WO2002099166A1 - Electrolyte and method for manufacturing and/or refining of silicon - Google Patents

Electrolyte and method for manufacturing and/or refining of silicon Download PDF

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Publication number
WO2002099166A1
WO2002099166A1 PCT/NO2002/000195 NO0200195W WO02099166A1 WO 2002099166 A1 WO2002099166 A1 WO 2002099166A1 NO 0200195 W NO0200195 W NO 0200195W WO 02099166 A1 WO02099166 A1 WO 02099166A1
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WO
WIPO (PCT)
Prior art keywords
silicon
melt
cao
electrolyte
cathode
Prior art date
Application number
PCT/NO2002/000195
Other languages
French (fr)
Inventor
Espen Olsen
Original Assignee
Sintef
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintef filed Critical Sintef
Priority to CA002449659A priority Critical patent/CA2449659A1/en
Priority to JP2003502269A priority patent/JP2004532933A/en
Priority to US10/477,747 priority patent/US20040238372A1/en
Priority to EP02731017A priority patent/EP1402086A1/en
Publication of WO2002099166A1 publication Critical patent/WO2002099166A1/en

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/33Silicon

Abstract

Electrolyte for the manufacture or refinery of silicon at high temperatures, particularly suited for the manufacture of high grade silicon. The electrolyte mainly comprises a salt melt of CaC12 and Cao. The invention further concerns a method for the manufacture of silicon in a salt melt at high temperature, in which quartz with a low content of phosphorous and boron is subjected to electrolysis in such a melt. Finally the invention concerns a method for the refinery of silicon, where the silicon to be refined is used as an alloy element for the anode to be used in an electrolytic cell comprising a melt as defined above.

