WO2003072614A3 - Thiol compound, photopolymerization initiator composition and photosensitive composition - Google Patents

Thiol compound, photopolymerization initiator composition and photosensitive composition Download PDF

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Publication number
WO2003072614A3
WO2003072614A3 PCT/JP2003/002219 JP0302219W WO03072614A3 WO 2003072614 A3 WO2003072614 A3 WO 2003072614A3 JP 0302219 W JP0302219 W JP 0302219W WO 03072614 A3 WO03072614 A3 WO 03072614A3
Authority
WO
WIPO (PCT)
Prior art keywords
composition
photopolymerization initiator
thiol compound
photosensitive composition
photosensitive
Prior art date
Application number
PCT/JP2003/002219
Other languages
French (fr)
Other versions
WO2003072614A2 (en
Inventor
Tsuyoshi Katoh
Hirotoshi Kamata
Mina Onishi
Original Assignee
Showa Denko Kk
Tsuyoshi Katoh
Hirotoshi Kamata
Mina Onishi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk, Tsuyoshi Katoh, Hirotoshi Kamata, Mina Onishi filed Critical Showa Denko Kk
Priority to AU2003224454A priority Critical patent/AU2003224454A1/en
Priority to KR1020047013107A priority patent/KR100976995B1/en
Priority to US10/505,778 priority patent/US7341828B2/en
Priority to EP03720880.8A priority patent/EP1478668B1/en
Publication of WO2003072614A2 publication Critical patent/WO2003072614A2/en
Publication of WO2003072614A3 publication Critical patent/WO2003072614A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • G03F3/106—Checking the colour or tonal value of separation negatives or positives using non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, other than silicon containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Abstract

A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β- position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
PCT/JP2003/002219 2002-02-28 2003-02-27 Thiol compound, photopolymerization initiator composition and photosensitive composition WO2003072614A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003224454A AU2003224454A1 (en) 2002-02-28 2003-02-27 Thiol compound, photopolymerization initiator composition and photosensitive composition
KR1020047013107A KR100976995B1 (en) 2002-02-28 2003-02-27 Thiol compound, photopolymerization initiator composition and photosensitive composition
US10/505,778 US7341828B2 (en) 2002-02-28 2003-02-27 Thiol compound, photopolymerization initiator composition and photosensitive composition
EP03720880.8A EP1478668B1 (en) 2002-02-28 2003-02-27 Thiol compound, photopolymerization initiator composition and photosensitive composition

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2002052515 2002-02-28
JP2002-052515 2002-02-28
JP2002257766 2002-09-03
JP2002-257766 2002-09-03
US40826802P 2002-09-06 2002-09-06
US60/408,268 2002-09-06

Publications (2)

Publication Number Publication Date
WO2003072614A2 WO2003072614A2 (en) 2003-09-04
WO2003072614A3 true WO2003072614A3 (en) 2004-04-22

Family

ID=33100322

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/002219 WO2003072614A2 (en) 2002-02-28 2003-02-27 Thiol compound, photopolymerization initiator composition and photosensitive composition

Country Status (7)

Country Link
US (1) US7341828B2 (en)
EP (1) EP1478668B1 (en)
JP (1) JP4902608B2 (en)
KR (1) KR100976995B1 (en)
CN (1) CN100523008C (en)
AU (1) AU2003224454A1 (en)
WO (1) WO2003072614A2 (en)

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WO2006048443A2 (en) * 2004-11-05 2006-05-11 Agfa Graphics Nv Photopolymerizable composition
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ATE554126T1 (en) * 2006-01-26 2012-05-15 Showa Denko Kk CURABLE COMPOSITION CONTAINING A THIOLEN COMPOUND
EP2030989A4 (en) * 2006-06-13 2011-08-31 Showa Denko Kk Polymerization accelerator, curable composition, cured product and method for producing thiol compound
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US8053167B2 (en) * 2006-11-21 2011-11-08 Showa Denko K.K. Curable compositions containing hydroxythiol compound, and cured products thereof
WO2008070737A1 (en) * 2006-12-05 2008-06-12 University Of Southern Mississippi Benzophenone/thioxanthone derivatives and their use in photopolymerizable compositions
CN101542392B (en) * 2007-03-29 2013-08-14 太阳控股株式会社 Photocurable resin composition, dry film, cured product, and printed wiring board
JP4601009B2 (en) * 2007-03-30 2010-12-22 富士フイルム株式会社 Ink set for inkjet recording and inkjet recording method
JP5043516B2 (en) * 2007-06-04 2012-10-10 太陽ホールディングス株式会社 Photocurable / thermosetting resin composition and printed wiring obtained using the same
US20090047531A1 (en) * 2007-08-17 2009-02-19 Ppg Industries Ohio, Inc. Packages having radiation-curable coatings
JP5653623B2 (en) * 2007-12-13 2015-01-14 昭和電工株式会社 Epoxy resin curing agent, method for producing the same, and epoxy resin composition
KR101027811B1 (en) * 2007-12-24 2011-04-07 한국생산기술연구원 A polycarbonate resin composition having a low coefficient of thermal expansion
JP5527965B2 (en) * 2008-02-22 2014-06-25 Ｊｓｒ株式会社 Radiation-sensitive composition for green pixel formation, color filter, and color liquid crystal display element
KR100869383B1 (en) 2008-03-07 2008-11-19 한국생산기술연구원 Polycarbonate resin composition having low-cet and optical film for plastic substrate
JP5251329B2 (en) * 2008-07-22 2013-07-31 東洋インキＳｃホールディングス株式会社 Blue coloring composition for color filter, color filter, and color display device
JP5277039B2 (en) * 2009-03-30 2013-08-28 富士フイルム株式会社 Planographic printing plate precursor and plate making method
JP5255504B2 (en) * 2009-03-31 2013-08-07 富士フイルム株式会社 Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern forming method, and printed circuit board
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WO2012128318A1 (en) * 2011-03-23 2012-09-27 三菱化学株式会社 Colored resin composition, color filter, liquid crystal display device, organic el display device
JP6028455B2 (en) * 2012-08-24 2016-11-16 大日本印刷株式会社 Photosensitive composition for volume hologram recording, photosensitive substrate for volume hologram recording, and volume hologram recording body
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KR101992867B1 (en) * 2013-03-29 2019-06-25 동우 화인켐 주식회사 Colored photosensitive resin composition
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Also Published As

Publication number Publication date
US7341828B2 (en) 2008-03-11
KR100976995B1 (en) 2010-08-19
CN100523008C (en) 2009-08-05
JP4902608B2 (en) 2012-03-21
KR20040101237A (en) 2004-12-02
EP1478668A2 (en) 2004-11-24
AU2003224454A1 (en) 2003-09-09
US20050153231A1 (en) 2005-07-14
WO2003072614A2 (en) 2003-09-04
AU2003224454A8 (en) 2003-09-09
CN1656127A (en) 2005-08-17
JP2009035555A (en) 2009-02-19
EP1478668B1 (en) 2013-04-10

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