WO2003093902A2 - Beleuchtungssystem, insbesondere für die euv-lithographie - Google Patents
Beleuchtungssystem, insbesondere für die euv-lithographie Download PDFInfo
- Publication number
- WO2003093902A2 WO2003093902A2 PCT/EP2003/003616 EP0303616W WO03093902A2 WO 2003093902 A2 WO2003093902 A2 WO 2003093902A2 EP 0303616 W EP0303616 W EP 0303616W WO 03093902 A2 WO03093902 A2 WO 03093902A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical element
- mirror
- raster elements
- lighting system
- mirror facets
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Definitions
- the invention relates to a lighting system, in particular for EUV lithography with a projection objective
- the invention also relates to a projection exposure system with such an illumination system.
- the wavelength of the light used for microlithography should be reduced further and further.
- lithography e.g. Zt. wavelengths of ⁇ 193 nm have already been used.
- a suitable for EUV lithography • lighting system is intended to homogeneously the default for EUV lithography field, in particular the annular field of an objective with as few reflections illuminate ie uniform.
- the pupil of the objective should be illuminated up to a certain degree of filling ⁇ independent of the field, and the exit pupil of the lighting system should be illuminated in the entrance pupil of the Lens.
- a lighting system is described, with a predetermined illumination in the exit pupil of the lighting system being able to be set by corresponding assignments of the raster elements of the first and second optical elements.
- the field in the reticle plane can be homogeneous and with a partially filled aperture, as well as the exit pupil of the illumination system. when illuminated.
- the variable setting of any lighting distribution in the exit pupil is largely without loss of light.
- the present invention has for its object to provide a lighting system with which the basic idea of the older patent application can be implemented in practice by constructive solutions.
- the pupil honeycombs can simultaneously be used as field lenses for the coupled formation of the light source in the entrance pupil of the Lithography lenses or projection lenses are used.
- the number M of the second raster elements (pupil honeycombs) of the pupil honeycomb plate or of the mirror carrier is always greater than N, N being the number of channels which is determined by the number of illuminated first raster elements (field honeycombs) variable illuminations can be kept in the exit pupil.
- N being the number of channels which is determined by the number of illuminated first raster elements (field honeycombs) variable illuminations can be kept in the exit pupil.
- N being the number of channels which is determined by the number of illuminated first raster elements (field honeycombs) variable illuminations
- Figure 1 shows a structure of an EUV lighting system with a light source, a lighting system and a Proj ejektobj ektiv;
- FIG. 5 shows a plan view of the second optical element in the form of a pupil honeycomb plate as a mirror carrier with a multiplicity of mirror facets with circular illumination
- FIG. 6 shows a plan view of the second optical element in the form of a pupil honeycomb plate with a plurality of mirror facets with annular illumination
- FIG. 7 shows a plan view of a pupil honeycomb plate
- FIG. 9 shows a plan view of a pupil honeycomb plate which is designed as a control disk
- Figure 10 is a section along the line X-X of Figure 9;
- FIG. 12 shows a plan view of the mirror facet according to FIG. 11;
- Figure 13 is an enlarged view of a mirror facet with another type of storage in section.
- FIG. 14 shows a top view of the mirror facet according to FIG. 13.
- FIG. 1 shows an overview of an EUV projection exposure system with a complete EUV lighting system with a light source 1, for example laser plasma, plasma or pinch plasma source or also another EUV light source, and a projection objective 2, which is only shown in principle.
- a collector mirror 2 which can consist, for example, of several shells arranged one inside the other, a plane mirror 3 or reflective spectral filter, an aperture 4 with an image of the light source (not designated), a first optical element 5 a plurality of facet mirrors 6 (see FIGS.
- a second optical element 7 arranged downstream with a plurality of raster elements 8 in the form of facet mirrors and two imaging mirrors 9a and 9b.
- the imaging mirrors 9a and 9b serve to image the facet mirrors 8 of the second optical element 7 in an entrance pupil of the projection objective 2.
- the reticle 12 can be moved in the y direction as a scanning system.
- the reticle plane 11 also simultaneously represents the object plane.
- the mirror facets 8 of the second optical element 7 In order to spend different light channels for setting the setting in the beam path of the lighting system, there is, for example, a larger number M of mirror facets 8 of the second optical element 7 than corresponds to the number N of mirror facets 6 of the first optical element 5. For reasons of clarity, the mirror facets are not shown in FIG. 1.
