WO2003085368A2 - Carbon nanotube sensor - Google Patents
Carbon nanotube sensor Download PDFInfo
- Publication number
- WO2003085368A2 WO2003085368A2 PCT/US2003/008104 US0308104W WO03085368A2 WO 2003085368 A2 WO2003085368 A2 WO 2003085368A2 US 0308104 W US0308104 W US 0308104W WO 03085368 A2 WO03085368 A2 WO 03085368A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carbon nanotubes
- sensor
- projections
- substrate
- thermally isolated
- Prior art date
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 239000002041 carbon nanotube Substances 0.000 title claims abstract description 66
- 229910021393 carbon nanotube Inorganic materials 0.000 title claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 49
- 239000004020 conductor Substances 0.000 claims abstract description 44
- 239000002071 nanotube Substances 0.000 claims abstract description 43
- 238000010438 heat treatment Methods 0.000 claims abstract description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 19
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract description 16
- 230000005855 radiation Effects 0.000 claims abstract description 16
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000005977 Ethylene Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 39
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- 229910052681 coesite Inorganic materials 0.000 claims description 5
- 229910052906 cristobalite Inorganic materials 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000002109 single walled nanotube Substances 0.000 claims description 5
- 229910052682 stishovite Inorganic materials 0.000 claims description 5
- 229910052905 tridymite Inorganic materials 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 1
- MYWUZJCMWCOHBA-VIFPVBQESA-N methamphetamine Chemical compound CN[C@@H](C)CC1=CC=CC=C1 MYWUZJCMWCOHBA-VIFPVBQESA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000012010 growth Effects 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000000750 progressive effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- MUJOIMFVNIBMKC-UHFFFAOYSA-N fludioxonil Chemical compound C=12OC(F)(F)OC2=CC=CC=1C1=CNC=C1C#N MUJOIMFVNIBMKC-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000007773 growth pattern Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Chemical group 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
- G01J5/023—Particular leg structure or construction or shape; Nanotubes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
- G01J5/024—Special manufacturing steps or sacrificial layers or layer structures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/953—Detector using nanostructure
- Y10S977/955—Of thermal property
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/23—Carbon containing
- Y10T436/235—In an aqueous solution [e.g., TOC, etc.]
Definitions
- the present invention relates to carbon nanotubes, and in particular to formation of sensors utilizing carbon nanotubes.
- Carbon nanotubes have been manufactured on substrates in a variety of different ways. Many methods of manufacturing carbon nanotubes involves the use of significant amounts of heat. This heat adversely affects semiconductor circuitry aheady formed on the substrate. Such circuitry exhibits further doping migration and other changes when its thermal budget is exhausted.
- Carbon nanotubes are formed on projections on a substrate.
- a metal such as nickel is deposited on the substrate, and heated to form the projections.
- Carbon nanotubes are formed from the projections by heating in an ethylene atmosphere.
- a heat sensor is also formed proximate the carbon nanotubes. When exposed to IR radiation, the heat sensor detects changes in temperature representative of the IR radiation.
- spaced platforms are first grown on the substrate, and the projections are formed on the platforms.
- Single wall carbon nanotubes are then grown from the projections to obtain a desired spacing.
- milled SiO 2 surfaces are used to form the nanotubes. Other surfaces may also be used as discovered.
- Carbon nanotubes are used in fomiing a gas sensor in a further embodiment.
- a thermally isolated area such as a pixel is formed on a substrate with an integrated heater.
- a pair of conductors each have a portion adjacent a portion of the other conductor with projections formed on the adjacent portions of the conductors.
- Multiple carbon nanotubes are formed between the conductors from one projection to another, h one embodiment, the conductors comprise multiple interleaved fingers with carbon nanotubes spai-riing between them.
- IV characteristics of the nanotubes are measured between the conductors in the presence of a gas to be detected.
- the gas absorbs into the nanotubes, changing their response to a voltage.
- the heater is used to heat the nanotubes and drive off the gas, essentially resetting the nanotubes for further measurements.
- the nanotubes are formed by using the heater to heat the thermally isolated pixel in an ethylene, methane or CO atmosphere, hi further embodiments, the n.anotubes are formed using an external heater.
