WO2002084720A3 - Dispositif d'exposition, systeme de traitement de substrat et procede permettant de produire ce dispositif - Google Patents
Dispositif d'exposition, systeme de traitement de substrat et procede permettant de produire ce dispositif Download PDFInfo
- Publication number
- WO2002084720A3 WO2002084720A3 PCT/JP2002/003318 JP0203318W WO02084720A3 WO 2002084720 A3 WO2002084720 A3 WO 2002084720A3 JP 0203318 W JP0203318 W JP 0203318W WO 02084720 A3 WO02084720 A3 WO 02084720A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- main body
- supported
- unit
- body unit
- points
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2002246319A AU2002246319A1 (en) | 2001-04-06 | 2002-04-03 | Exposure device and substrate processing system and device producing method |
US10/310,036 US6853443B2 (en) | 2001-04-06 | 2002-12-05 | Exposure apparatus, substrate processing system, and device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001108334A JP2002305140A (ja) | 2001-04-06 | 2001-04-06 | 露光装置及び基板処理システム |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/310,036 Continuation US6853443B2 (en) | 2001-04-06 | 2002-12-05 | Exposure apparatus, substrate processing system, and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002084720A2 WO2002084720A2 (fr) | 2002-10-24 |
WO2002084720A3 true WO2002084720A3 (fr) | 2007-10-25 |
Family
ID=18960494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/003318 WO2002084720A2 (fr) | 2001-04-06 | 2002-04-03 | Dispositif d'exposition, systeme de traitement de substrat et procede permettant de produire ce dispositif |
Country Status (6)
Country | Link |
---|---|
US (1) | US6853443B2 (ja) |
JP (1) | JP2002305140A (ja) |
KR (1) | KR20030011296A (ja) |
CN (1) | CN1636268A (ja) |
AU (1) | AU2002246319A1 (ja) |
WO (1) | WO2002084720A2 (ja) |
Families Citing this family (65)
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JP2004286099A (ja) * | 2003-03-20 | 2004-10-14 | Yaskawa Electric Corp | 制振装置 |
AU2003219097A1 (en) | 2003-03-26 | 2004-10-18 | Carl Zeiss Smt Ag | Device for the low-deformation replaceable mounting of an optical element |
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SG139736A1 (en) | 2003-04-11 | 2008-02-29 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
KR20060009957A (ko) | 2003-05-27 | 2006-02-01 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스의 제조 방법 |
WO2004109357A1 (ja) * | 2003-06-06 | 2004-12-16 | Nikon Corporation | 光学素子保持装置、鏡筒、露光装置、及びデバイスの製造方法 |
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CN102944981A (zh) * | 2003-07-09 | 2013-02-27 | 株式会社尼康 | 曝光装置、器件制造方法 |
KR101209540B1 (ko) | 2003-07-09 | 2012-12-07 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
CN102323724B (zh) * | 2003-07-28 | 2014-08-13 | 株式会社尼康 | 液浸曝光装置及其制造方法、曝光装置、器件制造方法 |
TWI474132B (zh) | 2003-10-28 | 2015-02-21 | 尼康股份有限公司 | 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法 |
TWI612338B (zh) | 2003-11-20 | 2018-01-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
WO2005054953A2 (en) * | 2003-11-24 | 2005-06-16 | Carl-Zeiss Smt Ag | Holding device for an optical element in an objective |
US7697222B2 (en) * | 2003-12-25 | 2010-04-13 | Nikon Corporation | Apparatus for holding optical element, barrel, exposure apparatus, and device producing method |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
