WO2005017951A3 - Quantum dots, nanocomposite materials with quantum dots, optical devices with quantum dots, and related fabrication methods - Google Patents
Quantum dots, nanocomposite materials with quantum dots, optical devices with quantum dots, and related fabrication methods Download PDFInfo
- Publication number
- WO2005017951A3 WO2005017951A3 PCT/US2003/024245 US0324245W WO2005017951A3 WO 2005017951 A3 WO2005017951 A3 WO 2005017951A3 US 0324245 W US0324245 W US 0324245W WO 2005017951 A3 WO2005017951 A3 WO 2005017951A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- quantum dots
- optical devices
- fabrication methods
- quantum
- nanocomposite materials
- Prior art date
Links
- 239000002096 quantum dot Substances 0.000 title abstract 10
- 239000000463 material Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000002114 nanocomposite Substances 0.000 title abstract 2
- 230000003287 optical effect Effects 0.000 title abstract 2
- 230000007547 defect Effects 0.000 abstract 1
- 238000005424 photoluminescence Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G—PHYSICS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/355—Non-linear optics characterised by the materials used
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/122—Single quantum well structures
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- G02B2006/12166—Manufacturing methods
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
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- G02F1/3517—All-optical modulation, gating, switching, e.g. control of a light beam by another light beam using an interferometer
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02365—Forming inorganic semiconducting materials on a substrate
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/34—Materials of the light emitting region containing only elements of group IV of the periodic system
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005507867A JP2006513458A (en) | 2002-08-02 | 2003-08-01 | Quantum dots, nanocomposites with quantum dots, optical devices with quantum dots, and related manufacturing methods |
AU2003304433A AU2003304433A1 (en) | 2002-08-02 | 2003-08-01 | Quantum dots, nanocomposite materials with quantum dots, optical devices with quantum dots, and related fabrication methods |
EP03816720A EP1547153A4 (en) | 2002-08-02 | 2003-08-01 | Quantum dots, nanocomposite materials with quantum dots, optical devices with quantum dots, and related fabrication methods |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/212,001 US20030066998A1 (en) | 2001-08-02 | 2002-08-02 | Quantum dots of Group IV semiconductor materials |
US10/211,991 | 2002-08-02 | ||
US10/212,005 US6710366B1 (en) | 2001-08-02 | 2002-08-02 | Nanocomposite materials with engineered properties |
US10/212,005 | 2002-08-02 | ||
US10/212,004 US6794265B2 (en) | 2001-08-02 | 2002-08-02 | Methods of forming quantum dots of Group IV semiconductor materials |
US10/212,001 | 2002-08-02 | ||
US10/212,004 | 2002-08-02 | ||
US10/211,991 US6819845B2 (en) | 2001-08-02 | 2002-08-02 | Optical devices with engineered nonlinear nanocomposite materials |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005017951A2 WO2005017951A2 (en) | 2005-02-24 |
WO2005017951A3 true WO2005017951A3 (en) | 2005-04-21 |
Family
ID=34199210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/024245 WO2005017951A2 (en) | 2002-08-02 | 2003-08-01 | Quantum dots, nanocomposite materials with quantum dots, optical devices with quantum dots, and related fabrication methods |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1547153A4 (en) |
JP (1) | JP2006513458A (en) |
AU (1) | AU2003304433A1 (en) |
WO (1) | WO2005017951A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8071359B2 (en) | 1997-11-25 | 2011-12-06 | The Regents Of The University Of California | Semiconductor nanocrystal probes for biological applications and process for making and using such probes |
US9441156B2 (en) | 1997-11-13 | 2016-09-13 | Massachusetts Institute Of Technology | Highly luminescent color-selective nanocrystalline materials |
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WO2004042784A2 (en) | 2002-08-15 | 2004-05-21 | Massachussetts Institute Of Technology | Stabilized semiconductor nanocrystals |
US7332211B1 (en) | 2002-11-07 | 2008-02-19 | Massachusetts Institute Of Technology | Layered materials including nanoparticles |
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US7645397B2 (en) * | 2004-01-15 | 2010-01-12 | Nanosys, Inc. | Nanocrystal doped matrixes |
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JP2007197382A (en) * | 2006-01-27 | 2007-08-09 | Konica Minolta Medical & Graphic Inc | Semiconductor nanoparticle |
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US8643058B2 (en) | 2006-07-31 | 2014-02-04 | Massachusetts Institute Of Technology | Electro-optical device including nanocrystals |