- Figure 1A, IB and 1C are progressive cross section representations of formation of an IR sensor.
- Figure 2A, 2B, 2C .and 2D are progressive cross section representations of formation of an alternative IR sensor.
- Figure 3 is a planar block diagram view of a self-heating sensor having carbon nanotubes.
- Figure 4 is a planar block diagram view of a thermally isolated self-heating sensor having carbon nanotubes.
- Figure 5 is a flowchart showing the use of nanotubes as a gas sensor.
- a substrate 110 is formed of silicon or other suitable material, such as saphire or germanium or other substrate material which is acceptable for photolithographic processes.
- a first metallic layer 120 is formed on top of substrate 110.
- the metallic layer 120 is nickel or cobalt in one embodiment and is formed approximately 50 Angstrom thick in a well known manner.
- a temperature sensor 125 is formed of a material responsive to temperature changes, such as platinum, proximate to the metallic layer 120. In some embodiments, it is directly beneath the metallic layer, and in others, it is closely adjacent the metallic layer 120 such that it is responsive to temperature changes about the metallic layer. In various embodiments, the temperature sensor 125 is formed prior to or after formation of the metallic layer.
- a bolometer comprising a thermally isolated structure on a silicon nitride or oxide bridge is utilized in yet further embodiments.
- the metallic layer is heated at approximately 900 degrees Celsius for several minutes until projections 130 form as shown in Figure IB. The time is temperature dependent, and other temperatures near or above a melting point of the metallic layer cause the metallic layer to separate into such projections in a known manner.
- the substrate is exposed to ethylene at approximately 700 to 800 degrees Celsius, forming carbon nanotubes 140 extending from the projections.
- Further embodiments utilize methane or CO. The nanotubes tend to grow in an undirected manner, resembling a tangle of hair upon completion.
- the temperature sensor 125 When exposed to infrared radiation (IR) 150, heat is trapped about the nanotubes 140 in a manner similar to that found in black gold structures. The heat causes a change in temperature that is detected by the temperature sensor 125.
- the temperature sensor comprises a platinum resistance thermometer, and a change in resistance is measured corresponding to the change in temperature.
- a high fill factor of carbon nanotubes is utilized.
- the nanotubes are combined with the temperature sensor on a thermally isolated structure to measure temperature rise of the nanotube absorbed radiation.
- the nanotubes and temperature sensor are part of a pixel in one embodiment. Multiple pixels are formed close together, and the nanotubes are not in electrical contact with a pixel. They are formed on either a dielectric or isolated metal.
- the temperature sensor is also not in contact with the tubes.
- the temperature sensor may serve as a heater for formation of the nanotubes, or a separate heater or oven may be utilized.
- One potential advantage of using a carbon nanotube structure as an IR absorber is that is provides high absorption, and also has a very low mass. This combination of properties enables fast pixel response times.
- FIGS. 2A-D are cross section representations illustrating formation of a further sensor.
- a substrate 210 has a first layer 220 formed, followed by a second layer 230.
- the first layer in one embodiment is platinum, or other layer having a higher melting point than the second layer 230.
- the second layer is nickel or cobalt, or other material one which carbon nanotubes will form.
- a temperature sensor 235 is formed proximate the first and second layers.
- each island is comprised of the first and second layers as earlier formed.
- Application of heat causes the formation of projections 260 out of the second layer material as shown in Figure 2C.
- the resulting structures form a desired pattern of platforms or thin Ni islands ready for carbon nanotube growth, hi one embodiment, the platforms are 1-5 micron rectangles, with a 1-5 micron spacing. Both the size and spacing, as well as the projection density are easily modified.
- nanotubes 270 have formed from the projections, again forming a tangle which traps heat produced by IR radiation 280.
- Four point temperature probes are used in one embodiment to ensure proper temperatures are maintained for nanotube deposition.
- the nanotubes used to absorb IR radiation are on the order of, or smaller than the dimensions of the IR radiation, 3 - 12 um.
- the spacing of the projections 260 should be on the same order of size, or slightly closer to account for curvature of the nanotubes forming between them.
