WO2003023462A1 - Production de donnees de motif depourvues de tout chevauchement ou de toute separation excessive des motifs de points adjacents les uns aux autres - Google Patents

Production de donnees de motif depourvues de tout chevauchement ou de toute separation excessive des motifs de points adjacents les uns aux autres Download PDF

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Publication number
WO2003023462A1
WO2003023462A1 PCT/JP2002/009012 JP0209012W WO03023462A1 WO 2003023462 A1 WO2003023462 A1 WO 2003023462A1 JP 0209012 W JP0209012 W JP 0209012W WO 03023462 A1 WO03023462 A1 WO 03023462A1
Authority
WO
WIPO (PCT)
Prior art keywords
pattern data
basic
coordinates
coordinate
overlapping
Prior art date
Application number
PCT/JP2002/009012
Other languages
English (en)
French (fr)
Inventor
Hiroshi Kanoh
Teruaki Suzuki
Original Assignee
Nec Corporation
Nec Lcd Technologies, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Corporation, Nec Lcd Technologies, Ltd. filed Critical Nec Corporation
Priority to JP2003527470A priority Critical patent/JP4309265B2/ja
Priority to KR1020047003409A priority patent/KR100675077B1/ko
Priority to EP02767890A priority patent/EP1429159A4/en
Priority to US10/487,496 priority patent/US7612847B2/en
Publication of WO2003023462A1 publication Critical patent/WO2003023462A1/ja
Priority to US12/384,267 priority patent/US7855766B2/en
Priority to US12/462,710 priority patent/US7787079B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
PCT/JP2002/009012 2001-09-07 2002-09-05 Production de donnees de motif depourvues de tout chevauchement ou de toute separation excessive des motifs de points adjacents les uns aux autres WO2003023462A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2003527470A JP4309265B2 (ja) 2001-09-07 2002-09-05 隣接するドットパターン同士の重なりや離れすぎのないパターンデータの生成
KR1020047003409A KR100675077B1 (ko) 2001-09-07 2002-09-05 인접하는 도트 패턴간 겹침이나 과도한 멀어짐이 없는 패턴 데이터의 생성
EP02767890A EP1429159A4 (en) 2001-09-07 2002-09-05 GENERATION OF PATTERN DATA FREE OF ANY OVERLAPPING OR EXCEPTIONAL SEPARATION OF SPOT PATTERNS
US10/487,496 US7612847B2 (en) 2001-09-07 2002-09-05 Generation of pattern data with no overlapping or excessive distance between adjacent patterns
US12/384,267 US7855766B2 (en) 2001-09-07 2009-04-02 Generation of pattern data with no overlapping or excessive distance between adjacent patterns
US12/462,710 US7787079B2 (en) 2001-09-07 2009-08-07 Generation of pattern data with no overlapping or excessive distance between adjacent dot patterns

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001272165 2001-09-07
JP2001-272165 2001-09-07

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US10487496 A-371-Of-International 2002-09-05
US12/384,267 Division US7855766B2 (en) 2001-09-07 2009-04-02 Generation of pattern data with no overlapping or excessive distance between adjacent patterns
US12/462,710 Division US7787079B2 (en) 2001-09-07 2009-08-07 Generation of pattern data with no overlapping or excessive distance between adjacent dot patterns

Publications (1)

Publication Number Publication Date
WO2003023462A1 true WO2003023462A1 (fr) 2003-03-20

Family

ID=19097575

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/009012 WO2003023462A1 (fr) 2001-09-07 2002-09-05 Production de donnees de motif depourvues de tout chevauchement ou de toute separation excessive des motifs de points adjacents les uns aux autres

Country Status (7)

Country Link
US (3) US7612847B2 (ja)
EP (1) EP1429159A4 (ja)
JP (1) JP4309265B2 (ja)
KR (1) KR100675077B1 (ja)
CN (1) CN1324331C (ja)
TW (1) TW567392B (ja)
WO (1) WO2003023462A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005215641A (ja) * 2004-02-02 2005-08-11 Shin Sti Technology Kk 拡散反射板及びフォトマスク

Families Citing this family (14)

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Publication number Priority date Publication date Assignee Title
TW567392B (en) * 2001-09-07 2003-12-21 Nec Corp Device for generating ragged pattern data in random arrangement, computer program, mask and manufacturing device, light reflection member manufacturing device, liquid crystal manufacturing device, liquid crystal display device, portable terminal device
JP2006133625A (ja) * 2004-11-09 2006-05-25 Nec Lcd Technologies Ltd 反射板及び該反射板を備える液晶表示装置
US7670726B2 (en) * 2006-07-20 2010-03-02 Zhijian Lu Optical diffusers, photomasks and their methods of fabrication
JP4883525B2 (ja) 2006-08-02 2012-02-22 Ｎｌｔテクノロジー株式会社 反射板及び液晶表示装置
US7593829B2 (en) * 2007-05-16 2009-09-22 Honeywell International Inc. Method for generating pseudo-random pattern designs for optical position determination systems
US8068136B2 (en) * 2007-05-16 2011-11-29 Honeywell International Inc. Method and system for determining angular position of an object
KR101115095B1 (ko) * 2009-03-03 2012-02-16 주식회사 엘지화학 불규칙한 분포의 구형 패턴을 갖는 확산 필름의 설계 방법
US8494221B2 (en) * 2011-04-28 2013-07-23 Honeywell International Inc. Inverse star tracker using psuedo-random overlapping circles
TWI552384B (zh) * 2011-08-31 2016-10-01 Asahi Kasei E Materials Corp Resin mold
KR101278347B1 (ko) * 2012-08-22 2013-06-25 주식회사 세코닉스 비정형 패턴을 갖는 광학필름 및 그 제조방법
TWI623776B (zh) 2012-12-17 2018-05-11 Ｌｇ伊諾特股份有限公司 設計光學基板的方法
KR101480892B1 (ko) * 2014-11-13 2015-01-13 아이벡스랩 주식회사 인증 패턴 결정 방법 및 그 방법을 이용한 결제 방법
CN107025106B (zh) * 2016-11-02 2020-08-04 阿里巴巴集团控股有限公司 一种图形绘制方法及装置
US10885233B2 (en) 2018-04-23 2021-01-05 Milliken & Company Systems and methods for generating textiles with repeating patterns

