WO2005046011A3 - Relax gas discharge laser lithography light source - Google Patents

Relax gas discharge laser lithography light source Download PDF

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Publication number
WO2005046011A3
WO2005046011A3 PCT/US2004/035671 US2004035671W WO2005046011A3 WO 2005046011 A3 WO2005046011 A3 WO 2005046011A3 US 2004035671 W US2004035671 W US 2004035671W WO 2005046011 A3 WO2005046011 A3 WO 2005046011A3
Authority
WO
WIPO (PCT)
Prior art keywords
pulse
laser light
incidence
optical element
light pulse
Prior art date
Application number
PCT/US2004/035671
Other languages
French (fr)
Other versions
WO2005046011A2 (en
Inventor
Richard L Sandstrom
William N Partlo
Daniel J W Brown
Thomas A Yager
Alexander I Ershov
Robert J Rafac
German E Rylov
Original Assignee
Cymer Inc
Richard L Sandstrom
William N Partlo
Daniel J W Brown
Thomas A Yager
Alexander I Ershov
Robert J Rafac
German E Rylov
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/701,280 external-priority patent/US7139301B2/en
Priority claimed from US10/808,157 external-priority patent/US7346093B2/en
Priority claimed from US10/847,799 external-priority patent/US7369597B2/en
Priority claimed from US10/875,662 external-priority patent/US7154928B2/en
Priority claimed from US10/884,101 external-priority patent/US7009140B2/en
Application filed by Cymer Inc, Richard L Sandstrom, William N Partlo, Daniel J W Brown, Thomas A Yager, Alexander I Ershov, Robert J Rafac, German E Rylov filed Critical Cymer Inc
Priority to JP2006538219A priority Critical patent/JP5357393B2/en
Publication of WO2005046011A2 publication Critical patent/WO2005046011A2/en
Publication of WO2005046011A3 publication Critical patent/WO2005046011A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/002—Optical devices or arrangements for the control of light using movable or deformable optical elements the movement or the deformation controlling the frequency of light, e.g. by Doppler effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating

Abstract

An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
PCT/US2004/035671 2003-11-03 2004-10-27 Relax gas discharge laser lithography light source WO2005046011A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006538219A JP5357393B2 (en) 2003-11-03 2004-10-27 RELAX gas discharge laser lithography light source

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US10/701,280 US7139301B2 (en) 1997-07-22 2003-11-03 Laser spectral engineering for lithographic process
US10/701,280 2003-11-03
US10/808,157 2004-03-23
US10/808,157 US7346093B2 (en) 2000-11-17 2004-03-23 DUV light source optical element improvements
US10/847,799 2004-05-18
US10/847,799 US7369597B2 (en) 2003-11-13 2004-05-18 Laser output light pulse stretcher
US10/875,662 US7154928B2 (en) 2004-06-23 2004-06-23 Laser output beam wavefront splitter for bandwidth spectrum control
US10/875,662 2004-06-23
US10/884,101 US7009140B2 (en) 2001-04-18 2004-07-01 Laser thin film poly-silicon annealing optical system
US10/884,101 2004-07-01
US10/956,784 2004-10-01
US10/956,784 US7088758B2 (en) 2001-07-27 2004-10-01 Relax gas discharge laser lithography light source

Publications (2)

Publication Number Publication Date
WO2005046011A2 WO2005046011A2 (en) 2005-05-19
WO2005046011A3 true WO2005046011A3 (en) 2005-12-22

Family

ID=34577978

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/035671 WO2005046011A2 (en) 2003-11-03 2004-10-27 Relax gas discharge laser lithography light source

Country Status (4)

