WO2002084422A3 - System and method for dividing flow - Google Patents
System and method for dividing flow Download PDFInfo
- Publication number
- WO2002084422A3 WO2002084422A3 PCT/US2001/050374 US0150374W WO02084422A3 WO 2002084422 A3 WO2002084422 A3 WO 2002084422A3 US 0150374 W US0150374 W US 0150374W WO 02084422 A3 WO02084422 A3 WO 02084422A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- flow
- flow rate
- gas
- line
- mass flow
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
- G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0363—For producing proportionate flow
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2496—Self-proportioning or correlating systems
- Y10T137/2514—Self-proportioning flow systems
- Y10T137/2521—Flow comparison or differential response
- Y10T137/2529—With electrical controller
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2496—Self-proportioning or correlating systems
- Y10T137/2514—Self-proportioning flow systems
- Y10T137/2531—Flow displacement element actuates electrical controller
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2496—Self-proportioning or correlating systems
- Y10T137/2559—Self-controlled branched flow systems
- Y10T137/265—Plural outflows
- Y10T137/2657—Flow rate responsive
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10197206T DE10197206B4 (en) | 2001-04-17 | 2001-12-31 | System and method for dividing a flow |
GB0319100A GB2389371B (en) | 2001-04-17 | 2001-12-31 | System and Method for Dividing Flow |
KR1020037011130A KR100855935B1 (en) | 2001-04-17 | 2001-12-31 | System and method for dividing flow |
JP2002582301A JP3926747B2 (en) | 2001-04-17 | 2001-12-31 | System and method for splitting a flow |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/836,748 | 2001-04-17 | ||
US09/836,748 US6418954B1 (en) | 2001-04-17 | 2001-04-17 | System and method for dividing flow |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002084422A2 WO2002084422A2 (en) | 2002-10-24 |
WO2002084422A3 true WO2002084422A3 (en) | 2004-02-26 |
Family
ID=25272639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/050374 WO2002084422A2 (en) | 2001-04-17 | 2001-12-31 | System and method for dividing flow |
Country Status (6)
Country | Link |
---|---|
US (1) | US6418954B1 (en) |
JP (1) | JP3926747B2 (en) |
KR (1) | KR100855935B1 (en) |
DE (1) | DE10197206B4 (en) |
GB (1) | GB2389371B (en) |
WO (1) | WO2002084422A2 (en) |
Families Citing this family (38)
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---|---|---|---|---|
US6752166B2 (en) * | 2001-05-24 | 2004-06-22 | Celerity Group, Inc. | Method and apparatus for providing a determined ratio of process fluids |
US6766260B2 (en) * | 2002-01-04 | 2004-07-20 | Mks Instruments, Inc. | Mass flow ratio system and method |
AU2003254050A1 (en) * | 2002-07-22 | 2004-02-09 | Mdc Vacuum Products Corporation | High-vacuum valve with retractable valve plate to eliminate abrasion |
US7534363B2 (en) * | 2002-12-13 | 2009-05-19 | Lam Research Corporation | Method for providing uniform removal of organic material |
US20040112540A1 (en) * | 2002-12-13 | 2004-06-17 | Lam Research Corporation | Uniform etch system |
US7169231B2 (en) | 2002-12-13 | 2007-01-30 | Lam Research Corporation | Gas distribution system with tuning gas |
US20040168719A1 (en) * | 2003-02-28 | 2004-09-02 | Masahiro Nambu | System for dividing gas flow |
JP4195837B2 (en) | 2003-06-20 | 2008-12-17 | 東京エレクトロン株式会社 | Gas diversion supply apparatus and gas diversion supply method |
JP4177192B2 (en) * | 2003-08-05 | 2008-11-05 | 株式会社日立ハイテクノロジーズ | Plasma etching apparatus and plasma etching method |
