WO2003090985A8 - Device and method for transferring a pattern to a substrate - Google Patents
Device and method for transferring a pattern to a substrateInfo
- Publication number
- WO2003090985A8 WO2003090985A8 PCT/SE2003/000640 SE0300640W WO03090985A8 WO 2003090985 A8 WO2003090985 A8 WO 2003090985A8 SE 0300640 W SE0300640 W SE 0300640W WO 03090985 A8 WO03090985 A8 WO 03090985A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- pattern
- stamping
- patterned
- transferring
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT03723553T ATE439969T1 (en) | 2002-04-24 | 2003-04-23 | APPARATUS AND METHOD FOR TRANSFERRING A PATTERN TO A SUBSTRATE |
EP03723553A EP1497102B1 (en) | 2002-04-24 | 2003-04-23 | Device and method for transferring a pattern to a substrate |
AU2003230483A AU2003230483A1 (en) | 2002-04-24 | 2003-04-23 | Device and method for transferring a pattern to a substrate |
US10/512,265 US20050172848A1 (en) | 2002-04-24 | 2003-04-23 | Device and method for transferring a pattern to a substrate |
DE60328879T DE60328879D1 (en) | 2002-04-24 | 2003-04-23 | DEVICE AND METHOD FOR TRANSFERRING A PATTERN TO A SUBSTRATE |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37482702P | 2002-04-24 | 2002-04-24 | |
SE0201239-1 | 2002-04-24 | ||
SE0201239A SE524563C2 (en) | 2002-04-24 | 2002-04-24 | Micro or nanostructures transferring device for lithography, has two stamping plates that are bendable towards each other while being secured to each other at respective holding areas |
US60/374,827 | 2002-04-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003090985A1 WO2003090985A1 (en) | 2003-11-06 |
WO2003090985A8 true WO2003090985A8 (en) | 2004-04-22 |
Family
ID=29272465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/SE2003/000640 WO2003090985A1 (en) | 2002-04-24 | 2003-04-23 | Device and method for transferring a pattern to a substrate |
Country Status (6)
Country | Link |
---|---|
US (1) | US20050172848A1 (en) |
EP (1) | EP1497102B1 (en) |
AT (1) | ATE439969T1 (en) |
AU (1) | AU2003230483A1 (en) |
DE (1) | DE60328879D1 (en) |
WO (1) | WO2003090985A1 (en) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080164638A1 (en) * | 2006-11-28 | 2008-07-10 | Wei Zhang | Method and apparatus for rapid imprint lithography |
US7686606B2 (en) | 2004-01-20 | 2010-03-30 | Wd Media, Inc. | Imprint embossing alignment system |
US7320584B1 (en) | 2004-07-07 | 2008-01-22 | Komag, Inc. | Die set having sealed compliant member |
US20060027036A1 (en) * | 2004-08-05 | 2006-02-09 | Biggs Todd L | Methods and apparatuses for imprinting substrates |
US7410591B2 (en) * | 2004-12-16 | 2008-08-12 | Asml Holding N.V. | Method and system for making a nano-plate for imprint lithography |
US7409759B2 (en) * | 2004-12-16 | 2008-08-12 | Asml Holding N.V. | Method for making a computer hard drive platen using a nano-plate |
US7363854B2 (en) | 2004-12-16 | 2008-04-29 | Asml Holding N.V. | System and method for patterning both sides of a substrate utilizing imprint lithography |
US7399422B2 (en) * | 2005-11-29 | 2008-07-15 | Asml Holding N.V. | System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby |
US7331283B2 (en) * | 2004-12-16 | 2008-02-19 | Asml Holding N.V. | Method and apparatus for imprint pattern replication |
KR100729427B1 (en) * | 2005-03-07 | 2007-06-15 | 주식회사 디엠에스 | Apparatus for making etching area on substrate |
US7281920B2 (en) | 2005-03-28 | 2007-10-16 | Komag, Inc. | Die set utilizing compliant gasket |
US7670530B2 (en) * | 2006-01-20 | 2010-03-02 | Molecular Imprints, Inc. | Patterning substrates employing multiple chucks |
MY144847A (en) * | 2005-12-08 | 2011-11-30 | Molecular Imprints Inc | Method and system for double-sided patterning of substrates |
US7695667B2 (en) * | 2006-03-01 | 2010-04-13 | Hitachi Global Storage Technologies Netherlands B.V. | Method and apparatus for separating a stamper from a patterned substrate |
US8377361B2 (en) * | 2006-11-28 | 2013-02-19 | Wei Zhang | Imprint lithography with improved substrate/mold separation |
TW200846278A (en) * | 2007-05-24 | 2008-12-01 | Contrel Technology Co Ltd | Method for producing viscous micro-structure |
KR101289337B1 (en) * | 2007-08-29 | 2013-07-29 | 시게이트 테크놀로지 엘엘씨 | Imprint lithography systm for dual side imprinting |
TW200932502A (en) * | 2008-01-18 | 2009-08-01 | Univ Nat Taiwan | An improved embossing apparatus |
JP5164589B2 (en) * | 2008-01-30 | 2013-03-21 | 株式会社日立ハイテクノロジーズ | Imprint device |
US9330685B1 (en) | 2009-11-06 | 2016-05-03 | WD Media, LLC | Press system for nano-imprinting of recording media with a two step pressing method |
US8496466B1 (en) | 2009-11-06 | 2013-07-30 | WD Media, LLC | Press system with interleaved embossing foil holders for nano-imprinting of recording media |
US8402638B1 (en) | 2009-11-06 | 2013-03-26 | Wd Media, Inc. | Press system with embossing foil free to expand for nano-imprinting of recording media |
