WO2002039099A2 - Measurement of surface defects - Google Patents
Measurement of surface defects Download PDFInfo
- Publication number
- WO2002039099A2 WO2002039099A2 PCT/EP2001/013042 EP0113042W WO0239099A2 WO 2002039099 A2 WO2002039099 A2 WO 2002039099A2 EP 0113042 W EP0113042 W EP 0113042W WO 0239099 A2 WO0239099 A2 WO 0239099A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lines
- light
- interference pattern
- defect
- intensity
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01993826A EP1336094A2 (en) | 2000-11-13 | 2001-11-08 | Measurement of surface defects |
JP2002541373A JP2004513364A (en) | 2000-11-13 | 2001-11-08 | Measurement of surface defects |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00203979 | 2000-11-13 | ||
EP00203979.0 | 2000-11-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002039099A2 true WO2002039099A2 (en) | 2002-05-16 |
WO2002039099A3 WO2002039099A3 (en) | 2003-02-13 |
Family
ID=8172263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/013042 WO2002039099A2 (en) | 2000-11-13 | 2001-11-08 | Measurement of surface defects |
Country Status (4)
Country | Link |
---|---|
US (1) | US20020191179A1 (en) |
EP (1) | EP1336094A2 (en) |
JP (1) | JP2004513364A (en) |
WO (1) | WO2002039099A2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2927175A1 (en) * | 2008-02-05 | 2009-08-07 | Altatech Semiconductor | DEVICE FOR INSPECTING SEMICONDUCTOR WAFERS |
US7795293B2 (en) | 2002-05-22 | 2010-09-14 | Glaxosmithkline Llc | 3′-[(2Z)-[1-(3,4-dimethylphenyl)-1,5-dihydro-3-methyl-5-oxo-4H-pyrazol-4-ylidene]hydrazino]-2′-hydroxy-[1,1′-biphenyl]-3-carboxylic acid bis-(monoethanolamine) |
FR3026484A1 (en) * | 2014-09-29 | 2016-04-01 | Altatech Semiconductor | METHOD AND SYSTEM FOR INSPECTING TRANSPARENT PLATES FOR ELECTRONICS, OPTICS OR OPTOELECTRONICS |
WO2017167573A1 (en) | 2016-03-31 | 2017-10-05 | Unity Semiconductor | Method and system for inspecting boards for microelectronics or optics by laser doppler effect |
EP4202423A1 (en) | 2021-12-23 | 2023-06-28 | Unity Semiconductor | A method and system for discriminating defects present on a frontside from defects present on a backside of a transparent substrate |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6597446B2 (en) * | 2001-03-22 | 2003-07-22 | Sentec Corporation | Holographic scatterometer for detection and analysis of wafer surface deposits |
US7420669B2 (en) * | 2004-07-01 | 2008-09-02 | Midwest Research Institute | Optic probe for semiconductor characterization |
CN103018258B (en) * | 2011-09-23 | 2015-11-25 | 深圳中科飞测科技有限公司 | Wafer detection method and wafer detecting apparatus |
FR3026485B1 (en) | 2014-09-29 | 2016-09-23 | Altatech Semiconductor | METHOD AND SYSTEM FOR INSPECTING PLATELETS FOR ELECTRONICS, OPTICS OR OPTOELECTRONICS |
FR3076618B1 (en) * | 2018-01-05 | 2023-11-24 | Unity Semiconductor | METHOD AND SYSTEM FOR OPTICAL INSPECTION OF A SUBSTRATE |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5343290A (en) * | 1992-06-11 | 1994-08-30 | International Business Machines Corporation | Surface particle detection using heterodyne interferometer |
US5502001A (en) * | 1990-12-19 | 1996-03-26 | Hitachi, Ltd. | Method of forming light beam and method of fabricating semiconductor integrated circuits |
WO1997034124A1 (en) * | 1996-03-14 | 1997-09-18 | Phase Metrics, Inc. | Optical surface detection for magnetic disks |
US5698069A (en) * | 1995-09-10 | 1997-12-16 | Nikon Precision Inc. | Technique for detecting particles on a wafer support surface |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4030830A (en) * | 1976-01-05 | 1977-06-21 | Atlantic Research Corporation | Process and apparatus for sensing defects on a smooth surface |
US4334779A (en) * | 1980-08-04 | 1982-06-15 | Canadian Patents & Dev. Limited | Non-contact optical apparatus for measuring the length or speed of a relatively moving surface |
US4794265A (en) * | 1987-05-08 | 1988-12-27 | Qc Optics, Inc. | Surface pit detection system and method |
JP2711140B2 (en) * | 1989-06-08 | 1998-02-10 | 三菱電機株式会社 | Fine particle measuring device |
JPH0427848A (en) * | 1990-05-23 | 1992-01-30 | Hitachi Electron Eng Co Ltd | Sample scanning system of foreign matter inspection apparatus |
US5486919A (en) * | 1992-04-27 | 1996-01-23 | Canon Kabushiki Kaisha | Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern |
-
2001
- 2001-11-08 WO PCT/EP2001/013042 patent/WO2002039099A2/en not_active Application Discontinuation
- 2001-11-08 JP JP2002541373A patent/JP2004513364A/en active Pending
- 2001-11-08 EP EP01993826A patent/EP1336094A2/en not_active Withdrawn
