WO2002084422A3 - System and method for dividing flow - Google Patents

System and method for dividing flow Download PDF

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Publication number
WO2002084422A3
WO2002084422A3 PCT/US2001/050374 US0150374W WO02084422A3 WO 2002084422 A3 WO2002084422 A3 WO 2002084422A3 US 0150374 W US0150374 W US 0150374W WO 02084422 A3 WO02084422 A3 WO 02084422A3
Authority
WO
WIPO (PCT)
Prior art keywords
flow
flow rate
gas
line
mass flow
Prior art date
Application number
PCT/US2001/050374
Other languages
French (fr)
Other versions
WO2002084422A2 (en
Inventor
Matthew Thomas Taylor
John Christopher Hallahan
William R Clark
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Priority to DE10197206T priority Critical patent/DE10197206B4/en
Priority to GB0319100A priority patent/GB2389371B/en
Priority to KR1020037011130A priority patent/KR100855935B1/en
Priority to JP2002582301A priority patent/JP3926747B2/en
Publication of WO2002084422A2 publication Critical patent/WO2002084422A2/en
Publication of WO2002084422A3 publication Critical patent/WO2002084422A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y10T137/0363—For producing proportionate flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2514—Self-proportioning flow systems
    • Y10T137/2521—Flow comparison or differential response
    • Y10T137/2529—With electrical controller
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2514—Self-proportioning flow systems
    • Y10T137/2531—Flow displacement element actuates electrical controller
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2559—Self-controlled branched flow systems
    • Y10T137/265—Plural outflows
    • Y10T137/2657—Flow rate responsive

Abstract

A system (100) for dividing a single flow of gas into two or more secondary flows of known, precise values, without requiring a high upstream pressure. The system includes an inlet (12) for receiving the single gas flow, and first and second flow lines (14, 16) connected to the inlet (12). A mass flow meter (18) measures gas flow through the first line (14) and provides a signal indicative of the measured flow rate. A restrictor (28) restricts gas flow through the first line (14) to a desired flow rate, and has a smallest cross-sectional flow area selected to provide an upstream pressure high enough to allow the mass flow meter to operate properly and lower than a predetermined upper pressure limit. A mass flow controller (28) receives the signal indicative of the measured flow rate from the mass flow meter (18) and maintains a flow rate through the second line based on the signal.
PCT/US2001/050374 2001-04-17 2001-12-31 System and method for dividing flow WO2002084422A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE10197206T DE10197206B4 (en) 2001-04-17 2001-12-31 System and method for dividing a flow
GB0319100A GB2389371B (en) 2001-04-17 2001-12-31 System and Method for Dividing Flow
KR1020037011130A KR100855935B1 (en) 2001-04-17 2001-12-31 System and method for dividing flow
JP2002582301A JP3926747B2 (en) 2001-04-17 2001-12-31 System and method for splitting a flow

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/836,748 2001-04-17
US09/836,748 US6418954B1 (en) 2001-04-17 2001-04-17 System and method for dividing flow

Publications (2)

Publication Number Publication Date
WO2002084422A2 WO2002084422A2 (en) 2002-10-24
WO2002084422A3 true WO2002084422A3 (en) 2004-02-26

Family

ID=25272639

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/050374 WO2002084422A2 (en) 2001-04-17 2001-12-31 System and method for dividing flow

Country Status (6)

Country Link
US (1) US6418954B1 (en)
JP (1) JP3926747B2 (en)
KR (1) KR100855935B1 (en)
DE (1) DE10197206B4 (en)
GB (1) GB2389371B (en)
WO (1) WO2002084422A2 (en)

