WO2003025628A3 - Enhance thermal stability through optical segmentation - Google Patents

Enhance thermal stability through optical segmentation Download PDF

Info

Publication number
WO2003025628A3
WO2003025628A3 PCT/US2002/023855 US0223855W WO03025628A3 WO 2003025628 A3 WO2003025628 A3 WO 2003025628A3 US 0223855 W US0223855 W US 0223855W WO 03025628 A3 WO03025628 A3 WO 03025628A3
Authority
WO
WIPO (PCT)
Prior art keywords
reflective
regions
patterned
ribbon
primary
Prior art date
Application number
PCT/US2002/023855
Other languages
French (fr)
Other versions
WO2003025628A2 (en
Inventor
Ilan Blech
Omar Leung
Original Assignee
Silicon Light Machines Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silicon Light Machines Inc filed Critical Silicon Light Machines Inc
Priority to JP2003529203A priority Critical patent/JP4420277B2/en
Priority to EP02750336A priority patent/EP1425622A4/en
Publication of WO2003025628A2 publication Critical patent/WO2003025628A2/en
Publication of WO2003025628A3 publication Critical patent/WO2003025628A3/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1828Diffraction gratings having means for producing variable diffraction
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0808Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements

Abstract

The current invention is directed to devices and systems with patterned reflective surfaces. The reflective surfaces are patterned with primary reflective regions (507) and gap regions (505). The gap regions (505) for separation between reflective material within adjacent primary reflective regions (507). The separation between reflective material reduces atomic flux which can lead to the depletion of the reflective material within regions of the reflective surface that are exposed to an intense light source. The primary reflective regions (507) are preferably formed from a reflective material such as aluminum, silver, gold or platinum. The gap regions (505) are left vacant or deposited with second material which is non-reflective, reflective or semi-reflective. The patterned reflective surface is preferably formed on a micro-structure, such an elongated ribbon. The patterned ribbon structure is preferably one of a plurality patterned ribbon structures in a grating light valve device (500).
PCT/US2002/023855 2001-08-16 2002-07-26 Enhance thermal stability through optical segmentation WO2003025628A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003529203A JP4420277B2 (en) 2001-08-16 2002-07-26 Enhanced thermal stability by optical resolution
EP02750336A EP1425622A4 (en) 2001-08-16 2002-07-26 Enhance thermal stability through optical segmentation

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/931,674 2001-08-16
US09/931,674 US6587253B2 (en) 2001-08-16 2001-08-16 Enhance thermal stability through optical segmentation

Publications (2)

Publication Number Publication Date
WO2003025628A2 WO2003025628A2 (en) 2003-03-27
WO2003025628A3 true WO2003025628A3 (en) 2003-07-10

Family

ID=25461165

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/023855 WO2003025628A2 (en) 2001-08-16 2002-07-26 Enhance thermal stability through optical segmentation

Country Status (4)

