WO2002071611A3 - Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array - Google Patents
Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array Download PDFInfo
- Publication number
- WO2002071611A3 WO2002071611A3 PCT/US2002/003512 US0203512W WO02071611A3 WO 2002071611 A3 WO2002071611 A3 WO 2002071611A3 US 0203512 W US0203512 W US 0203512W WO 02071611 A3 WO02071611 A3 WO 02071611A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- logic circuit
- gate array
- clock
- forming
- nmos
- Prior art date
Links
- 230000000295 complement effect Effects 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
- H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
- H03K19/0944—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET
- H03K19/0948—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET using CMOS or complementary insulated gate field-effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823487—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of vertical transistor structures, i.e. with channel vertical to the substrate surface
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
- H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
- H03K19/096—Synchronous circuits, i.e. using clock signals
- H03K19/0963—Synchronous circuits, i.e. using clock signals using transistors of complementary type
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE60239052T DE60239052D1 (en) | 2001-02-15 | 2002-02-07 | MONOTONE DYNAMIC / STATIC PSEUDO-NMOS LOGIC SWITCHING AND METHOD FOR GENERATING A LOGICAL GATE FIELD |
EP02704367A EP1378060B1 (en) | 2001-02-15 | 2002-02-07 | Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array |
JP2002570406A JP4036096B2 (en) | 2001-02-15 | 2002-02-07 | Monotonic dynamic-static pseudo-NMOS logic circuit and logic gate array forming method |
AU2002238056A AU2002238056A1 (en) | 2001-02-15 | 2002-02-07 | Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array |
KR1020037010613A KR100581010B1 (en) | 2001-02-15 | 2002-02-07 | Monotonic dynamic-static pseudo-NMOS logic circuit and method of forming a logic gate array |
AT02704367T ATE497279T1 (en) | 2001-02-15 | 2002-02-07 | MONOTONE DYNAMIC/STATIC PSEUDO-NMOS LOGIC CIRCUIT AND METHOD FOR GENERATING A LOGICAL GATE FIELD |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/788,109 US6649476B2 (en) | 2001-02-15 | 2001-02-15 | Monotonic dynamic-static pseudo-NMOS logic circuit and method of forming a logic gate array |
US09/788,109 | 2001-02-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002071611A2 WO2002071611A2 (en) | 2002-09-12 |
WO2002071611A3 true WO2002071611A3 (en) | 2003-10-30 |
Family
ID=25143469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/003512 WO2002071611A2 (en) | 2001-02-15 | 2002-02-07 | Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array |
Country Status (9)
Country | Link |
---|---|
US (3) | US6649476B2 (en) |
EP (1) | EP1378060B1 (en) |
JP (1) | JP4036096B2 (en) |
KR (1) | KR100581010B1 (en) |
CN (2) | CN1738047B (en) |
AT (1) | ATE497279T1 (en) |
AU (1) | AU2002238056A1 (en) |
DE (1) | DE60239052D1 (en) |
WO (1) | WO2002071611A2 (en) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6898362B2 (en) * | 2002-01-17 | 2005-05-24 | Micron Technology Inc. | Three-dimensional photonic crystal waveguide structure and method |
US6972599B2 (en) * | 2002-08-27 | 2005-12-06 | Micron Technology Inc. | Pseudo CMOS dynamic logic with delayed clocks |
US7198974B2 (en) * | 2003-03-05 | 2007-04-03 | Micron Technology, Inc. | Micro-mechanically strained semiconductor film |