US8747092B2 (en) | 2010-01-22 | 2014-06-10 | Nanonex Corporation | Fast nanoimprinting apparatus using deformale mold |
WO2013077386A1 (en) * | 2011-11-25 | 2013-05-30 | Scivax株式会社 | Imprinting device and imprinting method |
EP2815868B1 (en) * | 2012-02-14 | 2017-03-29 | Scivax Corporation | Imprint device and imprint method |
JP6291687B2 (en) * | 2012-08-27 | 2018-03-14 | Scivax株式会社 | Imprint apparatus and imprint method |
US10108086B2 (en) | 2013-03-15 | 2018-10-23 | Nanonex Corporation | System and methods of mold/substrate separation for imprint lithography |
US10105883B2 (en) | 2013-03-15 | 2018-10-23 | Nanonex Corporation | Imprint lithography system and method for manufacturing |
CN114101381A (en) * | 2021-11-10 | 2022-03-01 | 罗春燕 | Equipment for stamping patterns on decorative iron sheet |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2430057A1 (en) * | 1978-06-29 | 1980-01-25 | Thomson Csf | DEVICE FOR PRESSING FLEXIBLE DISCS AND PRESSING METHOD USING SUCH A DEVICE |
DE3932039A1 (en) * | 1989-09-26 | 1991-04-11 | Werner & Pfleiderer | RUBBER SPRAY PRESS |
US5425977A (en) * | 1993-08-16 | 1995-06-20 | Monsanto Company | Rough-surfaced interlayer |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
US5778774A (en) * | 1996-12-18 | 1998-07-14 | Framatome Connectors Usa Inc. | Articulating embossing die |
SE515607C2 (en) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Device and method for fabrication of structures |
SE515962C2 (en) * | 2000-03-15 | 2001-11-05 | Obducat Ab | Device for transferring patterns to objects |
-
2003
- 2003-04-23 EP EP03723553A patent/EP1497102B1/en not_active Expired - Lifetime
- 2003-04-23 DE DE60328879T patent/DE60328879D1/en not_active Expired - Lifetime
- 2003-04-23 US US10/512,265 patent/US20050172848A1/en not_active Abandoned
- 2003-04-23 WO PCT/SE2003/000640 patent/WO2003090985A1/en not_active Application Discontinuation
- 2003-04-23 AT AT03723553T patent/ATE439969T1/en not_active IP Right Cessation
- 2003-04-23 AU AU2003230483A patent/AU2003230483A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1497102A1 (en) | 2005-01-19 |
WO2003090985A1 (en) | 2003-11-06 |
AU2003230483A8 (en) | 2003-11-10 |
DE60328879D1 (en) | 2009-10-01 |
ATE439969T1 (en) | 2009-09-15 |
AU2003230483A1 (en) | 2003-11-10 |
US20050172848A1 (en) | 2005-08-11 |
EP1497102B1 (en) | 2009-08-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003090985A8 (en) | Device and method for transferring a pattern to a substrate | |
EP1387216A3 (en) | Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern | |
WO2004013693A3 (en) | Scatterometry alignment for imprint lithography | |
SG170619A1 (en) | Decal transfer microfabrication | |
AU2001271478A1 (en) | Lithographic plate having a conformal radiation-sensitive layer on a rough substrate | |
WO2008091279A3 (en) | Etching and hole arrays | |
ATE491968T1 (en) | PLANT PLATE PREPARATION AND LITHOGRAPHIC PRINTING PROCESS | |
WO2002075783A3 (en) | Wafer level interposer | |
WO2005043249A3 (en) | Composite optical lithography method for patterning lines of unequal width | |
EP1229144A3 (en) | Integrated mask and method and apparatus for manufacturing organic el device using the same | |
CA2478499A1 (en) | Elements for embossing and adhesive application | |
WO2003096123A8 (en) | Reversal imprint technique | |
WO2005036274A3 (en) | Optical lithography method for patterning lines of equal width | |
CA2354976A1 (en) | Method and apparatus for coupling trailer plates | |
CA2404853A1 (en) | Photoengraved printed data carrier | |
EP1291920A3 (en) | Solar cell, method for manufacturing the same, and apparatus for manufacturing the same | |
ATE529779T1 (en) | PRECURSOR FOR A PLATE PRINTING PLATE | |
EP1049143A3 (en) | Etching method | |
EP1280204A8 (en) | Wiring substrate having position information | |
AU4951399A (en) | Mechanical patterning of a device layer | |
AU8088198A (en) | Process of making absorbent structures and absorbent structures produced thereby | |
SG131896A1 (en) | Polarizing photolithography system | |
WO2005045528A3 (en) | Interference patterning | |
ATE327107T1 (en) | CARRIER OF A FLAT PRINTING PLATE AND FLAT PLATE PRINTING PLATE STARTING PRODUCT | |
CA2240420A1 (en) | Fixing device of tools for transferring metallic films onto a substrate and process for realizing a template for the positioning of these tools |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WR | Later publication of a revised version of an international search report | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003723553 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10512265 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 2003723553 Country of ref document: EP |
|
NENP | Non-entry into the national phase |
Ref country code: JP |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |