WO2003041133A3 - Electrothermal self-latching mems switch and method - Google Patents

Electrothermal self-latching mems switch and method Download PDF

Info

Publication number
WO2003041133A3
WO2003041133A3 PCT/US2002/036009 US0236009W WO03041133A3 WO 2003041133 A3 WO2003041133 A3 WO 2003041133A3 US 0236009 W US0236009 W US 0236009W WO 03041133 A3 WO03041133 A3 WO 03041133A3
Authority
WO
WIPO (PCT)
Prior art keywords
contact
electrothermal
mems switch
stationary contact
movable
Prior art date
Application number
PCT/US2002/036009
Other languages
French (fr)
Other versions
WO2003041133A2 (en
Inventor
Shawn J Cunningham
Original Assignee
Conventor Inc
Shawn J Cunningham
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Conventor Inc, Shawn J Cunningham filed Critical Conventor Inc
Publication of WO2003041133A2 publication Critical patent/WO2003041133A2/en
Publication of WO2003041133A3 publication Critical patent/WO2003041133A3/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0018Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
    • B81B3/0024Transducers for transforming thermal into mechanical energy or vice versa, e.g. thermal or bimorph actuators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/0051For defining the movement, i.e. structures that guide or limit the movement of an element
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/0015Cantilevers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00Electrostatic relays; Electro-adhesion relays
    • H01H59/0009Electrostatic relays; Electro-adhesion relays making use of micromechanics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H61/00Electrothermal relays
    • H01H61/04Electrothermal relays wherein the thermally-sensitive member is only heated directly
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002Electrostatic motors
    • H02N1/006Electrostatic motors of the gap-closing type
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N10/00Electric motors using thermal effects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/01Switches
    • B81B2201/012Switches characterised by the shape
    • B81B2201/014Switches characterised by the shape having a cantilever fixed on one side connected to one or more dimples
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/01Switches
    • B81B2201/012Switches characterised by the shape
    • B81B2201/018Switches not provided for in B81B2201/014 - B81B2201/016
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/01Suspended structures, i.e. structures allowing a movement
    • B81B2203/0118Cantilevers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/04Electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2207/00Microstructural systems or auxiliary parts thereof
    • B81B2207/07Interconnects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102Surface micromachining
    • B81C2201/0105Sacrificial layer
    • B81C2201/0107Sacrificial metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102Surface micromachining
    • B81C2201/0105Sacrificial layer
    • B81C2201/0108Sacrificial polymer, ashing of organics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102Surface micromachining
    • B81C2201/0105Sacrificial layer
    • B81C2201/0109Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/02Contacts characterised by the material thereof
    • H01H1/04Co-operating contacts of different material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/50Means for increasing contact pressure, preventing vibration of contacts, holding contacts together after engagement, or biasing contacts to the open position
    • H01H1/504Means for increasing contact pressure, preventing vibration of contacts, holding contacts together after engagement, or biasing contacts to the open position by thermal means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0036Switches making use of microelectromechanical systems [MEMS]
    • H01H2001/0042Bistable switches, i.e. having two stable positions requiring only actuating energy for switching between them, e.g. with snap membrane or by permanent magnet
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0036Switches making use of microelectromechanical systems [MEMS]
    • H01H2001/0063Switches making use of microelectromechanical systems [MEMS] having electrostatic latches, i.e. the activated position is kept by electrostatic forces other than the activation force
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0036Switches making use of microelectromechanical systems [MEMS]
    • H01H2001/0089Providing protection of elements to be released by etching of sacrificial element; Avoiding stiction problems, e.g. of movable element to substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00Electrostatic relays; Electro-adhesion relays
    • H01H59/0009Electrostatic relays; Electro-adhesion relays making use of micromechanics
    • H01H2059/0072Electrostatic relays; Electro-adhesion relays making use of micromechanics with stoppers or protrusions for maintaining a gap, reducing the contact area or for preventing stiction between the movable and the fixed electrode in the attracted position
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H61/00Electrothermal relays
    • H01H2061/006Micromechanical thermal relay
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49204Contact or terminal manufacturing
    • Y10T29/49208Contact or terminal manufacturing by assembling plural parts
    • Y10T29/49222Contact or terminal manufacturing by assembling plural parts forming array of contacts or terminals

Abstract

Electrothermal Self-Latching MEMS Switch and Method. According to one embodiment, a microscale switch (100) having a movable microcomponent (108) is provided and includes a substrate (102) having a stationary contact (104). The switch (100) can also include a structural layer (112) having a movable contact (108) positioned for contacting the stationary contact (104) when the structural layer (112) moves toward the substrate (102). Electrothermal latch (126) attached to the structural layer (112) and having electrical communication (114, 116) with the movable contact (108) to provide current flow between the electrothermal latch (126) and the stationary contact (104) when the movable contact (108) contacts the stationary contact (104) for maintaining the movable contact (108) in contact with the stationary contact (104).
PCT/US2002/036009 2001-11-09 2002-11-08 Electrothermal self-latching mems switch and method WO2003041133A2 (en)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US33805501P 2001-11-09 2001-11-09
US33806901P 2001-11-09 2001-11-09
US33752901P 2001-11-09 2001-11-09
US33752701P 2001-11-09 2001-11-09
US33807201P 2001-11-09 2001-11-09
US33752801P 2001-11-09 2001-11-09
US60/338,069 2001-11-09
US60/338,055 2001-11-09
US60/337,528 2001-11-09
US60/337,527 2001-11-09
US60/337,529 2001-11-09
US60/338,072 2001-11-09

Publications (2)

Publication Number Publication Date
WO2003041133A2 WO2003041133A2 (en) 2003-05-15
WO2003041133A3 true WO2003041133A3 (en) 2003-09-12

Family

ID=27559772

Family Applications (6)

Application Number Title Priority Date Filing Date
PCT/US2002/035926 WO2003042721A2 (en) 2001-11-09 2002-11-08 Trilayered beam mems device and related methods
PCT/US2002/035925 WO2003043044A1 (en) 2001-11-09 2002-11-08 Mems device having a trilayered beam and related methods
PCT/US2002/035923 WO2003043042A1 (en) 2001-11-09 2002-11-08 Mems device having electrothermal actuation and release and method for fabricating
PCT/US2002/036009 WO2003041133A2 (en) 2001-11-09 2002-11-08 Electrothermal self-latching mems switch and method
PCT/US2002/035988 WO2003040338A2 (en) 2001-11-09 2002-11-08 Micro-scale interconnect device with internal heat spreader and method for fabricating same
PCT/US2002/035927 WO2003043038A2 (en) 2001-11-09 2002-11-08 Mems device having contact and standoff bumps and related methods

Family Applications Before (3)

Application Number Title Priority Date Filing Date
PCT/US2002/035926 WO2003042721A2 (en) 2001-11-09 2002-11-08 Trilayered beam mems device and related methods
PCT/US2002/035925 WO2003043044A1 (en) 2001-11-09 2002-11-08 Mems device having a trilayered beam and related methods
PCT/US2002/035923 WO2003043042A1 (en) 2001-11-09 2002-11-08 Mems device having electrothermal actuation and release and method for fabricating

Family Applications After (2)

Application Number Title Priority Date Filing Date
PCT/US2002/035988 WO2003040338A2 (en) 2001-11-09 2002-11-08 Micro-scale interconnect device with internal heat spreader and method for fabricating same
PCT/US2002/035927 WO2003043038A2 (en) 2001-11-09 2002-11-08 Mems device having contact and standoff bumps and related methods

Country Status (7)

Country Link
US (9) US6847114B2 (en)
EP (9) EP1454349B1 (en)
CN (3) CN100550429C (en)
AT (8) ATE495538T1 (en)
AU (3) AU2002363529A1 (en)
DE (7) DE60230341D1 (en)
WO (6) WO2003042721A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8964280B2 (en) 2006-06-30 2015-02-24 Qualcomm Mems Technologies, Inc. Method of manufacturing MEMS devices providing air gap control