KR100853087B1 (en) * | 2007-04-26 | 2008-08-19 | 삼성전자주식회사 | Nanocrystal, preparation method thereof and electronic devices comprising the same |
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JP2010248325A (en) * | 2009-04-14 | 2010-11-04 | National Institute For Materials Science | Sheet-like illuminant |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5113473A (en) * | 1989-11-24 | 1992-05-12 | Matsushita Electric Industrial Co., Ltd. | Nonlinear, optical thin-films and manufacturing method thereof |
US5452123A (en) * | 1992-12-30 | 1995-09-19 | University Of Pittsburgh Of The Commonwealth System Of Higher Education | Method of making an optically nonlinear switched optical device and related devices |
US5474591A (en) * | 1994-01-31 | 1995-12-12 | Duke University | Method of synthesizing III-V semiconductor nanocrystals |
US5508829A (en) * | 1992-12-18 | 1996-04-16 | International Business Machines Corporation | LTG AlGaAs non-linear optical material and devices fabricated therefrom |
US5737102A (en) * | 1992-12-30 | 1998-04-07 | University Of Pittsburgh Of The Commonwealth System Of Higher Education | Method of making an optically nonlinear switched optical device and related devices |
US5909614A (en) * | 1997-12-08 | 1999-06-01 | Krivoshlykov; Sergei G. | Method of improving performance of semiconductor light emitting device |
US6268014B1 (en) * | 1997-10-02 | 2001-07-31 | Chris Eberspacher | Method for forming solar cell materials from particulars |
US6444143B2 (en) * | 1998-09-18 | 2002-09-03 | Massachusetts Institute Of Technology | Water-soluble fluorescent nanocrystals |
US6585947B1 (en) * | 1999-10-22 | 2003-07-01 | The Board Of Trustess Of The University Of Illinois | Method for producing silicon nanoparticles |
-
2003
- 2003-08-01 EP EP03816720A patent/EP1547153A4/en not_active Withdrawn
- 2003-08-01 AU AU2003304433A patent/AU2003304433A1/en not_active Abandoned
- 2003-08-01 WO PCT/US2003/024245 patent/WO2005017951A2/en active Search and Examination
- 2003-08-01 JP JP2005507867A patent/JP2006513458A/en active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5113473A (en) * | 1989-11-24 | 1992-05-12 | Matsushita Electric Industrial Co., Ltd. | Nonlinear, optical thin-films and manufacturing method thereof |
US5508829A (en) * | 1992-12-18 | 1996-04-16 | International Business Machines Corporation | LTG AlGaAs non-linear optical material and devices fabricated therefrom |
US5452123A (en) * | 1992-12-30 | 1995-09-19 | University Of Pittsburgh Of The Commonwealth System Of Higher Education | Method of making an optically nonlinear switched optical device and related devices |
US5737102A (en) * | 1992-12-30 | 1998-04-07 | University Of Pittsburgh Of The Commonwealth System Of Higher Education | Method of making an optically nonlinear switched optical device and related devices |
US5474591A (en) * | 1994-01-31 | 1995-12-12 | Duke University | Method of synthesizing III-V semiconductor nanocrystals |
US6268014B1 (en) * | 1997-10-02 | 2001-07-31 | Chris Eberspacher | Method for forming solar cell materials from particulars |
US5909614A (en) * | 1997-12-08 | 1999-06-01 | Krivoshlykov; Sergei G. | Method of improving performance of semiconductor light emitting device |
US6444143B2 (en) * | 1998-09-18 | 2002-09-03 | Massachusetts Institute Of Technology | Water-soluble fluorescent nanocrystals |
US6585947B1 (en) * | 1999-10-22 | 2003-07-01 | The Board Of Trustess Of The University Of Illinois | Method for producing silicon nanoparticles |
Non-Patent Citations (3)
Title |
---|
LIU F. ET AL.: "Enhancement of third-order nonlinearity of nanocrystalline GaSb embedded in silica films", MATERIALS SCIENCE AND ENGINEERING, vol. B76, 2000, pages 161 - 164, XP004205040 * |
RAKOVICH Y.P. ET AL.: "Third-order optical nonlinearities in thin films of CdS nanocrystals", PHYS. STAT. SOL.(B), vol. 1, 2001, pages 319 - 324, XP008044812 * |
See also references of EP1547153A4 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9441156B2 (en) | 1997-11-13 | 2016-09-13 | Massachusetts Institute Of Technology | Highly luminescent color-selective nanocrystalline materials |
US8071359B2 (en) | 1997-11-25 | 2011-12-06 | The Regents Of The University Of California | Semiconductor nanocrystal probes for biological applications and process for making and using such probes |
US9530928B2 (en) | 1997-11-25 | 2016-12-27 | The Regents Of The University Of California | Semiconductor nanocrystal probes for biological applications and process for making and using such probes |
Also Published As
Publication number | Publication date |
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AU2003304433A1 (en) | 2005-03-07 |
EP1547153A2 (en) | 2005-06-29 |
EP1547153A4 (en) | 2010-12-01 |
JP2006513458A (en) | 2006-04-20 |
WO2005017951A2 (en) | 2005-02-24 |
AU2003304433A8 (en) | 2005-03-07 |
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