WO2002084720A2 - Dispositif d'exposition, systeme de traitement de substrat et procede permettant de produire ce dispositif - Google Patents
Dispositif d'exposition, systeme de traitement de substrat et procede permettant de produire ce dispositif Download PDFInfo
- Publication number
- WO2002084720A2 WO2002084720A2 PCT/JP2002/003318 JP0203318W WO02084720A2 WO 2002084720 A2 WO2002084720 A2 WO 2002084720A2 JP 0203318 W JP0203318 W JP 0203318W WO 02084720 A2 WO02084720 A2 WO 02084720A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- main body
- supported
- unit
- body unit
- points
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU2002246319A AU2002246319A1 (en) | 2001-04-06 | 2002-04-03 | Exposure device and substrate processing system and device producing method |
| US10/310,036 US6853443B2 (en) | 2001-04-06 | 2002-12-05 | Exposure apparatus, substrate processing system, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001108334A JP2002305140A (ja) | 2001-04-06 | 2001-04-06 | 露光装置及び基板処理システム |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/310,036 Continuation US6853443B2 (en) | 2001-04-06 | 2002-12-05 | Exposure apparatus, substrate processing system, and device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2002084720A2 true WO2002084720A2 (fr) | 2002-10-24 |
| WO2002084720A3 WO2002084720A3 (fr) | 2007-10-25 |
Family
ID=18960494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2002/003318 WO2002084720A2 (fr) | 2001-04-06 | 2002-04-03 | Dispositif d'exposition, systeme de traitement de substrat et procede permettant de produire ce dispositif |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6853443B2 (ja) |
| JP (1) | JP2002305140A (ja) |
| KR (1) | KR20030011296A (ja) |
| CN (1) | CN1636268A (ja) |
| AU (1) | AU2002246319A1 (ja) |
| WO (1) | WO2002084720A2 (ja) |
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| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
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| US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| US8462317B2 (en) | 2007-10-16 | 2013-06-11 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
| US8520291B2 (en) | 2007-10-16 | 2013-08-27 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
| US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US8675177B2 (en) | 2003-04-09 | 2014-03-18 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas |
| US8854601B2 (en) | 2005-05-12 | 2014-10-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US9097981B2 (en) | 2007-10-12 | 2015-08-04 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| US9140993B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9164209B2 (en) | 2003-11-20 | 2015-10-20 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction |
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| JP2004286099A (ja) * | 2003-03-20 | 2004-10-14 | Yaskawa Electric Corp | 制振装置 |
| AU2003219097A1 (en) | 2003-03-26 | 2004-10-18 | Carl Zeiss Smt Ag | Device for the low-deformation replaceable mounting of an optical element |
| JPWO2004107416A1 (ja) | 2003-05-27 | 2006-07-20 | 株式会社ニコン | 露光装置及びデバイスの製造方法 |
| CN100576003C (zh) * | 2003-06-06 | 2009-12-30 | 株式会社尼康 | 光学元件保持装置、镜筒、曝光装置及设备的制造方法 |
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| JP4710308B2 (ja) * | 2004-10-29 | 2011-06-29 | 株式会社ニコン | レチクル搬送装置、露光装置、及びレチクルの搬送方法 |
| US7869000B2 (en) * | 2004-11-02 | 2011-01-11 | Nikon Corporation | Stage assembly with lightweight fine stage and low transmissibility |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000014779A1 (fr) * | 1998-09-03 | 2000-03-16 | Nikon Corporation | Appareil et procede d'exposition, dispositif et procede de production dudit appareil |
| JP2000206279A (ja) * | 1999-01-11 | 2000-07-28 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
| JP2001023885A (ja) * | 1999-07-08 | 2001-01-26 | Nikon Corp | 露光装置 |
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| CN1244021C (zh) * | 1996-11-28 | 2006-03-01 | 株式会社尼康 | 光刻装置和曝光方法 |
| JPH11315883A (ja) * | 1998-04-30 | 1999-11-16 | Canon Inc | 除振装置、露光装置およびデバイス製造方法 |
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-
2001
- 2001-04-06 JP JP2001108334A patent/JP2002305140A/ja active Pending
-
2002
- 2002-04-03 KR KR1020027013491A patent/KR20030011296A/ko not_active Application Discontinuation
- 2002-04-03 AU AU2002246319A patent/AU2002246319A1/en not_active Abandoned
- 2002-04-03 CN CNA028010620A patent/CN1636268A/zh active Pending
- 2002-04-03 WO PCT/JP2002/003318 patent/WO2002084720A2/ja active Application Filing
- 2002-12-05 US US10/310,036 patent/US6853443B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2000014779A1 (fr) * | 1998-09-03 | 2000-03-16 | Nikon Corporation | Appareil et procede d'exposition, dispositif et procede de production dudit appareil |
| JP2000206279A (ja) * | 1999-01-11 | 2000-07-28 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
| JP2001023885A (ja) * | 1999-07-08 | 2001-01-26 | Nikon Corp | 露光装置 |
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Also Published As
| Publication number | Publication date |
|---|---|
| AU2002246319A8 (en) | 2008-01-03 |
| WO2002084720A3 (fr) | 2007-10-25 |
| KR20030011296A (ko) | 2003-02-07 |
| JP2002305140A (ja) | 2002-10-18 |
| AU2002246319A1 (en) | 2002-10-28 |
| CN1636268A (zh) | 2005-07-06 |
| US6853443B2 (en) | 2005-02-08 |
| US20030117596A1 (en) | 2003-06-26 |
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