US20050075685A1 (en) * | 2003-10-02 | 2005-04-07 | Forsberg John W. | Medical device programmer with infrared communication |
US7072743B2 (en) * | 2004-03-09 | 2006-07-04 | Mks Instruments, Inc. | Semiconductor manufacturing gas flow divider system and method |
US20070066038A1 (en) | 2004-04-30 | 2007-03-22 | Lam Research Corporation | Fast gas switching plasma processing apparatus |
US7708859B2 (en) * | 2004-04-30 | 2010-05-04 | Lam Research Corporation | Gas distribution system having fast gas switching capabilities |
US7621290B2 (en) * | 2005-04-21 | 2009-11-24 | Mks Instruments, Inc. | Gas delivery method and system including a flow ratio controller using antisymmetric optimal control |
US7673645B2 (en) | 2005-04-21 | 2010-03-09 | Mks Instruments, Inc. | Gas delivery method and system including a flow ratio controller using a multiple antisymmetric optimal control arrangement |
US8997791B2 (en) * | 2006-04-14 | 2015-04-07 | Mks Instruments, Inc. | Multiple-channel flow ratio controller |
US9405298B2 (en) * | 2006-11-20 | 2016-08-02 | Applied Materials, Inc. | System and method to divide fluid flow in a predetermined ratio |
CA2678331A1 (en) | 2007-01-30 | 2008-08-07 | Bradley University | A heat transfer apparatus and method |
KR100872312B1 (en) * | 2007-05-04 | 2008-12-05 | 주식회사 디엠에스 | A control system for ecthing gas |
US20090137192A1 (en) * | 2007-11-28 | 2009-05-28 | Mks Instruments, Inc. | Multi-zone pressure control system |
US8855899B2 (en) * | 2008-05-15 | 2014-10-07 | Garmin Switzerland Gmbh | Virtual traffic sensors |
DK2307938T3 (en) * | 2008-06-26 | 2013-12-16 | Belparts | FLOW CONTROL SYSTEM |
JP5457021B2 (en) * | 2008-12-22 | 2014-04-02 | 東京エレクトロン株式会社 | Mixed gas supply method and mixed gas supply device |
JP5562712B2 (en) * | 2010-04-30 | 2014-07-30 | 東京エレクトロン株式会社 | Gas supply equipment for semiconductor manufacturing equipment |
US8707754B2 (en) * | 2010-04-30 | 2014-04-29 | Applied Materials, Inc. | Methods and apparatus for calibrating flow controllers in substrate processing systems |
US20110265883A1 (en) * | 2010-04-30 | 2011-11-03 | Applied Materials, Inc. | Methods and apparatus for reducing flow splitting errors using orifice ratio conductance control |
US20110265951A1 (en) * | 2010-04-30 | 2011-11-03 | Applied Materials, Inc. | Twin chamber processing system |
JP2011248773A (en) * | 2010-05-28 | 2011-12-08 | Horiba Ltd | Flow rate ratio control device |
US10126760B2 (en) | 2011-02-25 | 2018-11-13 | Mks Instruments, Inc. | System for and method of fast pulse gas delivery |
US9305810B2 (en) | 2011-06-30 | 2016-04-05 | Applied Materials, Inc. | Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery |
JP5739261B2 (en) * | 2011-07-28 | 2015-06-24 | 株式会社堀場エステック | Gas supply system |
US8849466B2 (en) | 2011-10-04 | 2014-09-30 | Mks Instruments, Inc. | Method of and apparatus for multiple channel flow ratio controller system |
US20130255784A1 (en) * | 2012-03-30 | 2013-10-03 | Applied Materials, Inc. | Gas delivery systems and methods of use thereof |
KR101652469B1 (en) * | 2015-02-27 | 2016-08-30 | 주식회사 유진테크 | Method for multi-supplying gas and apparatus for multi-supplying gas |
JP6543228B2 (en) * | 2016-08-11 | 2019-07-10 | Ckd株式会社 | Gas diversion control system |
US20180046206A1 (en) * | 2016-08-13 | 2018-02-15 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a process chamber |
KR101904110B1 (en) | 2017-02-08 | 2018-10-04 | 엠케이프리시젼 주식회사 | Annual Concentric flow restrict device |