Description

Electrolyte and method for manufacturing and/or refining of silicon.
The present invention relates to an electrolyte. The invention further relates to a method for the manufacture of or refining of silicon, by which the electrolyte is utilized.
Background
Silicon may in terms of quality be divided into three categories, silicon for metallurgical purposes, high-grade silicon for solar cell production (SoG-Si) and extremely high- grade silicon for electronic purposes.
The different quality levels of silicon are manufactured by different methods and varying conditions. With respect to the SoG-Si for solar cells, this quality has predominantly been produced from scrap resulting from the manufacture of the even higher grade silicon for electronic purposes. As long as this source for solar cells is sufficiently large to cover the market need, the price has been at an acceptable level. This is partly due to the fact that the price tolerance of the silicon for electronic purposes is very high in relation to the silicon for use in solar cells.
The demand for solar cell silicon is increasing, however, and already within 2001 access to raw material in the form of scrap from the electronics industiy may be too small to cover demand.
Electrochemical production of Si from quartz dissolved in a cryolite melt is described e.g. in PCT patent publication No. WO 95/ 33870. The cryolite melt has the advantageous property that it dissolves silicon dioxide well and that it is inexpensive. It is thus convenient for the manufacture of metallurgic grade silicon with a typical purity of 99.5 - 99.7%, provided there is no requirement for absence of particular kinds of impurities. This method has, however, severe drawbacks when it comes to the manufacture of high grade silicon. The cryolite melt is extremely corrosive, particularly at high temperatures, as a consequence of its fluoride content. Therefore the range of allowable electrode materials in such a melt is very limited. In practice only carbon electrodes have been able to be utilized for this purpose. Carbon electrodes are encumbered with certain disadvantages related to manufacture of very pure silicon as they tend to contaminate the melt, and thus the silicon produced therefrom, with traces of boron and phosphorous. These elements, which are found as trace elements in carbon, are not removable from the product by any known purification method, which renders silicon manufactured this way very difficult to use for the purposes of solar cells.
In addition substantial amounts of the cryolite melt deposits with the product, and this contamination is also very difficult to remove from the silicon by any lαiown refining or purification method.
Objective
It is thus an object of the present invention to provide a method for the manufacture of solar cell quality silicon (SoG-Si), i.e. with a maximum allowable content of B and P in the magnitude of 1 ppm.
It is a further object of the invention to provide a method of this type that is based on electrolysis and where contaminations included in the product are of a kind that are easily removable in a subsequent purification step.
It is a still further object of the invention to provide a method of this type that is simple and inexpensive, so that the resulting product may be produced at a reasonable cost.
These and other objects are achieved by means of the electrolyte and the method according to the invention.
The invention
The invention thus concerns an electrolyte as defined by claim 1.
The invention also concerns a method for the manufacture of silicon as defined by claim 4.
Finally the invention concerns a method for the refinery of silicon as defined by claim 10.
Preferred embodiments of the invention are disclosed by the dependent claims. According to phase diagrams a melt of CaCl2 will be able to dissolve SiO2 in an amount sufficient for the salt to serve as an electrolyte in a process of the kind mentioned above, and more precisely in the magnitude of 5%. It was, however, discovered during the work leading to the present invention, that said phase diagrams are incorrect. Pure CaCl2 dissolves SiO, only to a very limited degree, namely in the magnitude of 0.1 %. CaCl2 is highly hygroscopic, and a possible source of error for the known phase diagram(s) may be that the measurements have been conducted with a not completely pure CaCl2, which means that oxygen in the form of water may have been included in the melt.
It has been found as part of the present invention that addition of comparatively modest amounts of CaO to CaCl2 provides a melt that dissolves SiO2 to an extent that is fully satisfactory. Already at a 5% content of CaO the solubility is in the range of 3-4%, which is more than sufficient for the purpose. Acceptable solubilities were found already at concentrations lower than this. The underlying chemistry is not fully understood for this melt more than for other melts, but there is reason to believe that the SiO2 combines with CaO in an unknown stoichiometry. Such compounds complicate the deposition of metal from the melt. For the process according to the invention, this has, however, proved in practice to not be a problem.
A possible disadvantage of chloride based melts for electrolysis of dissolved oxides, is that significant amounts of chlorine gas develop at the anode. Thermodynamically oxygen should form before chloride, but kinetical relations will in practice decide the relative amounts of these gases. Therefore it is convenient to use an anode material that promotes the development of oxygen and inhibits the development of chloride gas. Carbon is an example of an anode material that is well suited for this purpose, but as mentioned above it has the disadvantage that it (usually) contains phosphorous and boron that easily transfer to the product. Some carbon sources may, however, be well suited as anode material for the method according to the invention.
In addition to carbon with a particularly low content of phosphorous and boron, modified nickel ferrite, doped tin oxide or an oxidation resistant metal alloy chosen among the metals, tungsten, silver, gold, platinum and palladium, may be used as anode material. Generally it is convenient to use inert, i.e. non-consumable, anodes. As cathode material, e.g. silicon or alloys containing silicon are well suited. Silicon alone has, however, an inconveniently low electrical conductivity , which is why some amount of metal, e.g. calcium, is preferably added. The amount of calcium in such an alloy may vary typically from a few per cent to e.g. 30%. The amount need not exceed a few per cent, typically 5% or less. Other materials that by experience may be included in such alloys, are tungsten, nickel and iron. Iron or tungsten have proved to be particularly advantageous, as well as alloys including silicon and said metals, as these metals/ alloys do not react with metals that deposit in the process, particularly calcium.
It is important that contaminations that occur in the silicon deposited on the cathode may easily be removed by simple methods to a comparatively high degree of purity.
The process may - with less purification - be competitive also with production processes of silicon of a lower quality than the solar cell quality.
According to one aspect, the invention may be utilized for refining silicon of an arbitrary degree of purity. According to this embodiment of the invention an alloy of the "impure" silicon together with another metal is used as anode in an electrolyte of said type. Particularly preferred is an alloy of copper and silicon. When such a process is run, nearly pure silicon will migrate through the electrolyte from the anode to the cathode and be deposited on the latter electrode as part of the production process. The contaminations will almost exclusively remain in the anode.
Examples
Two simple examples were conducted without any particular optimization of the electrodes, in order to get an indication of the electrolyte's suitability for the process. The test conditions are listed in table 1.
Table 1 : Test conditions
Figure imgf000006_0001
Silicon manufactured during the test runs were analysed with respect to phosphorus and boron according to test method (Ar-ICP-AE). The measurements were controlled against a pure electronic grade silicon. The results are shown in table 2.
Table 2: Test results
The results of tests la and lb indicates a certain content of phosphorous, which mainly origins from the raw materials. Typically the CaO would contain some phosphorous. With respect to boron, the very low levels found in the test runs la and lb indicate that the method works according to the expectations with platinum anode and CaSi cathode. Test 2 shows an undesired high content of boron with respect to the use of the material for electronic purposes. This content mainly originates from the electrodes.
In general these tests show that the electrolyte and the method as such work according to expectations, but that the choice of electrodes needs to be adapted and optimized according to the desired purity of the end product.