US6917221B2 (en) * | 2003-04-28 | 2005-07-12 | International Business Machines Corporation | Method and apparatus for enhancing the soft error rate immunity of dynamic logic circuits |
US7041575B2 (en) * | 2003-04-29 | 2006-05-09 | Micron Technology, Inc. | Localized strained semiconductor on insulator |
US7115480B2 (en) * | 2003-05-07 | 2006-10-03 | Micron Technology, Inc. | Micromechanical strained semiconductor by wafer bonding |
US6987037B2 (en) * | 2003-05-07 | 2006-01-17 | Micron Technology, Inc. | Strained Si/SiGe structures by ion implantation |
US7501329B2 (en) | 2003-05-21 | 2009-03-10 | Micron Technology, Inc. | Wafer gettering using relaxed silicon germanium epitaxial proximity layers |
US7662701B2 (en) | 2003-05-21 | 2010-02-16 | Micron Technology, Inc. | Gettering of silicon on insulator using relaxed silicon germanium epitaxial proximity layers |
US7439158B2 (en) | 2003-07-21 | 2008-10-21 | Micron Technology, Inc. | Strained semiconductor by full wafer bonding |
US6929984B2 (en) | 2003-07-21 | 2005-08-16 | Micron Technology Inc. | Gettering using voids formed by surface transformation |
US6969656B2 (en) * | 2003-12-05 | 2005-11-29 | Freescale Semiconductor, Inc. | Method and circuit for multiplying signals with a transistor having more than one independent gate structure |
US7142478B2 (en) * | 2004-03-19 | 2006-11-28 | Infineon Technologies Ag | Clock stop detector |
US7084667B2 (en) * | 2004-07-13 | 2006-08-01 | International Business Machines Corporation | Low leakage monotonic CMOS logic |
US7518182B2 (en) | 2004-07-20 | 2009-04-14 | Micron Technology, Inc. | DRAM layout with vertical FETs and method of formation |
US7247570B2 (en) * | 2004-08-19 | 2007-07-24 | Micron Technology, Inc. | Silicon pillars for vertical transistors |
US7285812B2 (en) * | 2004-09-02 | 2007-10-23 | Micron Technology, Inc. | Vertical transistors |
US7199419B2 (en) * | 2004-12-13 | 2007-04-03 | Micron Technology, Inc. | Memory structure for reduced floating body effect |
US7229895B2 (en) * | 2005-01-14 | 2007-06-12 | Micron Technology, Inc | Memory array buried digit line |
US7326611B2 (en) * | 2005-02-03 | 2008-02-05 | Micron Technology, Inc. | DRAM arrays, vertical transistor structures and methods of forming transistor structures and DRAM arrays |
US20060176757A1 (en) * | 2005-02-09 | 2006-08-10 | International Business Machines Corporation | High performance CMOS NOR predecode circuit |
US7371627B1 (en) | 2005-05-13 | 2008-05-13 | Micron Technology, Inc. | Memory array with ultra-thin etched pillar surround gate access transistors and buried data/bit lines |
US7120046B1 (en) | 2005-05-13 | 2006-10-10 | Micron Technology, Inc. | Memory array with surrounding gate access transistors and capacitors with global and staggered local bit lines |
US7888721B2 (en) * | 2005-07-06 | 2011-02-15 | Micron Technology, Inc. | Surround gate access transistors with grown ultra-thin bodies |
US7768051B2 (en) | 2005-07-25 | 2010-08-03 | Micron Technology, Inc. | DRAM including a vertical surround gate transistor |
US7439576B2 (en) * | 2005-08-29 | 2008-10-21 | Micron Technology, Inc. | Ultra-thin body vertical tunneling transistor |
US7696567B2 (en) | 2005-08-31 | 2010-04-13 | Micron Technology, Inc | Semiconductor memory device |
US7312626B2 (en) * | 2005-08-31 | 2007-12-25 | Micron Technology, Inc. | CMOS circuits with reduced crowbar current |
US7446372B2 (en) * | 2005-09-01 | 2008-11-04 | Micron Technology, Inc. | DRAM tunneling access transistor |