Families Citing this family (312)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6853067B1 (en) 1999-10-12 2005-02-08 Microassembly Technologies, Inc. Microelectromechanical systems using thermocompression bonding
US20020096421A1 (en) * 2000-11-29 2002-07-25 Cohn Michael B. MEMS device with integral packaging
JP3651671B2 (en) * 2001-08-30 2005-05-25 株式会社東芝 Micromechanical switch and manufacturing method thereof
US7132736B2 (en) * 2001-10-31 2006-11-07 Georgia Tech Research Corporation Devices having compliant wafer-level packages with pillars and methods of fabrication
EP1454349B1 (en) * 2001-11-09 2006-09-27 WiSpry, Inc. Trilayered beam mems device and related methods
US7521366B2 (en) * 2001-12-12 2009-04-21 Lg Display Co., Ltd. Manufacturing method of electro line for liquid crystal display device
US7045459B2 (en) * 2002-02-19 2006-05-16 Northrop Grumman Corporation Thin film encapsulation of MEMS devices
US7763947B2 (en) * 2002-04-23 2010-07-27 Sharp Laboratories Of America, Inc. Piezo-diode cantilever MEMS
US7135777B2 (en) * 2002-05-03 2006-11-14 Georgia Tech Research Corporation Devices having compliant wafer-level input/output interconnections and packages using pillars and methods of fabrication thereof
US7002225B2 (en) * 2002-05-24 2006-02-21 Northrup Grumman Corporation Compliant component for supporting electrical interface component
US6777258B1 (en) * 2002-06-28 2004-08-17 Silicon Light Machines, Inc. Conductive etch stop for etching a sacrificial layer
US7064637B2 (en) * 2002-07-18 2006-06-20 Wispry, Inc. Recessed electrode for electrostatically actuated structures
US7551048B2 (en) * 2002-08-08 2009-06-23 Fujitsu Component Limited Micro-relay and method of fabricating the same
EP1394554B1 (en) * 2002-08-30 2011-11-02 STMicroelectronics Srl Process for the fabrication of a threshold acceleration sensor
US20040121505A1 (en) * 2002-09-30 2004-06-24 Magfusion, Inc. Method for fabricating a gold contact on a microswitch
US7053736B2 (en) * 2002-09-30 2006-05-30 Teravicta Technologies, Inc. Microelectromechanical device having an active opening switch
US7317232B2 (en) * 2002-10-22 2008-01-08 Cabot Microelectronics Corporation MEM switching device
US6835589B2 (en) * 2002-11-14 2004-12-28 International Business Machines Corporation Three-dimensional integrated CMOS-MEMS device and process for making the same
US6800503B2 (en) * 2002-11-20 2004-10-05 International Business Machines Corporation MEMS encapsulated structure and method of making same
US7498911B2 (en) * 2003-02-26 2009-03-03 Memtronics Corporation Membrane switch components and designs
WO2004079795A2 (en) 2003-03-04 2004-09-16 Rohm And Haas Electronic Materials, L.L.C. Coaxial waveguide microstructures and methods of formation thereof
US6720267B1 (en) * 2003-03-19 2004-04-13 United Microelectronics Corp. Method for forming a cantilever beam model micro-electromechanical system
NL1023275C2 (en) * 2003-04-25 2004-10-27 Cavendish Kinetics Ltd Method for manufacturing a micro-mechanical element.
CA2429909A1 (en) * 2003-05-27 2004-11-27 Cognos Incorporated Transformation of tabular and cross-tabulated queries based upon e/r schema into multi-dimensional expression queries
DE10325564B4 (en) * 2003-06-05 2008-12-18 Infineon Technologies Ag Smart card module
US7061022B1 (en) * 2003-08-26 2006-06-13 United States Of America As Represented By The Secretary Of The Army Lateral heat spreading layers for epi-side up ridge waveguide semiconductor lasers
JP4823478B2 (en) * 2003-09-19 2011-11-24 株式会社半導体エネルギー研究所 Method for manufacturing light emitting device
US7520790B2 (en) * 2003-09-19 2009-04-21 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method of display device
US7388459B2 (en) * 2003-10-28 2008-06-17 Medtronic, Inc. MEMs switching circuit and method for an implantable medical device
US7283024B2 (en) * 2003-12-18 2007-10-16 Intel Corporation MEMS switch stopper bumps with adjustable height
GB0330010D0 (en) 2003-12-24 2004-01-28 Cavendish Kinetics Ltd Method for containing a device and a corresponding device
US7142087B2 (en) * 2004-01-27 2006-11-28 Lucent Technologies Inc. Micromechanical latching switch
US7352266B2 (en) * 2004-02-20 2008-04-01 Wireless Mems, Inc. Head electrode region for a reliable metal-to-metal contact micro-relay MEMS switch
US7265299B2 (en) * 2004-03-04 2007-09-04 Au Optronics Corporation Method for reducing voltage drop across metal lines of electroluminescence display devices
US20050244099A1 (en) * 2004-03-24 2005-11-03 Pasch Nicholas F Cantilevered micro-electromechanical switch array
US7362199B2 (en) * 2004-03-31 2008-04-22 Intel Corporation Collapsible contact switch
FR2868591B1 (en) * 2004-04-06 2006-06-09 Commissariat Energie Atomique MICROCOMMUTER WITH LOW ACTUATION VOLTAGE AND LOW CONSUMPTION
US7476327B2 (en) * 2004-05-04 2009-01-13 Idc, Llc Method of manufacture for microelectromechanical devices
DE102004026654B4 (en) * 2004-06-01 2009-07-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Micromechanical RF switching element and method of manufacture
US7749792B2 (en) * 2004-06-02 2010-07-06 Carnegie Mellon University Self-assembling MEMS devices having thermal actuation
US20060055499A1 (en) * 2004-09-16 2006-03-16 Bolle Cristian A Fuse arrangement
US7630119B2 (en) 2004-09-27 2009-12-08 Qualcomm Mems Technologies, Inc. Apparatus and method for reducing slippage between structures in an interferometric modulator
US7417783B2 (en) * 2004-09-27 2008-08-26 Idc, Llc Mirror and mirror layer for optical modulator and method
US7420725B2 (en) 2004-09-27 2008-09-02 Idc, Llc Device having a conductive light absorbing mask and method for fabricating same
US7527995B2 (en) 2004-09-27 2009-05-05 Qualcomm Mems Technologies, Inc. Method of making prestructure for MEMS systems
US7372613B2 (en) 2004-09-27 2008-05-13 Idc, Llc Method and device for multistate interferometric light modulation
US7944599B2 (en) 2004-09-27 2011-05-17 Qualcomm Mems Technologies, Inc. Electromechanical device with optical function separated from mechanical and electrical function
US7369296B2 (en) 2004-09-27 2008-05-06 Idc, Llc Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator
US7564612B2 (en) 2004-09-27 2009-07-21 Idc, Llc Photonic MEMS and structures
US7289259B2 (en) 2004-09-27 2007-10-30 Idc, Llc Conductive bus structure for interferometric modulator array
US20060065622A1 (en) * 2004-09-27 2006-03-30 Floyd Philip D Method and system for xenon fluoride etching with enhanced efficiency
US7583429B2 (en) 2004-09-27 2009-09-01 Idc, Llc Ornamental display device
US7304784B2 (en) * 2004-09-27 2007-12-04 Idc, Llc Reflective display device having viewable display on both sides
US7936497B2 (en) 2004-09-27 2011-05-03 Qualcomm Mems Technologies, Inc. MEMS device having deformable membrane characterized by mechanical persistence
US8008736B2 (en) 2004-09-27 2011-08-30 Qualcomm Mems Technologies, Inc. Analog interferometric modulator device
US7193492B2 (en) * 2004-09-29 2007-03-20 Lucent Technologies Inc. Monolithic MEMS device having a balanced cantilever plate
US7239064B1 (en) * 2004-10-15 2007-07-03 Morgan Research Corporation Resettable latching MEMS temperature sensor apparatus and method
KR100619110B1 (en) * 2004-10-21 2006-09-04 한국전자통신연구원 Micro-electro mechanical systems switch and a method of fabricating the same
US7230513B2 (en) * 2004-11-20 2007-06-12 Wireless Mems, Inc. Planarized structure for a reliable metal-to-metal contact micro-relay MEMS switch
TWI252838B (en) * 2004-12-02 2006-04-11 Delta Electronics Inc Micro-switch
US7446628B2 (en) * 2004-12-09 2008-11-04 Wispry, Inc. Pole-zero elements and related systems and methods
US7521784B2 (en) * 2004-12-17 2009-04-21 Hewlett-Packard Development Company, L.P. System for coupling wire to semiconductor region
KR100661176B1 (en) * 2004-12-17 2006-12-26 삼성전자주식회사 Micro Mechanical Electro System Switch and the Method of it
US7391090B2 (en) * 2004-12-17 2008-06-24 Hewlett-Packard Development Company, L.P. Systems and methods for electrically coupling wires and conductors