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US6752166B2 (en) * 2001-05-24 2004-06-22 Celerity Group, Inc. Method and apparatus for providing a determined ratio of process fluids
US6766260B2 (en) * 2002-01-04 2004-07-20 Mks Instruments, Inc. Mass flow ratio system and method
AU2003254050A1 (en) * 2002-07-22 2004-02-09 Mdc Vacuum Products Corporation High-vacuum valve with retractable valve plate to eliminate abrasion
US7534363B2 (en) * 2002-12-13 2009-05-19 Lam Research Corporation Method for providing uniform removal of organic material
US20040112540A1 (en) * 2002-12-13 2004-06-17 Lam Research Corporation Uniform etch system
US7169231B2 (en) 2002-12-13 2007-01-30 Lam Research Corporation Gas distribution system with tuning gas
US20040168719A1 (en) * 2003-02-28 2004-09-02 Masahiro Nambu System for dividing gas flow
JP4195837B2 (en) 2003-06-20 2008-12-17 東京エレクトロン株式会社 Gas diversion supply apparatus and gas diversion supply method
JP4177192B2 (en) * 2003-08-05 2008-11-05 株式会社日立ハイテクノロジーズ Plasma etching apparatus and plasma etching method
US20050075685A1 (en) * 2003-10-02 2005-04-07 Forsberg John W. Medical device programmer with infrared communication
US7072743B2 (en) * 2004-03-09 2006-07-04 Mks Instruments, Inc. Semiconductor manufacturing gas flow divider system and method
US20070066038A1 (en) 2004-04-30 2007-03-22 Lam Research Corporation Fast gas switching plasma processing apparatus
US7708859B2 (en) * 2004-04-30 2010-05-04 Lam Research Corporation Gas distribution system having fast gas switching capabilities
US7621290B2 (en) * 2005-04-21 2009-11-24 Mks Instruments, Inc. Gas delivery method and system including a flow ratio controller using antisymmetric optimal control
US7673645B2 (en) 2005-04-21 2010-03-09 Mks Instruments, Inc. Gas delivery method and system including a flow ratio controller using a multiple antisymmetric optimal control arrangement
US8997791B2 (en) * 2006-04-14 2015-04-07 Mks Instruments, Inc. Multiple-channel flow ratio controller
US9405298B2 (en) * 2006-11-20 2016-08-02 Applied Materials, Inc. System and method to divide fluid flow in a predetermined ratio
CA2678331A1 (en) 2007-01-30 2008-08-07 Bradley University A heat transfer apparatus and method
KR100872312B1 (en) * 2007-05-04 2008-12-05 주식회사 디엠에스 A control system for ecthing gas
US20090137192A1 (en) * 2007-11-28 2009-05-28 Mks Instruments, Inc. Multi-zone pressure control system
US8855899B2 (en) * 2008-05-15 2014-10-07 Garmin Switzerland Gmbh Virtual traffic sensors
DK2307938T3 (en) * 2008-06-26 2013-12-16 Belparts FLOW CONTROL SYSTEM
JP5457021B2 (en) * 2008-12-22 2014-04-02 東京エレクトロン株式会社 Mixed gas supply method and mixed gas supply device
JP5562712B2 (en) * 2010-04-30 2014-07-30 東京エレクトロン株式会社 Gas supply equipment for semiconductor manufacturing equipment
US8707754B2 (en) * 2010-04-30 2014-04-29 Applied Materials, Inc. Methods and apparatus for calibrating flow controllers in substrate processing systems
US20110265883A1 (en) * 2010-04-30 2011-11-03 Applied Materials, Inc. Methods and apparatus for reducing flow splitting errors using orifice ratio conductance control
US20110265951A1 (en) * 2010-04-30 2011-11-03 Applied Materials, Inc. Twin chamber processing system
JP2011248773A (en) * 2010-05-28 2011-12-08 Horiba Ltd Flow rate ratio control device
US10126760B2 (en) 2011-02-25 2018-11-13 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US9305810B2 (en) 2011-06-30 2016-04-05 Applied Materials, Inc. Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery
JP5739261B2 (en) * 2011-07-28 2015-06-24 株式会社堀場エステック Gas supply system
US8849466B2 (en) 2011-10-04 2014-09-30 Mks Instruments, Inc. Method of and apparatus for multiple channel flow ratio controller system
US20130255784A1 (en) * 2012-03-30 2013-10-03 Applied Materials, Inc. Gas delivery systems and methods of use thereof
KR101652469B1 (en) * 2015-02-27 2016-08-30 주식회사 유진테크 Method for multi-supplying gas and apparatus for multi-supplying gas
JP6543228B2 (en) * 2016-08-11 2019-07-10 Ckd株式会社 Gas diversion control system
US20180046206A1 (en) * 2016-08-13 2018-02-15 Applied Materials, Inc. Method and apparatus for controlling gas flow to a process chamber
KR101904110B1 (en) 2017-02-08 2018-10-04 엠케이프리시젼 주식회사 Annual Concentric flow restrict device
WO2019191428A1 (en) * 2018-03-30 2019-10-03 Lam Research Corporation Mems-based coriolis mass flow controller

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Also Published As

Publication number Publication date
DE10197206B4 (en) 2009-02-19
DE10197206T5 (en) 2004-04-22
KR20040008129A (en) 2004-01-28
US6418954B1 (en) 2002-07-16
KR100855935B1 (en) 2008-09-02
WO2002084422A2 (en) 2002-10-24
GB2389371B (en) 2005-06-01
GB2389371A (en) 2003-12-10
GB0319100D0 (en) 2003-09-17
JP3926747B2 (en) 2007-06-06
JP2005503603A (en) 2005-02-03

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