- the mirror facets 6 of the first optical element 5 are each individually adjustable in angle, while the mirror facets 8 of the second optical element 7 are adjustable both in angle and in location. Details of this are described and illustrated in the figures 7 to 14 explained below. Due to the tiltable arrangement and the displaceability of the mirror facets 6 and 8, different beam paths can and thus different light channels are created between the first optical element 5 and the second optical element 7.
- the adjustability of the mirror facets 6 and 8 makes it possible to implement different settings in an exit pupil 15 of the lighting system, which at the same time forms an entry pupil of the projection objective 2.
- FIG. 2 shows a larger fill factor ⁇ .
- FIG. 4 shows a plan view of a mirror carrier 16 of the first optical element 5 with a multiplicity of raster elements in the form of mirror facets 6
- individually adjustable mirror facets 6 as field honeycombs in Rectangular shape, which are arranged in blocks in an area illuminated by the nested collector mirror 2.
- the mirror facets 6 can each be individually adjusted with respect to their angle.
- Mirror facets 8 of the second optical element 7 can additionally be shifted among one another and, if necessary, independently of one another.
- FIG. 6 shows a plan view of a mirror carrier 16 of the second optical element 7 with mirror facets in an annular or annular setting. Another possibility is a known quadrupole setting (not shown). The illuminated mirror facets are each shown dark in FIGS. 5 and 6.
- FIG. 7 shows a top view of the mirror carrier 16 of the second optical element 7, the mirror carrier 16 being designed as a guide disk.
- the mirror carrier 16 or the guide disk is provided with a plurality of guide grooves 17 (only one guide groove 17 is shown in FIG. 7 for reasons of clarity), in each of which a circular mirror facet 8 is guided.
- the guide grooves 17 run essentially radially or slightly curved. The course of the guide grooves 17 depends on the respective application and on the desired direction of displacement of the mirror facets 8.
- a control disk 18 is arranged in parallel and adjacent thereto, which is also provided with a number of control grooves 19 corresponding to the guide grooves 17 and thus the mirror facets 8.
- Each mirror facet 8 is thus guided in a guide groove 17 and in a control groove 19. If the tax • disk 18 is moved by a drive device, not shown, in the direction of arrow 20 in FIG. 7, the mirror facets 8 move radially inwards or outwards along the guide groove 17. This shift changes the assignment of the light channels and thus the illumination. This means that by turning the control disk 18 relative to the guide disk 16, the associated mirror facet 8 is displaced along the associated guide groove 17 at the intersection of the two grooves 17 and 19.
- FIGS. 9 and 10 show an embodiment for displacing the mirror facets 8 of the second optical element 7 in each case in a guide groove 17 of the mirror carrier 16, a drive device 21 (in FIGS. 9 and 10 only shown in principle and in broken lines) being provided in each case.
- each mirror facet 8 has its own drive in the associated guide groove 17, the drive e.g. can take place according to the known piezo inch worm principle.
- Each mirror facet 6 can be tilted with respect to the mirror carrier 16 by means of actuators 23, which are not shown in any more detail and are located between the mirror carrier 16 and the underside of each mirror facet 6. From the top view according to FIG. 12 it can be seen that an actuator 23, which is located on the y-axis, and a further actuator 23, which is located on the x-axis, provide tilting possibilities in both directions.
- the two actuators 23 are each located on their associated axis outside the axis intersection.
- FIGS. 13 and 14 show an embodiment by means of which larger tilts for the mirror facets 6 are made possible.
- FIG. 13 in this case there is a central tilting joint or tilting bearing 24 between the mirror facet 6 and the mirror support 16.
- actuators 23 tilt the mirror facet 6 in both the x and y directions.
- the tilting devices shown in FIGS. 11 to 14 allow not only the mirror facets 6 of the first optical element 5 but also the mirror facets 8 of the second optical element 7 to be adjusted as desired and independently of one another.
- the mirror facets 8 of the second optical element 7 have a circular shape.
- this difference has no influence on the type or mode of operation of the tilting devices shown in FIGS. 11 to 14.
- Actuators that can be activated magnetically or electrically are also possible as actuators 23.
- the actuators 23 can continuously adjust the mirror facets 6 and 8 via a control loop (not shown).
