WO2003057678A8 - Positive-working photoimageable bottom antireflective coating - Google Patents

Positive-working photoimageable bottom antireflective coating

Info

Publication number
WO2003057678A8
WO2003057678A8 PCT/EP2003/000022 EP0300022W WO03057678A8 WO 2003057678 A8 WO2003057678 A8 WO 2003057678A8 EP 0300022 W EP0300022 W EP 0300022W WO 03057678 A8 WO03057678 A8 WO 03057678A8
Authority
WO
WIPO (PCT)
Prior art keywords
antireflective coating
positive
relates
photoimageable
composition
Prior art date
Application number
PCT/EP2003/000022
Other languages
French (fr)
Other versions
WO2003057678A1 (en
Inventor
Joseph E Oberlander
Ralph R Dammel
Shuji Ding-Lee
Mark O Neisser
Medhat A Toukhy
Original Assignee
Clariant Int Ltd
Clariant Finance Bvi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Int Ltd, Clariant Finance Bvi Ltd filed Critical Clariant Int Ltd
Priority to EP03706347A priority Critical patent/EP1465877B1/en
Priority to DE60323726T priority patent/DE60323726D1/en
Priority to JP2003557995A priority patent/JP2005517972A/en
Priority to KR1020047010600A priority patent/KR100970181B1/en
Publication of WO2003057678A1 publication Critical patent/WO2003057678A1/en
Publication of WO2003057678A8 publication Critical patent/WO2003057678A8/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P29/00—Non-central analgesic, antipyretic or antiinflammatory agents, e.g. antirheumatic agents; Non-steroidal antiinflammatory drugs [NSAID]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Abstract

The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
PCT/EP2003/000022 2002-01-09 2003-01-03 Positive-working photoimageable bottom antireflective coating WO2003057678A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP03706347A EP1465877B1 (en) 2002-01-09 2003-01-03 Positive-working photoimageable bottom antireflective coating
DE60323726T DE60323726D1 (en) 2002-01-09 2003-01-03 ILLUSTRATIVE, POSITIVELY WORKING REFLECTIVE REDUCING LAYER
JP2003557995A JP2005517972A (en) 2002-01-09 2003-01-03 Positive photoimageable bottom antireflection coating
KR1020047010600A KR100970181B1 (en) 2002-01-09 2003-01-03 Positive-working photoimageable bottom antireflective coating

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/042,532 2002-01-09
US10/042,532 US6844131B2 (en) 2002-01-09 2002-01-09 Positive-working photoimageable bottom antireflective coating

Publications (2)

Publication Number Publication Date
WO2003057678A1 WO2003057678A1 (en) 2003-07-17
WO2003057678A8 true WO2003057678A8 (en) 2004-12-29

Family

ID=21922430

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/000022 WO2003057678A1 (en) 2002-01-09 2003-01-03 Positive-working photoimageable bottom antireflective coating

Country Status (10)

Country Link
US (1) US6844131B2 (en)
EP (1) EP1465877B1 (en)
JP (1) JP2005517972A (en)
KR (3) KR101020685B1 (en)
CN (2) CN100526982C (en)
AT (1) ATE409183T1 (en)
DE (1) DE60323726D1 (en)
MY (1) MY132774A (en)
TW (1) TWI295412B (en)
WO (1) WO2003057678A1 (en)

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WO2003057678A1 (en) 2003-07-17
KR20100039437A (en) 2010-04-15
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US20030129531A1 (en) 2003-07-10
US6844131B2 (en) 2005-01-18
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ATE409183T1 (en) 2008-10-15
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