WO2002041389A3 - A method for monitoring line width of electronic circuit patterns - Google Patents

A method for monitoring line width of electronic circuit patterns Download PDF

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Publication number
WO2002041389A3
WO2002041389A3 PCT/EP2001/013305 EP0113305W WO0241389A3 WO 2002041389 A3 WO2002041389 A3 WO 2002041389A3 EP 0113305 W EP0113305 W EP 0113305W WO 0241389 A3 WO0241389 A3 WO 0241389A3
Authority
WO
WIPO (PCT)
Prior art keywords
focus
line width
pattern
array
independent
Prior art date
Application number
PCT/EP2001/013305
Other languages
French (fr)
Other versions
WO2002041389A2 (en
Inventor
David H Ziger
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Priority to JP2002543692A priority Critical patent/JP2004514292A/en
Priority to EP01996883A priority patent/EP1334407A2/en
Publication of WO2002041389A2 publication Critical patent/WO2002041389A2/en
Publication of WO2002041389A3 publication Critical patent/WO2002041389A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus

Abstract

To measure line width at best focus in a projected circuit pattern, a set pattern is formed on a substrate, and then an array of test patterns formed adjacent the set pattern. The focus varies by predetermined steps along the array, with the focus of a test pattern at an intermediate position along the array corresponding to the focus of the set pattern. By scanning the test patterns and measuring the line width at each test pattern, data can be obtained to provide a curve indicative of focus relative to line width which shows either a maximum or a minimum line width at that focus, dependent on exposure data. This information can be used to change the programming of a stepper for the focus of a projector to obtain focus independent line width and/or to determine the stability of line widths independent of machine focus and/or to determine the stability of line widths independent of the machine focus.
PCT/EP2001/013305 2000-11-16 2001-11-14 A method for monitoring line width of electronic circuit patterns WO2002041389A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002543692A JP2004514292A (en) 2000-11-16 2001-11-14 How to monitor line width of electronic circuit patterns
EP01996883A EP1334407A2 (en) 2000-11-16 2001-11-14 A method for monitoring line width of electronic circuit patterns

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71324000A 2000-11-16 2000-11-16
US09/713,240 2000-11-16

Publications (2)

Publication Number Publication Date
WO2002041389A2 WO2002041389A2 (en) 2002-05-23
WO2002041389A3 true WO2002041389A3 (en) 2003-03-13

Family

ID=24865351

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/013305 WO2002041389A2 (en) 2000-11-16 2001-11-14 A method for monitoring line width of electronic circuit patterns

Country Status (3)

Country Link
EP (1) EP1334407A2 (en)
JP (1) JP2004514292A (en)
WO (1) WO2002041389A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4084312B2 (en) * 2004-01-16 2008-04-30 株式会社東芝 Lithography process evaluation system, lithography process evaluation method, exposure apparatus evaluation method, mask pattern design method, and semiconductor device manufacturing method
JP6063630B2 (en) * 2012-03-19 2017-01-18 株式会社日立ハイテクノロジーズ Pattern measuring apparatus and semiconductor measuring system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US990567A (en) * 1910-08-24 1911-04-25 Gustave Krieger Corset-shoe.
US5338630A (en) * 1992-03-05 1994-08-16 National Semiconductor Corporation Photolithography control system and method using latent image measurements
US5747202A (en) * 1993-06-07 1998-05-05 Canon Kabushiki Kaisha Projection exposure method
US5989764A (en) * 1991-03-04 1999-11-23 Lucent Technologies Inc. Method of adjusting lithography tool through scattered energy measurement

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US990567A (en) * 1910-08-24 1911-04-25 Gustave Krieger Corset-shoe.
US5989764A (en) * 1991-03-04 1999-11-23 Lucent Technologies Inc. Method of adjusting lithography tool through scattered energy measurement
US5338630A (en) * 1992-03-05 1994-08-16 National Semiconductor Corporation Photolithography control system and method using latent image measurements
US5747202A (en) * 1993-06-07 1998-05-05 Canon Kabushiki Kaisha Projection exposure method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DIRKSEN P ET AL: "FOCUS AND EXPOSURE DOSE DETERMINATION USING STEPPER ALIGNMENT", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 2726, 1996, pages 799 - 808, XP001016402 *

Also Published As

Publication number Publication date
EP1334407A2 (en) 2003-08-13
JP2004514292A (en) 2004-05-13
WO2002041389A2 (en) 2002-05-23

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