WO2019191428A1 (en) * | 2018-03-30 | 2019-10-03 | Lam Research Corporation | Mems-based coriolis mass flow controller |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3092127A (en) * | 1958-12-01 | 1963-06-04 | Phillips Petroleum Co | Proportioning stream flows |
US4369031A (en) * | 1981-09-15 | 1983-01-18 | Thermco Products Corporation | Gas control system for chemical vapor deposition system |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1767588A (en) | 1927-04-15 | 1930-06-24 | Cutler Hammer Inc | Apparatus for proportioning and controlling the rates of flow of fluids |
US1886575A (en) | 1931-08-10 | 1932-11-08 | Smoot Engineering Corp | Multiple flow regulation |
US2314152A (en) | 1940-03-30 | 1943-03-16 | Brown Instr Co | Control instrument |
US2288297A (en) | 1940-04-02 | 1942-06-30 | Julius M Naiman | Method for controlling the flow of gases |
US2638912A (en) | 1947-11-21 | 1953-05-19 | Niles Bement Pond Co | Fluid distributing apparatus |
US2661756A (en) | 1951-04-05 | 1953-12-08 | Thompson Prod Inc | Flow control apparatus |
US2780414A (en) | 1952-11-27 | 1957-02-05 | Stamicarbon | Heat input stabilization |
CH380397A (en) | 1960-02-19 | 1964-07-31 | Sulzer Ag | Control arrangement for dividing a medium flow into at least two partial flows |
US3438385A (en) | 1965-01-21 | 1969-04-15 | Honeywell Inc | Flow blending control system |
US3556126A (en) | 1968-11-19 | 1971-01-19 | Ashland Oil Inc | Pipeline valve control system |
US3762428A (en) | 1971-11-15 | 1973-10-02 | Ocean Systems | Volumetric gas mixing system |
US4838295A (en) * | 1986-08-21 | 1989-06-13 | Airsensors, Inc. | System for controlling mass flow rates of two gases |
US5165450A (en) | 1991-12-23 | 1992-11-24 | Texaco Inc. | Means for separating a fluid stream into two separate streams |
US5307833A (en) | 1992-10-26 | 1994-05-03 | Texaco Inc. | Method and apparatus for automatically transferring and measuring wet steam between priority and secondary users |
US5453124A (en) | 1992-12-30 | 1995-09-26 | Texas Instruments Incorporated | Programmable multizone gas injector for single-wafer semiconductor processing equipment |
IT1275825B1 (en) | 1995-10-30 | 1997-10-17 | Nuovo Pignone Spa | IMPROVED SYSTEM FOR MEASUREMENT AND REGULATION OF GAS MASS FLOW RATE |
US5684245A (en) * | 1995-11-17 | 1997-11-04 | Mks Instruments, Inc. | Apparatus for mass flow measurement of a gas |
US6333272B1 (en) * | 2000-10-06 | 2001-12-25 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
-
2001
- 2001-04-17 US US09/836,748 patent/US6418954B1/en not_active Expired - Lifetime
- 2001-12-31 KR KR1020037011130A patent/KR100855935B1/en active IP Right Grant
- 2001-12-31 GB GB0319100A patent/GB2389371B/en not_active Expired - Fee Related
- 2001-12-31 WO PCT/US2001/050374 patent/WO2002084422A2/en active Application Filing
- 2001-12-31 JP JP2002582301A patent/JP3926747B2/en not_active Expired - Fee Related
- 2001-12-31 DE DE10197206T patent/DE10197206B4/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3092127A (en) * | 1958-12-01 | 1963-06-04 | Phillips Petroleum Co | Proportioning stream flows |
US4369031A (en) * | 1981-09-15 | 1983-01-18 | Thermco Products Corporation | Gas control system for chemical vapor deposition system |
Also Published As
Publication number | Publication date |
---|---|
DE10197206B4 (en) | 2009-02-19 |
DE10197206T5 (en) | 2004-04-22 |
KR20040008129A (en) | 2004-01-28 |
US6418954B1 (en) | 2002-07-16 |
KR100855935B1 (en) | 2008-09-02 |
WO2002084422A2 (en) | 2002-10-24 |
GB2389371B (en) | 2005-06-01 |
GB2389371A (en) | 2003-12-10 |
GB0319100D0 (en) | 2003-09-17 |
JP3926747B2 (en) | 2007-06-06 |
JP2005503603A (en) | 2005-02-03 |
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