US7597819B1 (en) * 2004-12-20 2009-10-06 Sandia Corporation Redox buffered hydrofluoric acid etchant for the reduction of galvanic attack during release etching of MEMS devices having noble material films
TWI287634B (en) * 2004-12-31 2007-10-01 Wen-Chang Dung Micro-electromechanical probe circuit film, method for making the same and applications thereof
US7235750B1 (en) 2005-01-31 2007-06-26 United States Of America As Represented By The Secretary Of The Air Force Radio frequency MEMS switch contact metal selection
US7601554B1 (en) 2005-01-31 2009-10-13 The United States Of America As Represented By The Secretary Of The Air Force Shaped MEMS contact
US7655996B1 (en) * 2005-02-03 2010-02-02 The United States Of America As Represented By The Secretary Of The Army MEMS structure support and release mechanism
US7404167B2 (en) 2005-02-23 2008-07-22 Taiwan Semiconductor Manufacturing Company, Ltd. Method for improving design window
JP4707424B2 (en) * 2005-03-18 2011-06-22 株式会社東芝 Variable capacitance element, variable capacitance device, and mobile phone using variable capacitance device
ATE525738T1 (en) * 2005-03-18 2011-10-15 Reseaux Mems MEMS ACTUATORS AND SWITCHES
JP4498181B2 (en) * 2005-03-22 2010-07-07 東京エレクトロン株式会社 Switch array
US7322856B2 (en) * 2005-03-31 2008-01-29 Molex Incorporated High-density, robust connector
DE102005016243B3 (en) 2005-04-08 2006-09-28 Austriamicrosystems Ag Micromechanical component e.g. micro electro mechanical system structure, for use as e.g. micro sensor, has one metal layer of multi-layer structure extending at side over pile and electrically conductive membrane integrated in structure
FR2885735B1 (en) * 2005-05-10 2007-08-03 St Microelectronics Sa INTEGRATED CIRCUIT WAVE GUIDE
US7692521B1 (en) * 2005-05-12 2010-04-06 Microassembly Technologies, Inc. High force MEMS device
US7884989B2 (en) * 2005-05-27 2011-02-08 Qualcomm Mems Technologies, Inc. White interferometric modulators and methods for forming the same
US7321275B2 (en) * 2005-06-23 2008-01-22 Intel Corporation Ultra-low voltage capable zipper switch
JP4489651B2 (en) * 2005-07-22 2010-06-23 株式会社日立製作所 Semiconductor device and manufacturing method thereof
EP2495212A3 (en) * 2005-07-22 2012-10-31 QUALCOMM MEMS Technologies, Inc. Mems devices having support structures and methods of fabricating the same
US7612635B2 (en) * 2005-08-03 2009-11-03 Kolo Technologies, Inc. MEMS acoustic filter and fabrication of the same
US20070040637A1 (en) * 2005-08-19 2007-02-22 Yee Ian Y K Microelectromechanical switches having mechanically active components which are electrically isolated from components of the switch used for the transmission of signals
US7528691B2 (en) * 2005-08-26 2009-05-05 Innovative Micro Technology Dual substrate electrostatic MEMS switch with hermetic seal and method of manufacture
US7960208B2 (en) * 2005-08-26 2011-06-14 Innovative Micro Technology Wafer level hermetic bond using metal alloy with raised feature
US7582969B2 (en) * 2005-08-26 2009-09-01 Innovative Micro Technology Hermetic interconnect structure and method of manufacture
US8736081B2 (en) 2005-08-26 2014-05-27 Innovative Micro Technology Wafer level hermetic bond using metal alloy with keeper layer
US20070048887A1 (en) * 2005-08-26 2007-03-01 Innovative Micro Technology Wafer level hermetic bond using metal alloy
US7569926B2 (en) * 2005-08-26 2009-08-04 Innovative Micro Technology Wafer level hermetic bond using metal alloy with raised feature
US7233048B2 (en) * 2005-08-26 2007-06-19 Innovative Micro Technology MEMS device trench plating process and apparatus for through hole vias
US20070090474A1 (en) * 2005-09-08 2007-04-26 Li Gary G MEMS device and method of fabrication
US20080094149A1 (en) * 2005-09-22 2008-04-24 Sungsung Electronics Co., Ltd. Power amplifier matching circuit and method using tunable mems devices
US7332980B2 (en) * 2005-09-22 2008-02-19 Samsung Electronics Co., Ltd. System and method for a digitally tunable impedance matching network
US7580172B2 (en) * 2005-09-30 2009-08-25 Qualcomm Mems Technologies, Inc. MEMS device and interconnects for same
KR100827314B1 (en) * 2005-10-10 2008-05-06 삼성전기주식회사 Method of manufacturing MEMS element and optical modulator having flat surface by heat treatment
US8043950B2 (en) * 2005-10-26 2011-10-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US7630114B2 (en) * 2005-10-28 2009-12-08 Idc, Llc Diffusion barrier layer for MEMS devices
US20070096860A1 (en) * 2005-11-02 2007-05-03 Innovative Micro Technology Compact MEMS thermal device and method of manufacture
KR100744543B1 (en) * 2005-12-08 2007-08-01 한국전자통신연구원 Micro-electro mechanical systems switch and method of fabricating the same switch
US8066462B2 (en) * 2005-12-12 2011-11-29 Telezygology, Inc. Development in beam type fasteners
JP5399075B2 (en) * 2005-12-22 2014-01-29 エプコス アクチエンゲゼルシャフト MEMS device apparatus having capacitors connected in series
US7602261B2 (en) * 2005-12-22 2009-10-13 Intel Corporation Micro-electromechanical system (MEMS) switch
US7525151B2 (en) * 2006-01-05 2009-04-28 International Rectifier Corporation Vertical DMOS device in integrated circuit
FR2895986B1 (en) * 2006-01-06 2008-09-05 Centre Nat Rech Scient PREPARATION OF MULTILAYER MICROCOMPONENTS BY THE METHOD OF THE SACRIFICIAL THICK LAYER
US20070196048A1 (en) * 2006-01-12 2007-08-23 Almantas Galvanauskas Optical waveform shaping
US7916980B2 (en) 2006-01-13 2011-03-29 Qualcomm Mems Technologies, Inc. Interconnect structure for MEMS device
US7382515B2 (en) 2006-01-18 2008-06-03 Qualcomm Mems Technologies, Inc. Silicon-rich silicon nitrides as etch stops in MEMS manufacture
US7678601B2 (en) * 2006-01-20 2010-03-16 Texas Instruments Incorporated Method of forming an acceleration sensor
US20070170528A1 (en) * 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
US7671693B2 (en) * 2006-02-17 2010-03-02 Samsung Electronics Co., Ltd. System and method for a tunable impedance matching network
US7480432B2 (en) * 2006-02-28 2009-01-20 Corning Incorporated Glass-based micropositioning systems and methods
US7463113B2 (en) * 2006-02-28 2008-12-09 Motorla, Inc. Apparatus and methods relating to electrically conductive path interfaces disposed within capacitor plate openings
EP1999772B1 (en) * 2006-03-08 2020-05-06 Wispry, Inc. Micro-electro-mechanical system mems variable capacitor
US7710045B2 (en) * 2006-03-17 2010-05-04 3M Innovative Properties Company Illumination assembly with enhanced thermal conductivity
US7711239B2 (en) 2006-04-19 2010-05-04 Qualcomm Mems Technologies, Inc. Microelectromechanical device and method utilizing nanoparticles
US7554421B2 (en) * 2006-05-16 2009-06-30 Intel Corporation Micro-electromechanical system (MEMS) trampoline switch/varactor
GB0610392D0 (en) 2006-05-25 2006-07-05 Univ Durham Electro-mechanical actuator and apparatus incorporating such device
US7649671B2 (en) 2006-06-01 2010-01-19 Qualcomm Mems Technologies, Inc. Analog interferometric modulator device with electrostatic actuation and release
US7605675B2 (en) * 2006-06-20 2009-10-20 Intel Corporation Electromechanical switch with partially rigidified electrode
US7835061B2 (en) * 2006-06-28 2010-11-16 Qualcomm Mems Technologies, Inc. Support structures for free-standing electromechanical devices
US7911010B2 (en) * 2006-07-17 2011-03-22 Kwj Engineering, Inc. Apparatus and method for microfabricated multi-dimensional sensors and sensing systems
JP4234737B2 (en) * 2006-07-24 2009-03-04 株式会社東芝 MEMS switch
JP4265630B2 (en) * 2006-08-04 2009-05-20 セイコーエプソン株式会社 MEMS switch, voltage divider circuit, gain adjustment circuit, attenuator, and method of manufacturing MEMS switch
CN101501805B (en) * 2006-08-09 2012-07-04 皇家飞利浦电子股份有限公司 Self-locking micro electro mechanical device
US7495368B2 (en) * 2006-08-31 2009-02-24 Evigia Systems, Inc. Bimorphic structures, sensor structures formed therewith, and methods therefor
US7688167B2 (en) * 2006-10-12 2010-03-30 Innovative Micro Technology Contact electrode for microdevices and etch method of manufacture
US7684106B2 (en) 2006-11-02 2010-03-23 Qualcomm Mems Technologies, Inc. Compatible MEMS switch architecture