Country Link
US (1) US6587253B2 (en)
EP (1) EP1425622A4 (en)
JP (1) JP4420277B2 (en)
WO (1) WO2003025628A2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6782205B2 (en) 2001-06-25 2004-08-24 Silicon Light Machines Method and apparatus for dynamic equalization in wavelength division multiplexing
US6829092B2 (en) 2001-08-15 2004-12-07 Silicon Light Machines, Inc. Blazed grating light valve
US6785001B2 (en) 2001-08-21 2004-08-31 Silicon Light Machines, Inc. Method and apparatus for measuring wavelength jitter of light signal
US6768589B2 (en) 2001-12-21 2004-07-27 Polychromix Corporation Method and apparatus providing reduced polarization-dependent loss
US6800238B1 (en) 2002-01-15 2004-10-05 Silicon Light Machines, Inc. Method for domain patterning in low coercive field ferroelectrics
US20030223748A1 (en) * 2002-02-20 2003-12-04 Stowe Timothy D. System and method for seamless spectral control
US6822797B1 (en) 2002-05-31 2004-11-23 Silicon Light Machines, Inc. Light modulator structure for producing high-contrast operation using zero-order light
US6813059B2 (en) 2002-06-28 2004-11-02 Silicon Light Machines, Inc. Reduced formation of asperities in contact micro-structures
US6801354B1 (en) 2002-08-20 2004-10-05 Silicon Light Machines, Inc. 2-D diffraction grating for substantially eliminating polarization dependent losses
US6712480B1 (en) 2002-09-27 2004-03-30 Silicon Light Machines Controlled curvature of stressed micro-structures
US7027202B1 (en) * 2003-02-28 2006-04-11 Silicon Light Machines Corp Silicon substrate as a light modulator sacrificial layer
US6806997B1 (en) * 2003-02-28 2004-10-19 Silicon Light Machines, Inc. Patterned diffractive light modulator ribbon for PDL reduction
US6829077B1 (en) 2003-02-28 2004-12-07 Silicon Light Machines, Inc. Diffractive light modulator with dynamically rotatable diffraction plane
JP2005197659A (en) * 2003-12-08 2005-07-21 Sony Corp Optical apparatus and image forming apparatus
US20060171386A1 (en) * 2004-09-01 2006-08-03 Interactic Holdings, Llc Means and apparatus for a scaleable congestion free switching system with intelligent control III
US9482755B2 (en) 2008-11-17 2016-11-01 Faro Technologies, Inc. Measurement system having air temperature compensation between a target and a laser tracker
US9772394B2 (en) 2010-04-21 2017-09-26 Faro Technologies, Inc. Method and apparatus for following an operator and locking onto a retroreflector with a laser tracker
US9377885B2 (en) 2010-04-21 2016-06-28 Faro Technologies, Inc. Method and apparatus for locking onto a retroreflector with a laser tracker
US9400170B2 (en) 2010-04-21 2016-07-26 Faro Technologies, Inc. Automatic measurement of dimensional data within an acceptance region by a laser tracker
US20140340750A1 (en) * 2011-02-14 2014-11-20 Faro Technologies, Inc. Cube Corner Retroreflector For Measuring Six Degrees of Freedom
GB2511236B (en) 2011-03-03 2015-01-28 Faro Tech Inc Target apparatus and method
GB2504890A (en) 2011-04-15 2014-02-12 Faro Tech Inc Enhanced position detector in laser tracker
US9482529B2 (en) 2011-04-15 2016-11-01 Faro Technologies, Inc. Three-dimensional coordinate scanner and method of operation
US9686532B2 (en) 2011-04-15 2017-06-20 Faro Technologies, Inc. System and method of acquiring three-dimensional coordinates using multiple coordinate measurement devices
CN104094081A (en) 2012-01-27 2014-10-08 法罗技术股份有限公司 Inspection method with barcode identification
WO2014104001A1 (en) * 2012-12-26 2014-07-03 株式会社ニコン Spatial light modulator and method for driving same, and exposure method and device
US9041914B2 (en) 2013-03-15 2015-05-26 Faro Technologies, Inc. Three-dimensional coordinate scanner and method of operation
US9395174B2 (en) 2014-06-27 2016-07-19 Faro Technologies, Inc. Determining retroreflector orientation by optimizing spatial fit

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439731A (en) * 1994-03-11 1995-08-08 Cornell Research Goundation, Inc. Interconnect structures containing blocked segments to minimize stress migration and electromigration damage
US5841579A (en) * 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve

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Publication number Priority date Publication date Assignee Title
US5311360A (en) * 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
US5661592A (en) * 1995-06-07 1997-08-26 Silicon Light Machines Method of making and an apparatus for a flat diffraction grating light valve
US5949570A (en) * 1995-06-20 1999-09-07 Matsushita Electric Industrial Co., Ltd. Diffractive optical modulator and method for producing the same, infrared sensor including such a diffractive optical modulator and method for producing the same, and display device including such a diffractive optical modulator
US5999319A (en) * 1997-05-02 1999-12-07 Interscience, Inc. Reconfigurable compound diffraction grating
US6288829B1 (en) * 1998-10-05 2001-09-11 Fuji Photo Film, Co., Ltd. Light modulation element, array-type light modulation element, and flat-panel display unit
US6233087B1 (en) * 1998-12-18 2001-05-15 Eastman Kodak Company Electro-mechanical grating device
US6307663B1 (en) * 2000-01-26 2001-10-23 Eastman Kodak Company Spatial light modulator with conformal grating device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439731A (en) * 1994-03-11 1995-08-08 Cornell Research Goundation, Inc. Interconnect structures containing blocked segments to minimize stress migration and electromigration damage
US5841579A (en) * 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve

Also Published As

Publication number Publication date
WO2003025628A2 (en) 2003-03-27
US20030035195A1 (en) 2003-02-20
EP1425622A4 (en) 2007-05-02
JP4420277B2 (en) 2010-02-24
US6587253B2 (en) 2003-07-01
EP1425622A2 (en) 2004-06-09
JP2005503581A (en) 2005-02-03

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