<Formula 6>
ΘΘ RβRgRioRi 1 NX
wherein R8, R , Rio, and Rn are independently alkyl group or aryl group, and
Figure imgf000022_0003
<Formula 7> 3
Figure imgf000023_0001
wherein Rj2 and R]3 are independently alkyl group or aryl group.
2. The thermal curable one-liquid type epoxy resin composition for overcoat
according to claim 1 , wherein the binder resin having the formula 1 has an average molecular weight
of 2,000-100,000, a dispersity of 1.0-5.0, and an acid value of 0-400 KOHmg/g.
3. The thermal curable one-liquid type epoxy resin composition for overcoat
according to claim 1, wherein the compound having the formula 2 is one selected from the group
consisting of phthalic anhydride, tetrahydrophthalic anhydride, hexa-hydrophthalic
anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endomethylene tetra-hydrophthalic anhydride, hexachloroendomethylene
tetra-hydrophthalic anhydride, dodecyl succinic anhydride, and trimellitic anhydride.
4. The thermal curable one-liquid type epoxy resin composition for overcoat according to claim 1, wherein the compound having the formula 3 is pyromellitic dianhydride or benzophenone tetra-carboxylic acid dianhydride.
5. The thermal curable one-liquid type epoxy resin composition for overcoat
according to claim 1 , wherein the compounds having the formulas 4 to 7 are independently selected
from the group consisting of diphenyl iodonium trifluoromethane sulfonate, diphenyl
iodonium nonafluorobutane sulfonate, di-(4-t-butylbenzene)iodonium trifluoromethane
sulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium
nonafluorobutanesulfonate, diphenyl 4-methylphenyl sulfonium
trifluoromethanesulfonate, S-(2-naphthalenecarbonylmethyl) tetrahydrothiophenium
trifluoromethanesulfonate, dimethyl(4-naphthol)sulfonium trifluoromethanesulfonate,
N-succinimidyl 10-camphorsulfonate,
N-( 1 ,2,4,6-tetrahydrophthalimidyl)-P-toluenesulfonate,
N-( 1 ,8-naphthalenedicarboximidyl)- 10-camphorsulfonate, and
N-(l ,8-naphthalenecarboximidyl)-p-toluenesulfonate.
6. The thermal curable one-liquid type epoxy resin composition for overcoat according to claim 1, wherein the silicon-based compound having epoxy group comprises at least one
selected from the group consisting of (3-glycidoxypropyl)trimethoxy(ethoxy)silane,
(3 -glycidoxypropy 1) methyldimethoxy(ethoxy)silane, (3 -glycidoxypropy 1)
dimethylmethoxy(ethoxy) silane, 3,4-epoxybutyltrimethoxy(ethoxy)silane, and
2-(3 ,4-epoxycyclohexyl) ethyltrimethoxy(ethoxy)silane
7. The thermal curable one-liquid type epoxy resin composition for overcoat
according to claim 1 , further comprising a solvent such that a viscosity of the composition is 2-20 cps.
8. The thermal curable one-liquid type epoxy resin composition for overcoat
according to claim 7, wherein the solvent includes at least one selected from the group consisting of
ethyl acetate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate (EEP),
ethyl lactate, propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl
ether, propylene glycol propyl ether, methyl cellosolve acetate, ethyl cellosolve acetate,
diethylene glycol methyl(or ethyl) acetate, acetone, methyl isobutyl ketone,
cyclohexanone, dimethylformamide (DMF), N,N-dimethylacetamide (DMAc),
N-methyl-2-pyrrolidone (NMP), γ-butyrolactone, diethyl ether, ethylene glycol dimethyl
ether, diglyme, tetrahydrofiiran (THF), methanol, ethanol, propanol, iso-propanol, methyl(or ethyl) cellosolve, diethylene glycol methyl(or ethyl) ether, dipropylene glycol
methyl ether, toluene, xylene, hexane, heptane, and octane.
PCT/KR2004/003221 2003-12-09 2004-12-09 Thermal curable one-liquid type epoxy resin composition for over-coat WO2005057285A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2003-0089006 2003-12-09
KR1020030089006A KR100579833B1 (en) 2003-12-09 2003-12-09 Thermal Curable One-liqud Type Epoxy Resin Composition For Over-Coat

Publications (1)

Publication Number Publication Date
WO2005057285A1 true WO2005057285A1 (en) 2005-06-23

Family

ID=34675716

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2004/003221 WO2005057285A1 (en) 2003-12-09 2004-12-09 Thermal curable one-liquid type epoxy resin composition for over-coat

Country Status (2)

