WO2004090465A3 - Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry - Google Patents

Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry Download PDF

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Publication number
WO2004090465A3
WO2004090465A3 PCT/US2004/010031 US2004010031W WO2004090465A3 WO 2004090465 A3 WO2004090465 A3 WO 2004090465A3 US 2004010031 W US2004010031 W US 2004010031W WO 2004090465 A3 WO2004090465 A3 WO 2004090465A3
Authority
WO
WIPO (PCT)
Prior art keywords
beams
measurement beams
interferometry
scattered
reflected
Prior art date
Application number
PCT/US2004/010031
Other languages
French (fr)
Other versions
WO2004090465A2 (en
Inventor
Henry Allen Hill
Original Assignee
Zetetic Inst
Henry Allen Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zetetic Inst, Henry Allen Hill filed Critical Zetetic Inst
Priority to JP2006509581A priority Critical patent/JP2006522339A/en
Priority to EP04758728A priority patent/EP1608934A4/en
Publication of WO2004090465A2 publication Critical patent/WO2004090465A2/en
Publication of WO2004090465A3 publication Critical patent/WO2004090465A3/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
    • G01B9/02014—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation by using pulsed light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G01B9/02042—Confocal imaging
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G01B9/02081—Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Abstract

A method of making interferometric measurements of an object, the method including: generating an input beam (124) that includes a plurality of component beams (126A, 126B), each of which is at a different frequency and all of which are spatially coextensive with each other, some of the components having a first polarization and the rest having a second polarization that is orthogonal to the first polarization; deriving a plurality of measurement beams (128C, 128D) from the plurality of component beams, each of the plurality of measurement beams being at the frequency of the component beam from which it is derived; focusing the plurality of measurement beams onto a selected spot (160) to produce a plurality of return measurement beams; combining each of the return measurement beams of the plurality of return measurement beams with a different corresponding reference beam of a plurality of reference beams to produce a plurality of interference beams; and acquiring a plurality of electrical interference signal values for the selected spot from the plurality of interference beams.
PCT/US2004/010031 2003-04-01 2004-04-01 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry WO2004090465A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006509581A JP2006522339A (en) 2003-04-01 2004-04-01 Apparatus and method for simultaneous measurement of orthogonally polarized beam fields scattered / reflected or transmitted by interferometric objects
EP04758728A EP1608934A4 (en) 2003-04-01 2004-04-01 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45942503P 2003-04-01 2003-04-01
US60/459,425 2003-04-01

Publications (2)

Publication Number Publication Date
WO2004090465A2 WO2004090465A2 (en) 2004-10-21
WO2004090465A3 true WO2004090465A3 (en) 2005-03-24

Family

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PCT/US2004/010031 WO2004090465A2 (en) 2003-04-01 2004-04-01 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry

Country Status (5)

Country Link
US (1) US7099014B2 (en)
EP (1) EP1608934A4 (en)
JP (1) JP2006522339A (en)
KR (1) KR20050119672A (en)
WO (1) WO2004090465A2 (en)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6403124B1 (en) * 1997-04-16 2002-06-11 Sigma-Tau Industrie Farmaceutiche Riunite S.P.A. Storage and maintenance of blood products including red blood cells and platelets
KR20050114611A (en) * 2003-01-27 2005-12-06 제테틱 인스티튜트 Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry
US7084983B2 (en) * 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
US7009712B2 (en) * 2003-01-27 2006-03-07 Zetetic Institute Leaky guided wave modes used in interferometric confocal microscopy to measure properties of trenches
US7164480B2 (en) 2003-02-04 2007-01-16 Zetetic Institute Compensation for effects of mismatch in indices of refraction at a substrate-medium interface in non-confocal, confocal, and interferometric confocal microscopy
US7263259B2 (en) * 2003-02-07 2007-08-28 Zetetic Institute Multiple-source arrays fed by guided-wave structures and resonant guided-wave structure cavities
WO2004072695A2 (en) * 2003-02-13 2004-08-26 Zetetic Institute Transverse differential interferometric confocal microscopy
KR20050098952A (en) * 2003-02-19 2005-10-12 제테틱 인스티튜트 Longitudinal differential interferometric confocal microscopy
WO2004074881A2 (en) * 2003-02-19 2004-09-02 Zetetic Institute Method and apparatus for dark field interferometric confocal microscopy
US7099014B2 (en) 2003-04-01 2006-08-29 Zetetic Institute Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
KR20050108422A (en) 2003-04-01 2005-11-16 제테틱 인스티튜트 Method for constructing a catadioptric lens system
JP2006522338A (en) * 2003-04-03 2006-09-28 ゼテテック インスティテュート Apparatus and method for field measurement of backscattered and forward scattered / reflected beams by interferometric objects
WO2005008214A2 (en) * 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
WO2005008334A2 (en) 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
WO2005026810A2 (en) * 2003-09-10 2005-03-24 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
US20050111007A1 (en) * 2003-09-26 2005-05-26 Zetetic Institute Catoptric and catadioptric imaging system with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
US7312877B2 (en) * 2003-10-01 2007-12-25 Zetetic Institute Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
WO2005108914A2 (en) 2004-05-06 2005-11-17 Zetetic Institute Apparatus and methods for measurement of critical dimensions of features and detection of defects in uv, vuv, and euv lithography masks
TW200538704A (en) * 2004-05-21 2005-12-01 Zetetic Inst Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry
TW200607991A (en) * 2004-08-16 2006-03-01 Zetetic Inst Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
WO2006023612A2 (en) * 2004-08-19 2006-03-02 Zetetic Institute Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers
US7145663B2 (en) * 2004-09-20 2006-12-05 Zetetic Institute Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and/or adaptive catoptric surfaces
EP1869399A2 (en) * 2005-04-11 2007-12-26 Zetetic Institute Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
EP1883783A2 (en) * 2005-05-18 2008-02-06 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
TW200706831A (en) * 2005-08-08 2007-02-16 Zetetic Inst Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
US7460245B2 (en) * 2005-08-26 2008-12-02 Zetetic Institute Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
TW200728685A (en) * 2005-11-15 2007-08-01 Zetetic Inst Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
US7692792B2 (en) * 2006-06-22 2010-04-06 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
WO2010011389A2 (en) * 2008-05-01 2010-01-28 Massachusetts Institute Of Technology Optimized cascaded raman fiber-based laser source for high efficiency mid-infrared spectral generation
US20140268149A1 (en) * 2013-03-15 2014-09-18 University Of Rochester Device and method for detection of polarization features