- a control loop not shown
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/512,100 US7196841B2 (en) | 2002-04-30 | 2003-04-08 | Lighting system, particularly for use in extreme ultraviolet (EUV) lithography |
EP03724973A EP1499925A2 (de) | 2002-04-30 | 2003-04-08 | Beleuchtungssystem, insbesondere f r die euv-lithographie |
AU2003227574A AU2003227574A1 (en) | 2002-04-30 | 2003-04-08 | Lighting system, particularly for use in extreme ultraviolet (euv) lithography |
JP2004502061A JP2005524236A (ja) | 2002-04-30 | 2003-04-08 | 特には極端紫外線(euv)リソグラフィに用いる、照明システム |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10219514.5 | 2002-04-30 | ||
DE10219514A DE10219514A1 (de) | 2002-04-30 | 2002-04-30 | Beleuchtungssystem, insbesondere für die EUV-Lithographie |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003093902A2 true WO2003093902A2 (de) | 2003-11-13 |
WO2003093902A3 WO2003093902A3 (de) | 2004-03-11 |
Family
ID=29224960
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/003616 WO2003093902A2 (de) | 2002-04-30 | 2003-04-08 | Beleuchtungssystem, insbesondere für die euv-lithographie |
Country Status (7)
Country | Link |
---|---|
US (1) | US7196841B2 (de) |
EP (1) | EP1499925A2 (de) |
JP (1) | JP2005524236A (de) |
CN (1) | CN1650234A (de) |
AU (1) | AU2003227574A1 (de) |
DE (1) | DE10219514A1 (de) |
WO (1) | WO2003093902A2 (de) |
Cited By (6)
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JP2006295023A (ja) * | 2005-04-14 | 2006-10-26 | Canon Inc | 光学装置及びそれを備えた露光装置 |
EP1975724A1 (de) * | 2007-03-30 | 2008-10-01 | ASML Netherlands BV | Lithographische Vorrichtung und Verfahren |
EP2020679A1 (de) * | 2006-05-25 | 2009-02-04 | Nikon Corporation | Optische beleuchtungsvorrichtung, belichtungsgerät und geräteherstellungsverfahren |
WO2009074211A1 (en) | 2007-12-11 | 2009-06-18 | Carl Zeiss Smt Ag | Illumination optics for microlithography |
JP2011512659A (ja) * | 2008-02-15 | 2011-04-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
US9250536B2 (en) | 2007-03-30 | 2016-02-02 | Asml Netherlands B.V. | Lithographic apparatus and method |
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US7843632B2 (en) * | 2006-08-16 | 2010-11-30 | Cymer, Inc. | EUV optics |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19903807A1 (de) * | 1998-05-05 | 1999-11-11 | Zeiss Carl Fa | Beleuchtungssystem insbesondere für die EUV-Lithographie |
EP1026547A2 (de) * | 1999-01-27 | 2000-08-09 | Svg Lithography Systems, Inc. | Facettenreflektor-Kondensor für die EUV-Lithographie |
DE19935568A1 (de) * | 1999-07-30 | 2001-02-15 | Zeiss Carl Fa | Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems |
DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
DE10120446A1 (de) * | 2001-04-26 | 2002-11-28 | Zeiss Carl | Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von in der Projektionsoptik einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie, auftretenden Abbildungsfehlern |
Family Cites Families (130)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3077958A (en) | 1961-09-05 | 1963-02-19 | United Aircraft Corp | Zero thermal expansion device |
US3802781A (en) | 1972-08-15 | 1974-04-09 | D Wright | Extensometers |
US3837125A (en) | 1973-09-04 | 1974-09-24 | Celestron Pacific | Method and system for making schmidt corrector lenses |
US3917385A (en) | 1973-09-19 | 1975-11-04 | Rockwell International Corp | Simplified micropositioner |
US3879105A (en) | 1974-04-04 | 1975-04-22 | Jenoptik Jena Gmbh | Telescope with an image reversing system |
US4060315A (en) | 1975-07-07 | 1977-11-29 | Rockwell International Corporation | Precision mirror mount |
US4038971A (en) | 1975-10-22 | 1977-08-02 | Bezborodko Joseph A I B | Concave, mirrored solar collector |
