WO2002044699A3 - Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung - Google Patents
Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung Download PDFInfo
- Publication number
- WO2002044699A3 WO2002044699A3 PCT/EP2001/014005 EP0114005W WO0244699A3 WO 2002044699 A3 WO2002044699 A3 WO 2002044699A3 EP 0114005 W EP0114005 W EP 0114005W WO 0244699 A3 WO0244699 A3 WO 0244699A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- properties
- determining
- integrated circuit
- circuit
- design
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/20—Design optimisation, verification or simulation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/433,250 US7302090B2 (en) | 2000-11-30 | 2001-11-30 | Method and device for determining the properties of an integrated circuit |
DE50111874T DE50111874D1 (de) | 2000-11-30 | 2001-11-30 | Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung |
EP01989545A EP1337838B1 (de) | 2000-11-30 | 2001-11-30 | Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung |
AU2002227965A AU2002227965A1 (en) | 2000-11-30 | 2001-11-30 | Method and device for determining the properties of an integrated circuit |
JP2002546194A JP4216592B2 (ja) | 2000-11-30 | 2001-11-30 | 集積回路の特性を測定するプロセスと装置 |
KR1020037007344A KR100846018B1 (ko) | 2000-11-30 | 2001-11-30 | 집적 회로의 특성 측정 장치 및 방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10059516.2 | 2000-11-30 | ||
DE10059516 | 2000-11-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002044699A2 WO2002044699A2 (de) | 2002-06-06 |
WO2002044699A3 true WO2002044699A3 (de) | 2002-09-19 |
Family
ID=7665267
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/014005 WO2002044699A2 (de) | 2000-11-30 | 2001-11-30 | Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung |
PCT/EP2001/014004 WO2002045014A2 (de) | 2000-11-30 | 2001-11-30 | Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/014004 WO2002045014A2 (de) | 2000-11-30 | 2001-11-30 | Verfahren und vorrichtung zur bestimmung von eigenschaften einer integrierten schaltung |
Country Status (7)
Country | Link |
---|---|
US (1) | US7302090B2 (de) |
EP (1) | EP1337838B1 (de) |
JP (1) | JP4216592B2 (de) |
KR (1) | KR100846018B1 (de) |
AU (2) | AU2002227965A1 (de) |
DE (1) | DE50111874D1 (de) |
WO (2) | WO2002044699A2 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100979484B1 (ko) * | 2002-07-15 | 2010-09-02 | 케이엘에이-텐코 코포레이션 | 다른 리소그래픽 과정 변수들을 위한 레티클의 가상 이미지를 얻는 것을 포함하는 결점 조사 방법 |
US7698665B2 (en) | 2003-04-06 | 2010-04-13 | Luminescent Technologies, Inc. | Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern |
US7480889B2 (en) * | 2003-04-06 | 2009-01-20 | Luminescent Technologies, Inc. | Optimized photomasks for photolithography |
US7124394B1 (en) * | 2003-04-06 | 2006-10-17 | Luminescent Technologies, Inc. | Method for time-evolving rectilinear contours representing photo masks |
JP4351928B2 (ja) * | 2004-02-23 | 2009-10-28 | 株式会社東芝 | マスクデータの補正方法、フォトマスクの製造方法及びマスクデータの補正プログラム |
US7448012B1 (en) | 2004-04-21 | 2008-11-04 | Qi-De Qian | Methods and system for improving integrated circuit layout |
JP2007536673A (ja) * | 2004-05-09 | 2007-12-13 | メンター・グラフィクス・コーポレーション | 見込み欠陥位置同定方法、見込み欠陥位置同定ツール |
US7251807B2 (en) * | 2005-02-24 | 2007-07-31 | Synopsys, Inc. | Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity model |
US7707541B2 (en) * | 2005-09-13 | 2010-04-27 | Luminescent Technologies, Inc. | Systems, masks, and methods for photolithography |
WO2007041600A2 (en) | 2005-10-03 | 2007-04-12 | Luminescent Technologies, Inc. | Mask-pattern determination using topology types |
WO2007041602A2 (en) | 2005-10-03 | 2007-04-12 | Luminescent Technologies, Inc. | Lithography verification using guard bands |
US7793253B2 (en) | 2005-10-04 | 2010-09-07 | Luminescent Technologies, Inc. | Mask-patterns including intentional breaks |
WO2007044557A2 (en) | 2005-10-06 | 2007-04-19 | Luminescent Technologies, Inc. | System, masks, and methods for photomasks optimized with approximate and accurate merit functions |
KR101285967B1 (ko) * | 2005-11-18 | 2013-07-12 | 케이엘에이-텐코 코포레이션 | 검사 데이터와 조합하여 설계 데이터를 활용하는 방법 및시스템 |
US8160350B2 (en) * | 2006-02-01 | 2012-04-17 | Applied Materials Israel, Ltd. | Method and system for evaluating a variation in a parameter of a pattern |