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
US6552852B2 (en) * 2000-12-21 2003-04-22 Zetetic Institute Catoptric and catadioptric imaging systems
US6717736B1 (en) * 2003-02-13 2004-04-06 Zetetic Institute Catoptric and catadioptric imaging systems
US6753968B2 (en) * 1999-08-02 2004-06-22 Zetetic Institute Optical storage system based on scanning interferometric near-field confocal microscopy

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3628027A (en) 1969-12-17 1971-12-14 Sulzer Ag Beam deflecting and focusing means for photoelectric monitoring, counting or control apparatus
US3748015A (en) 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US4011011A (en) 1973-03-09 1977-03-08 The Perkin-Elmer Corporation Optical projection apparatus
US4272684A (en) 1978-10-06 1981-06-09 Xerox Corporation Optical beam-splitting arrangements on object side of a lens
US4226501A (en) 1978-10-12 1980-10-07 The Perkin-Elmer Corporation Four mirror unobscurred anastigmatic telescope with all spherical surfaces
US4685803A (en) 1986-01-23 1987-08-11 Zygo Corporation Method and apparatus for the measurement of the refractive index of a gas
US4733967A (en) 1987-03-19 1988-03-29 Zygo Corporation Apparatus for the measurement of the refractive index of a gas
US5241423A (en) 1990-07-11 1993-08-31 International Business Machines Corporation High resolution reduction catadioptric relay lens
US5220403A (en) 1991-03-11 1993-06-15 International Business Machines Corporation Apparatus and a method for high numerical aperture microscopic examination of materials
DE69121201D1 (en) 1991-08-27 1996-09-05 Ibm Method and device for generating high-resolution optical images
IT1265106B1 (en) 1993-07-23 1996-10-30 Solari Udine Spa OPTICAL SYSTEM FOR LIGHT-EMITTING DIODES
KR950704670A (en) 1993-09-30 1995-11-20 가따다 데쯔야 Confocal Optics
US5614763A (en) 1995-03-13 1997-03-25 Zetetic Institute Methods for improving performance and temperature robustness of optical coupling between solid state light sensors and optical systems
US5699201A (en) 1995-03-27 1997-12-16 Hewlett-Packard Co. Low-profile, high-gain, wide-field-of-view, non-imaging optics
US5633972A (en) 1995-11-29 1997-05-27 Trustees Of Tufts College Superresolution imaging fiber for subwavelength light energy generation and near-field optical microscopy
US5894195A (en) 1996-05-03 1999-04-13 Mcdermott; Kevin Elliptical axial lighting device
US5915048A (en) 1996-06-05 1999-06-22 Zetetic Institute Method and apparatus for discriminating in-focus images from out-of-focus light signals from background and foreground light sources
US5760901A (en) 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
US6480285B1 (en) 1997-01-28 2002-11-12 Zetetic Institute Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation
US5828455A (en) 1997-03-07 1998-10-27 Litel Instruments Apparatus, method of measurement, and method of data analysis for correction of optical system
US6330065B1 (en) 1997-10-02 2001-12-11 Zygo Corporation Gas insensitive interferometric apparatus and methods
US6219144B1 (en) 1997-10-02 2001-04-17 Zygo Corporation Apparatus and method for measuring the refractive index and optical path length effects of air using multiple-pass interferometry
US6124931A (en) 1997-10-02 2000-09-26 Zygo Corporation Apparatus and methods for measuring intrinsic optical properties of a gas
US6052231A (en) 1998-01-21 2000-04-18 International Business Machines Corporation Beam dividing elements permitting projection of an image with high contrast
US6407816B1 (en) 1998-02-23 2002-06-18 Zygo Corporation Interferometer and method for measuring the refractive index and optical path length effects of air