Country Link
US (1) US7088758B2 (en)
JP (1) JP5357393B2 (en)
TW (1) TWI258257B (en)
WO (1) WO2005046011A2 (en)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
KR100702845B1 (en) * 2006-01-20 2007-04-03 삼성전자주식회사 Eximer laser and line narrowing module at the same
JP2007329432A (en) * 2006-06-09 2007-12-20 Canon Inc Aligner
JP2008140956A (en) * 2006-12-01 2008-06-19 Canon Inc Exposure device
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
JP5410396B2 (en) 2010-03-23 2014-02-05 ギガフォトン株式会社 Laser equipment
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP2013062484A (en) * 2011-08-24 2013-04-04 Gigaphoton Inc Laser device
JP2013070029A (en) 2011-09-08 2013-04-18 Gigaphoton Inc Master oscillator system and laser device
JP6113426B2 (en) 2011-09-08 2017-04-12 ギガフォトン株式会社 Master oscillator system and laser device
JP2013145863A (en) 2011-11-29 2013-07-25 Gigaphoton Inc Two-beam interference apparatus and two-beam interference exposure system
JP6063133B2 (en) 2012-02-15 2017-01-18 ギガフォトン株式会社 Excimer laser and laser device
CN102615425A (en) * 2012-04-20 2012-08-01 上海市激光技术研究所 Processing system of laser special-shaped micropores based on refractive scanning system
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
JP2013247240A (en) 2012-05-25 2013-12-09 Gigaphoton Inc Laser device
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
JP5965454B2 (en) * 2014-10-14 2016-08-03 株式会社アマダホールディングス Direct diode laser processing apparatus and sheet metal processing method using the same
WO2016084263A1 (en) * 2014-11-28 2016-06-02 ギガフォトン株式会社 Narrowband laser device
US9778108B2 (en) 2015-05-22 2017-10-03 Cymer, Llc Metrology system and method having a plurality of sensors for estimating a spectral feature of a pulsed light beam
US10012544B2 (en) 2016-11-29 2018-07-03 Cymer, Llc Homogenization of light beam for spectral feature metrology
JP2021500603A (en) * 2017-10-19 2021-01-07 サイマー リミテッド ライアビリティ カンパニー Forming multiple spatial images with a single lithography exposure pass
US11287743B2 (en) 2018-03-12 2022-03-29 Asml Netherlands B.V. Control system and method
CN111937256B (en) * 2018-03-30 2023-08-18 西默有限公司 Spectral feature selection and pulse timing control of pulsed light beams
CN109217076B (en) * 2018-10-31 2019-10-25 中国科学院物理研究所 Laser adjusting method and corresponding device
KR102548825B1 (en) * 2018-12-03 2023-06-29 삼성디스플레이 주식회사 Laser crystalizing apparatus and method of manufacturing display apparatus
CN113544590A (en) * 2019-03-03 2021-10-22 Asml荷兰有限公司 Method and apparatus for imaging using reduced bandwidth
US11803126B2 (en) * 2019-07-23 2023-10-31 Cymer, Llc Method of compensating wavelength error induced by repetition rate deviation
WO2021186741A1 (en) * 2020-03-19 2021-09-23 ギガフォトン株式会社 Exposure method, exposure system, and method for manufacturing electronic device
WO2021234835A1 (en) * 2020-05-20 2021-11-25 ギガフォトン株式会社 Narrowband gas laser apparatus, wavelength control method, and method for manufacturing electronic device
WO2022180698A1 (en) * 2021-02-24 2022-09-01 ギガフォトン株式会社 Laser equipment and method for manufacturing electronic device
JPWO2022219690A1 (en) * 2021-04-12 2022-10-20
WO2023096768A1 (en) * 2021-11-29 2023-06-01 Cymer, Llc Control voltage threshold selection to facilitate multifocal imaging
WO2023135658A1 (en) * 2022-01-11 2023-07-20 ギガフォトン株式会社 Method for manufacturing electronic device, laser apparatus, and wavelength sequence calculation system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6178045B1 (en) * 1997-05-29 2001-01-23 Corning Incorporated Spatial filter for high power laser beam
US20010045974A1 (en) * 1998-11-20 2001-11-29 3M Innovative Properties Company Mask orbiting for laser ablated feature formation
US20020154668A1 (en) * 1999-12-10 2002-10-24 Knowles David S. Very narrow band, two chamber, high rep rate gas discharge laser system
US20030007138A1 (en) * 2001-03-27 2003-01-09 Nikon Corporation Projection optical system, a projection exposure apparatus, and a projection exposure method