- FIG. 3 is a planar block diagram view of a semiconductor substrate 310 having CMOS or other logic family circuitry 330 formed thereon. Conductors 340 are shown coupled to the circuitry 330 for connecting to further circuitry on or off the substrate. A sensor 343 is also integrated into the semiconductor substrate 310. The sensor 343 is formed in a manner which does not significantly adversely affect a thermal budget of the circuitry 330.
- the thermally isolated portion is formed in one of many known manners. In one embodiment, it resembles an inverse pyramid with ah or insulator between it and most of the substrate. Points of contact with the substrate, such as at the peak of the pyramid and at other portions of the thermally isolated portion coupled by conductors to other circuitry or external contacts.
- a heater 350 such as a platinum contact is formed proximate the thermally isolated portion in manner that enables the heater to heat the thermally isolated portion as desired.
- Two conductors 355 and 360 provide current to the heater to control the heat it produces.
- a pair of contacts 365 and 370 are formed, and extend onto the thermally isolated portion. The contacts overlap for at least a portion of their travel on the thermally isolated portion at overlapping portions 375 and 380.
- the overlapping portions 375 and 380 are adjacent to each other and run substantially parallel to each other in one embodiment. They are separated a short distance compatible with growth of carbon nanotubes 385 between them.
- the heater heats the overlapping portions of the contacts in an ethylene, methane or CO environment.
- projections are first formed, again using the heater to produce desired temperatures.
- platforms are formed on the overlapping portions of the contacts with projections formed on the platforms.
- An electric field is applied in one embodiment to control the direction of growth of the carbon nanotubes, and to obtain point to point connection by the tubes. This produces a structure of nanotubes stretching between overlapping portions 375 and 380 without significantly adversely heating circuitry 330. Further detail of one embodiment of sensor 343 is shown in Figure 4. The sensor is formed in a substrate 410.
- a thermally isolated region 415 is formed in the substrate by creating air gaps 420 on all sides of the thermally isolated region 415 in a known manner.
- a pyramid shaped opening is formed, with the thermally isolated region supported by multiple supports 425.
- a heater 430 is formed on the thermally isolated region 415 in a circular pattern.
- the heater 430 comprises a platinum layer coupled to contacts 435 and 440.
- the platinum layer is formed on a Ni adhesion layer, and is passivated with SiN in one embodiment.
- Contacts 435 and 440 for heater 430 are supported by multiple supports bridging gaps 420 from substrate 410.
- Further bridges 425 provide support for a pair of conductors 445 and 450 which extend onto the thermally isolated region 415.
- Conductor 445 and conductor 450 end in comb-like adjacent conductor structures 455 and 460.
- Structure 455 has multiple fingers 465 intermeshing or interleaved with opposing fingers 470 from structure 460.
- the conductors are formed in a common manner such as by vapor deposition.
- the fingers are patterned in one embodiment using photolithographic techniques, or are formed by laser removal of the conductors to form a desired pattern.
- Plural carbon nanotubes 480 are formed from finger to finger by applying heat from heater 430 in an ethylene, methane or CO environment.
- An electric field is used in some embodiments to produce a more directed growth of the nanotubes between the fingers. Structures other than finger like structures that provide good characteristics for forming carbon nanotube bridges may also be used.
- the sensor acts as a CO, O, or other gas sensor in one embodiment. IV characteristics between conductors 445 and 450 are measured. These characteristics change when the nanotubes 480 have absorbed CO. CO tends to stay absorbed in the nanotubes for several minutes or more. Without driving off the CO quickly, the sensor is slow to detect when CO levels have changed.
- the heater 430 is used to heat the nanotubes to a temperature sufficient to drive off the CO at a faster rate, yet not high enough to cause further growth of the nanotubes or otherwise significantly adversely affect the structure of the senor or other circuitry formed on the same substrate.
- the heater 430 is used to heat the nanotubes to a temperature sufficient to drive off the CO at a faster rate, yet not high enough to cause further growth of the nanotubes or otherwise significantly adversely affect the structure of the senor or other circuitry formed on the same substrate.
- an integrated heater on a thermally isolated structure allows the use of low power to desorb the gas. h further embodiments, external heaters are utilized.
- a flowchart in Figure 5 illustrates use of the sensor to sense CO or other gases whose effect on carbon nanotubes IN characteristics are determinable.