JP5085101B2 (en) * 2006-11-17 2012-11-28 オリンパス株式会社 Variable spectroscopic element
WO2008064216A2 (en) * 2006-11-20 2008-05-29 Massachusetts Institute Of Technology Micro-electro mechanical tunneling switch
CN101188159B (en) * 2006-11-24 2011-01-12 阎跃军 Segment adjustable inductor
US8222087B2 (en) 2006-12-19 2012-07-17 HGST Netherlands, B.V. Seed layer for a heat spreader in a magnetic recording head
US7706042B2 (en) 2006-12-20 2010-04-27 Qualcomm Mems Technologies, Inc. MEMS device and interconnects for same
KR100840644B1 (en) * 2006-12-29 2008-06-24 동부일렉트로닉스 주식회사 Switching device and method of fabricating the same
EP1939137B1 (en) * 2006-12-30 2016-08-24 Nuvotronics, LLC Three-dimensional microstructures and methods of formation thereof
JP4916893B2 (en) * 2007-01-05 2012-04-18 株式会社日本マイクロニクス Probe manufacturing method
US7400015B1 (en) * 2007-01-15 2008-07-15 International Business Machines Corporation Semiconductor structure with field shield and method of forming the structure
US8115987B2 (en) 2007-02-01 2012-02-14 Qualcomm Mems Technologies, Inc. Modulating the intensity of light from an interferometric reflector
KR20090125087A (en) * 2007-02-20 2009-12-03 퀄컴 엠이엠스 테크놀로지스, 인크. Equipment and methods for etching of mems
US20080197964A1 (en) * 2007-02-21 2008-08-21 Simpler Networks Inc. Mems actuators and switches
KR101593686B1 (en) 2007-03-20 2016-02-12 누보트로닉스, 엘.엘.씨 Integrated electronic components and methods of formation thereof
KR101472134B1 (en) 2007-03-20 2014-12-15 누보트로닉스, 엘.엘.씨 Coaxial transmission line microstructures and methods of formation thereof
CN101652317B (en) * 2007-04-04 2012-12-12 高通Mems科技公司 Eliminate release etch attack by interface modification in sacrificial layers
US7643202B2 (en) 2007-05-09 2010-01-05 Qualcomm Mems Technologies, Inc. Microelectromechanical system having a dielectric movable membrane and a mirror
US7719752B2 (en) 2007-05-11 2010-05-18 Qualcomm Mems Technologies, Inc. MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same
US7992294B2 (en) * 2007-05-25 2011-08-09 Molex Incorporated Method of manufacturing an interconnect device which forms a heat sink and electrical connections between a heat generating device and a power source
US8102638B2 (en) * 2007-06-13 2012-01-24 The University Court Of The University Of Edinburgh Micro electromechanical capacitive switch
US7625825B2 (en) * 2007-06-14 2009-12-01 Qualcomm Mems Technologies, Inc. Method of patterning mechanical layer for MEMS structures
US7630121B2 (en) 2007-07-02 2009-12-08 Qualcomm Mems Technologies, Inc. Electromechanical device with optical function separated from mechanical and electrical function
US8068268B2 (en) 2007-07-03 2011-11-29 Qualcomm Mems Technologies, Inc. MEMS devices having improved uniformity and methods for making them
US8310016B2 (en) * 2007-07-17 2012-11-13 Kwj Engineering, Inc. Apparatus and method for microfabricated multi-dimensional sensors and sensing systems
EP2183782B1 (en) * 2007-07-23 2017-12-27 Wispry, Inc. Multi-layer beam and method of manufacturing same
CN101755232A (en) 2007-07-25 2010-06-23 高通Mems科技公司 Mems display devices and methods of fabricating the same
JP2010538306A (en) 2007-07-31 2010-12-09 クォルコム・メムズ・テクノロジーズ・インコーポレーテッド Device for increasing the color shift of interferometric modulators
US8154378B2 (en) * 2007-08-10 2012-04-10 Alcatel Lucent Thermal actuator for a MEMS-based relay switch
US7847999B2 (en) 2007-09-14 2010-12-07 Qualcomm Mems Technologies, Inc. Interferometric modulator display devices
CN101802985A (en) * 2007-09-14 2010-08-11 高通Mems科技公司 Etching processes used in mems production
DE112008002554B4 (en) * 2007-10-15 2018-05-09 Epcos Ag Process for producing a MEMS element on a substrate
TW200919593A (en) * 2007-10-18 2009-05-01 Asia Pacific Microsystems Inc Elements and modules with micro caps and wafer level packaging method thereof
KR20100090257A (en) 2007-10-19 2010-08-13 퀄컴 엠이엠스 테크놀로지스, 인크. Display with integrated photovoltaic device
US8058549B2 (en) 2007-10-19 2011-11-15 Qualcomm Mems Technologies, Inc. Photovoltaic devices with integrated color interferometric film stacks
US8054527B2 (en) 2007-10-23 2011-11-08 Qualcomm Mems Technologies, Inc. Adjustably transmissive MEMS-based devices
US8941631B2 (en) 2007-11-16 2015-01-27 Qualcomm Mems Technologies, Inc. Simultaneous light collection and illumination on an active display
US20090140433A1 (en) * 2007-11-30 2009-06-04 Alces Technology, Inc. MEMS chip-to-chip interconnects
WO2009079460A1 (en) * 2007-12-14 2009-06-25 University Of Florida Research Foundation, Inc. Electrothermal microactuator for large vertical displacement without tilt or lateral shift
US7609136B2 (en) * 2007-12-20 2009-10-27 General Electric Company MEMS microswitch having a conductive mechanical stop
WO2009079780A1 (en) * 2007-12-21 2009-07-02 The Royal Institution For The Advancement Of Learning/Mcgill University Low temperature ceramic microelectromechanical structures
US7863079B2 (en) 2008-02-05 2011-01-04 Qualcomm Mems Technologies, Inc. Methods of reducing CD loss in a microelectromechanical device
US8199020B1 (en) * 2008-02-11 2012-06-12 The United States Of America As Represented By The Secretary Of The Army Thermal cutoff fuse for arbitrary temperatures
US7989262B2 (en) * 2008-02-22 2011-08-02 Cavendish Kinetics, Ltd. Method of sealing a cavity
US8164821B2 (en) * 2008-02-22 2012-04-24 Qualcomm Mems Technologies, Inc. Microelectromechanical device with thermal expansion balancing layer or stiffening layer
US7944604B2 (en) 2008-03-07 2011-05-17 Qualcomm Mems Technologies, Inc. Interferometric modulator in transmission mode
US7612933B2 (en) 2008-03-27 2009-11-03 Qualcomm Mems Technologies, Inc. Microelectromechanical device with spacing layer
EP2107038B1 (en) * 2008-03-31 2012-05-16 Imec Electrostatically actuatable MEMS device featuring reduced substrate charging
US7898723B2 (en) 2008-04-02 2011-03-01 Qualcomm Mems Technologies, Inc. Microelectromechanical systems display element with photovoltaic structure
US7969638B2 (en) 2008-04-10 2011-06-28 Qualcomm Mems Technologies, Inc. Device having thin black mask and method of fabricating the same
TW201000910A (en) * 2008-04-21 2010-01-01 Top Eng Co Ltd Card for MEMS probe and method for manufacturing thereof
US8451077B2 (en) 2008-04-22 2013-05-28 International Business Machines Corporation MEMS switches with reduced switching voltage and methods of manufacture
US7993950B2 (en) * 2008-04-30 2011-08-09 Cavendish Kinetics, Ltd. System and method of encapsulation
US8023191B2 (en) * 2008-05-07 2011-09-20 Qualcomm Mems Technologies, Inc. Printable static interferometric images
US7956759B1 (en) 2008-05-13 2011-06-07 The United States Of America As Represented By The Secretary Of The Army Humidity sensitive cutoff fuse
US8023167B2 (en) 2008-06-25 2011-09-20 Qualcomm Mems Technologies, Inc. Backlight displays
US8174352B2 (en) * 2008-06-26 2012-05-08 Cornell University Method for making a transducer, transducer made therefrom, and applications thereof
US7859740B2 (en) 2008-07-11 2010-12-28 Qualcomm Mems Technologies, Inc. Stiction mitigation with integrated mech micro-cantilevers through vertical stress gradient control
US7977635B2 (en) * 2008-08-08 2011-07-12 Oliver Edwards Radiant energy imager using null switching
US7855826B2 (en) * 2008-08-12 2010-12-21 Qualcomm Mems Technologies, Inc. Method and apparatus to reduce or eliminate stiction and image retention in interferometric modulator devices
US8358266B2 (en) 2008-09-02 2013-01-22 Qualcomm Mems Technologies, Inc. Light turning device with prismatic light turning features
US20110169517A1 (en) * 2008-09-05 2011-07-14 Kim Sang-Hee Mems probe card and method of manufacturing same
ITTO20080714A1 (en) * 2008-09-30 2010-04-01 St Microelectronics Srl MICROELETTROMECHANICAL DEVICE PROVIDED WITH AN ANTI-ADHESION STRUCTURE AND ITS ANTI-ADHESION METHOD
WO2010061363A2 (en) 2008-11-26 2010-06-03 Freescale Semiconductor, Inc. Electromechanical transducer device and method of forming a electromechanical transducer device