Family Cites Families (102)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759106A (en) 1951-05-25 1956-08-14 Wolter Hans Optical image-forming mirror system providing for grazing incidence of rays
US3279176A (en) 1959-07-31 1966-10-18 North American Aviation Inc Ion rocket engine
US3150483A (en) 1962-05-10 1964-09-29 Aerospace Corp Plasma generator and accelerator
US3232046A (en) 1962-06-06 1966-02-01 Aerospace Corp Plasma generator and propulsion exhaust system
US3746870A (en) 1970-12-21 1973-07-17 Gen Electric Coated light conduit
US3969628A (en) 1974-04-04 1976-07-13 The United States Of America As Represented By The Secretary Of The Army Intense, energetic electron beam assisted X-ray generator
US4042848A (en) 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
US3946332A (en) 1974-06-13 1976-03-23 Samis Michael A High power density continuous wave plasma glow jet laser system
US3961197A (en) 1974-08-21 1976-06-01 The United States Of America As Represented By The United States Energy Research And Development Administration X-ray generator
US3960473A (en) 1975-02-06 1976-06-01 The Glastic Corporation Die structure for forming a serrated rod
US4223279A (en) 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US4162160A (en) 1977-08-25 1979-07-24 Fansteel Inc. Electrical contact material and method for making the same
US4143275A (en) 1977-09-28 1979-03-06 Battelle Memorial Institute Applying radiation
US4203393A (en) 1979-01-04 1980-05-20 Ford Motor Company Plasma jet ignition engine and method
US4410992A (en) 1980-03-26 1983-10-18 Laser Science, Inc. Generation of pulsed laser radiation at a finely controlled frequency by transient regerative amplification
US4550408A (en) 1981-02-27 1985-10-29 Heinrich Karning Method and apparatus for operating a gas laser
US4538291A (en) 1981-11-09 1985-08-27 Kabushiki Kaisha Suwa Seikosha X-ray source
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US4504964A (en) 1982-09-20 1985-03-12 Eaton Corporation Laser beam plasma pinch X-ray system
US4618971A (en) 1982-09-20 1986-10-21 Eaton Corporation X-ray lithography system
US4633492A (en) 1982-09-20 1986-12-30 Eaton Corporation Plasma pinch X-ray method
US4536884A (en) 1982-09-20 1985-08-20 Eaton Corporation Plasma pinch X-ray apparatus
DE3332711A1 (en) 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim DEVICE FOR GENERATING A PLASMA SOURCE WITH HIGH RADIATION INTENSITY IN THE X-RAY AREA
JPS60175351A (en) 1984-02-14 1985-09-09 Nippon Telegr & Teleph Corp <Ntt> X rays generation device and x rays exposure method
DE3406677A1 (en) 1984-02-24 1985-09-05 Fa. Carl Zeiss, 7920 Heidenheim DEVICE FOR COMPENSATING THE EMISSION OF A LASER BEAM
US4785192A (en) 1984-06-21 1988-11-15 American Telephone And Telegraph Company, At&T Bell Laboratories Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment
US4883352A (en) 1984-06-21 1989-11-28 American Telephone And Telegraph Company Deep-uv lithography
US4837794A (en) 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US4626193A (en) 1985-08-02 1986-12-02 Itt Corporation Direct spark ignition system
CA1239486A (en) 1985-10-03 1988-07-19 Rajendra P. Gupta Gas discharge derived annular plasma pinch x-ray source
CA1239487A (en) 1985-10-03 1988-07-19 National Research Council Of Canada Multiple vacuum arc derived plasma pinch x-ray source
US4891820A (en) 1985-12-19 1990-01-02 Rofin-Sinar, Inc. Fast axial flow laser circulating system
US4869999A (en) 1986-08-08 1989-09-26 Hitachi, Ltd. Method of forming pattern and projection aligner for carrying out the same
US4937619A (en) 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
US4697270A (en) 1986-08-27 1987-09-29 The United States Of America As Represented By The United States Department Of Energy Copper vapor laser acoustic thermometry system
US4940331A (en) 1986-09-24 1990-07-10 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US4798467A (en) 1986-09-24 1989-01-17 The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US4817101A (en) 1986-09-26 1989-03-28 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser spectroscopy system
DE3891284T1 (en) 1987-07-17 1990-04-26 Komatsu Mfg Co Ltd LASER SHAFT LENGTH CONTROL DEVICE
US4823354A (en) 1987-12-15 1989-04-18 Lumonics Inc. Excimer lasers
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
US4881231A (en) 1988-11-28 1989-11-14 Kantilal Jain Frequency-stabilized line-narrowed excimer laser source system for high resolution lithography
IL91240A (en) 1989-08-07 1994-07-31 Quick Tech Ltd Pulsed laser apparatus and systems and techniques for its operation
DE3927089C1 (en) 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5005180A (en) 1989-09-01 1991-04-02 Schneider (Usa) Inc. Laser catheter system
US5102776A (en) 1989-11-09 1992-04-07 Cornell Research Foundation, Inc. Method and apparatus for microlithography using x-pinch x-ray source
