WO2004074881A3 - Method and apparatus for dark field interferometric confocal microscopy - Google Patents
Method and apparatus for dark field interferometric confocal microscopy Download PDFInfo
- Publication number
- WO2004074881A3 WO2004074881A3 PCT/US2004/004946 US2004004946W WO2004074881A3 WO 2004074881 A3 WO2004074881 A3 WO 2004074881A3 US 2004004946 W US2004004946 W US 2004004946W WO 2004074881 A3 WO2004074881 A3 WO 2004074881A3
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- WIPO (PCT)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/0056—Optical details of the image generation based on optical coherence, e.g. phase-contrast arrangements, interference arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/143—Beam splitting or combining systems operating by reflection only using macroscopically faceted or segmented reflective surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04712864A EP1595107A4 (en) | 2003-02-19 | 2004-02-19 | Method and apparatus for dark field interferometric confocal microscopy |
JP2006503719A JP2006518488A (en) | 2003-02-19 | 2004-02-19 | Method and apparatus for using dark field interference confocal microscope |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US44825003P | 2003-02-19 | 2003-02-19 | |
US44836003P | 2003-02-19 | 2003-02-19 | |
US60/448,360 | 2003-02-19 | ||
US60/448,250 | 2003-02-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004074881A2 WO2004074881A2 (en) | 2004-09-02 |
WO2004074881A3 true WO2004074881A3 (en) | 2005-05-12 |
Family
ID=32912290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/004946 WO2004074881A2 (en) | 2003-02-19 | 2004-02-19 | Method and apparatus for dark field interferometric confocal microscopy |
Country Status (5)
Country | Link |
---|---|
US (1) | US7023560B2 (en) |
EP (1) | EP1595107A4 (en) |
JP (1) | JP2006518488A (en) |
KR (1) | KR20050098940A (en) |
WO (1) | WO2004074881A2 (en) |
Families Citing this family (28)
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EP1588119A4 (en) * | 2003-01-27 | 2007-03-07 | Zetetic Inst | Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry |
US7084983B2 (en) * | 2003-01-27 | 2006-08-01 | Zetetic Institute | Interferometric confocal microscopy incorporating a pinhole array beam-splitter |
JP2006516762A (en) * | 2003-01-27 | 2006-07-06 | ゼテテック インスティテュート | Leaky sandwiched waveguide mode used in interference confocal microscopy to measure trench properties |
KR20050114615A (en) * | 2003-02-04 | 2005-12-06 | 제테틱 인스티튜트 | Compensation for effects of mismatch in indices of refraction at a substrate-medium interface in non-confocal, confocal, and interferometric confocal microscopy |
WO2004072688A2 (en) * | 2003-02-07 | 2004-08-26 | Zetetic Institute | Multiple-source arrays fed by guided-wave structures and resonant guided-wave structure cavities |
WO2004072695A2 (en) * | 2003-02-13 | 2004-08-26 | Zetetic Institute | Transverse differential interferometric confocal microscopy |
JP2006518487A (en) * | 2003-02-19 | 2006-08-10 | ゼテテック インスティテュート | Vertical differential interference confocal microscope |
JP2006518488A (en) * | 2003-02-19 | 2006-08-10 | ゼテテック インスティテュート | Method and apparatus for using dark field interference confocal microscope |
WO2004090465A2 (en) * | 2003-04-01 | 2004-10-21 | Zetetic Institute | Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
US7054077B2 (en) | 2003-04-01 | 2006-05-30 | Zetetic Institute | Method for constructing a catadioptric lens system |
JP2006522338A (en) * | 2003-04-03 | 2006-09-28 | ゼテテック インスティテュート | Apparatus and method for field measurement of backscattered and forward scattered / reflected beams by interferometric objects |
WO2005008214A2 (en) * | 2003-07-07 | 2005-01-27 | Zetetic Institute | Apparatus and method for ellipsometric measurements with high spatial resolution |
WO2005008334A2 (en) | 2003-07-07 | 2005-01-27 | Zetetic Institute | Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
US7355722B2 (en) * | 2003-09-10 | 2008-04-08 | Zetetic Institute | Catoptric and catadioptric imaging systems with adaptive catoptric surfaces |