US7687342B2 (en) | 2005-09-01 | 2010-03-30 | Micron Technology, Inc. | Method of manufacturing a memory device |
US7416943B2 (en) | 2005-09-01 | 2008-08-26 | Micron Technology, Inc. | Peripheral gate stacks and recessed array gates |
US7557032B2 (en) | 2005-09-01 | 2009-07-07 | Micron Technology, Inc. | Silicided recessed silicon |
US7544584B2 (en) * | 2006-02-16 | 2009-06-09 | Micron Technology, Inc. | Localized compressive strained semiconductor |
US7425491B2 (en) | 2006-04-04 | 2008-09-16 | Micron Technology, Inc. | Nanowire transistor with surrounding gate |
US7491995B2 (en) | 2006-04-04 | 2009-02-17 | Micron Technology, Inc. | DRAM with nanofin transistors |
US20070228491A1 (en) * | 2006-04-04 | 2007-10-04 | Micron Technology, Inc. | Tunneling transistor with sublithographic channel |
US8734583B2 (en) * | 2006-04-04 | 2014-05-27 | Micron Technology, Inc. | Grown nanofin transistors |
US8354311B2 (en) * | 2006-04-04 | 2013-01-15 | Micron Technology, Inc. | Method for forming nanofin transistors |
US7923373B2 (en) | 2007-06-04 | 2011-04-12 | Micron Technology, Inc. | Pitch multiplication using self-assembling materials |
US7724036B2 (en) * | 2007-09-06 | 2010-05-25 | Ashutosh Das | Clock guided logic with reduced switching |
US8347165B2 (en) | 2007-12-17 | 2013-01-01 | Micron Technology, Inc. | Self-timed error correcting code evaluation system and method |
KR101468897B1 (en) * | 2008-03-11 | 2014-12-04 | 삼성전자주식회사 | Domino logic circuit and pipeline domino logic circuit |
US8134854B2 (en) * | 2008-11-25 | 2012-03-13 | Mediatek Inc. | Efuse device |
WO2013018061A1 (en) * | 2011-08-03 | 2013-02-07 | Ben Gurion University Of The Negev Research And Development Authority | Device and method for dual-mode logic |
US9401363B2 (en) | 2011-08-23 | 2016-07-26 | Micron Technology, Inc. | Vertical transistor devices, memory arrays, and methods of forming vertical transistor devices |
US8806316B2 (en) | 2012-01-11 | 2014-08-12 | Micron Technology, Inc. | Circuits, integrated circuits, and methods for interleaved parity computation |
US9859286B2 (en) | 2014-12-23 | 2018-01-02 | International Business Machines Corporation | Low-drive current FinFET structure for improving circuit density of ratioed logic in SRAM devices |
US10505540B2 (en) | 2017-03-08 | 2019-12-10 | Tacho Holdings, Llc | Unipolar logic circuits |
US10079602B1 (en) | 2017-10-10 | 2018-09-18 | Tacho Holdings, Llc | Unipolar latched logic circuits |
US11750191B2 (en) | 2017-10-10 | 2023-09-05 | Tacho Holdings, Llc | Three-dimensional logic circuit |
US11228315B2 (en) | 2017-10-10 | 2022-01-18 | Tacho Holdings, Llc | Three-dimensional logic circuit |
KR102105945B1 (en) * | 2018-12-10 | 2020-04-29 | 포항공과대학교 산학협력단 | Pseudo complementary logic network |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0082773A2 (en) * | 1981-12-17 | 1983-06-29 | FAIRCHILD CAMERA & INSTRUMENT CORPORATION | Apparatus and method for CMOS multistaged dynamic logic circuit |
EP0700093A1 (en) * | 1994-08-25 | 1996-03-06 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method of manufacturing the same |
US5545586A (en) * | 1990-11-27 | 1996-08-13 | Nec Corporation | Method of making a transistor having easily controllable impurity profile |
WO1997049134A2 (en) * | 1996-06-21 | 1997-12-24 | Micron Technology, Inc. | Soi-transistor circuitry employing soi-transistors and method of manufacture thereof |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4569032A (en) | 1983-12-23 | 1986-02-04 | At&T Bell Laboratories | Dynamic CMOS logic circuits for implementing multiple AND-functions |