US4092518A (en) | 1976-12-07 | 1978-05-30 | Laser Technique S.A. | Method of decorating a transparent plastics material article by means of a laser beam |
US4195913A (en) | 1977-11-09 | 1980-04-01 | Spawr Optical Research, Inc. | Optical integration with screw supports |
US4162120A (en) | 1977-12-02 | 1979-07-24 | Ford Aerospace & Communications Corp. | Thermal compensator linkage |
US4236296A (en) | 1978-10-13 | 1980-12-02 | Exxon Research & Engineering Co. | Etch method of cleaving semiconductor diode laser wafers |
US4277141A (en) | 1979-03-28 | 1981-07-07 | Tropel, Inc. | Multifaceted mirror and assembly fixture and method of making such mirror |
US4202605A (en) | 1979-04-05 | 1980-05-13 | Rockwell International Corporation | Active segmented mirror |
US4226507A (en) | 1979-07-09 | 1980-10-07 | The Perkin-Elmer Corporation | Three actuator deformable specimen |
US4295710A (en) | 1979-09-04 | 1981-10-20 | Rockwell International Corporation | Deformable mirror with dither |
JPS57624A (en) | 1980-06-03 | 1982-01-05 | Nippon Kogaku Kk <Nikon> | Albada type reverse-galilean finder |
US4380391A (en) | 1980-09-30 | 1983-04-19 | The United States Of America As Represented By The Secretary Of The Army | Short pulse CO2 laser for ranging and target identification |
US4403421A (en) | 1980-11-13 | 1983-09-13 | Shepherd Daniel R | Telescopic gun sight |
US4408874A (en) | 1981-05-07 | 1983-10-11 | Computervision Corporation | Projection aligner with specific means for bending mirror |
US4389115A (en) | 1981-08-06 | 1983-06-21 | Richter Thomas A | Optical system |
DE3323828C2 (de) | 1983-07-01 | 1986-01-16 | Messerschmitt-Bölkow-Blohm GmbH, 8012 Ottobrunn | Laserwarnsensor |
US4871237A (en) | 1983-07-27 | 1989-10-03 | Nikon Corporation | Method and apparatus for adjusting imaging performance of projection optical apparatus |
JPS60219744A (ja) | 1984-04-17 | 1985-11-02 | Canon Inc | 投影露光装置 |
JP2516194B2 (ja) | 1984-06-11 | 1996-07-10 | 株式会社日立製作所 | 投影露光方法 |
US4969726A (en) | 1985-06-03 | 1990-11-13 | Northrop Corporation | Ring laser gyro path-length-control mechanism |
US4672439A (en) | 1985-09-04 | 1987-06-09 | Texas Instruments Incorporated | FLIR imager with hybrid optical/electronic processor |
DE3544429A1 (de) | 1985-12-16 | 1987-06-19 | Juwedor Gmbh | Verfahren zur galvanoplastischen herstellung von schmuckwaren |
US4953965A (en) | 1985-12-26 | 1990-09-04 | Toshiba Machine Company, Ltd. | High-accuracy traveling table apparatus |
US4705369A (en) | 1986-03-21 | 1987-11-10 | The United States Of America As Represented By The United States Department Of Energy | Mirror mount |
US4722592A (en) | 1986-12-29 | 1988-02-02 | The United States Of America As Represented By The Secretary Of The Army | Motorized-axis-angular fine adjustment prism mount |
US4740276A (en) | 1987-05-08 | 1988-04-26 | The United States Of America As Represented By The Secretary Of The Air Force | Fabrication of cooled faceplate segmented aperture mirrors (SAM) by electroforming |
US4849668A (en) | 1987-05-19 | 1989-07-18 | Massachusetts Institute Of Technology | Embedded piezoelectric structure and control |
AT393925B (de) | 1987-06-02 | 1992-01-10 | Ims Ionen Mikrofab Syst | Anordnung zur durchfuehrung eines verfahrens zum positionieren der abbildung der auf einer maske befindlichen struktur auf ein substrat, und verfahren zum ausrichten von auf einer maske angeordneten markierungen auf markierungen, die auf einem traeger angeordnet sind |
US4932778A (en) | 1987-06-22 | 1990-06-12 | Pioneer Data Processing, Inc. | Autokinesis free optical instrument |
US4865454A (en) | 1987-11-24 | 1989-09-12 | Kaman Aerospace Corporation | Adaptive optical system with synchronous detection of wavefront phase |
