WO2003007076A3 - Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds - Google Patents

Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds Download PDF

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Publication number
WO2003007076A3
WO2003007076A3 PCT/US2002/015762 US0215762W WO03007076A3 WO 2003007076 A3 WO2003007076 A3 WO 2003007076A3 US 0215762 W US0215762 W US 0215762W WO 03007076 A3 WO03007076 A3 WO 03007076A3
Authority
WO
WIPO (PCT)
Prior art keywords
diazonium salt
salt containing
containing compound
alkoxy
aromatic diazonium
Prior art date
Application number
PCT/US2002/015762
Other languages
French (fr)
Other versions
WO2003007076A2 (en
Inventor
Stephan J Platzer
Maria T Sypek
Paul Perron
Harald Baumann
Melinda Alden
Original Assignee
Kodac Polychrome Graphics L L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodac Polychrome Graphics L L filed Critical Kodac Polychrome Graphics L L
Publication of WO2003007076A2 publication Critical patent/WO2003007076A2/en
Publication of WO2003007076A3 publication Critical patent/WO2003007076A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins

Abstract

The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1. Upon imagewise exposure and development, an imaged element is obtained, which is mounted on a dry printing press containing lithographic ink and used to produce printed stock.
PCT/US2002/015762 2001-07-12 2002-05-20 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds WO2003007076A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/904,205 US6638679B2 (en) 2001-07-12 2001-07-12 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds
US09/904,205 2001-07-12

Publications (2)

Publication Number Publication Date
WO2003007076A2 WO2003007076A2 (en) 2003-01-23
WO2003007076A3 true WO2003007076A3 (en) 2003-03-27

Family

ID=25418765

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/015762 WO2003007076A2 (en) 2001-07-12 2002-05-20 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds

Country Status (2)

Country Link
US (2) US6638679B2 (en)
WO (1) WO2003007076A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6638679B2 (en) * 2001-07-12 2003-10-28 Kodak Polychrome Graphics, Llc Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds
US7018909B2 (en) * 2003-02-28 2006-03-28 S.O.I.Tec Silicon On Insulator Technologies S.A. Forming structures that include a relaxed or pseudo-relaxed layer on a substrate
TW200616967A (en) 2004-06-24 2006-06-01 Smithkline Beecham Corp Novel indazole carboxamides and their use
UA99699C2 (en) 2005-06-30 2012-09-25 Смитклайн Бичам Корпорейшн Indole carboxamide derivatives and pharmaceutical composition comprising thereof
US8063071B2 (en) 2007-10-31 2011-11-22 GlaxoSmithKline, LLC Chemical compounds
AR065804A1 (en) 2007-03-23 2009-07-01 Smithkline Beecham Corp COMPOSITE OF INDOL CARBOXAMIDE, PHARMACEUTICAL COMPOSITION THAT UNDERSTANDS IT AND USE OF THIS COMPOUND TO PREPARE A MEDICINAL PRODUCT
EP2406249A1 (en) 2009-03-10 2012-01-18 Glaxo Group Limited Indole derivatives as ikk2 inhibitors
WO2020203312A1 (en) 2019-03-29 2020-10-08 日東電工株式会社 Polarization film, polarization plate, and production method for said polarization film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533620A (en) * 1982-03-18 1985-08-06 American Hoechst Corporation Light sensitive co-condensates

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL273556A (en) 1961-01-25
US3849392A (en) 1969-05-20 1974-11-19 Kalle Ag Process for the production of polycondensation products of aromatic diazonium compounds
US3867147A (en) 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
LU75749A1 (en) 1976-09-08 1978-04-27
US4408532A (en) 1980-04-30 1983-10-11 Minnesota Mining And Manufacturing Company Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer
JPH02277695A (en) 1989-04-20 1990-11-14 Fuji Photo Film Co Ltd Thermal transfer image receiving material
JP3317574B2 (en) * 1994-03-15 2002-08-26 富士写真フイルム株式会社 Negative image recording material
DE69608734T2 (en) * 1995-02-15 2000-11-23 Agfa Gevaert Nv Diazo recording element with improved storage stability
JPH09160233A (en) 1995-11-17 1997-06-20 Hoechst Ag Radiation-sensitive recording material for manufacture of planographic printing plate
US5919601A (en) 1996-11-12 1999-07-06 Kodak Polychrome Graphics, Llc Radiation-sensitive compositions and printing plates
US5846685A (en) 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
EP0896251A1 (en) 1997-07-28 1999-02-10 Agfa-Gevaert N.V. Method of making a lithographic printing plate
DE69804179T2 (en) 1997-09-10 2002-11-28 Fuji Photo Film Co Ltd Photosensitive composition
US6638679B2 (en) * 2001-07-12 2003-10-28 Kodak Polychrome Graphics, Llc Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533620A (en) * 1982-03-18 1985-08-06 American Hoechst Corporation Light sensitive co-condensates

Also Published As

Publication number Publication date
US20040063022A1 (en) 2004-04-01
US6861196B2 (en) 2005-03-01
US20030013035A1 (en) 2003-01-16
US6638679B2 (en) 2003-10-28
WO2003007076A2 (en) 2003-01-23

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