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Publication number Priority date Publication date Assignee Title
JPS59208536A (ja) * 1983-05-12 1984-11-26 Canon Inc フオ−カシングスクリ−ンの製造方法
US5733710A (en) * 1991-12-03 1998-03-31 Asahi Kogaku Kogyo Kabushiki Kaisha Method for manufacturing a master die for a diffusion plate and diffusion plate manufactured by said method
US5936688A (en) * 1996-02-27 1999-08-10 Sharp Kabushiki Kaisha Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same
JP2000292785A (ja) * 1999-03-04 2000-10-20 Samsung Electronics Co Ltd 反射型液晶表示装置及びその製造方法
JP2000338480A (ja) * 1999-05-28 2000-12-08 Kyocera Corp 反射型液晶表示装置の製法

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JP3375352B2 (ja) 1991-12-03 2003-02-10 ペンタックス株式会社 拡散板および拡散板用母型の作製方法
US5965327A (en) 1991-12-03 1999-10-12 Asahi Kogaku Kogyo Kaisha Method for manufacturing a master die for a diffusion plate and diffusion manufactured by said method
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US5965235A (en) * 1996-11-08 1999-10-12 The Procter & Gamble Co. Three-dimensional, amorphous-patterned, nesting-resistant sheet materials and method and apparatus for making same
US6219113B1 (en) * 1996-12-17 2001-04-17 Matsushita Electric Industrial Co., Ltd. Method and apparatus for driving an active matrix display panel
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US6421052B1 (en) * 1999-04-09 2002-07-16 The Procter & Gamble Company Method of seaming and expanding amorphous patterns
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KR100768271B1 (ko) * 2001-03-22 2007-10-17 삼성전자주식회사 모아레 현상을 제거하기 위한 반사형 액정표시어셈블리에서의 조명방법, 이를 적용한 반사형 액정표시어셈블리, 이들에 적용된 광 공급 유닛, 이에 적용된 광분포 변경 유닛의 제조방법
TW567392B (en) * 2001-09-07 2003-12-21 Nec Corp Device for generating ragged pattern data in random arrangement, computer program, mask and manufacturing device, light reflection member manufacturing device, liquid crystal manufacturing device, liquid crystal display device, portable terminal device
JP2003122267A (ja) * 2001-10-04 2003-04-25 Koninkl Philips Electronics Nv 光反射体及びそれを用いた表示装置
US7173659B2 (en) * 2001-12-13 2007-02-06 International Business Machines Corporation System and method for anti-moire imaging
WO2004027497A1 (ja) * 2002-09-20 2004-04-01 Hitachi Displays, Ltd. 半透過反射型液晶表示装置
ATE423991T1 (de) * 2004-01-05 2009-03-15 Tpo Hong Kong Holding Ltd Reflektive struktur und bildanzeigeeinrichtung
JP2005321610A (ja) * 2004-05-10 2005-11-17 Alps Electric Co Ltd 反射型双安定ネマティック液晶表示装置
JP4768393B2 (ja) * 2005-10-21 2011-09-07 Ｎｅｃ液晶テクノロジー株式会社 液晶表示装置およびその製造方法
JP2010080280A (ja) * 2008-09-26 2010-04-08 Sony Corp 面光源装置及び表示装置

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Publication number Priority date Publication date Assignee Title
JPS59208536A (ja) * 1983-05-12 1984-11-26 Canon Inc フオ−カシングスクリ−ンの製造方法
US5733710A (en) * 1991-12-03 1998-03-31 Asahi Kogaku Kogyo Kabushiki Kaisha Method for manufacturing a master die for a diffusion plate and diffusion plate manufactured by said method
US5936688A (en) * 1996-02-27 1999-08-10 Sharp Kabushiki Kaisha Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same
JP2000292785A (ja) * 1999-03-04 2000-10-20 Samsung Electronics Co Ltd 反射型液晶表示装置及びその製造方法
JP2000338480A (ja) * 1999-05-28 2000-12-08 Kyocera Corp 反射型液晶表示装置の製法

Non-Patent Citations (1)

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Title
See also references of EP1429159A4 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005215641A (ja) * 2004-02-02 2005-08-11 Shin Sti Technology Kk 拡散反射板及びフォトマスク
JP4512378B2 (ja) * 2004-02-02 2010-07-28 住友化学株式会社 拡散反射板の製造方法

Also Published As

Publication number Publication date
KR100675077B1 (ko) 2007-01-29
CN1554029A (zh) 2004-12-08
TW567392B (en) 2003-12-21
JP4309265B2 (ja) 2009-08-05
CN1324331C (zh) 2007-07-04
JPWO2003023462A1 (ja) 2004-12-24
EP1429159A1 (en) 2004-06-16
US20040239844A1 (en) 2004-12-02
US7787079B2 (en) 2010-08-31
US7855766B2 (en) 2010-12-21
KR20040044864A (ko) 2004-05-31
US7612847B2 (en) 2009-11-03
US20090322757A1 (en) 2009-12-31
US20090228539A1 (en) 2009-09-10
EP1429159A4 (en) 2008-07-16

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