US4826304A (en) | 1988-04-11 | 1989-05-02 | Gte Government Systems Corporation | Adjustable optical mounting assembly |
US4932770A (en) | 1988-12-20 | 1990-06-12 | Caravaty Raymond D | Dual plane rear vision mirror |
US5026977A (en) | 1989-04-05 | 1991-06-25 | The Charles Stark Draper Laboratory, Inc. | Wavefront sensing and correction with deformable mirror |
US4959531A (en) | 1989-09-29 | 1990-09-25 | Eastman Kodak Company | Alignment sensing and correcting assembly for an optical element |
FR2656079B1 (fr) | 1989-12-20 | 1994-05-06 | Etat Francais Delegue Armement | Lunette episcopique modulable et reconfigurable. |
US5074654A (en) | 1990-08-22 | 1991-12-24 | Litton Systems, Inc. | Hydraulic actuators for optical systems |
US5079414A (en) | 1990-10-09 | 1992-01-07 | Gte Government Systems Corporation | Tracking telescope using an atomic resonance filter |
NL9100421A (nl) | 1991-03-08 | 1992-10-01 | Asm Lithography Bv | Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting. |
US5132979A (en) | 1991-08-16 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Laser frequency modulator for modulating a laser cavity |
US5428482A (en) | 1991-11-04 | 1995-06-27 | General Signal Corporation | Decoupled mount for optical element and stacked annuli assembly |
US5157555A (en) | 1991-12-04 | 1992-10-20 | General Electric Company | Apparatus for adjustable correction of spherical aberration |
US5210650A (en) | 1992-03-31 | 1993-05-11 | Eastman Kodak Company | Compact, passively athermalized optical assembly |
US5438451A (en) | 1992-09-25 | 1995-08-01 | Schweizer; Bruno | Linearly fine-adjustable stage |
US5400184A (en) | 1992-10-29 | 1995-03-21 | The United States Of America As Represented By The United States Department Of Energy | Kinematic high bandwidth mirror mount |
US5414557A (en) | 1992-11-30 | 1995-05-09 | Itt Corporation | Reticle apparatus for night vision devices |
US6252334B1 (en) | 1993-01-21 | 2001-06-26 | Trw Inc. | Digital control of smart structures |
US5581605A (en) | 1993-02-10 | 1996-12-03 | Nikon Corporation | Optical element, production method of optical element, optical system, and optical apparatus |
US5361292A (en) | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
US5339346A (en) | 1993-05-20 | 1994-08-16 | At&T Bell Laboratories | Device fabrication entailing plasma-derived x-ray delineation |
US5485053A (en) | 1993-10-15 | 1996-01-16 | Univ America Catholic | Method and device for active constrained layer damping for vibration and sound control |
US5537262A (en) | 1993-10-19 | 1996-07-16 | Asahi Kogaku Kogyo Kabushiki Kaisha | Rotational torque setting apparatus for screw mechanism |
JP2891074B2 (ja) | 1993-12-10 | 1999-05-17 | 三菱電機株式会社 | 反射鏡固定装置 |
US6154000A (en) | 1994-09-07 | 2000-11-28 | Omnitek Research & Development, Inc. | Apparatus for providing a controlled deflection and/or actuator apparatus |
US5529277A (en) | 1994-09-20 | 1996-06-25 | Ball Corporation | Suspension system having two degrees of rotational freedom |
DE69529442T2 (de) | 1994-09-22 | 2003-11-20 | Ricoh Kk | Informationsaufzeichnungsverfahren und -vorrichtung |
US6341006B1 (en) | 1995-04-07 | 2002-01-22 | Nikon Corporation | Projection exposure apparatus |
US5870133A (en) | 1995-04-28 | 1999-02-09 | Minolta Co., Ltd. | Laser scanning device and light source thereof having temperature correction capability |
US5724017A (en) | 1995-07-31 | 1998-03-03 | General Electric Company | Electrical transformer with reduced core noise |
JPH09152505A (ja) | 1995-11-30 | 1997-06-10 | Sharp Corp | 変形可能ミラー及びその製造方法及び光学装置並びに記録再生装置 |
US5737137A (en) | 1996-04-01 | 1998-04-07 | The Regents Of The University Of California | Critical illumination condenser for x-ray lithography |