TWI360837B (en) | 2004-02-06 | 2012-03-21 | Nikon Corp | Polarization changing device, optical illumination |
JP4710308B2 (ja) * | 2004-10-29 | 2011-06-29 | 株式会社ニコン | レチクル搬送装置、露光装置、及びレチクルの搬送方法 |
US7417714B2 (en) * | 2004-11-02 | 2008-08-26 | Nikon Corporation | Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage |
US7869000B2 (en) * | 2004-11-02 | 2011-01-11 | Nikon Corporation | Stage assembly with lightweight fine stage and low transmissibility |
KR20070085764A (ko) * | 2004-11-04 | 2007-08-27 | 가부시키가이샤 니콘 | 미동 스테이지 z 지지 장치 |
WO2006080516A1 (ja) * | 2005-01-31 | 2006-08-03 | Nikon Corporation | 露光装置及びデバイス製造方法 |
USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
KR101455551B1 (ko) | 2005-05-12 | 2014-10-27 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
WO2006133800A1 (en) | 2005-06-14 | 2006-12-21 | Carl Zeiss Smt Ag | Lithography projection objective, and a method for correcting image defects of the same |
US20070030462A1 (en) * | 2005-08-03 | 2007-02-08 | Nikon Corporation | Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers |
US8953148B2 (en) * | 2005-12-28 | 2015-02-10 | Nikon Corporation | Exposure apparatus and making method thereof |
JP2007294594A (ja) * | 2006-04-24 | 2007-11-08 | Nsk Ltd | 露光装置及び露光方法 |
US7936443B2 (en) * | 2006-05-09 | 2011-05-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20080073596A1 (en) * | 2006-08-24 | 2008-03-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
TWI596444B (zh) * | 2006-08-31 | 2017-08-21 | 尼康股份有限公司 | Exposure method and device, and device manufacturing method |
US8908144B2 (en) * | 2006-09-27 | 2014-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100779372B1 (ko) * | 2006-12-06 | 2007-11-23 | 동부일렉트로닉스 주식회사 | 진동측정수단이 구비된 노광장치 및 진동저감방법 |
WO2008078688A1 (ja) * | 2006-12-27 | 2008-07-03 | Nikon Corporation | ステージ装置、露光装置、及びデバイスの製造方法 |
JP5013906B2 (ja) * | 2007-03-05 | 2012-08-29 | キヤノン株式会社 | 光学素子保持装置 |
KR100866447B1 (ko) * | 2007-06-19 | 2008-10-31 | 주식회사 동부하이텍 | 반도체 장치 제조용 노광 장치 |
US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
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JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
CN101681123B (zh) | 2007-10-16 | 2013-06-12 | 株式会社尼康 | 照明光学系统、曝光装置以及元件制造方法 |
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US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
NL1036167A1 (nl) | 2007-11-20 | 2009-05-25 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
JP5097166B2 (ja) | 2008-05-28 | 2012-12-12 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及び装置の動作方法 |
KR101695034B1 (ko) | 2008-05-28 | 2017-01-10 | 가부시키가이샤 니콘 | 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법 |
NL1036957A1 (nl) * | 2008-06-13 | 2009-12-15 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
JP5126076B2 (ja) * | 2009-01-08 | 2013-01-23 | 富士通株式会社 | 位置測定装置、成膜方法並びに成膜プログラム及び成膜装置 |
JP5534910B2 (ja) * | 2009-04-23 | 2014-07-02 | ギガフォトン株式会社 | 極端紫外光源装置 |
DE102009026187A1 (de) * | 2009-07-16 | 2011-01-27 | Hseb Dresden Gmbh | Inspektionssystem |
US8892222B2 (en) * | 2009-07-17 | 2014-11-18 | Diversitech Equipment And Sales (1984) Ltd. | Fume extraction system with automatic fume hood positioning |
WO2011074649A1 (ja) * | 2009-12-18 | 2011-06-23 | 株式会社ニコン | 基板処理装置のメンテナンス方法および安全装置 |
EP2447777B1 (en) * | 2010-10-27 | 2019-08-07 | ASML Netherlands BV | Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method |
CN102955368B (zh) * | 2011-08-22 | 2015-09-30 | 上海微电子装备有限公司 | 一种步进光刻设备及光刻曝光方法 |