- the sensor is exposed to gas at 510, and IN characteristics are measured versus time at 520.
- the sensor may be continuously exposed to gas, or the exposure may be halted at this point.
- the sensor is heated to approximately between 300 and 400 degrees Celsius to drive off the gas. Exposure to the gas is then continued or started again at 510. This cycle is repeated as many times as desired.
- the invention provides the ability to detect various gases.
- the sensor If the sensor is powered by a battery, the sensor need not be operated until needed. When needed, a cleansing heating is first applied to make sure the carbon nanotubes are not already saturated with gas to be detected.
- a method of forming carbon nanotubes has been described along with several uses of structures created with the nanotubes.
- the use of projections to control the density of the nanotubes provides the ability to better control temperature response of a plurality of nanotubes to radiation.
- the use of integrated heaters provides both the ability to form nanotubes without adversely affecting circuitry on the same die or substrate, but also to produce sensors that utilize heat to improve their cycle time, such as by driving off gas more quickly. While the nanotubes were described as forming in environments containing specific gases, they may be formed in different environments without departing from the invention.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003260445A AU2003260445A1 (en) | 2002-03-18 | 2003-03-17 | Carbon nanotube sensor |
DE60323735T DE60323735D1 (en) | 2002-03-18 | 2003-03-17 | INFRARED SENSOR WITH CARBON NANNY TUBE |
EP03741755A EP1485689B1 (en) | 2002-03-18 | 2003-03-17 | Infrared sensor with carbon nanotubes |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/100,440 | 2002-03-18 | ||
US10/100,440 US6919730B2 (en) | 2002-03-18 | 2002-03-18 | Carbon nanotube sensor |
Publications (2)
Publication Number | Publication Date |
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WO2003085368A2 true WO2003085368A2 (en) | 2003-10-16 |
WO2003085368A3 WO2003085368A3 (en) | 2004-03-18 |
Family
ID=28039817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/008104 WO2003085368A2 (en) | 2002-03-18 | 2003-03-17 | Carbon nanotube sensor |
Country Status (5)
Country | Link |
---|---|
US (3) | US6919730B2 (en) |
EP (3) | EP1944589A1 (en) |
AU (1) | AU2003260445A1 (en) |
DE (1) | DE60323735D1 (en) |
WO (1) | WO2003085368A2 (en) |
Cited By (2)
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WO2004048958A2 (en) * | 2002-11-26 | 2004-06-10 | Honeywell International Inc. | Nanotube sensor |
WO2007064355A2 (en) | 2005-06-03 | 2007-06-07 | Honeywell International Inc. | Carbon nanotube-based glucose sensor |
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US7259410B2 (en) * | 2001-07-25 | 2007-08-21 | Nantero, Inc. | Devices having horizontally-disposed nanofabric articles and methods of making the same |
US6919592B2 (en) | 2001-07-25 | 2005-07-19 | Nantero, Inc. | Electromechanical memory array using nanotube ribbons and method for making same |
US6706402B2 (en) | 2001-07-25 | 2004-03-16 | Nantero, Inc. | Nanotube films and articles |
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US8937575B2 (en) | 2009-07-31 | 2015-01-20 | Nantero Inc. | Microstrip antenna elements and arrays comprising a shaped nanotube fabric layer and integrated two terminal nanotube select devices |
US7666382B2 (en) * | 2004-12-16 | 2010-02-23 | Nantero, Inc. | Aqueous carbon nanotube applicator liquids and methods for producing applicator liquids thereof |
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US7057402B2 (en) | 2006-06-06 |
AU2003260445A1 (en) | 2003-10-20 |
US6919730B2 (en) | 2005-07-19 |
US20050134296A1 (en) | 2005-06-23 |
EP1485689B1 (en) | 2008-09-24 |
WO2003085368A3 (en) | 2004-03-18 |
US20070117213A1 (en) | 2007-05-24 |
US20030173985A1 (en) | 2003-09-18 |
EP1944590A1 (en) | 2008-07-16 |
DE60323735D1 (en) | 2008-11-06 |
US8294008B2 (en) | 2012-10-23 |
EP1944589A1 (en) | 2008-07-16 |
EP1485689A2 (en) | 2004-12-15 |
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