WO2002054390A1 - Support d'enregistrement magnetique et son procede de fabrication, dispositif de stockage magnetique - Google Patents
Support d'enregistrement magnetique et son procede de fabrication, dispositif de stockage magnetique Download PDFInfo
- Publication number
- WO2002054390A1 WO2002054390A1 PCT/JP2001/011533 JP0111533W WO02054390A1 WO 2002054390 A1 WO2002054390 A1 WO 2002054390A1 JP 0111533 W JP0111533 W JP 0111533W WO 02054390 A1 WO02054390 A1 WO 02054390A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- magnetic
- recording medium
- magnetic recording
- seed layer
- Prior art date
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 587
- 238000004519 manufacturing process Methods 0.000 title claims description 41
- 238000003860 storage Methods 0.000 title abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 64
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 59
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 56
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 26
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 20
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 102
- 238000000034 method Methods 0.000 claims description 71
- 239000013078 crystal Substances 0.000 claims description 65
- 229910052751 metal Inorganic materials 0.000 claims description 46
- 239000002184 metal Substances 0.000 claims description 46
- 239000007789 gas Substances 0.000 claims description 35
- 238000004544 sputter deposition Methods 0.000 claims description 34
- 230000005415 magnetization Effects 0.000 claims description 29
- 238000005530 etching Methods 0.000 claims description 21
- 239000000696 magnetic material Substances 0.000 claims description 15
- 238000005546 reactive sputtering Methods 0.000 claims description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 230000003746 surface roughness Effects 0.000 claims description 9
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- 230000001747 exhibiting effect Effects 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 3
- 238000000992 sputter etching Methods 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910020641 Co Zr Inorganic materials 0.000 claims 1
- 229910020520 Co—Zr Inorganic materials 0.000 claims 1
- 230000008878 coupling Effects 0.000 abstract description 24
- 238000010168 coupling process Methods 0.000 abstract description 24
- 238000005859 coupling reaction Methods 0.000 abstract description 24
- 230000007704 transition Effects 0.000 abstract description 24
- 230000003313 weakening effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 586
- 239000010408 film Substances 0.000 description 116
- 230000002829 reductive effect Effects 0.000 description 29
- 238000001020 plasma etching Methods 0.000 description 26
- 230000015572 biosynthetic process Effects 0.000 description 25
- 239000006249 magnetic particle Substances 0.000 description 22
- 239000011241 protective layer Substances 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 20
- 230000005381 magnetic domain Effects 0.000 description 20
- 230000005347 demagnetization Effects 0.000 description 19
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 16
- 229910001882 dioxygen Inorganic materials 0.000 description 16
- 239000002245 particle Substances 0.000 description 14
- 230000001050 lubricating effect Effects 0.000 description 13
- 239000011521 glass Substances 0.000 description 12
- 239000000314 lubricant Substances 0.000 description 12
- 238000005259 measurement Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 239000006185 dispersion Substances 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 229910003481 amorphous carbon Inorganic materials 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000003252 repetitive effect Effects 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000001552 radio frequency sputter deposition Methods 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000002923 metal particle Substances 0.000 description 4
- 239000013081 microcrystal Substances 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000010702 perfluoropolyether Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910000861 Mg alloy Inorganic materials 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- -1 for example Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910019586 CoZrTa Inorganic materials 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000089 atomic force micrograph Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/676—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer
