WO2004013661A3 - Methods and apparatus for preparing specimens for microscopy - Google Patents

Methods and apparatus for preparing specimens for microscopy Download PDF

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Publication number
WO2004013661A3
WO2004013661A3 PCT/US2003/024224 US0324224W WO2004013661A3 WO 2004013661 A3 WO2004013661 A3 WO 2004013661A3 US 0324224 W US0324224 W US 0324224W WO 2004013661 A3 WO2004013661 A3 WO 2004013661A3
Authority
WO
WIPO (PCT)
Prior art keywords
specimen
microscopy
methods
preparing specimens
ion beam
Prior art date
Application number
PCT/US2003/024224
Other languages
French (fr)
Other versions
WO2004013661A2 (en
Inventor
Paul E Fischione
Alan C Robins
David W Smith
Rocco R Cerchiara
Joseph M Matesa Jr
Original Assignee
E A Fischione Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by E A Fischione Instr Inc filed Critical E A Fischione Instr Inc
Priority to EP03767095A priority Critical patent/EP1585999A4/en
Priority to AU2003261342A priority patent/AU2003261342A1/en
Priority to JP2004526344A priority patent/JP2006509999A/en
Publication of WO2004013661A2 publication Critical patent/WO2004013661A2/en
Publication of WO2004013661A3 publication Critical patent/WO2004013661A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Abstract

An apparatus for preparing specimens for microscopy including equipment for providing two or more of each of the following specimen processing activities under continuous vacuum condition : plasma cleaning the specimen, ion beam or reactive ion beam etching the specimen, plasma etching the specimen and coating the specimen with a conductive material. Also, an apparatus and method for detecting a position of a surface of the specimen in a processing chamber, wherein the detected position is used to automatically move the specimen to appropriate locations for subsequent processing.
PCT/US2003/024224 2002-08-02 2003-08-01 Methods and apparatus for preparing specimens for microscopy WO2004013661A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP03767095A EP1585999A4 (en) 2002-08-02 2003-08-01 Methods and apparatus for preparing specimens for microscopy
AU2003261342A AU2003261342A1 (en) 2002-08-02 2003-08-01 Methods and apparatus for preparing specimens for microscopy
JP2004526344A JP2006509999A (en) 2002-08-02 2003-08-01 Microscope sample preparation method and apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40093202P 2002-08-02 2002-08-02
US60/400,932 2002-08-02

Publications (2)

Publication Number Publication Date
WO2004013661A2 WO2004013661A2 (en) 2004-02-12
WO2004013661A3 true WO2004013661A3 (en) 2006-10-05

Family

ID=31495904

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/024224 WO2004013661A2 (en) 2002-08-02 2003-08-01 Methods and apparatus for preparing specimens for microscopy

Country Status (5)

Country Link
US (3) US8679307B2 (en)
EP (1) EP1585999A4 (en)
JP (1) JP2006509999A (en)
AU (1) AU2003261342A1 (en)
WO (1) WO2004013661A2 (en)

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US20140098380A1 (en) 2014-04-10
EP1585999A2 (en) 2005-10-19
AU2003261342A8 (en) 2004-02-23
US20140157914A1 (en) 2014-06-12
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US20040108067A1 (en) 2004-06-10
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