WO2004086147A3 - Method of imparting patterns of surface relief to rigid substrates - Google Patents
Method of imparting patterns of surface relief to rigid substrates Download PDFInfo
- Publication number
- WO2004086147A3 WO2004086147A3 PCT/CA2004/000431 CA2004000431W WO2004086147A3 WO 2004086147 A3 WO2004086147 A3 WO 2004086147A3 CA 2004000431 W CA2004000431 W CA 2004000431W WO 2004086147 A3 WO2004086147 A3 WO 2004086147A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- surface relief
- rigid substrates
- layer
- imparting patterns
- imparting
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/20—Applying plastic materials and superficially modelling the surface of these materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/02—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a matt or rough surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/061—Special surface effect
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
- B05D1/42—Distributing applied liquids or other fluent materials by members moving relatively to surface by non-rotary members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA2,423,531 | 2003-03-26 | ||
CA 2423531 CA2423531A1 (en) | 2003-03-26 | 2003-03-26 | Method of imparting patterns of surface relief to rigid substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004086147A2 WO2004086147A2 (en) | 2004-10-07 |
WO2004086147A3 true WO2004086147A3 (en) | 2005-02-10 |
Family
ID=33034933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CA2004/000431 WO2004086147A2 (en) | 2003-03-26 | 2004-03-23 | Method of imparting patterns of surface relief to rigid substrates |
Country Status (2)
Country | Link |
---|---|
CA (1) | CA2423531A1 (en) |
WO (1) | WO2004086147A2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2017332162A1 (en) * | 2016-09-20 | 2019-03-28 | Cook Medical Technologies Llc | Imprinting tape, method of manufacture thereof and articles comprising the same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4986496A (en) * | 1985-05-31 | 1991-01-22 | Minnesota Mining And Manufacturing | Drag reduction article |
US5480596A (en) * | 1989-07-12 | 1996-01-02 | Canon Kabushiki Kaisha | Optical recording medium substrate sheet producing apparatus having roll stamper with elastomer layer of predetermined hardness |
US5575878A (en) * | 1994-11-30 | 1996-11-19 | Honeywell Inc. | Method for making surface relief profilers |
EP1072954A2 (en) * | 1999-07-28 | 2001-01-31 | Lucent Technologies Inc. | Lithographic process for device fabrication |
-
2003
- 2003-03-26 CA CA 2423531 patent/CA2423531A1/en not_active Abandoned
-
2004
- 2004-03-23 WO PCT/CA2004/000431 patent/WO2004086147A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4986496A (en) * | 1985-05-31 | 1991-01-22 | Minnesota Mining And Manufacturing | Drag reduction article |
US5480596A (en) * | 1989-07-12 | 1996-01-02 | Canon Kabushiki Kaisha | Optical recording medium substrate sheet producing apparatus having roll stamper with elastomer layer of predetermined hardness |
US5575878A (en) * | 1994-11-30 | 1996-11-19 | Honeywell Inc. | Method for making surface relief profilers |
EP1072954A2 (en) * | 1999-07-28 | 2001-01-31 | Lucent Technologies Inc. | Lithographic process for device fabrication |
Also Published As
Publication number | Publication date |
---|---|
WO2004086147A2 (en) | 2004-10-07 |
CA2423531A1 (en) | 2004-09-26 |
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