WO2004001860A1 - Transistor a base permeable en nanotubes et methodes de production - Google Patents
Transistor a base permeable en nanotubes et methodes de production Download PDFInfo
- Publication number
- WO2004001860A1 WO2004001860A1 PCT/US2003/019144 US0319144W WO2004001860A1 WO 2004001860 A1 WO2004001860 A1 WO 2004001860A1 US 0319144 W US0319144 W US 0319144W WO 2004001860 A1 WO2004001860 A1 WO 2004001860A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nanotube
- nanotubes
- base
- layer
- base layer
- Prior art date
Links
- 239000002071 nanotube Substances 0.000 title claims abstract description 122
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000004065 semiconductor Substances 0.000 claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 23
- 239000010410 layer Substances 0.000 claims description 99
- 239000003054 catalyst Substances 0.000 claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- 239000002041 carbon nanotube Substances 0.000 claims description 15
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 15
- 239000004744 fabric Substances 0.000 claims description 15
- 239000000725 suspension Substances 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims description 8
- 239000002109 single walled nanotube Substances 0.000 claims description 7
- 239000002356 single layer Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 238000004528 spin coating Methods 0.000 claims description 5
- 239000000443 aerosol Substances 0.000 claims description 3
- 238000007598 dipping method Methods 0.000 claims description 3
- 230000037361 pathway Effects 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 9
- 239000013078 crystal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 241000894007 species Species 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 208000012868 Overgrowth Diseases 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 239000002238 carbon nanotube film Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- 241000239290 Araneae Species 0.000 description 1
- 229910018999 CoSi2 Inorganic materials 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229910012990 NiSi2 Inorganic materials 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229910008814 WSi2 Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000007833 carbon precursor Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002048 multi walled nanotube Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229940083575 sodium dodecyl sulfate Drugs 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/7722—Field effect transistors using static field induced regions, e.g. SIT, PBT
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/20—Organic diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/40—Organic transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Theoretical Computer Science (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Computer Hardware Design (AREA)
- Bipolar Transistors (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03761093A EP1537605A4 (fr) | 2002-06-19 | 2003-06-17 | Transistor a base permeable en nanotubes et methodes de production |
CA002489827A CA2489827A1 (fr) | 2002-06-19 | 2003-06-17 | Transistor a base permeable en nanotubes et methodes de production |
AU2003248713A AU2003248713A1 (en) | 2002-06-19 | 2003-06-17 | Nanotube permeable base transistor and method of making same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/175,586 US6759693B2 (en) | 2002-06-19 | 2002-06-19 | Nanotube permeable base transistor |
US10/174,889 | 2002-06-19 | ||
US10/174,889 US6774052B2 (en) | 2002-06-19 | 2002-06-19 | Method of making nanotube permeable base transistor |
US10/175,586 | 2002-06-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004001860A1 true WO2004001860A1 (fr) | 2003-12-31 |
Family
ID=30002640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/019144 WO2004001860A1 (fr) | 2002-06-19 | 2003-06-17 | Transistor a base permeable en nanotubes et methodes de production |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1537605A4 (fr) |
AU (1) | AU2003248713A1 (fr) |
CA (1) | CA2489827A1 (fr) |
WO (1) | WO2004001860A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007089322A2 (fr) * | 2005-11-23 | 2007-08-09 | William Marsh Rice University | Préparation de transistors en minces films (tft) ou d'étiquettes d'identification par radiofréquence (rfid) ou autres électroniques imprimables à l'aide d'une imprimante à jet d'encre et encres pour nanotubes de carbone |
EP1964188A2 (fr) * | 2005-09-06 | 2008-09-03 | Nantero, Inc. | Nanotubes de carbone pour le transfert sélectif de chaleur à partir d'éléments électroniques |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4378629A (en) | 1979-08-10 | 1983-04-05 | Massachusetts Institute Of Technology | Semiconductor embedded layer technology including permeable base transistor, fabrication method |
WO2001003208A1 (fr) | 1999-07-02 | 2001-01-11 | President And Fellows Of Harvard College | Dispositifs s nanoscopiques a base de fils, ensembles ainsi formes et procedes de fabrication y relatifs |
US6325909B1 (en) | 1999-09-24 | 2001-12-04 | The Governing Council Of The University Of Toronto | Method of growth of branched carbon nanotubes and devices produced from the branched nanotubes |
US6465813B2 (en) * | 1998-06-16 | 2002-10-15 | Hyundai Electronics Industries Co., Ltd. | Carbon nanotube device |
US20030198812A1 (en) | 2001-07-25 | 2003-10-23 | Thomas Rueckes | Nanotube films and articles |
US20030199172A1 (en) | 2001-07-25 | 2003-10-23 | Thomas Rueckes | Methods of nanotube films and articles |
-
2003
- 2003-06-17 CA CA002489827A patent/CA2489827A1/fr not_active Abandoned
- 2003-06-17 AU AU2003248713A patent/AU2003248713A1/en not_active Abandoned
- 2003-06-17 WO PCT/US2003/019144 patent/WO2004001860A1/fr not_active Application Discontinuation
- 2003-06-17 EP EP03761093A patent/EP1537605A4/fr not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4378629A (en) | 1979-08-10 | 1983-04-05 | Massachusetts Institute Of Technology | Semiconductor embedded layer technology including permeable base transistor, fabrication method |
US6465813B2 (en) * | 1998-06-16 | 2002-10-15 | Hyundai Electronics Industries Co., Ltd. | Carbon nanotube device |
WO2001003208A1 (fr) | 1999-07-02 | 2001-01-11 | President And Fellows Of Harvard College | Dispositifs s nanoscopiques a base de fils, ensembles ainsi formes et procedes de fabrication y relatifs |
US6325909B1 (en) | 1999-09-24 | 2001-12-04 | The Governing Council Of The University Of Toronto | Method of growth of branched carbon nanotubes and devices produced from the branched nanotubes |
US20030198812A1 (en) | 2001-07-25 | 2003-10-23 | Thomas Rueckes | Nanotube films and articles |
US20030199172A1 (en) | 2001-07-25 | 2003-10-23 | Thomas Rueckes | Methods of nanotube films and articles |
Non-Patent Citations (9)
Title |
---|
CHICO L ET AL., PHYSICAL REVIEW LETTERS, vol. 76, no. 6, February 1996 (1996-02-01), pages 971 - 974 |
HSU ET AL., J. APP. PHYS., vol. 69, pages 4282 - 4285 |
MIYAO ET AL., J. CRYST. GROWTH, vol. 111, 1991, pages 957 - 960 |
NILSSON ET AL., SOLID STATE ELEC., vol. 42, 1998, pages 297 - 305 |
PISCH ET AL., J. APP. PHYS., vol. 80, 1996, pages 2742 - 2748 |
See also references of EP1537605A4 |
VON KANEL, MAT. SCI. REP., vol. 8, 1992, pages 193 - 269 |
WERNERSSON ET AL., MAT. SCI.& ENG., vol. B 51, 1998, pages 76 - 80 |
ZARING ET AL., REP. PROGRESS PHYS., vol. 56, 1993, pages 1397 - 1467 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1964188A2 (fr) * | 2005-09-06 | 2008-09-03 | Nantero, Inc. | Nanotubes de carbone pour le transfert sélectif de chaleur à partir d'éléments électroniques |
EP1964188A4 (fr) * | 2005-09-06 | 2010-06-16 | Nantero Inc | Nanotubes de carbone pour le transfert sélectif de chaleur à partir d'éléments électroniques |
WO2007089322A2 (fr) * | 2005-11-23 | 2007-08-09 | William Marsh Rice University | Préparation de transistors en minces films (tft) ou d'étiquettes d'identification par radiofréquence (rfid) ou autres électroniques imprimables à l'aide d'une imprimante à jet d'encre et encres pour nanotubes de carbone |
WO2007089322A3 (fr) * | 2005-11-23 | 2008-03-06 | Univ Rice William M | Préparation de transistors en minces films (tft) ou d'étiquettes d'identification par radiofréquence (rfid) ou autres électroniques imprimables à l'aide d'une imprimante à jet d'encre et encres pour nanotubes de carbone |
US7821079B2 (en) | 2005-11-23 | 2010-10-26 | William Marsh Rice University | Preparation of thin film transistors (TFTs) or radio frequency identification (RFID) tags or other printable electronics using ink-jet printer and carbon nanotube inks |
US8106430B2 (en) * | 2005-11-23 | 2012-01-31 | William Marsh Rice University | Preparation of thin film transistors (TFTs) or radio frequency identification (RFID) tags or other printable electronics using ink-jet printer and carbon nanotube inks |
Also Published As
Publication number | Publication date |
---|---|
CA2489827A1 (fr) | 2003-12-31 |
EP1537605A4 (fr) | 2008-03-05 |
EP1537605A1 (fr) | 2005-06-08 |
AU2003248713A1 (en) | 2004-01-06 |
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