Country Link
KR (1) KR100579833B1 (en)
WO (1) WO2005057285A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008174750A (en) * 2007-01-18 2008-07-31 Samyang Ems Co Ltd Thermosetting type overcoat resin composition
CN101824266A (en) * 2010-05-05 2010-09-08 南通亿诺高分子新型材料有限公司 Coating material for experiment glass slides and preparation method thereof
CN109422987A (en) * 2017-08-30 2019-03-05 京东方科技集团股份有限公司 Flatness layer composition, preparation method, flat layer material and display device
CN112500524A (en) * 2020-12-28 2021-03-16 陕西科技大学 Anhydride group modified acrylate resin curing agent, preparation method and application

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100642446B1 (en) * 2004-10-15 2006-11-02 제일모직주식회사 Thermosetting One-Solution Type Composition For Protective Film Of Color Filter And Color Filter By Using The Same
KR100845692B1 (en) 2004-12-29 2008-07-11 제일모직주식회사 Thermosetting One-Solution type Composition for Protective Film of Color Filter and Color Filter by using the Same
KR102326729B1 (en) * 2019-09-27 2021-11-17 주식회사 삼양사 A thermosetting overcoat resin composition and an overcoat formed therefrom, and a substrate comprising the overcoat layer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180794A (en) * 1989-04-27 1993-01-19 Nippon Kayaku Kabushiki Kaisha Resin compositions and process for forming transparent thin films
US5614594A (en) * 1994-06-01 1997-03-25 Sumitomo Chemical Company, Limited Curable resin composition for overcoat film of color filter and color filter
US5968688A (en) * 1996-09-30 1999-10-19 Nippon Shokubai Co., Ltd. Color filter grade photosensitive resin coloring composition and color filter using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180794A (en) * 1989-04-27 1993-01-19 Nippon Kayaku Kabushiki Kaisha Resin compositions and process for forming transparent thin films
US5614594A (en) * 1994-06-01 1997-03-25 Sumitomo Chemical Company, Limited Curable resin composition for overcoat film of color filter and color filter
US5968688A (en) * 1996-09-30 1999-10-19 Nippon Shokubai Co., Ltd. Color filter grade photosensitive resin coloring composition and color filter using the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008174750A (en) * 2007-01-18 2008-07-31 Samyang Ems Co Ltd Thermosetting type overcoat resin composition
CN101824266A (en) * 2010-05-05 2010-09-08 南通亿诺高分子新型材料有限公司 Coating material for experiment glass slides and preparation method thereof
CN101824266B (en) * 2010-05-05 2013-02-13 南通天盛光伏科技有限公司 Coating material for experiment glass slides and preparation method thereof
CN109422987A (en) * 2017-08-30 2019-03-05 京东方科技集团股份有限公司 Flatness layer composition, preparation method, flat layer material and display device
CN112500524A (en) * 2020-12-28 2021-03-16 陕西科技大学 Anhydride group modified acrylate resin curing agent, preparation method and application
CN112500524B (en) * 2020-12-28 2022-03-01 陕西科技大学 Anhydride group modified acrylate resin curing agent, preparation method and application

Also Published As

Publication number Publication date
KR100579833B1 (en) 2006-05-15
KR20050055943A (en) 2005-06-14

Similar Documents

Publication Publication Date Title
JP4181152B2 (en) Negative resist composition
TWI514070B (en) A color resist composition and a color filter using the composition
US8945815B2 (en) Alkaline soluble resin and light sensible resin composition comprising same and use thereof
JP4672789B2 (en) Negative photoresist composition
KR101899290B1 (en) Colored photosensitive resin composition, color filter and display device
US20070060729A1 (en) Photosensitive resin composition and dry film resist using the same
TWI644903B (en) Oxime ester derivative compounds, photopolymerization initiator, and photosensitive composition containing the same
JP2017537347A (en) Black matrix photoresist composition for liquid crystal display panel
US6803172B2 (en) Organic anti-reflective coating material and preparation thereof
TW201825528A (en) Photo-initiators and photosensitive resin composition for light shield comprising the same
WO2005057285A1 (en) Thermal curable one-liquid type epoxy resin composition for over-coat
CN106054532B (en) Negative photosensitive polysiloxane composition
CN101328298B (en) Copolymer, resin composition, overcoating film and process for forming the same
JP5134982B2 (en) Thermosetting overcoat resin composition
TWI534539B (en) Negative type photosensitive resin composition
KR100367471B1 (en) Resist Composition For Over-Coat
CN112904673B (en) Single-component photoresist composition, application thereof and touch screen comprising single-component photoresist composition
KR100483373B1 (en) Resist Composition For Over-Coat
JP2019161091A (en) Photosensitive resin composition and manufacturing method of organic electroluminescent element
KR101144736B1 (en) Negative resist compositions with high heat resistance
WO2004107052A1 (en) Negative photoresist composition for spinless (slit) coating
TWI826935B (en) Photosensivive composition comprising organometallic compounds and polysiloxane copolymer and method for preparing the same
KR101580854B1 (en) Curable resin composition set for forming resin cured film protective film and process for forming protective film
TWI405035B (en) Photo-sensitivity resin composition and overcoating layer of color filter
KR100597715B1 (en) Negative resist composition

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase