WO2003060447A8 - Temperature measurement and heat-treating methods and systems - Google Patents
Temperature measurement and heat-treating methods and systemsInfo
- Publication number
- WO2003060447A8 WO2003060447A8 PCT/CA2002/001987 CA0201987W WO03060447A8 WO 2003060447 A8 WO2003060447 A8 WO 2003060447A8 CA 0201987 W CA0201987 W CA 0201987W WO 03060447 A8 WO03060447 A8 WO 03060447A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- temperature
- device side
- previous
- response
- identified
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000009529 body temperature measurement Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10297622.8T DE10297622B4 (en) | 2001-12-26 | 2002-12-23 | Temperature measurement and methods and systems for heat treatment |
US10/497,447 US7445382B2 (en) | 2001-12-26 | 2002-12-23 | Temperature measurement and heat-treating methods and system |
JP2003560494A JP2005515425A (en) | 2001-12-26 | 2002-12-23 | Temperature measurement and heat treatment method and system |
AU2002350358A AU2002350358A1 (en) | 2001-12-26 | 2002-12-23 | Temperature measurement and heat-treating methods and systems |
KR1020047010182A KR101067901B1 (en) | 2001-12-26 | 2002-12-23 | Temperature measurement and heat-treating methods and systems |
US11/302,600 US7616872B2 (en) | 2001-12-26 | 2005-12-14 | Temperature measurement and heat-treating methods and systems |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34211501P | 2001-12-26 | 2001-12-26 | |
US60/342,115 | 2001-12-26 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10497447 A-371-Of-International | 2002-12-23 | ||
US11/302,600 Continuation US7616872B2 (en) | 2001-12-26 | 2005-12-14 | Temperature measurement and heat-treating methods and systems |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003060447A1 WO2003060447A1 (en) | 2003-07-24 |
WO2003060447A8 true WO2003060447A8 (en) | 2003-12-04 |
Family
ID=23340390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CA2002/001987 WO2003060447A1 (en) | 2001-12-26 | 2002-12-23 | Temperature measurement and heat-treating methods and systems |
Country Status (7)
Country | Link |
---|---|
US (2) | US7445382B2 (en) |
JP (3) | JP2005515425A (en) |
KR (2) | KR101067902B1 (en) |
CN (2) | CN101324470B (en) |
AU (1) | AU2002350358A1 (en) |
DE (1) | DE10297622B4 (en) |
WO (1) | WO2003060447A1 (en) |
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2002
- 2002-12-23 AU AU2002350358A patent/AU2002350358A1/en not_active Abandoned
- 2002-12-23 KR KR1020107006383A patent/KR101067902B1/en active IP Right Grant
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- 2002-12-23 JP JP2003560494A patent/JP2005515425A/en active Pending
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- 2002-12-23 CN CNB028259602A patent/CN100416243C/en not_active Expired - Lifetime
- 2002-12-23 DE DE10297622.8T patent/DE10297622B4/en not_active Expired - Lifetime
- 2002-12-23 WO PCT/CA2002/001987 patent/WO2003060447A1/en active Application Filing
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CN101324470B (en) | 2011-03-30 |
KR101067901B1 (en) | 2011-09-28 |
DE10297622B4 (en) | 2018-06-14 |
CN1608199A (en) | 2005-04-20 |
JP2009092676A (en) | 2009-04-30 |
JP2011117979A (en) | 2011-06-16 |
AU2002350358A1 (en) | 2003-07-30 |
KR101067902B1 (en) | 2011-09-27 |
JP5133278B2 (en) | 2013-01-30 |
KR20040066930A (en) | 2004-07-27 |
KR20100039455A (en) | 2010-04-15 |
WO2003060447A1 (en) | 2003-07-24 |
US7616872B2 (en) | 2009-11-10 |
CN101324470A (en) | 2008-12-17 |
DE10297622T5 (en) | 2005-01-05 |
JP5166562B2 (en) | 2013-03-21 |
US7445382B2 (en) | 2008-11-04 |
JP2005515425A (en) | 2005-05-26 |
US20050063453A1 (en) | 2005-03-24 |
CN100416243C (en) | 2008-09-03 |
US20060096677A1 (en) | 2006-05-11 |
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