WO2010061364A2 (en) 2008-11-26 2010-06-03 Freescale Semiconductor, Inc. Electromechanical transducer device and method of forming a electromechanical transducer device
US8257119B2 (en) 2008-12-19 2012-09-04 Honeywell International Systems and methods for affixing a silicon device to a support structure
US8445306B2 (en) 2008-12-24 2013-05-21 International Business Machines Corporation Hybrid MEMS RF switch and method of fabricating same
US8957485B2 (en) * 2009-01-21 2015-02-17 Cavendish Kinetics, Ltd. Fabrication of MEMS based cantilever switches by employing a split layer cantilever deposition scheme
US8270056B2 (en) 2009-03-23 2012-09-18 Qualcomm Mems Technologies, Inc. Display device with openings between sub-pixels and method of making same
US8877648B2 (en) * 2009-03-26 2014-11-04 Semprius, Inc. Methods of forming printable integrated circuit devices by selective etching to suspend the devices from a handling substrate and devices formed thereby
JP5187441B2 (en) * 2009-04-24 2013-04-24 株式会社村田製作所 MEMS device and manufacturing method thereof
FR2946036B1 (en) * 2009-05-26 2011-11-25 Thales Sa METHOD FOR INTEGRATING MEMS-TYPE MICRO SWITCHES ON GAN SUBSTRATES COMPRISING ELECTRONIC POWER COMPONENTS
WO2010138763A1 (en) 2009-05-29 2010-12-02 Qualcomm Mems Technologies, Inc. Illumination devices and methods of fabrication thereof
JP2010284748A (en) * 2009-06-11 2010-12-24 Toshiba Corp Electric component
EP2449670B1 (en) 2009-06-29 2015-01-21 Freescale Semiconductor, Inc. Method of forming an electromechanical transducer device
JP2011017626A (en) * 2009-07-09 2011-01-27 Sony Corp Mechanical quantity detection member and mechanical quantity detection apparatus
TWM378928U (en) * 2009-07-29 2010-04-21 Pixart Imaging Inc Mems device and spring element of mems
JP5398411B2 (en) * 2009-08-10 2014-01-29 株式会社東芝 Micro movable device and manufacturing method of micro movable device
US8138007B2 (en) * 2009-08-26 2012-03-20 Freescale Semiconductor, Inc. MEMS device with stress isolation and method of fabrication
US8569091B2 (en) * 2009-08-27 2013-10-29 International Business Machines Corporation Integrated circuit switches, design structure and methods of fabricating the same
US8270062B2 (en) 2009-09-17 2012-09-18 Qualcomm Mems Technologies, Inc. Display device with at least one movable stop element
US20110063068A1 (en) * 2009-09-17 2011-03-17 The George Washington University Thermally actuated rf microelectromechanical systems switch
US8779886B2 (en) * 2009-11-30 2014-07-15 General Electric Company Switch structures
US8826529B2 (en) 2009-09-23 2014-09-09 General Electric Company Method of forming a micro-electromechanical system device
US8354899B2 (en) 2009-09-23 2013-01-15 General Electric Company Switch structure and method
US8488228B2 (en) 2009-09-28 2013-07-16 Qualcomm Mems Technologies, Inc. Interferometric display with interferometric reflector
US20110123783A1 (en) * 2009-11-23 2011-05-26 David Sherrer Multilayer build processses and devices thereof
CN102086017B (en) * 2009-12-03 2014-11-26 原相科技股份有限公司 Micro electronmechanical element and micro electronmechanical spring element
CN102110616B (en) * 2009-12-25 2012-09-05 华东光电集成器件研究所 Method for realizing thin film multilayer wiring on low temperature cofired ceramic (LTCC) substrate
US8237263B2 (en) * 2009-12-31 2012-08-07 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for cooling an integrated circuit
CN102741958B (en) * 2010-01-15 2016-09-14 维斯普瑞公司 MEMS cantilever adjustable condenser and method equipped with spring
KR101067214B1 (en) * 2010-04-07 2011-09-22 삼성전기주식회사 A printed circuit board and a method of manufacturing the same
CN102834761A (en) 2010-04-09 2012-12-19 高通Mems科技公司 Mechanical layer and methods of forming the same
CN101814866B (en) * 2010-04-16 2012-08-01 大连理工大学 Method for manufacturing electrothermal drive microstructure
US20110269295A1 (en) * 2010-04-30 2011-11-03 Hopper Peter J Method of Forming a Semiconductor Wafer that Provides Galvanic Isolation
US8709264B2 (en) 2010-06-25 2014-04-29 International Business Machines Corporation Planar cavity MEMS and related structures, methods of manufacture and design structures
JP5667391B2 (en) * 2010-08-11 2015-02-12 日本電波工業株式会社 Disc type MEMS vibrator
FR2963784B1 (en) * 2010-08-11 2012-08-31 Univ Limoges ELECTROMECHANICAL MICROSYSTEMS WITH AIR GAPS.
WO2012024238A1 (en) 2010-08-17 2012-02-23 Qualcomm Mems Technologies, Inc. Actuation and calibration of a charge neutral electrode in an interferometric display device
US9057872B2 (en) 2010-08-31 2015-06-16 Qualcomm Mems Technologies, Inc. Dielectric enhanced mirror for IMOD display
DE102010047128A1 (en) * 2010-09-30 2012-04-05 Infineon Technologies Ag Hall sensor arrangement for redundantly measuring a magnetic field
KR20120064364A (en) * 2010-12-09 2012-06-19 삼성전자주식회사 Method for manufacturing the solar cell
US8735200B2 (en) * 2010-12-13 2014-05-27 Sagnik Pal Fabrication of robust electrothermal MEMS with fast thermal response
US9221677B2 (en) * 2010-12-20 2015-12-29 Rf Micro Devices, Inc. Composite sacrificial structure for reliably creating a contact gap in a MEMS switch
US20120174572A1 (en) * 2011-01-10 2012-07-12 Donato Clausi Method for mechanical and electrical integration of sma wires to microsystems
US8171800B1 (en) * 2011-01-25 2012-05-08 Continental Automotive Systems, Inc. Differential pressure sensor using dual backside absolute pressure sensing
US8962443B2 (en) * 2011-01-31 2015-02-24 Avago Technologies General Ip (Singapore) Pte. Ltd. Semiconductor device having an airbridge and method of fabricating the same
US8963159B2 (en) 2011-04-04 2015-02-24 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same
US9134527B2 (en) 2011-04-04 2015-09-15 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same
US8531192B2 (en) * 2011-04-15 2013-09-10 Robert Bosch Gmbh High-impedance MEMS switch
US8659816B2 (en) 2011-04-25 2014-02-25 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of making the same
US8866300B1 (en) 2011-06-05 2014-10-21 Nuvotronics, Llc Devices and methods for solder flow control in three-dimensional microstructures
US8814601B1 (en) 2011-06-06 2014-08-26 Nuvotronics, Llc Batch fabricated microconnectors
CN103732526B (en) * 2011-06-07 2016-04-06 维斯普瑞公司 For optimizing the system and method for current density in the MEMS capacitive device being integrated with CMOS
US8973250B2 (en) * 2011-06-20 2015-03-10 International Business Machines Corporation Methods of manufacturing a micro-electro-mechanical system (MEMS) structure
US9120667B2 (en) 2011-06-20 2015-09-01 International Business Machines Corporation Micro-electro-mechanical system (MEMS) and related actuator bumps, methods of manufacture and design structures
US8643140B2 (en) * 2011-07-11 2014-02-04 United Microelectronics Corp. Suspended beam for use in MEMS device
EP2731783A4 (en) 2011-07-13 2016-03-09 Nuvotronics Llc Methods of fabricating electronic and mechanical structures
CN102367165B (en) * 2011-08-31 2015-01-21 华东光电集成器件研究所 Method for interconnecting electrodes of MEMS (micro electro mechanical system) device based on SOI (silicon-on-insulator)
CN102423258B (en) * 2011-09-20 2013-12-25 上海交通大学 MEMS (Micro Electro Mechanical System) technology-based wireless transmission implantable symmetrical structure pressure sensor
US20130106875A1 (en) * 2011-11-02 2013-05-02 Qualcomm Mems Technologies, Inc. Method of improving thin-film encapsulation for an electromechanical systems assembly
US8736939B2 (en) 2011-11-04 2014-05-27 Qualcomm Mems Technologies, Inc. Matching layer thin-films for an electromechanical systems reflective display device
US9349558B2 (en) * 2011-12-06 2016-05-24 Palo Alto Research Center Incorporated Mechanically acuated heat switch
FR2984010B1 (en) * 2011-12-09 2014-01-03 St Microelectronics Rousset INTEGRATED CAPACITIVE DEVICE HAVING THERMALLY VARIABLE CAPACITIVE VALUE
FR2984013B1 (en) 2011-12-09 2014-01-10 St Microelectronics Rousset MECHANICAL INTEGRATED ELECTRICAL SWITCHING DEVICE HAVING A BLOCKED STATE
US8673670B2 (en) 2011-12-15 2014-03-18 International Business Machines Corporation Micro-electro-mechanical system (MEMS) structures and design structures