US5694257A (en) | 1996-05-06 | 1997-12-02 | New Focus, Inc. | Rotary beamsplitter prism mount |
US6144511A (en) | 1996-08-26 | 2000-11-07 | Fujitsu Denso Ltd. | Optical device fixing device |
JP3695494B2 (ja) * | 1996-11-13 | 2005-09-14 | セイコーエプソン株式会社 | 光変調デバイス、その製造方法および表示装置 |
US5891317A (en) | 1997-02-04 | 1999-04-06 | Avon Products, Inc. | Electroformed hollow jewelry |
US6128122A (en) * | 1998-09-18 | 2000-10-03 | Seagate Technology, Inc. | Micromachined mirror with stretchable restoring force member |
JP4534260B2 (ja) | 1997-07-22 | 2010-09-01 | 株式会社ニコン | 露光方法、露光装置、その製造方法及び光洗浄方法 |
DE19735831A1 (de) | 1997-08-18 | 1999-02-25 | Zeiss Carl Fa | Galvanoplastische Optik-Fassung |
US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
US6054784A (en) | 1997-12-29 | 2000-04-25 | Asm Lithography B.V. | Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
JPH11224839A (ja) | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
DE19807120A1 (de) | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
US6108121A (en) | 1998-03-24 | 2000-08-22 | The Board Of Trustees Of The Leland Stanford Junior University | Micromachined high reflectance deformable mirror |
US7126137B2 (en) * | 1998-05-05 | 2006-10-24 | Carl Zeiss Smt Ag | Illumination system with field mirrors for producing uniform scanning energy |
DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
DE19825716A1 (de) | 1998-06-09 | 1999-12-16 | Zeiss Carl Fa | Baugruppe aus optischem Element und Fassung |
US5986795A (en) | 1998-06-15 | 1999-11-16 | Chapman; Henry N. | Deformable mirror for short wavelength applications |
US5986827A (en) | 1998-06-17 | 1999-11-16 | The Regents Of The University Of California | Precision tip-tilt-piston actuator that provides exact constraint |
TWI242113B (en) | 1998-07-17 | 2005-10-21 | Asml Netherlands Bv | Positioning device and lithographic projection apparatus comprising such a device |
US6210865B1 (en) * | 1998-08-06 | 2001-04-03 | Euv Llc | Extreme-UV lithography condenser |
US6225027B1 (en) * | 1998-08-06 | 2001-05-01 | Euv Llc | Extreme-UV lithography system |
US6469827B1 (en) * | 1998-08-06 | 2002-10-22 | Euv Llc | Diffraction spectral filter for use in extreme-UV lithography condenser |
US6118577A (en) * | 1998-08-06 | 2000-09-12 | Euv, L.L.C | Diffractive element in extreme-UV lithography condenser |
FR2783055B1 (fr) | 1998-09-04 | 2000-11-24 | Essilor Int | Support pour lentille optique, et son procede de mise en oeuvre |
US6521892B2 (en) * | 1998-10-09 | 2003-02-18 | Thomson-Csf Optronics Canada Inc. | Uncooled driver viewer enhancement system |
US6296811B1 (en) | 1998-12-10 | 2001-10-02 | Aurora Biosciences Corporation | Fluid dispenser and dispensing methods |
DE19859634A1 (de) | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
US6373552B1 (en) | 1999-01-20 | 2002-04-16 | Asm Lithography B.V. | Optical correction plate, and its application in a lithographic projection apparatus |
DE19904152A1 (de) | 1999-02-03 | 2000-08-10 | Zeiss Carl Fa | Baugruppe aus einem optischen Element und einer Fassung |
JP2000234906A (ja) | 1999-02-15 | 2000-08-29 | Koji Masutani | 反射部材移動装置および前記反射部材移動装置を使用する光路長周期的増減装置 |
DE19908554A1 (de) | 1999-02-27 | 2000-08-31 | Zeiss Carl Fa | Verstellbare Baugruppe |
DE19910947A1 (de) | 1999-03-12 | 2000-09-14 | Zeiss Carl Fa | Vorrichtung zum Verschieben eines optischen Elementes entlang der optischen Achse |
US6033079A (en) * | 1999-03-15 | 2000-03-07 | Hudyma; Russell | High numerical aperture ring field projection system for extreme ultraviolet lithography |
US6428173B1 (en) | 1999-05-03 | 2002-08-06 | Jds Uniphase, Inc. | Moveable microelectromechanical mirror structures and associated methods |