JP3697919B2 (en) 1998-12-18 2005-09-21 コニカミノルタホールディングス株式会社 Video display device using reflective display element
US6271923B1 (en) 1999-05-05 2001-08-07 Zygo Corporation Interferometry system having a dynamic beam steering assembly for measuring angle and distance
US6917726B2 (en) 2001-09-27 2005-07-12 Cornell Research Foundation, Inc. Zero-mode clad waveguides for performing spectroscopy with confined effective observation volumes
JP2004505313A (en) 2000-07-27 2004-02-19 ゼテティック・インスティチュート Differential interference scanning near-field confocal microscopy
WO2002010830A2 (en) 2000-07-27 2002-02-07 Zetetic Institute Multiple-source arrays for confocal and near-field microscopy
AU2001279047A1 (en) 2000-07-27 2002-02-13 Zetetic Institute Control of position and orientation of sub-wavelength aperture array in near-field microscopy
US6847029B2 (en) 2000-07-27 2005-01-25 Zetetic Institute Multiple-source arrays with optical transmission enhanced by resonant cavities
WO2002010832A2 (en) 2000-07-27 2002-02-07 Zetetic Institute Scanning interferometric near-field confocal microscopy with background amplitude reduction and compensation
US6597721B1 (en) 2000-09-21 2003-07-22 Ut-Battelle, Llc Micro-laser
KR100649555B1 (en) 2001-03-27 2006-11-24 삼성에스디아이 주식회사 Projection screen and projection system using it
US6847452B2 (en) 2001-08-02 2005-01-25 Zygo Corporation Passive zero shear interferometers
KR20050114611A (en) 2003-01-27 2005-12-06 제테틱 인스티튜트 Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry
US7084983B2 (en) 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
US7164480B2 (en) 2003-02-04 2007-01-16 Zetetic Institute Compensation for effects of mismatch in indices of refraction at a substrate-medium interface in non-confocal, confocal, and interferometric confocal microscopy
US7263259B2 (en) 2003-02-07 2007-08-28 Zetetic Institute Multiple-source arrays fed by guided-wave structures and resonant guided-wave structure cavities
WO2004072695A2 (en) 2003-02-13 2004-08-26 Zetetic Institute Transverse differential interferometric confocal microscopy
WO2004074881A2 (en) 2003-02-19 2004-09-02 Zetetic Institute Method and apparatus for dark field interferometric confocal microscopy
KR20050098952A (en) 2003-02-19 2005-10-12 제테틱 인스티튜트 Longitudinal differential interferometric confocal microscopy
US6972846B2 (en) * 2003-03-31 2005-12-06 Metrolaser, Inc. Multi-beam heterodyne laser doppler vibrometer
KR20050108422A (en) 2003-04-01 2005-11-16 제테틱 인스티튜트 Method for constructing a catadioptric lens system
US7099014B2 (en) 2003-04-01 2006-08-29 Zetetic Institute Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
JP2006522338A (en) 2003-04-03 2006-09-28 ゼテテック インスティテュート Apparatus and method for field measurement of backscattered and forward scattered / reflected beams by interferometric objects

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
US6753968B2 (en) * 1999-08-02 2004-06-22 Zetetic Institute Optical storage system based on scanning interferometric near-field confocal microscopy
US6552852B2 (en) * 2000-12-21 2003-04-22 Zetetic Institute Catoptric and catadioptric imaging systems
US6717736B1 (en) * 2003-02-13 2004-04-06 Zetetic Institute Catoptric and catadioptric imaging systems

Also Published As

Publication number Publication date
JP2006522339A (en) 2006-09-28
KR20050119672A (en) 2005-12-21
EP1608934A2 (en) 2005-12-28
EP1608934A4 (en) 2007-03-21
US7099014B2 (en) 2006-08-29
WO2004090465A2 (en) 2004-10-21
US20040227951A1 (en) 2004-11-18

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