US20130181893A1 (en) * 2012-01-13 2013-07-18 Qualcomm Mems Technologies, Inc. Electrostatically transduced sensors composed of photochemically etched glass
FR2988712B1 (en) 2012-04-02 2014-04-11 St Microelectronics Rousset INTEGRATED CIRCUIT EQUIPPED WITH A DEVICE FOR DETECTING ITS SPACE ORIENTATION AND / OR CHANGE OF THIS ORIENTATION.
US8748999B2 (en) * 2012-04-20 2014-06-10 Taiwan Semiconductor Manufacturing Company, Ltd. Capacitive sensors and methods for forming the same
EP2842165A4 (en) * 2012-04-26 2015-10-14 Hewlett Packard Development Co Customizable nonlinear electrical devices
US8569115B1 (en) 2012-07-06 2013-10-29 LuxVue Technology Corporation Method of forming a compliant bipolar micro device transfer head with silicon electrodes
WO2014008110A1 (en) * 2012-07-06 2014-01-09 LuxVue Technology Corporation Compliant bipolar micro device transfer head with silicon electrodes
US9162878B2 (en) 2012-08-30 2015-10-20 Innovative Micro Technology Wafer level hermetic bond using metal alloy with raised feature and wetting layer
US9325044B2 (en) 2013-01-26 2016-04-26 Nuvotronics, Inc. Multi-layer digital elliptic filter and method
JP6105304B2 (en) * 2013-01-31 2017-03-29 ルネサスエレクトロニクス株式会社 Inductor device and semiconductor device
US9306254B1 (en) 2013-03-15 2016-04-05 Nuvotronics, Inc. Substrate-free mechanical interconnection of electronic sub-systems using a spring configuration
US9306255B1 (en) 2013-03-15 2016-04-05 Nuvotronics, Inc. Microstructure including microstructural waveguide elements and/or IC chips that are mechanically interconnected to each other
US9233832B2 (en) 2013-05-10 2016-01-12 Globalfoundries Inc. Micro-electro-mechanical system (MEMS) structures and design structures
US9911563B2 (en) * 2013-07-31 2018-03-06 Analog Devices Global MEMS switch device and method of fabrication
FR3009653B1 (en) * 2013-08-09 2015-08-07 Commissariat Energie Atomique DEVICE FOR CONVERTING THERMAL ENERGY IN ELECTRICAL ENERGY
FR3012671B1 (en) 2013-10-29 2015-11-13 St Microelectronics Rousset INTEGRATED MECHANICAL DEVICE WITH VERTICAL MOVEMENT
US9162868B2 (en) 2013-11-27 2015-10-20 Infineon Technologies Ag MEMS device
US10310009B2 (en) 2014-01-17 2019-06-04 Nuvotronics, Inc Wafer scale test interface unit and contactors
WO2015109532A1 (en) * 2014-01-24 2015-07-30 吉瑞高新科技股份有限公司 Battery holder, electronic cigarette and atomisation control method for electronic cigarette
US9796578B2 (en) * 2014-03-10 2017-10-24 Apple Inc. Microelectromechanical systems devices with improved reliability
US9385306B2 (en) 2014-03-14 2016-07-05 The United States Of America As Represented By The Secretary Of The Army Ferroelectric mechanical memory and method
US10640362B2 (en) 2014-04-01 2020-05-05 Wispry, Inc. Systems, devices, and methods for reducing surface dielectric charging in a RF MEMS actuator element
EP2937311B1 (en) * 2014-04-25 2019-08-21 Rolex Sa Method for manufacturing a reinforced timepiece component, corresponding timepiece component and timepiece
US9274277B2 (en) 2014-05-15 2016-03-01 Globalfoundries Inc. Waveguide devices with supporting anchors
FR3022691B1 (en) 2014-06-23 2016-07-01 Stmicroelectronics Rousset INTEGRATED COMMANDABLE CAPACITIVE DEVICE
CN105428256B (en) * 2014-07-30 2018-07-20 中芯国际集成电路制造(上海)有限公司 A kind of semiconductor devices and its manufacturing method and electronic device
CN105366624B (en) * 2014-07-30 2017-06-13 中芯国际集成电路制造(上海)有限公司 A kind of semiconductor devices and its manufacture method and electronic installation
EP3201123A4 (en) * 2014-10-03 2018-05-23 Wispry, Inc. Systems, devices, and methods to reduce dielectric charging in micro-electromechanical systems devices
US10132699B1 (en) * 2014-10-06 2018-11-20 National Technology & Engineering Solutions Of Sandia, Llc Electrodeposition processes for magnetostrictive resonators
US10847469B2 (en) 2016-04-26 2020-11-24 Cubic Corporation CTE compensation for wafer-level and chip-scale packages and assemblies
US10511073B2 (en) 2014-12-03 2019-12-17 Cubic Corporation Systems and methods for manufacturing stacked circuits and transmission lines
US9466452B1 (en) 2015-03-31 2016-10-11 Stmicroelectronics, Inc. Integrated cantilever switch
FR3034567B1 (en) 2015-03-31 2017-04-28 St Microelectronics Rousset METALLIC DEVICE WITH IMPROVED MOBILE PIECE (S) LOADED IN A CAVITY OF THE INTERCONNECTION PART ("BEOL") OF AN INTEGRATED CIRCUIT
US9971970B1 (en) 2015-04-27 2018-05-15 Rigetti & Co, Inc. Microwave integrated quantum circuits with VIAS and methods for making the same
WO2017019557A1 (en) * 2015-07-24 2017-02-02 Trustees Of Boston University Mems devices for smart lighting applications
CN108883927B (en) * 2016-02-29 2023-06-13 密歇根大学董事会 Method for manufacturing three-dimensional microstructure device
CN109154697B (en) 2016-05-20 2020-11-10 镁可微波技术有限公司 Semiconductor laser and method for planarizing semiconductor laser
US20180079640A1 (en) * 2016-09-22 2018-03-22 Innovative Micro Technology Mems device with offset electrode
CN107917750B (en) * 2016-10-08 2020-06-26 北京大学 MEMS (micro-electromechanical system) thermal type acoustic particle sensor
CN107915280B (en) * 2016-10-11 2020-05-26 青岛经济技术开发区海尔热水器有限公司 Water bar system with double circulation modes
DE102016122525B4 (en) * 2016-11-22 2019-09-19 Infineon Technologies Ag Sensor components of a microelectronic system
US10996125B2 (en) * 2017-05-17 2021-05-04 Infineon Technologies Ag Pressure sensors and method for forming a MEMS pressure sensor
US11276727B1 (en) 2017-06-19 2022-03-15 Rigetti & Co, Llc Superconducting vias for routing electrical signals through substrates and their methods of manufacture
US11121301B1 (en) 2017-06-19 2021-09-14 Rigetti & Co, Inc. Microwave integrated quantum circuits with cap wafers and their methods of manufacture
US11170984B2 (en) * 2017-07-24 2021-11-09 Spark Thermionics, Inc. Small gap device system and method of fabrication
JP6842386B2 (en) * 2017-08-31 2021-03-17 キオクシア株式会社 Semiconductor device
US11385108B2 (en) * 2017-11-02 2022-07-12 Nextinput, Inc. Sealed force sensor with etch stop layer
US10720338B1 (en) 2017-11-07 2020-07-21 Honeywell Federal Manufacturing & Technologies, Llc Low temperature cofired ceramic substrates and fabrication techniques for the same
US10319654B1 (en) 2017-12-01 2019-06-11 Cubic Corporation Integrated chip scale packages
US11040871B2 (en) * 2017-12-14 2021-06-22 Invensense, Inc. Device comprising a micro-electro-mechanical system substrate with protrusions of different heights that has been integrated with a complementary metal-oxide-semiconductor substrate
US11464140B2 (en) 2019-12-06 2022-10-04 Frore Systems Inc. Centrally anchored MEMS-based active cooling systems
US10943850B2 (en) 2018-08-10 2021-03-09 Frore Systems Inc. Piezoelectric MEMS-based active cooling for heat dissipation in compute devices
GB201815797D0 (en) 2018-09-27 2018-11-14 Sofant Tech Ltd Mems devices and circuits including same
US10793422B2 (en) * 2018-12-17 2020-10-06 Vanguard International Semiconductor Singapore Pte. Ltd. Microelectromechanical systems packages and methods for packaging a microelectromechanical systems device
TWI708424B (en) * 2019-07-04 2020-10-21 國家中山科學研究院 Direct attached switch device for active frequency selective surface and manufacturing method thereof
CN114586479A (en) 2019-10-30 2022-06-03 福珞尔系统公司 MEMS-based airflow system
US11510341B2 (en) * 2019-12-06 2022-11-22 Frore Systems Inc. Engineered actuators usable in MEMs active cooling devices
US11796262B2 (en) 2019-12-06 2023-10-24 Frore Systems Inc. Top chamber cavities for center-pinned actuators
CN113336187A (en) * 2020-02-14 2021-09-03 绍兴中芯集成电路制造股份有限公司 MEMS device packaging method and packaging structure
US11765863B2 (en) 2020-10-02 2023-09-19 Frore Systems Inc. Active heat sink
US20230068451A1 (en) * 2021-08-30 2023-03-02 Texas Instruments Incorporated Methods and apparatus to thermally actuate microelectromechanical structures devices
WO2023059519A2 (en) * 2021-10-04 2023-04-13 Formfactor, Inc. Thermal management techniques for high power integrated circuits operating in dry cryogenic environments