WO2007147826A1 (en) * | 2006-06-23 | 2007-12-27 | Sagantec Israel Ltd | Layout processing system |
WO2008039674A2 (en) | 2006-09-20 | 2008-04-03 | Luminescent Technologies, Inc. | Photo-mask and wafer image reconstruction |
US8331645B2 (en) * | 2006-09-20 | 2012-12-11 | Luminescent Technologies, Inc. | Photo-mask and wafer image reconstruction |
US8006203B2 (en) * | 2008-08-28 | 2011-08-23 | Synopsys, Inc. | Bulk image modeling for optical proximity correction |
US8551283B2 (en) | 2010-02-02 | 2013-10-08 | Apple Inc. | Offset control for assembling an electronic device housing |
US8463016B2 (en) * | 2010-02-05 | 2013-06-11 | Luminescent Technologies, Inc. | Extending the field of view of a mask-inspection image |
US8612903B2 (en) | 2010-09-14 | 2013-12-17 | Luminescent Technologies, Inc. | Technique for repairing a reflective photo-mask |
US8555214B2 (en) | 2010-09-14 | 2013-10-08 | Luminescent Technologies, Inc. | Technique for analyzing a reflective photo-mask |
US8458622B2 (en) | 2010-11-29 | 2013-06-04 | Luminescent Technologies, Inc. | Photo-mask acceptance technique |
US8386968B2 (en) | 2010-11-29 | 2013-02-26 | Luminescent Technologies, Inc. | Virtual photo-mask critical-dimension measurement |
US9005852B2 (en) | 2012-09-10 | 2015-04-14 | Dino Technology Acquisition Llc | Technique for repairing a reflective photo-mask |
US8653454B2 (en) | 2011-07-13 | 2014-02-18 | Luminescent Technologies, Inc. | Electron-beam image reconstruction |
US9091935B2 (en) | 2013-03-11 | 2015-07-28 | Kla-Tencor Corporation | Multistage extreme ultra-violet mask qualification |
US9494854B2 (en) | 2013-03-14 | 2016-11-15 | Kla-Tencor Corporation | Technique for repairing an EUV photo-mask |
US11798157B2 (en) | 2019-10-11 | 2023-10-24 | The Regents Of The University Of Michigan | Non-destructive imaging techniques for integrated circuits and other applications |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5801954A (en) * | 1996-04-24 | 1998-09-01 | Micron Technology, Inc. | Process for designing and checking a mask layout |
WO1999014706A2 (en) * | 1997-09-17 | 1999-03-25 | Numerical Technologies, Inc. | Visual inspection and verification system |
US6081659A (en) * | 1997-05-08 | 2000-06-27 | Lsi Logic Corporation | Comparing aerial image to actual photoresist pattern for masking process characterization |
US6091845A (en) * | 1998-02-24 | 2000-07-18 | Micron Technology, Inc. | Inspection technique of photomask |
-
2001
- 2001-11-30 JP JP2002546194A patent/JP4216592B2/ja not_active Expired - Lifetime
- 2001-11-30 WO PCT/EP2001/014005 patent/WO2002044699A2/de active IP Right Grant
- 2001-11-30 DE DE50111874T patent/DE50111874D1/de not_active Expired - Lifetime
- 2001-11-30 US US10/433,250 patent/US7302090B2/en not_active Expired - Lifetime
- 2001-11-30 KR KR1020037007344A patent/KR100846018B1/ko active IP Right Grant
- 2001-11-30 AU AU2002227965A patent/AU2002227965A1/en not_active Abandoned
- 2001-11-30 EP EP01989545A patent/EP1337838B1/de not_active Expired - Lifetime
- 2001-11-30 AU AU2002238409A patent/AU2002238409A1/en not_active Withdrawn
- 2001-11-30 WO PCT/EP2001/014004 patent/WO2002045014A2/de not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5801954A (en) * | 1996-04-24 | 1998-09-01 | Micron Technology, Inc. | Process for designing and checking a mask layout |
US6081659A (en) * | 1997-05-08 | 2000-06-27 | Lsi Logic Corporation | Comparing aerial image to actual photoresist pattern for masking process characterization |
WO1999014706A2 (en) * | 1997-09-17 | 1999-03-25 | Numerical Technologies, Inc. | Visual inspection and verification system |
US6091845A (en) * | 1998-02-24 | 2000-07-18 | Micron Technology, Inc. | Inspection technique of photomask |
Also Published As
Publication number | Publication date |
---|---|
KR20040022201A (ko) | 2004-03-11 |
DE50111874D1 (de) | 2007-02-22 |
AU2002238409A1 (en) | 2002-06-11 |
WO2002044699A2 (de) | 2002-06-06 |
EP1337838B1 (de) | 2007-01-10 |
US7302090B2 (en) | 2007-11-27 |
KR100846018B1 (ko) | 2008-07-11 |
JP4216592B2 (ja) | 2009-01-28 |
JP2004514938A (ja) | 2004-05-20 |
US20040136587A1 (en) | 2004-07-15 |
EP1337838A2 (de) | 2003-08-27 |
AU2002227965A1 (en) | 2002-06-11 |
WO2002045014A2 (de) | 2002-06-06 |
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