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US5027076A (en) 1990-01-29 1991-06-25 Ball Corporation Open cage density sensor
US5095492A (en) 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
US5126638A (en) 1991-05-13 1992-06-30 Maxwell Laboratories, Inc. Coaxial pseudospark discharge switch
US5691989A (en) 1991-07-26 1997-11-25 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
US5142166A (en) 1991-10-16 1992-08-25 Science Research Laboratory, Inc. High voltage pulsed power source
KR100269350B1 (en) 1991-11-26 2000-10-16 구본준 Manufacturing Method of Thin Film Transistor
US5371587A (en) 1992-05-06 1994-12-06 The Boeing Company Chirped synthetic wavelength laser radar
US5416391A (en) 1992-07-31 1995-05-16 Correa; Paulo N. Electromechanical transduction of plasma pulses
JP3155837B2 (en) 1992-09-14 2001-04-16 株式会社東芝 Optical transmission equipment
DE4232915A1 (en) * 1992-10-01 1994-04-07 Hohla Kristian Device for shaping the cornea by removing tissue
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5303002A (en) 1993-03-31 1994-04-12 Intel Corporation Method and apparatus for enhancing the focus latitude in lithography
US5411224A (en) 1993-04-08 1995-05-02 Dearman; Raymond M. Guard for jet engine
US5440578B1 (en) 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers
US5420877A (en) 1993-07-16 1995-05-30 Cymer Laser Technologies Temperature compensation method and apparatus for wave meters and tunable lasers controlled thereby
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
JPH08172233A (en) 1994-12-15 1996-07-02 Anritsu Corp Variable wavelength light source
US5504795A (en) 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
JP3041540B2 (en) 1995-02-17 2000-05-15 サイマー・インコーポレーテッド Pulse power generation circuit and method for generating pulse power
US5706301A (en) 1995-08-16 1998-01-06 Telefonaktiebolaget L M Ericsson Laser wavelength control system
US5830336A (en) 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
JP3421184B2 (en) 1995-12-19 2003-06-30 理化学研究所 Method of selecting wavelength in tunable laser and laser oscillating device capable of selecting wavelength in tunable laser
US5863017A (en) 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface
US5867514A (en) 1997-01-09 1999-02-02 Cymer, Inc. Laser wavelength control circuit having automatic DC offset and gain adjustment
US6829091B2 (en) * 1997-02-07 2004-12-07 Canon Kabushiki Kaisha Optical system and optical instrument with diffractive optical element
US5771258A (en) 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5963616A (en) 1997-03-11 1999-10-05 University Of Central Florida Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
US5936988A (en) 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5991324A (en) 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5866871A (en) 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof
US5763930A (en) 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6064072A (en) 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6016216A (en) 1997-05-17 2000-01-18 Aurora Photonics, Inc. Polarization-independent acousto-optic tunable filter
US5856991A (en) 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US6014398A (en) 1997-10-10 2000-01-11 Cymer, Inc. Narrow band excimer laser with gas additive
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6067306A (en) 1997-08-08 2000-05-23 Cymer, Inc. Laser-illuminated stepper or scanner with energy sensor feedback
US5870420A (en) 1997-08-18 1999-02-09 Cymer, Inc. Cross-flow blower with braces
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US5978406A (en) 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6016325A (en) 1998-04-27 2000-01-18 Cymer, Inc. Magnetic modulator voltage and temperature timing compensation circuit
US6678291B2 (en) * 1999-12-15 2004-01-13 Lambda Physik Ag Molecular fluorine laser
US6034978A (en) 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
JP2003051634A (en) * 2001-08-08 2003-02-21 Ushio Inc Discharge excited laser
JP2003224320A (en) * 2002-01-28 2003-08-08 Komatsu Ltd Resonator for band-narrowed laser, its designing method, and band-narrowed laser

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6178045B1 (en) * 1997-05-29 2001-01-23 Corning Incorporated Spatial filter for high power laser beam
US20010045974A1 (en) * 1998-11-20 2001-11-29 3M Innovative Properties Company Mask orbiting for laser ablated feature formation
US20020154668A1 (en) * 1999-12-10 2002-10-24 Knowles David S. Very narrow band, two chamber, high rep rate gas discharge laser system
US20030007138A1 (en) * 2001-03-27 2003-01-09 Nikon Corporation Projection optical system, a projection exposure apparatus, and a projection exposure method

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US20050083983A1 (en) 2005-04-21
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US7088758B2 (en) 2006-08-08
JP2007511074A (en) 2007-04-26

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