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5796152A (en) * 1997-01-24 1998-08-18 Roxburgh Ltd. Cantilevered microstructure
US5824186A (en) * 1993-12-17 1998-10-20 The Regents Of The University Of California Method and apparatus for fabricating self-assembling microstructures
US6316278B1 (en) * 1999-03-16 2001-11-13 Alien Technology Corporation Methods for fabricating a multiple modular assembly
US6324748B1 (en) * 1996-12-16 2001-12-04 Jds Uniphase Corporation Method of fabricating a microelectro mechanical structure having an arched beam

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2095911B (en) * 1981-03-17 1985-02-13 Standard Telephones Cables Ltd Electrical switch device
US4423401A (en) * 1982-07-21 1983-12-27 Tektronix, Inc. Thin-film electrothermal device
US5025346A (en) * 1989-02-17 1991-06-18 Regents Of The University Of California Laterally driven resonant microstructures
US5376772A (en) * 1990-08-31 1994-12-27 The Pilot Ink Co., Ltd. Electrothermal instrument with heat generating element of sintered BaTiO3 in contact with heat transmitting member
JP2804196B2 (en) * 1991-10-18 1998-09-24 株式会社日立製作所 Microsensor and control system using the same
US5479042A (en) * 1993-02-01 1995-12-26 Brooktree Corporation Micromachined relay and method of forming the relay
US5662771A (en) * 1994-12-01 1997-09-02 Analog Devices, Inc. Surface micromachining process
US5619177A (en) * 1995-01-27 1997-04-08 Mjb Company Shape memory alloy microactuator having an electrostatic force and heating means
US5597643A (en) * 1995-03-13 1997-01-28 Hestia Technologies, Inc. Multi-tier laminate substrate with internal heat spreader
US5629794A (en) * 1995-05-31 1997-05-13 Texas Instruments Incorporated Spatial light modulator having an analog beam for steering light
US5578976A (en) * 1995-06-22 1996-11-26 Rockwell International Corporation Micro electromechanical RF switch
US5717631A (en) * 1995-07-21 1998-02-10 Carnegie Mellon University Microelectromechanical structure and process of making same
GB2304918B (en) * 1995-08-30 1999-05-19 Daewoo Electronics Co Ltd Method for manufacturing a thin film actuated mirror having a stable elastic member
US5920391A (en) * 1995-10-27 1999-07-06 Schlumberger Industries, S.A. Tunable Fabry-Perot filter for determining gas concentration
US5638946A (en) * 1996-01-11 1997-06-17 Northeastern University Micromechanical switch with insulated switch contact
JPH09232465A (en) * 1996-02-27 1997-09-05 Fuji Kiko Denshi Kk Printed wiring board for mounting semiconductor
US5914801A (en) * 1996-09-27 1999-06-22 Mcnc Microelectromechanical devices including rotating plates and related methods
US6232847B1 (en) * 1997-04-28 2001-05-15 Rockwell Science Center, Llc Trimmable singleband and tunable multiband integrated oscillator using micro-electromechanical system (MEMS) technology
US5870007A (en) * 1997-06-16 1999-02-09 Roxburgh Ltd. Multi-dimensional physical actuation of microstructures
JP4240575B2 (en) 1998-05-15 2009-03-18 ヤマハ株式会社 Musical sound synthesis method, recording medium, and musical sound synthesizer
US6046659A (en) * 1998-05-15 2000-04-04 Hughes Electronics Corporation Design and fabrication of broadband surface-micromachined micro-electro-mechanical switches for microwave and millimeter-wave applications
US6154176A (en) * 1998-08-07 2000-11-28 Sarnoff Corporation Antennas formed using multilayer ceramic substrates
ES2248865T3 (en) * 1998-08-14 2006-03-16 Renata Ag SHORT CIRCUITS AND BATTERY BEHAVIORING THIS SHORT CIRCUITS.
US6040611A (en) * 1998-09-10 2000-03-21 Hughes Electonics Corporation Microelectromechanical device
JP2000188049A (en) * 1998-12-22 2000-07-04 Nec Corp Micro machine switch and manufacture thereof
US6236300B1 (en) * 1999-03-26 2001-05-22 R. Sjhon Minners Bistable micro-switch and method of manufacturing the same
US6229683B1 (en) * 1999-06-30 2001-05-08 Mcnc High voltage micromachined electrostatic switch
US6057520A (en) * 1999-06-30 2000-05-02 Mcnc Arc resistant high voltage micromachined electrostatic switch
US6175170B1 (en) * 1999-09-10 2001-01-16 Sridhar Kota Compliant displacement-multiplying apparatus for microelectromechanical systems
US6211598B1 (en) * 1999-09-13 2001-04-03 Jds Uniphase Inc. In-plane MEMS thermal actuator and associated fabrication methods
US6307452B1 (en) * 1999-09-16 2001-10-23 Motorola, Inc. Folded spring based micro electromechanical (MEM) RF switch
US6310339B1 (en) * 1999-10-28 2001-10-30 Hrl Laboratories, Llc Optically controlled MEM switches
US6396368B1 (en) * 1999-11-10 2002-05-28 Hrl Laboratories, Llc CMOS-compatible MEM switches and method of making
US6535318B1 (en) * 1999-11-12 2003-03-18 Jds Uniphase Corporation Integrated optoelectronic devices having pop-up mirrors therein and methods of forming and operating same
EP1153405B1 (en) * 1999-12-10 2006-09-13 Koninklijke Philips Electronics N.V. Electronic devices including micromechanical switches
US6229684B1 (en) * 1999-12-15 2001-05-08 Jds Uniphase Inc. Variable capacitor and associated fabrication method
US6367251B1 (en) * 2000-04-05 2002-04-09 Jds Uniphase Corporation Lockable microelectromechanical actuators using thermoplastic material, and methods of operating same
US6275325B1 (en) * 2000-04-07 2001-08-14 Microsoft Corporation Thermally activated microelectromechanical systems actuator
US6580170B2 (en) * 2000-06-22 2003-06-17 Texas Instruments Incorporated Semiconductor device protective overcoat with enhanced adhesion to polymeric materials
US6630367B1 (en) * 2000-08-01 2003-10-07 Hrl Laboratories, Llc Single crystal dual wafer, tunneling sensor and a method of making same
US6555404B1 (en) * 2000-08-01 2003-04-29 Hrl Laboratories, Llc Method of manufacturing a dual wafer tunneling gyroscope
US6708491B1 (en) * 2000-09-12 2004-03-23 3M Innovative Properties Company Direct acting vertical thermal actuator
US6531947B1 (en) * 2000-09-12 2003-03-11 3M Innovative Properties Company Direct acting vertical thermal actuator with controlled bending
US6483056B2 (en) * 2000-10-27 2002-11-19 Daniel J Hyman Microfabricated relay with multimorph actuator and electrostatic latch mechanism
US6504118B2 (en) * 2000-10-27 2003-01-07 Daniel J Hyman Microfabricated double-throw relay with multimorph actuator and electrostatic latch mechanism
US6538798B2 (en) * 2000-12-11 2003-03-25 Axsun Technologies, Inc. Process for fabricating stiction control bumps on optical membrane via conformal coating of etch holes
US6583374B2 (en) * 2001-02-20 2003-06-24 Rockwell Automation Technologies, Inc. Microelectromechanical system (MEMS) digital electrical isolator
US7280014B2 (en) * 2001-03-13 2007-10-09 Rochester Institute Of Technology Micro-electro-mechanical switch and a method of using and making thereof
US6522452B2 (en) * 2001-04-26 2003-02-18 Jds Uniphase Corporation Latchable microelectromechanical structures using non-newtonian fluids, and methods of operating same
US20020162685A1 (en) * 2001-05-07 2002-11-07 Jeffrey Gotro Thermal dissipating printed circuit board and methods
US6664885B2 (en) * 2001-08-31 2003-12-16 Adc Telecommunications, Inc. Thermally activated latch
EP1454349B1 (en) 2001-11-09 2006-09-27 WiSpry, Inc. Trilayered beam mems device and related methods