- G11B5/678—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer having three or more magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/012—Recording on, or reproducing or erasing from, magnetic disks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12465—All metal or with adjacent metals having magnetic properties, or preformed fiber orientation coordinate with shape
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12868—Group IB metal-base component alternative to platinum group metal-base component [e.g., precious metal, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002555406A JP3472291B2 (ja) | 2000-12-28 | 2001-12-27 | 磁気記録媒体及びその製造方法並びに磁気記憶装置 |
KR1020037000271A KR100545692B1 (ko) | 2000-12-28 | 2001-12-27 | 자기 기록 매체, 그 제조 방법 및 자기 기억 장치 |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-400476 | 2000-12-28 | ||
JP2000400471 | 2000-12-28 | ||
JP2000400476 | 2000-12-28 | ||
JP2000-400471 | 2000-12-28 | ||
JP2001042568 | 2001-02-19 | ||
JP2001-042568 | 2001-02-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002054390A1 true WO2002054390A1 (fr) | 2002-07-11 |
Family
ID=27345606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/011533 WO2002054390A1 (fr) | 2000-12-28 | 2001-12-27 | Support d'enregistrement magnetique et son procede de fabrication, dispositif de stockage magnetique |
Country Status (6)
Country | Link |
---|---|
US (2) | US6602621B2 (ja) |
JP (1) | JP3472291B2 (ja) |
KR (1) | KR100545692B1 (ja) |
CN (1) | CN1447966A (ja) |
TW (1) | TW561462B (ja) |
WO (1) | WO2002054390A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005031714A1 (ja) * | 2003-09-26 | 2005-04-07 | Tdk Corporation | 磁気記録媒体及びその製造方法 |
JP2013168197A (ja) * | 2012-02-14 | 2013-08-29 | Showa Denko Kk | 磁気記録媒体及び磁気記録再生装置 |
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1447966A (zh) * | 2000-12-28 | 2003-10-08 | 日立麦克赛尔株式会社 | 磁记录介质及其制造方法以及磁存储设备 |
JP4097059B2 (ja) * | 2001-08-01 | 2008-06-04 | 富士通株式会社 | 磁気記録媒体の製造方法 |
US7019924B2 (en) * | 2001-02-16 | 2006-03-28 | Komag, Incorporated | Patterned medium and recording head |
AU2002310155A1 (en) * | 2002-01-08 | 2003-07-30 | Seagate Technology Llc | Heat assisted magnetic recording head with hybrid write pole |
KR100469750B1 (ko) * | 2002-02-23 | 2005-02-02 | 학교법인 성균관대학 | 다층산화물 인공격자를 갖는 소자 |
EP1508895A4 (en) * | 2002-05-24 | 2005-06-22 | Fujitsu Ltd | INFORMATION RECORDING MEDIUM AND INFORMATION STORAGE DEVICE |
JP3905424B2 (ja) * | 2002-06-06 | 2007-04-18 | 富士通株式会社 | 垂直磁気記録媒体及びこれを備えた磁気記録装置 |
JP2004046928A (ja) * | 2002-07-09 | 2004-02-12 | Sony Corp | 磁気記録媒体 |
JP4416408B2 (ja) * | 2002-08-26 | 2010-02-17 | 株式会社日立グローバルストレージテクノロジーズ | 垂直磁気記録媒体 |
US20040071951A1 (en) * | 2002-09-30 | 2004-04-15 | Sungho Jin | Ultra-high-density information storage media and methods for making the same |
KR100464318B1 (ko) * | 2002-10-01 | 2005-01-03 | 삼성전자주식회사 | 자기기록매체 |
WO2004040557A1 (en) * | 2002-10-31 | 2004-05-13 | Showa Denko K.K. | Perpendicular magnetic recording medium, production process thereof, and perpendicular magnetic recording and reproducing apparatus |
US20050036223A1 (en) * | 2002-11-27 | 2005-02-17 | Wachenschwanz David E. | Magnetic discrete track recording disk |
US7147790B2 (en) | 2002-11-27 | 2006-12-12 | Komag, Inc. | Perpendicular magnetic discrete track recording disk |
WO2004059632A2 (en) * | 2002-12-30 | 2004-07-15 | Koninklijke Philips Electronics N.V. | Magnetically clamped optical disc and apparatus |
MY143045A (en) * | 2003-01-14 | 2011-02-28 | Showa Denko Kk | Magnetic recording medium, method of manufacturing therefor, and magnetic read/write apparatus |
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SG143046A1 (en) * | 2003-06-30 | 2008-06-27 | Shinetsu Chemical Co | Substrate for magnetic recording medium |
AU2003270382A1 (en) * | 2003-09-05 | 2005-04-21 | Seagate Technology Llc | Dual seed layer for recording media |
US7158346B2 (en) * | 2003-12-23 | 2007-01-02 | Seagate Technology Llc | Heat assisted magnetic recording film including superparamagnetic nanoparticles dispersed in an antiferromagnetic or ferrimagnetic matrix |
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US7384699B2 (en) * | 2004-08-02 | 2008-06-10 | Seagate Technology Llc | Magnetic recording media with tuned exchange coupling and method for fabricating same |
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US7259553B2 (en) * | 2005-04-13 | 2007-08-21 | Sri International | System and method of magnetically sensing position of a moving component |
US7651794B2 (en) * | 2005-04-28 | 2010-01-26 | Hitachi Global Storage Technologies Netherlands B.V. | Adhesion layer for thin film magnetic recording medium |
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WO2007091702A1 (en) * | 2006-02-10 | 2007-08-16 | Showa Denko K.K. | Magnetic recording medium, method for production thereof and magnetic recording and reproducing device |
US20070187227A1 (en) * | 2006-02-15 | 2007-08-16 | Marinero Ernesto E | Method for making a perpendicular magnetic recording disk |
WO2007114400A1 (ja) * | 2006-03-31 | 2007-10-11 | Hoya Corporation | 垂直磁気記録媒体の製造方法 |
US20070292721A1 (en) * | 2006-04-25 | 2007-12-20 | Berger Andreas K | Perpendicular magnetic recording medium |
US7862913B2 (en) * | 2006-10-23 | 2011-01-04 | Hitachi Global Storage Technologies Netherlands B.V. | Oxide magnetic recording layers for perpendicular recording media |
KR100868761B1 (ko) * | 2006-11-20 | 2008-11-13 | 삼성전자주식회사 | 자구벽 이동을 이용한 정보 저장 매체 |
JP2009187608A (ja) * | 2008-02-05 | 2009-08-20 | Toshiba Corp | 垂直磁気記録パターンド媒体および磁気記録再生装置 |
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US9990940B1 (en) | 2014-12-30 | 2018-06-05 | WD Media, LLC | Seed structure for perpendicular magnetic recording media |
KR20170034961A (ko) | 2015-09-21 | 2017-03-30 | 에스케이하이닉스 주식회사 | 전자 장치 및 그 제조 방법 |
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KR102590306B1 (ko) | 2016-09-06 | 2023-10-19 | 에스케이하이닉스 주식회사 | 전자 장치 및 그 제조 방법 |
US9940963B1 (en) | 2016-11-17 | 2018-04-10 | Western Digital Technologies, Inc. | Magnetic media with atom implanted magnetic layer |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60129922A (ja) * | 1983-12-16 | 1985-07-11 | Matsushita Electric Ind Co Ltd | 磁気記録媒体 |
JPH0830951A (ja) * | 1994-07-18 | 1996-02-02 | Denki Kagaku Kogyo Kk | 垂直磁気記録媒体 |
JPH11339241A (ja) * | 1998-05-21 | 1999-12-10 | Sony Corp | 磁気記録媒体および磁気記録媒体の製造方法 |
JP2001155329A (ja) * | 1999-11-30 | 2001-06-08 | Sony Corp | 磁気記録媒体 |
JP2001250218A (ja) * | 2000-03-01 | 2001-09-14 | Hitachi Ltd | 磁気記録媒体とその製法およびそれを用いた磁気記録再生装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH023102A (ja) | 1987-08-26 | 1990-01-08 | Sony Corp | 垂直磁気記録媒体 |
JP2727582B2 (ja) | 1988-09-05 | 1998-03-11 | ソニー株式会社 | 垂直磁化膜 |
JPH04311809A (ja) | 1991-04-10 | 1992-11-04 | Fujitsu Ltd | 垂直磁気記録媒体とその製造方法 |
JPH05282650A (ja) | 1991-10-03 | 1993-10-29 | Censtor Corp | 局部緩和抑制現象を示す改善された垂直型磁気記録媒体 |
JPH0773429A (ja) | 1993-08-31 | 1995-03-17 | Fujitsu Ltd | 垂直磁気記録媒体、および、その製造方法 |
JP2000215437A (ja) | 1999-01-28 | 2000-08-04 | Hitachi Ltd | 磁気記録媒体及びそれを用いた磁気記録装置 |
JP3721011B2 (ja) | 1999-06-28 | 2005-11-30 | 日立マクセル株式会社 | 情報記録媒体及びそれを用いた磁気記憶装置、光磁気記憶装置 |
US6328856B1 (en) * | 1999-08-04 | 2001-12-11 | Seagate Technology Llc | Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device |
US6468670B1 (en) * | 2000-01-19 | 2002-10-22 | International Business Machines Corporation | Magnetic recording disk with composite perpendicular recording layer |
CN1447966A (zh) * | 2000-12-28 | 2003-10-08 | 日立麦克赛尔株式会社 | 磁记录介质及其制造方法以及磁存储设备 |
-
2001
- 2001-12-27 CN CN01814455A patent/CN1447966A/zh active Pending
- 2001-12-27 WO PCT/JP2001/011533 patent/WO2002054390A1/ja active IP Right Grant
- 2001-12-27 KR KR1020037000271A patent/KR100545692B1/ko not_active IP Right Cessation
- 2001-12-27 US US10/026,636 patent/US6602621B2/en not_active Expired - Fee Related
- 2001-12-27 JP JP2002555406A patent/JP3472291B2/ja not_active Expired - Fee Related
- 2001-12-28 TW TW090132707A patent/TW561462B/zh active
-
2003
- 2003-04-11 US US10/411,299 patent/US6815098B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60129922A (ja) * | 1983-12-16 | 1985-07-11 | Matsushita Electric Ind Co Ltd | 磁気記録媒体 |
JPH0830951A (ja) * | 1994-07-18 | 1996-02-02 | Denki Kagaku Kogyo Kk | 垂直磁気記録媒体 |
JPH11339241A (ja) * | 1998-05-21 | 1999-12-10 | Sony Corp | 磁気記録媒体および磁気記録媒体の製造方法 |
JP2001155329A (ja) * | 1999-11-30 | 2001-06-08 | Sony Corp | 磁気記録媒体 |
JP2001250218A (ja) * | 2000-03-01 | 2001-09-14 | Hitachi Ltd | 磁気記録媒体とその製法およびそれを用いた磁気記録再生装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005031714A1 (ja) * | 2003-09-26 | 2005-04-07 | Tdk Corporation | 磁気記録媒体及びその製造方法 |
JP2013168197A (ja) * | 2012-02-14 | 2013-08-29 | Showa Denko Kk | 磁気記録媒体及び磁気記録再生装置 |
Also Published As
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US20020122959A1 (en) | 2002-09-05 |
KR20030057522A (ko) | 2003-07-04 |
US6602621B2 (en) | 2003-08-05 |
TW561462B (en) | 2003-11-11 |
JP3472291B2 (ja) | 2003-12-02 |
CN1447966A (zh) | 2003-10-08 |
US6815098B2 (en) | 2004-11-09 |
KR100545692B1 (ko) | 2006-01-24 |
US20030162057A1 (en) | 2003-08-28 |
JPWO2002054390A1 (ja) | 2004-05-13 |
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