US6246822B1 (en) | 1999-05-18 | 2001-06-12 | The Boeing Company | Fiber-coupled receiver and associated method |
US6160628A (en) | 1999-06-29 | 2000-12-12 | Nikon Corporation | Interferometer system and method for lens column alignment |
DE19930643C2 (de) | 1999-07-02 | 2002-01-24 | Zeiss Carl | Baugruppe aus einem optischen Element und einer Fassung |
TW442783B (en) | 1999-07-09 | 2001-06-23 | Ind Tech Res Inst | Folding mirror |
US6478434B1 (en) | 1999-11-09 | 2002-11-12 | Ball Aerospace & Technologies Corp. | Cryo micropositioner |
DE19959616A1 (de) * | 1999-12-10 | 2001-06-13 | Volkswagen Ag | Steuereinrichtung für ein automatisch und manuell schaltbares Schaltgetriebe in einem Kraftfahrzeug |
DE10016925A1 (de) | 2000-04-05 | 2001-10-11 | Zeiss Carl | Irisblende |
DE10019562A1 (de) | 2000-04-20 | 2001-10-25 | Zeiss Carl | Vorrichtung zum Verbinden von Gehäusen oder Fassungen für optische Elemente |
US6411426B1 (en) | 2000-04-25 | 2002-06-25 | Asml, Us, Inc. | Apparatus, system, and method for active compensation of aberrations in an optical system |
DE10026541A1 (de) * | 2000-05-27 | 2001-11-29 | Zeiss Carl | Vorrichtung zur präzisen Positionierung eines Bauteils, insbesondere eines optischen Bauteiles |
US6560384B1 (en) * | 2000-06-01 | 2003-05-06 | Calient Networks, Inc. | Optical switch having mirrors arranged to accommodate freedom of movement |
DE10030005A1 (de) | 2000-06-17 | 2001-12-20 | Zeiss Carl | Objektiv, insbesondere Projektionsobjektiv in der Halbleiter-Lithographie |
KR100493151B1 (ko) * | 2000-07-19 | 2005-06-02 | 삼성전자주식회사 | 멀티폴디스 스프링을 이용한 다축 구동을 위한싱글스테이지 마이크로 구동기 |
US6449106B1 (en) | 2000-08-10 | 2002-09-10 | Nikon Corporation | Catadioptric lens barrel structure having a support structure to maintain alignment of a plurality of sub-barrels |
US6566627B2 (en) * | 2000-08-11 | 2003-05-20 | Westar Photonics, Inc. | Laser method for shaping of optical lenses |
DE10039712A1 (de) * | 2000-08-14 | 2002-02-28 | Zeiss Carl | Vorrichtung zum Verstellen der Lage zweier Bauelemente zueinander |
JP4019160B2 (ja) * | 2000-08-21 | 2007-12-12 | 富士フイルム株式会社 | 遠隔操作システム |
US6537479B1 (en) * | 2000-08-24 | 2003-03-25 | Colbar Art, Inc. | Subsurface engraving of three-dimensional sculpture |
DE10046379A1 (de) * | 2000-09-20 | 2002-03-28 | Zeiss Carl | System zur gezielten Deformation von optischen Elementen |
DE10050125A1 (de) * | 2000-10-11 | 2002-04-25 | Zeiss Carl | Vorrichtung zum Temperaturausgleich für thermisch belastete Körper mit niederer Wärmeleitfähigkeit, insbesondere für Träger reflektierender Schichten oder Substrate in der Optik |
DE10051706A1 (de) * | 2000-10-18 | 2002-05-02 | Zeiss Carl | Vorrichtung zur Lagerung eines optischen Elementes |
DE10053899A1 (de) * | 2000-10-31 | 2002-05-08 | Zeiss Carl | Vorrichtung zur Lagerung eines optischen Elementes |
DE10100546A1 (de) * | 2001-01-08 | 2002-07-11 | Zeiss Carl | Vorrichtung zur Verstellung eines optischen Elementes in einem Objektiv |
US6549692B1 (en) * | 2001-02-13 | 2003-04-15 | Tellium, Inc. | Optical monitoring of the angular position of micro mirrors in an optical switch |
US6539142B2 (en) * | 2001-06-01 | 2003-03-25 | Agilent Technologies, Inc. | System and method for actively aligning mirrors in an optical switch |
US6798494B2 (en) * | 2001-08-30 | 2004-09-28 | Euv Llc | Apparatus for generating partially coherent radiation |
DE10200366A1 (de) * | 2002-01-08 | 2003-07-17 | Zeiss Optronik Gmbh | Mehrkanalempfängersystem für winkelaufgelöste Laserentfernungsmessung |
US6729062B2 (en) * | 2002-01-31 | 2004-05-04 | Richard L. Thomas | Mil.dot reticle and method for producing the same |
DE10215140B4 (de) * | 2002-04-05 | 2012-12-06 | Carl Zeiss | Objektiv für eine Filmkamera |