US20050111007A1 (en) * | 2003-09-26 | 2005-05-26 | Zetetic Institute | Catoptric and catadioptric imaging system with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces |
US7312877B2 (en) * | 2003-10-01 | 2007-12-25 | Zetetic Institute | Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy |
US7345771B2 (en) | 2004-05-06 | 2008-03-18 | Zetetic Institute | Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks |
TW200538704A (en) * | 2004-05-21 | 2005-12-01 | Zetetic Inst | Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
US7161680B2 (en) * | 2004-08-16 | 2007-01-09 | Zetetic Institute | Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry |
WO2006023612A2 (en) * | 2004-08-19 | 2006-03-02 | Zetetic Institute | Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers |
WO2006034065A2 (en) * | 2004-09-20 | 2006-03-30 | Zetetic Institute | Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces |
EP1869399A2 (en) * | 2005-04-11 | 2007-12-26 | Zetetic Institute | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
US7428058B2 (en) * | 2005-05-18 | 2008-09-23 | Zetetic Institute | Apparatus and method for in situ and ex situ measurements of optical system flare |
US7916304B2 (en) * | 2006-12-21 | 2011-03-29 | Howard Hughes Medical Institute | Systems and methods for 3-dimensional interferometric microscopy |
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US20120314200A1 (en) * | 2011-06-09 | 2012-12-13 | Ophir Eyal | Coupled multi-wavelength confocal systems for distance measurements |
US8969784B2 (en) | 2012-05-14 | 2015-03-03 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Optical lens assembly and optical devices thereof |
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JP2006518488A (en) * | 2003-02-19 | 2006-08-10 | ゼテテック インスティテュート | Method and apparatus for using dark field interference confocal microscope |
WO2004090465A2 (en) * | 2003-04-01 | 2004-10-21 | Zetetic Institute | Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
US7054077B2 (en) | 2003-04-01 | 2006-05-30 | Zetetic Institute | Method for constructing a catadioptric lens system |
JP2006522338A (en) * | 2003-04-03 | 2006-09-28 | ゼテテック インスティテュート | Apparatus and method for field measurement of backscattered and forward scattered / reflected beams by interferometric objects |
WO2005008334A2 (en) | 2003-07-07 | 2005-01-27 | Zetetic Institute | Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
-
2004
- 2004-02-19 JP JP2006503719A patent/JP2006518488A/en not_active Withdrawn
- 2004-02-19 WO PCT/US2004/004946 patent/WO2004074881A2/en not_active Application Discontinuation
- 2004-02-19 EP EP04712864A patent/EP1595107A4/en not_active Withdrawn
- 2004-02-19 KR KR1020057015052A patent/KR20050098940A/en not_active Application Discontinuation
- 2004-02-19 US US10/782,058 patent/US7023560B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US5327223A (en) * | 1991-08-27 | 1994-07-05 | International Business Machines Corporation | Method and apparatus for generating high resolution optical images |
US5828455A (en) * | 1997-03-07 | 1998-10-27 | Litel Instruments | Apparatus, method of measurement, and method of data analysis for correction of optical system |
US6445453B1 (en) * | 1999-08-02 | 2002-09-03 | Zetetic Institute | Scanning interferometric near-field confocal microscopy |
US6552805B2 (en) * | 2000-07-27 | 2003-04-22 | Zetetic Institute | Control of position and orientation of sub-wavelength aperture array in near-field microscopy |
US20040201854A1 (en) * | 2003-02-19 | 2004-10-14 | Zetetic Institute | Longitudinal differential interferometric confocal microscopy |
Also Published As
Publication number | Publication date |
---|---|
WO2004074881A2 (en) | 2004-09-02 |
US20040201855A1 (en) | 2004-10-14 |
EP1595107A4 (en) | 2007-01-24 |
KR20050098940A (en) | 2005-10-12 |
JP2006518488A (en) | 2006-08-10 |
EP1595107A2 (en) | 2005-11-16 |
US7023560B2 (en) | 2006-04-04 |
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