US4797580A (en) | 1987-10-29 | 1989-01-10 | Northern Telecom Limited | Current-mirror-biased pre-charged logic circuit |
EP0457150A3 (en) * | 1990-05-14 | 1992-06-17 | Lsi Logic Corporation | Bicmos compacted logic array |
US5335106A (en) * | 1992-10-30 | 1994-08-02 | Mpb Technologies Inc. | Optically-based frequency synthesizer for generating an electric output signal at a preselected frequency that can be changed over a wide band of frequencies for communication purpose |
WO1994021088A2 (en) * | 1993-03-02 | 1994-09-15 | British Telecommunications Public Limited Company | Optically encoded signals |
US5440243A (en) | 1993-09-21 | 1995-08-08 | Apple Computer, Inc. | Apparatus and method for allowing a dynamic logic gate to operation statically using subthreshold conduction precharging |
DE69534362T2 (en) * | 1994-08-15 | 2006-05-24 | Nippon Telegraph And Telephone Corp. | All-in-one multi-channel TDM-WDM converter and all-optical multi-channel time demultiplexer |
US5525916A (en) | 1995-04-10 | 1996-06-11 | The University Of Waterloo | All-N-logic high-speed single-phase dynamic CMOS logic |
US5867036A (en) | 1996-05-29 | 1999-02-02 | Lsi Logic Corporation | Domino scan architecture and domino scan flip-flop for the testing of domino and hybrid CMOS circuits |
US5798938A (en) | 1996-07-02 | 1998-08-25 | Hewlett-Packard Co. | System and method for verification of a precharge critical path for a system of cascaded dynamic logic gates |
US5796282A (en) | 1996-08-12 | 1998-08-18 | Intel Corporation | Latching mechanism for pulsed domino logic with inherent race margin and time borrowing |
US5828234A (en) | 1996-08-27 | 1998-10-27 | Intel Corporation | Pulsed reset single phase domino logic |
US5691230A (en) | 1996-09-04 | 1997-11-25 | Micron Technology, Inc. | Technique for producing small islands of silicon on insulator |
US5862373A (en) * | 1996-09-06 | 1999-01-19 | Intel Corporation | Pad cells for a 2/N mode clocking scheme |
US5852373A (en) | 1996-09-30 | 1998-12-22 | International Business Machines Corporation | Static-dynamic logic circuit |
US5929477A (en) * | 1997-01-22 | 1999-07-27 | International Business Machines Corporation | Self-aligned diffused source vertical transistors with stack capacitors in a 4F-square memory cell array |
TW344131B (en) | 1997-06-03 | 1998-11-01 | Nat Science Council | A 1.5V bootstrapped all-N-logic true-single-phase CMOS dynamic logic circuit suitable for low supply voltage and high speed pipelined |
US6072209A (en) | 1997-07-08 | 2000-06-06 | Micro Technology, Inc. | Four F2 folded bit line DRAM cell structure having buried bit and word lines |
US6150687A (en) | 1997-07-08 | 2000-11-21 | Micron Technology, Inc. | Memory cell having a vertical transistor with buried source/drain and dual gates |
US6255853B1 (en) * | 1997-09-29 | 2001-07-03 | Texas Instruments Incorporated | Integrated circuit having dynamic logic with reduced standby leakage current |
US6107835A (en) | 1997-12-11 | 2000-08-22 | Intrinsity, Inc. | Method and apparatus for a logic circuit with constant power consumption |
US5982963A (en) * | 1997-12-15 | 1999-11-09 | University Of Southern California | Tunable nonlinearly chirped grating |
US5942917A (en) | 1997-12-29 | 1999-08-24 | Intel Corporation | High speed ratioed CMOS logic structures for a pulsed input environment |
US6297531B2 (en) * | 1998-01-05 | 2001-10-02 | International Business Machines Corporation | High performance, low power vertical integrated CMOS devices |
US5977579A (en) * | 1998-12-03 | 1999-11-02 | Micron Technology, Inc. | Trench dram cell with vertical device and buried word lines |
US6049106A (en) * | 1999-01-14 | 2000-04-11 | Micron Technology, Inc. | Large grain single crystal vertical thin film polysilicon MOSFETs |
US6275071B1 (en) * | 1999-12-29 | 2001-08-14 | Intel Corporation | Domino logic circuit and method |
US6252222B1 (en) * | 2000-01-13 | 2001-06-26 | Schlumberger Technologies, Inc. | Differential pulsed laser beam probing of integrated circuits |
JP3463988B2 (en) * | 2000-03-28 | 2003-11-05 | Necマイクロシステム株式会社 | Intermediate potential circuit |
US6406962B1 (en) * | 2001-01-17 | 2002-06-18 | International Business Machines Corporation | Vertical trench-formed dual-gate FET device structure and method for creation |
US6559491B2 (en) | 2001-02-09 | 2003-05-06 | Micron Technology, Inc. | Folded bit line DRAM with ultra thin body transistors |
US6448601B1 (en) | 2001-02-09 | 2002-09-10 | Micron Technology, Inc. | Memory address and decode circuits with ultra thin body transistors |
US6496034B2 (en) | 2001-02-09 | 2002-12-17 | Micron Technology, Inc. | Programmable logic arrays with ultra thin body transistors |
US6597203B2 (en) * | 2001-03-14 | 2003-07-22 | Micron Technology, Inc. | CMOS gate array with vertical transistors |
US6956406B2 (en) * | 2001-07-02 | 2005-10-18 | Intrinsity, Inc. | Static storage element for dynamic logic |
AU2001281094A1 (en) | 2001-08-06 | 2003-02-24 | Micron Technology, Inc. | Interpolation error minimization for data reduction |
US6650145B2 (en) | 2002-04-04 | 2003-11-18 | International Business Machines Corporation | Circuits and systems for limited switch dynamic logic |
US6664836B1 (en) * | 2002-12-12 | 2003-12-16 | International Business Machines Corporation | Dynamic phase splitter circuit and method for low-noise and simultaneous production of true and complement dynamic logic signals |
-
2001
- 2001-02-15 US US09/788,109 patent/US6649476B2/en not_active Expired - Fee Related
-
2002
- 2002-02-07 AU AU2002238056A patent/AU2002238056A1/en not_active Abandoned
- 2002-02-07 KR KR1020037010613A patent/KR100581010B1/en not_active IP Right Cessation
- 2002-02-07 DE DE60239052T patent/DE60239052D1/en not_active Expired - Lifetime
- 2002-02-07 AT AT02704367T patent/ATE497279T1/en not_active IP Right Cessation
- 2002-02-07 JP JP2002570406A patent/JP4036096B2/en not_active Expired - Fee Related
- 2002-02-07 CN CN2005100995858A patent/CN1738047B/en not_active Expired - Fee Related
- 2002-02-07 CN CNB028050738A patent/CN100464502C/en not_active Expired - Fee Related
- 2002-02-07 EP EP02704367A patent/EP1378060B1/en not_active Expired - Lifetime
- 2002-02-07 WO PCT/US2002/003512 patent/WO2002071611A2/en not_active Application Discontinuation
- 2002-10-29 US US10/283,775 patent/US6801056B2/en not_active Expired - Fee Related
-
2003
- 2003-02-13 US US10/367,519 patent/US6946879B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0082773A2 (en) * | 1981-12-17 | 1983-06-29 | FAIRCHILD CAMERA & INSTRUMENT CORPORATION | Apparatus and method for CMOS multistaged dynamic logic circuit |
US5545586A (en) * | 1990-11-27 | 1996-08-13 | Nec Corporation | Method of making a transistor having easily controllable impurity profile |
EP0700093A1 (en) * | 1994-08-25 | 1996-03-06 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method of manufacturing the same |
WO1997049134A2 (en) * | 1996-06-21 | 1997-12-24 | Micron Technology, Inc. | Soi-transistor circuitry employing soi-transistors and method of manufacture thereof |