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5824186A (en) * 1993-12-17 1998-10-20 The Regents Of The University Of California Method and apparatus for fabricating self-assembling microstructures
US6324748B1 (en) * 1996-12-16 2001-12-04 Jds Uniphase Corporation Method of fabricating a microelectro mechanical structure having an arched beam
US5796152A (en) * 1997-01-24 1998-08-18 Roxburgh Ltd. Cantilevered microstructure
US6316278B1 (en) * 1999-03-16 2001-11-13 Alien Technology Corporation Methods for fabricating a multiple modular assembly

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8964280B2 (en) 2006-06-30 2015-02-24 Qualcomm Mems Technologies, Inc. Method of manufacturing MEMS devices providing air gap control

Also Published As

Publication number Publication date
DE60238956D1 (en) 2011-02-24
DE60215045T2 (en) 2007-03-29
US20040188785A1 (en) 2004-09-30
US20030116417A1 (en) 2003-06-26
ATE432240T1 (en) 2009-06-15
ATE417021T1 (en) 2008-12-15
DE60229675D1 (en) 2008-12-11
US6876047B2 (en) 2005-04-05
DE60217924T2 (en) 2007-08-02
CN1695233A (en) 2005-11-09
US6847114B2 (en) 2005-01-25
DE60215045D1 (en) 2006-11-09
EP1454349A4 (en) 2005-03-16
EP1454349A2 (en) 2004-09-08
CN100550429C (en) 2009-10-14
ATE341098T1 (en) 2006-10-15
WO2003042721A3 (en) 2003-11-13
US20070158775A1 (en) 2007-07-12
EP1760746B1 (en) 2011-01-12
EP1454333A4 (en) 2005-09-21
DE60222468D1 (en) 2007-10-25
CN1613128A (en) 2005-05-04
US20030119221A1 (en) 2003-06-26
EP1454333B1 (en) 2007-09-12
WO2003040338A2 (en) 2003-05-15
EP1454349B1 (en) 2006-09-27
DE60217924D1 (en) 2007-03-15
US20040197960A1 (en) 2004-10-07
EP1461816B1 (en) 2007-01-24
US20030116851A1 (en) 2003-06-26
CN1292447C (en) 2006-12-27
WO2003043038A2 (en) 2003-05-22
WO2003043042A1 (en) 2003-05-22
AU2002363529A1 (en) 2003-05-19
EP1461816A2 (en) 2004-09-29
EP1461816A4 (en) 2005-03-30
WO2003040338A3 (en) 2003-10-02
US6876482B2 (en) 2005-04-05
ATE412611T1 (en) 2008-11-15
ATE524412T1 (en) 2011-09-15
CN100474519C (en) 2009-04-01
EP1717195A1 (en) 2006-11-02
US20040012298A1 (en) 2004-01-22
EP1760746A2 (en) 2007-03-07
EP1760036B1 (en) 2012-06-13
EP1717194A1 (en) 2006-11-02
US8420427B2 (en) 2013-04-16
EP1760036A1 (en) 2007-03-07
WO2003043044A1 (en) 2003-05-22
WO2003043038A3 (en) 2004-07-15
ATE495538T1 (en) 2011-01-15
CN1613154A (en) 2005-05-04
US6917086B2 (en) 2005-07-12
US20030116848A1 (en) 2003-06-26
DE60232471D1 (en) 2009-07-09
EP1760746A3 (en) 2007-03-14
WO2003042721A2 (en) 2003-05-22
EP1721866B1 (en) 2008-12-10
EP1721866A1 (en) 2006-11-15
AU2002359369A1 (en) 2003-05-26
US6882264B2 (en) 2005-04-19
EP1717193B1 (en) 2008-10-29
ATE372955T1 (en) 2007-09-15
EP1454333A1 (en) 2004-09-08
EP1717195B1 (en) 2011-09-14
EP1717194B1 (en) 2009-05-27
DE60230341D1 (en) 2009-01-22
EP1717193A1 (en) 2006-11-02
WO2003041133A2 (en) 2003-05-15
DE60222468T2 (en) 2008-06-12
US6746891B2 (en) 2004-06-08
US20030117257A1 (en) 2003-06-26
AU2002359370A1 (en) 2003-05-26
US8264054B2 (en) 2012-09-11
ATE352854T1 (en) 2007-02-15

Similar Documents

Publication Publication Date Title
WO2003041133A3 (en) Electrothermal self-latching mems switch and method
AU2001249055A1 (en) Microelectromechanical micro-relay with liquid metal contacts
WO2002055431A3 (en) Wafer level interconnection
NZ510707A (en) Pushbutton switch with magnetically coupled armature
EP1391906A3 (en) Electrostatic RF mems switches
WO2004097910A3 (en) Multi-stable micro electromechanical switches and methods of fabricating same
EP1202311A3 (en) Slide switch
EP2151839B1 (en) Electrical pushbutton snap switch
WO1999050863A3 (en) Fabricating and using a micromachined magnetostatic relay or switch
EP1720183A4 (en) Switch and device using the switch
WO2005024868A3 (en) Mems switch with bistable element having straight beam components
WO2005038988A3 (en) Flexible magnetically coupled pushbutton switch
WO2006068744A3 (en) Liquid metal switch employing micro-electromechanical system (mems) structures for actuation
AU2001274371A1 (en) Bistable electrical switch and relay with a bistable electrical switch
AU4021901A (en) Low current high temperature switch contacts
ATE336798T1 (en) ELECTROMAGNETIC RELAY
WO2005015594A3 (en) Bistable micromechanical switch, actuating method and corresponding method for realizing the same
WO2004025680A3 (en) High power electrical contactor with improved bridge contact mechanism
HK1078984A1 (en) Switch contact arrangement with an erosion displayfor the switch contacts
WO2004095483A3 (en) Wetting finger latching piezoelectric relay
WO2004095484A3 (en) Reducing oxides in a fluid-based switch
EP1686600A3 (en) Two pole switch
AU2003289779A1 (en) Electrical switch with limited contact arcing
WO2008030355A3 (en) Programmable polyelectrolyte electrical switches
EP1039578A3 (en) Switch

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LU MC NL PT SE SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP