WO2004001508A3 - Method and apparatus for maskless photolithography - Google Patents

Method and apparatus for maskless photolithography

Info

Publication number
WO2004001508A3
WO2004001508A3 PCT/US2003/020019 US0320019W WO2004001508A3 WO 2004001508 A3 WO2004001508 A3 WO 2004001508A3 US 0320019 W US0320019 W US 0320019W WO 2004001508 A3 WO2004001508 A3 WO 2004001508A3
Authority
WO
WIPO (PCT)
Prior art keywords
maskless
dimensional
create
micromirror array
pattern generator
Prior art date
Application number
PCT/US2003/020019
Other languages
French (fr)
Other versions
WO2004001508A2 (en
Inventor
David P Fries
Original Assignee
Univ South Florida
David P Fries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/179,083 external-priority patent/US6544698B1/en
Priority claimed from US10/408,696 external-priority patent/US7095484B1/en
Application filed by Univ South Florida, David P Fries filed Critical Univ South Florida
Priority to AU2003243779A priority Critical patent/AU2003243779A1/en
Publication of WO2004001508A2 publication Critical patent/WO2004001508A2/en
Publication of WO2004001508A3 publication Critical patent/WO2004001508A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Abstract

The present invention pertains to a method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on multi layer two-dimensional or three dimensional structure. The subject invention also relates to a maskless photolithography system and method for creating gray scale patterns and large scale patterns on substrates. The system and method uses a maskless pattern generator to generate a patterned light beam for exposing photoreactive materials. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce gray scale patterns to photoform layers of continuously variable thickness. In an alternate embodiment, the maskless pattern generator comprises a variably transmissive light filter, such as an LCD display, to variably filter light impinging on photoreactive materials to create gray scaled features. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. In a specific embodiment, a fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. In a embodiment, the fixture can be rotated in one, two, or three directions.
PCT/US2003/020019 2002-06-25 2003-06-24 Method and apparatus for maskless photolithography WO2004001508A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003243779A AU2003243779A1 (en) 2002-06-25 2003-06-24 Method and apparatus for maskless photolithography

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/179,083 US6544698B1 (en) 2001-06-27 2002-06-25 Maskless 2-D and 3-D pattern generation photolithography
US10/179,083 2002-06-25
US10/408,696 US7095484B1 (en) 2001-06-27 2003-04-07 Method and apparatus for maskless photolithography
US10/408,696 2003-04-07

Publications (2)

Publication Number Publication Date
WO2004001508A2 WO2004001508A2 (en) 2003-12-31
WO2004001508A3 true WO2004001508A3 (en) 2004-08-05

Family

ID=30002663

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/020019 WO2004001508A2 (en) 2002-06-25 2003-06-24 Method and apparatus for maskless photolithography

Country Status (2)

Country Link
AU (1) AU2003243779A1 (en)
WO (1) WO2004001508A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7012674B2 (en) * 2004-01-13 2006-03-14 Asml Holding N.V. Maskless optical writer
DE102006019963B4 (en) * 2006-04-28 2023-12-07 Envisiontec Gmbh Device and method for producing a three-dimensional object by layer-by-layer solidifying a material that can be solidified under the influence of electromagnetic radiation using mask exposure
CN102036908A (en) * 2008-05-23 2011-04-27 3M创新有限公司 Fabrication of microscale tooling
US9336993B2 (en) * 2014-02-26 2016-05-10 Taiwan Semiconductor Manufacturing Company, Ltd. Digital pattern generator (DPG) for E-beam lithography
CN110603491B (en) 2017-06-26 2022-02-22 应用材料公司 Image improvement for alignment by incoherent illumination mixing
CN110930316B (en) * 2019-10-24 2023-09-05 中山新诺科技股份有限公司 Gray image processing exposure method, device, system and equipment
US11366307B2 (en) 2020-08-27 2022-06-21 Kla Corporation Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
CN116300319A (en) * 2021-12-21 2023-06-23 广东洛恩光电科技有限公司 Photoetching machine and method for manufacturing holographic master plate, holographic master plate and anti-counterfeiting element

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020024714A1 (en) * 1998-03-02 2002-02-28 Torbjorn Sandstrom Pattern generator
US6379867B1 (en) * 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020024714A1 (en) * 1998-03-02 2002-02-28 Torbjorn Sandstrom Pattern generator
US6379867B1 (en) * 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system

Also Published As

Publication number Publication date
AU2003243779A1 (en) 2004-01-06
AU2003243779A8 (en) 2004-01-06
WO2004001508A2 (en) 2003-12-31

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