WO2004031454A3 - Cathode design for use in electrodeposition cell - Google Patents

Cathode design for use in electrodeposition cell Download PDF

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Publication number
WO2004031454A3
WO2004031454A3 PCT/GB2003/004080 GB0304080W WO2004031454A3 WO 2004031454 A3 WO2004031454 A3 WO 2004031454A3 GB 0304080 W GB0304080 W GB 0304080W WO 2004031454 A3 WO2004031454 A3 WO 2004031454A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrodeposition cell
cathode design
cell
cathode
substrate
Prior art date
Application number
PCT/GB2003/004080
Other languages
French (fr)
Other versions
WO2004031454A2 (en
Inventor
Daniel Robert Johnson
Original Assignee
Qinetiq Ltd
Daniel Robert Johnson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qinetiq Ltd, Daniel Robert Johnson filed Critical Qinetiq Ltd
Priority to AU2003267606A priority Critical patent/AU2003267606A1/en
Publication of WO2004031454A2 publication Critical patent/WO2004031454A2/en
Publication of WO2004031454A3 publication Critical patent/WO2004031454A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0671—Selective plating

Abstract

The present application provides a cathode for use in an electroplating cell comprising a porous electrically non-conducting substrate having a first surface which is arranged, during operation of the plating cell, to be coated with deposited metal and a second surface which is arranged, in use, to be electrically connected to the plating cell wherein there are one or more electrically conductive pathways between the first and second surfaces of the substrate, and a method of its preparation.
PCT/GB2003/004080 2002-10-01 2003-09-25 Cathode design for use in electrodeposition cell WO2004031454A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003267606A AU2003267606A1 (en) 2002-10-01 2003-09-25 Cathode design for use in electrodeposition cell

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0222711A GB2393736A (en) 2002-10-01 2002-10-01 A Cathode for use in an Electroplating Cell
GB0222711.4 2002-10-01

Publications (2)

Publication Number Publication Date
WO2004031454A2 WO2004031454A2 (en) 2004-04-15
WO2004031454A3 true WO2004031454A3 (en) 2005-01-06

Family

ID=9945068

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2003/004080 WO2004031454A2 (en) 2002-10-01 2003-09-25 Cathode design for use in electrodeposition cell

Country Status (4)

Country Link
AU (1) AU2003267606A1 (en)
GB (1) GB2393736A (en)
TW (1) TW200408730A (en)
WO (1) WO2004031454A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6616438B2 (en) * 2018-02-09 2019-12-04 田中貴金属工業株式会社 Feeder
CN113136573A (en) * 2020-01-17 2021-07-20 先丰通讯股份有限公司 Chemical deposition system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4765833A (en) * 1984-11-08 1988-08-23 Bridgestone Corporation Porous ceramic structure and method of filtering aluminum
DE4214905A1 (en) * 1992-05-05 1993-11-11 Silberkraft Leichtakku Electroless metallisation of microporous plastics film in metal ion soln. - giving mechanical stability, strong adhesion, corrosion resistance and high conductivity, e.g. for capacitor or thin film battery
US5262718A (en) * 1985-08-05 1993-11-16 Raychem Limited Anisotropically electrically conductive article
US5498467A (en) * 1994-07-26 1996-03-12 W. L. Gore & Associates, Inc. Process for preparing selectively conductive materials by electroless metal deposition and product made therefrom
US20030107465A1 (en) * 2001-09-21 2003-06-12 Kabushiki Kaisha Toshiba Passive element component and substrate with built-in passive element

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998019858A1 (en) * 1996-11-06 1998-05-14 Motorola Inc. Circuit comprising microstrip conductor and method for making the same
RU2003135208A (en) * 2001-06-04 2005-05-10 Квинетик Лимитед (Gb) METHOD FOR FORMING FIGURE
GB0113408D0 (en) * 2001-06-04 2001-07-25 Secr Defence Autocatalytic coating method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4765833A (en) * 1984-11-08 1988-08-23 Bridgestone Corporation Porous ceramic structure and method of filtering aluminum
US5262718A (en) * 1985-08-05 1993-11-16 Raychem Limited Anisotropically electrically conductive article
DE4214905A1 (en) * 1992-05-05 1993-11-11 Silberkraft Leichtakku Electroless metallisation of microporous plastics film in metal ion soln. - giving mechanical stability, strong adhesion, corrosion resistance and high conductivity, e.g. for capacitor or thin film battery
US5498467A (en) * 1994-07-26 1996-03-12 W. L. Gore & Associates, Inc. Process for preparing selectively conductive materials by electroless metal deposition and product made therefrom
US20030107465A1 (en) * 2001-09-21 2003-06-12 Kabushiki Kaisha Toshiba Passive element component and substrate with built-in passive element

Also Published As

Publication number Publication date
TW200408730A (en) 2004-06-01
WO2004031454A2 (en) 2004-04-15
AU2003267606A8 (en) 2004-04-23
AU2003267606A1 (en) 2004-04-23
GB2393736A (en) 2004-04-07
GB0222711D0 (en) 2002-11-06

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