Claims

Claims
1. Electrolyte for the manufacture of or refinery of silicon at high temperatures, characterized in that it mainly comprises a salt melt of CaCl2 and CaO.
2. Electrolyte as claimed in claim 1, characterized in that the CaO constitutes 0,5-15% calculated on the basis of the entire melt, while the rest of the melt is preferably CaCl2.
3. Electrolyte as claimed in claim 1, characterized in that the CaO constitutes 2-5% calculated on the basis of the entire melt, while the rest of the melt is preferably CaO,.
4. Method for the manufacture of silicon in a salt melt at high temperatures, characterized in that quartz with a low content of phosphorous and boron is subjected to electrolysis in a melt of CaCl2 and CaO.
5. Method as claimed in claim 4, characterized in that the electrodes used in the process are substantially inert.
6. Method as claimed in claim 4, characterized in that silicon or silicon-containing alloys are used as cathode material.
7. Method as claimed in claim 6, characterized in that an alloy of silicon with some amounts of calcium is used as cathode material.
8. Method as claimed in claim 6, characterized in that iron and/ or tungsten or alloys of these materials are used as cathode material.
9. Method as claimed in claim 4, characterized in that nickel ferrite, doped tin oxide, carbon or an oxidation resistant alloy of metals chosen from tungsten, silver or the noble metals platinum and palladium is used as anode material.
10. Method as claimed in claim 9, characterized in that nickel ferrite cermet containing copper and nickel or antimony- doped tin oxide is used as anode material.
11. Method for the refinery of silicon at a high temperature, characterized in that the silicon to be refined is used as an alloy element in the anode in an electrolytic cell comprising a melt of CaCl2 and CaO.
12. Method as claimed in claim 11, characterized in that a substantially inert material is used for the cathode.
13. Method as claimed in claim 12, characterized in that silicon or silicon-containing alloys are used as cathode.
14. Method as claimed in claim 12 or 13, characterized in that that an alloy of silicon with some calcium is used as cathode.
PCT/NO2002/000195 2001-06-05 2002-06-03 Electrolyte and method for manufacturing and/or refining of silicon WO2002099166A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CA002449659A CA2449659A1 (en) 2001-06-05 2002-06-03 Electrolyte and method for manufacturing and/or refining of silicon
JP2003502269A JP2004532933A (en) 2001-06-05 2002-06-03 Electrolyte and method for producing and / or purifying silicon
US10/477,747 US20040238372A1 (en) 2001-06-05 2002-06-03 Electrolyte and method for manufacturing and/or refining of silicon
EP02731017A EP1402086A1 (en) 2001-06-05 2002-06-03 Electrolyte and method for manufacturing and/or refining of silicon

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NO20012749 2001-06-05
NO20012749A NO317073B1 (en) 2001-06-05 2001-06-05 Electrolyte and process for the manufacture or refining of silicon

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EP (1) EP1402086A1 (en)
JP (1) JP2004532933A (en)
CA (1) CA2449659A1 (en)
NO (1) NO317073B1 (en)
WO (1) WO2002099166A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005063621A1 (en) * 2003-12-29 2005-07-14 Elkem Asa Silicon feedstock for solar cells
NL1031734C2 (en) * 2006-05-03 2007-11-06 Girasolar B V Process for purifying a semiconductor material using an oxidation-reduction reaction.
JP2010530637A (en) * 2007-06-18 2010-09-09 アール・イー・シー・スキャンウェハー・アー・エス Method to regenerate elemental silicon from cutting residue
CN101967649A (en) * 2010-09-09 2011-02-09 昆明理工大学 Method for preparing silicon from composite molten salt electrolyte
CN103173780A (en) * 2013-03-01 2013-06-26 中南大学 Method and device for preparing solar polycrystalline silicon material by semi-continuous molten salt electrolysis
US10147836B2 (en) 2012-05-31 2018-12-04 Board Of Regents Of The University Of Texas System Production of thin film solar grade silicon on metals by electrodeposition from silicon dioxide in a molten salt

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JP4765066B2 (en) * 2005-05-19 2011-09-07 国立大学法人京都大学 Method for producing silicon
CA2645161C (en) * 2006-03-10 2011-11-22 Elkem As Method for electrolytic production and refining of metals
JP2010523450A (en) * 2007-04-05 2010-07-15 ソルヴェイ(ソシエテ アノニム) High purity calcium compound
US7872676B2 (en) * 2007-07-13 2011-01-18 Micron Technology, Inc. Methods, systems, and devices for offset compensation in CMOC imagers
CN101736354B (en) * 2008-11-06 2011-11-16 北京有色金属研究总院 Method for preparing one or more of silicon nano power, silicon nanowires and silicon nanotubes by electrochemical method
CN101979712A (en) * 2010-12-01 2011-02-23 武汉大学 Method for preparing elemental silicon
US20180291513A1 (en) * 2017-04-11 2018-10-11 Wisconsin Alumni Research Foundation Low temperature electrochemical production of silicon
CN110629241B (en) * 2019-09-16 2021-06-22 上海大学 Silicon material manufacturing method