Non-Patent Citations (1)
Title |
---|
THORP T ET AL: "Monotonic static CMOS and dual VT technology", PROCEEDINGS 1999 INTERNATIONAL SYMPOSIUM ON LOW POWER ELECTRONICS AND DESIGN. (ISLPED). SAN DIEGO, CA, AUG. 16 - 17, 1999, INTERNATIONAL SYMPOSIUM ON LOW POWER ELECTRONICS AND DESIGN, NEW YORK, NY: ACM, US, 16 August 1999 (1999-08-16), pages 151 - 155, XP010355959, ISBN: 1-58113-133-X * |
Also Published As
Publication number | Publication date |
---|---|
US6649476B2 (en) | 2003-11-18 |
JP2005505150A (en) | 2005-02-17 |
US6801056B2 (en) | 2004-10-05 |
KR100581010B1 (en) | 2006-05-16 |
AU2002238056A1 (en) | 2002-09-19 |
US20030049910A1 (en) | 2003-03-13 |
CN1491483A (en) | 2004-04-21 |
ATE497279T1 (en) | 2011-02-15 |
CN100464502C (en) | 2009-02-25 |
DE60239052D1 (en) | 2011-03-10 |
CN1738047A (en) | 2006-02-22 |
EP1378060B1 (en) | 2011-01-26 |
US20020110032A1 (en) | 2002-08-15 |
US6946879B2 (en) | 2005-09-20 |
EP1378060A2 (en) | 2004-01-07 |
CN1738047B (en) | 2010-05-12 |
US20030153156A1 (en) | 2003-08-14 |
WO2002071611A2 (en) | 2002-09-12 |
JP4036096B2 (en) | 2008-01-23 |
KR20040051575A (en) | 2004-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2002071611A3 (en) | Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array | |
US4899066A (en) | OR-type CMOS logic circuit with fast precharging | |
US5880608A (en) | Pulsed domino latches | |
TW278152B (en) | A design method of clock generating circuit and pll circuit and semi-conductor device combined with clock generating circuit | |
CA2338114C (en) | Single rail domino logic for four-phase clocking scheme | |
DE69221109T2 (en) | Digitally controlled CMOS delay gate | |
TW285771B (en) | A complementary signal differential amplifier and a semiconductor memory device which have the complementary signal differential amplifier inside | |
GB2337168A (en) | Method and apparatus for implementing an adiabatic logic family | |
EP0372273A3 (en) | Pass gate multiplexer | |
IE813068L (en) | Semiconductor buffer circuit | |
AU6346198A (en) | An inverse toggle xor and xnor circuit | |
KR970013364A (en) | High-Speed Synchronous Dynamic Random Access Memory | |
GR3006154T3 (en) | ||
EP0270300A3 (en) | Static pla or rom circuit with self-generated precharge | |
TW367653B (en) | Division circuit of 4/5 | |
JPS6467795A (en) | Reading amplifier | |
KR960026760A (en) | Pulse Signal Shaping Circuit | |
US5650735A (en) | Low power, high performance latching interfaces for converting dynamic inputs into static outputs | |
EP0291963A3 (en) | Fast c-mos adder | |
TW200506941A (en) | Non-inverting domino register | |
US4496851A (en) | Dynamic metal oxide semiconductor field effect transistor clocking circuit | |
EP0218451A3 (en) | Schmitt circuit | |
US20050093578A1 (en) | Output device for static random access memory | |
KR200296045Y1 (en) | A ring oscillator | |
TW200518169A (en) | Priority circuit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2002570406 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020037010613 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 028050738 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2002704367 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
WWP | Wipo information: published in national office |
Ref document number: 2002704367 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1020037010613 Country of ref document: KR |
|
WWR | Wipo information: refused in national office |
Ref document number: 1020037010613 Country of ref document: KR |