TWI463593B (zh) * | 2012-01-18 | 2014-12-01 | Himax Tech Ltd | 對位系統 |
US9242313B2 (en) | 2012-07-30 | 2016-01-26 | General Electric Company | Welding furnace and viewport assembly |
JP5398040B1 (ja) * | 2012-08-03 | 2014-01-29 | Necアクセステクニカ株式会社 | 画像読取装置および集光部材 |
JP6254180B2 (ja) * | 2012-11-30 | 2017-12-27 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 振動が制御される基板ハンドリングロボット、システム及び方法 |
US9368378B2 (en) * | 2013-12-31 | 2016-06-14 | Sophia Wen | Semiconductor wafer cleaning system |
US9176070B2 (en) * | 2014-04-07 | 2015-11-03 | Hseb Dresden Gmbh | Inspection assembly |
CN106507684B (zh) | 2014-06-16 | 2020-01-10 | Asml荷兰有限公司 | 光刻设备、转移衬底的方法和器件制造方法 |
CN107407889B (zh) * | 2015-03-03 | 2019-04-12 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
WO2016167339A1 (ja) * | 2015-04-17 | 2016-10-20 | 株式会社ニコン | 露光システム |
JP7360308B2 (ja) * | 2019-11-25 | 2023-10-12 | キヤノン株式会社 | 露光装置、露光方法、および物品製造方法 |
CN111427148B (zh) * | 2020-04-01 | 2022-02-22 | 北京航空航天大学 | 一种麦克斯韦力驱动的快速偏摆镜 |
CN117250832B (zh) * | 2023-11-15 | 2024-02-23 | 福建安芯半导体科技有限公司 | 一种精密定位平台及光刻机 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09297018A (ja) * | 1996-05-07 | 1997-11-18 | Nikon Corp | 位置検出装置 |
WO2000014779A1 (fr) * | 1998-09-03 | 2000-03-16 | Nikon Corporation | Appareil et procede d'exposition, dispositif et procede de production dudit appareil |
JP2000206279A (ja) * | 1999-01-11 | 2000-07-28 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
JP2001023885A (ja) * | 1999-07-08 | 2001-01-26 | Nikon Corp | 露光装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69608204T2 (de) * | 1995-05-30 | 2001-01-04 | Asm Lithography Bv | Lithographisches gerät mit einem sowie horizontal als auch vertikal justierbaren maskenhalter |
TW318255B (ja) | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
SG102627A1 (en) | 1996-11-28 | 2004-03-26 | Nikon Corp | Lithographic device |
JPH11315883A (ja) * | 1998-04-30 | 1999-11-16 | Canon Inc | 除振装置、露光装置およびデバイス製造方法 |
US6529260B2 (en) * | 2001-05-03 | 2003-03-04 | Nikon Corporation | Lifting support assembly for an exposure apparatus |
-
2001
- 2001-04-06 JP JP2001108334A patent/JP2002305140A/ja active Pending
-
2002
- 2002-04-03 CN CNA028010620A patent/CN1636268A/zh active Pending
- 2002-04-03 KR KR1020027013491A patent/KR20030011296A/ko not_active Application Discontinuation
- 2002-04-03 AU AU2002246319A patent/AU2002246319A1/en not_active Abandoned
- 2002-04-03 WO PCT/JP2002/003318 patent/WO2002084720A2/ja active Application Filing
- 2002-12-05 US US10/310,036 patent/US6853443B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09297018A (ja) * | 1996-05-07 | 1997-11-18 | Nikon Corp | 位置検出装置 |
WO2000014779A1 (fr) * | 1998-09-03 | 2000-03-16 | Nikon Corporation | Appareil et procede d'exposition, dispositif et procede de production dudit appareil |
JP2000206279A (ja) * | 1999-01-11 | 2000-07-28 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
JP2001023885A (ja) * | 1999-07-08 | 2001-01-26 | Nikon Corp | 露光装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2002305140A (ja) | 2002-10-18 |
US20030117596A1 (en) | 2003-06-26 |
KR20030011296A (ko) | 2003-02-07 |
AU2002246319A1 (en) | 2002-10-28 |
AU2002246319A8 (en) | 2008-01-03 |
US6853443B2 (en) | 2005-02-08 |
CN1636268A (zh) | 2005-07-06 |
WO2002084720A2 (fr) | 2002-10-24 |
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