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FR2480796A1 (en) * 1980-04-21 1981-10-23 Extramet Sarl High purity silicon deposit formation - by electrolytic deposition from alkali (ne earth) metal halide melt contg. dissolved silicon
US4699704A (en) * 1985-02-13 1987-10-13 Hiroshi Ishizuka Electrolytic cell for a molten salt
US4738759A (en) * 1984-10-05 1988-04-19 Extramet S.A. Zone Industrielle Method for producing calcium or calcium alloys and silicon of high purity
WO1997027143A1 (en) * 1996-01-22 1997-07-31 Jan Reidar Stubergh Production of high purity silicon metal, aluminium, their alloys, silicon carbide and aluminium oxide from alkali alkaline earth alumino silicates

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GB833767A (en) * 1956-10-19 1960-04-27 Timax Corp Continuous electrolytic production of titanium
US3003934A (en) * 1959-01-08 1961-10-10 Timax Associates Process for the electrolytic production of metals
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Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
FR2480796A1 (en) * 1980-04-21 1981-10-23 Extramet Sarl High purity silicon deposit formation - by electrolytic deposition from alkali (ne earth) metal halide melt contg. dissolved silicon
US4738759A (en) * 1984-10-05 1988-04-19 Extramet S.A. Zone Industrielle Method for producing calcium or calcium alloys and silicon of high purity
US4699704A (en) * 1985-02-13 1987-10-13 Hiroshi Ishizuka Electrolytic cell for a molten salt
WO1997027143A1 (en) * 1996-01-22 1997-07-31 Jan Reidar Stubergh Production of high purity silicon metal, aluminium, their alloys, silicon carbide and aluminium oxide from alkali alkaline earth alumino silicates

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7381392B2 (en) 2003-12-29 2008-06-03 Elkem As Silicon feedstock for solar cells
EP2607308A1 (en) * 2003-12-29 2013-06-26 Elkem AS Silicon feedstock for solar cells
US7931883B2 (en) 2003-12-29 2011-04-26 Elkem As Silicon feedstock for solar cells
WO2005063621A1 (en) * 2003-12-29 2005-07-14 Elkem Asa Silicon feedstock for solar cells
EA009791B1 (en) * 2003-12-29 2008-04-28 Элкем Ас Silicon feedstock for solar cells
WO2007126309A3 (en) * 2006-05-03 2008-04-03 Girasolar B V Method for the purification of a semiconductor material by application of an oxidation-reduction reaction
WO2007126309A2 (en) * 2006-05-03 2007-11-08 Girasolar B.V. Method for the purification of a semiconductor material by application of an oxidation-reduction reaction
NL1031734C2 (en) * 2006-05-03 2007-11-06 Girasolar B V Process for purifying a semiconductor material using an oxidation-reduction reaction.
JP2010530637A (en) * 2007-06-18 2010-09-09 アール・イー・シー・スキャンウェハー・アー・エス Method to regenerate elemental silicon from cutting residue
DE112008001644T5 (en) 2007-06-18 2010-09-09 Rec Scan Wafer As Process for recovering elemental silicon from cutting residues
CN101967649A (en) * 2010-09-09 2011-02-09 昆明理工大学 Method for preparing silicon from composite molten salt electrolyte
US10147836B2 (en) 2012-05-31 2018-12-04 Board Of Regents Of The University Of Texas System Production of thin film solar grade silicon on metals by electrodeposition from silicon dioxide in a molten salt
CN103173780A (en) * 2013-03-01 2013-06-26 中南大学 Method and device for preparing solar polycrystalline silicon material by semi-continuous molten salt electrolysis
CN103173780B (en) * 2013-03-01 2015-06-03 中南大学 Method and device for preparing solar polycrystalline silicon material by semi-continuous molten salt electrolysis

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CA2449659A1 (en) 2002-12-12
NO317073B1 (en) 2004-08-02
NO20012749L (en) 2002-12-06
JP2004532933A (en) 2004-10-28
US20040238372A1 (en) 2004-12-02
EP1402086A1 (en) 2004-03-31
NO20012749D0 (en) 2001-06-05

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