US6768567B2 (en) * | 2002-06-05 | 2004-07-27 | Euv Llc | Synchrotron-based EUV lithography illuminator simulator |
US6870554B2 (en) * | 2003-01-07 | 2005-03-22 | Anvik Corporation | Maskless lithography with multiplexed spatial light modulators |
US6853440B1 (en) * | 2003-04-04 | 2005-02-08 | Asml Netherlands B.V. | Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination |
-
2002
- 2002-04-30 DE DE10219514A patent/DE10219514A1/de not_active Withdrawn
-
2003
- 2003-04-08 US US10/512,100 patent/US7196841B2/en not_active Expired - Fee Related
- 2003-04-08 AU AU2003227574A patent/AU2003227574A1/en not_active Abandoned
- 2003-04-08 CN CN03809609.9A patent/CN1650234A/zh active Pending
- 2003-04-08 EP EP03724973A patent/EP1499925A2/de not_active Withdrawn
- 2003-04-08 JP JP2004502061A patent/JP2005524236A/ja active Pending
- 2003-04-08 WO PCT/EP2003/003616 patent/WO2003093902A2/de not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19903807A1 (de) * | 1998-05-05 | 1999-11-11 | Zeiss Carl Fa | Beleuchtungssystem insbesondere für die EUV-Lithographie |
EP1026547A2 (de) * | 1999-01-27 | 2000-08-09 | Svg Lithography Systems, Inc. | Facettenreflektor-Kondensor für die EUV-Lithographie |
DE19935568A1 (de) * | 1999-07-30 | 2001-02-15 | Zeiss Carl Fa | Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems |
DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
DE10120446A1 (de) * | 2001-04-26 | 2002-11-28 | Zeiss Carl | Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von in der Projektionsoptik einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie, auftretenden Abbildungsfehlern |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006295023A (ja) * | 2005-04-14 | 2006-10-26 | Canon Inc | 光学装置及びそれを備えた露光装置 |
EP2020679A1 (de) * | 2006-05-25 | 2009-02-04 | Nikon Corporation | Optische beleuchtungsvorrichtung, belichtungsgerät und geräteherstellungsverfahren |
EP2020679A4 (de) * | 2006-05-25 | 2011-04-13 | Nikon Corp | Optische beleuchtungsvorrichtung, belichtungsgerät und geräteherstellungsverfahren |
US8937706B2 (en) | 2007-03-30 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and method |
EP1975724A1 (de) * | 2007-03-30 | 2008-10-01 | ASML Netherlands BV | Lithographische Vorrichtung und Verfahren |
US10222703B2 (en) | 2007-03-30 | 2019-03-05 | Asml Netherlands B.V. | Lithographic apparatus and method |
US9778575B2 (en) | 2007-03-30 | 2017-10-03 | Asml Netherlands B.V. | Lithographic apparatus and method |
US9250536B2 (en) | 2007-03-30 | 2016-02-02 | Asml Netherlands B.V. | Lithographic apparatus and method |
WO2009074211A1 (en) | 2007-12-11 | 2009-06-18 | Carl Zeiss Smt Ag | Illumination optics for microlithography |
US8937708B2 (en) | 2007-12-11 | 2015-01-20 | Carl Zeiss Smt Gmbh | Illumination optics for microlithography |
US9411241B2 (en) | 2008-02-15 | 2016-08-09 | Carl Zeiss Smt Gmbh | Facet mirror for use in a projection exposure apparatus for microlithography |
JP2014140047A (ja) * | 2008-02-15 | 2014-07-31 | Carl Zeiss Smt Gmbh | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
US9996012B2 (en) | 2008-02-15 | 2018-06-12 | Carl Zeiss Smt Gmbh | Facet mirror for use in a projection exposure apparatus for microlithography |
JP2011512659A (ja) * | 2008-02-15 | 2011-04-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
Also Published As
Publication number | Publication date |
---|---|
US7196841B2 (en) | 2007-03-27 |
US20050174650A1 (en) | 2005-08-11 |
AU2003227574A8 (en) | 2003-11-17 |
AU2003227574A1 (en) | 2003-11-17 |
JP2005524236A (ja) | 2005-08-11 |
WO2003093902A3 (de) | 2004-03-11 |
CN1650234A (zh) | 2005-08-03 |
DE10219514A1 (de) | 2003-11-13 |
EP1499925A2 (de) | 2005-01-26 |
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