- 2001-11-08 US US10/169,819 patent/US20020191179A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5502001A (en) * | 1990-12-19 | 1996-03-26 | Hitachi, Ltd. | Method of forming light beam and method of fabricating semiconductor integrated circuits |
US5343290A (en) * | 1992-06-11 | 1994-08-30 | International Business Machines Corporation | Surface particle detection using heterodyne interferometer |
US5698069A (en) * | 1995-09-10 | 1997-12-16 | Nikon Precision Inc. | Technique for detecting particles on a wafer support surface |
WO1997034124A1 (en) * | 1996-03-14 | 1997-09-18 | Phase Metrics, Inc. | Optical surface detection for magnetic disks |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7795293B2 (en) | 2002-05-22 | 2010-09-14 | Glaxosmithkline Llc | 3′-[(2Z)-[1-(3,4-dimethylphenyl)-1,5-dihydro-3-methyl-5-oxo-4H-pyrazol-4-ylidene]hydrazino]-2′-hydroxy-[1,1′-biphenyl]-3-carboxylic acid bis-(monoethanolamine) |
FR2927175A1 (en) * | 2008-02-05 | 2009-08-07 | Altatech Semiconductor | DEVICE FOR INSPECTING SEMICONDUCTOR WAFERS |
WO2009112704A1 (en) * | 2008-02-05 | 2009-09-17 | Altatech Semiconductor | Device for the inspection of semiconductor wafers |
FR3026484A1 (en) * | 2014-09-29 | 2016-04-01 | Altatech Semiconductor | METHOD AND SYSTEM FOR INSPECTING TRANSPARENT PLATES FOR ELECTRONICS, OPTICS OR OPTOELECTRONICS |
WO2016050738A1 (en) * | 2014-09-29 | 2016-04-07 | Altatech Semiconductor | Method and system for inspecting transparent wafers for electronics, optics or optoelectronics |
CN106716112A (en) * | 2014-09-29 | 2017-05-24 | 统半导体公司 | Method and system for inspecting transparent wafers for electronics, optics or optoelectronics |
WO2017167573A1 (en) | 2016-03-31 | 2017-10-05 | Unity Semiconductor | Method and system for inspecting boards for microelectronics or optics by laser doppler effect |
FR3049710A1 (en) * | 2016-03-31 | 2017-10-06 | Altatech Semiconductor | METHOD AND SYSTEM FOR INSPECTING DOPPLER LASER EFFECT OF WAFERS FOR MICROELECTRONICS OR OPTICS |
CN109073566A (en) * | 2016-03-31 | 2018-12-21 | 统半导体公司 | For being used for the method and system of microelectronics or optical plate by laser doppler detection |
CN109073566B (en) * | 2016-03-31 | 2022-07-19 | 统一半导体公司 | Method and system for detecting plates for microelectronics or optics by laser doppler effect |
EP4202423A1 (en) | 2021-12-23 | 2023-06-28 | Unity Semiconductor | A method and system for discriminating defects present on a frontside from defects present on a backside of a transparent substrate |
WO2023117229A1 (en) | 2021-12-23 | 2023-06-29 | Unity Semiconductor | A method and system for discriminating defects present on a frontside from defects present on a backside of a transparent substrate |
Also Published As
Publication number | Publication date |
---|---|
WO2002039099A3 (en) | 2003-02-13 |
EP1336094A2 (en) | 2003-08-20 |
US20020191179A1 (en) | 2002-12-19 |
JP2004513364A (en) | 2004-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5159412A (en) | Optical measurement device with enhanced sensitivity | |
US5042951A (en) | High resolution ellipsometric apparatus | |
US7161668B2 (en) | Wafer edge inspection | |
US5875029A (en) | Apparatus and method for surface inspection by specular interferometric and diffuse light detection | |
US6724475B2 (en) | Apparatus for rapidly measuring angle-dependent diffraction effects on finely patterned surfaces | |
US7161669B2 (en) | Wafer edge inspection | |
JP3965117B2 (en) | High sensitivity optical inspection system and method for detecting defects on diffractive surfaces | |
WO2020038360A1 (en) | Detection system | |
WO2015151557A1 (en) | Defect inspection device and inspection method | |
US20090059236A1 (en) | Wafer Edge Inspection | |
CN108463877A (en) | The system and method for infrared spectrum ellipsometry for extension | |
US6806959B2 (en) | Measurement of surface defects on a movable surface | |
JPH0650903A (en) | Apparatus and method for detecting surface particle | |
EP0396409A2 (en) | High resolution ellipsometric apparatus | |
US20020191179A1 (en) | Measurement of surface defects | |
CN110849898A (en) | Wafer defect detection system and method | |
JP3920218B2 (en) | Surface inspection device | |
US7295300B1 (en) | Detecting surface pits | |
JPH0783840A (en) | Rotary defect inspection device | |
US20220187218A1 (en) | Angle independent optical surface inspector | |
JP3258904B2 (en) | Scattered light detector | |
KR20230084735A (en) | Broadband spectrum meter | |
JPH10300685A (en) | Method and device for analyzing foreign object | |
JPH041559A (en) | Device and method for inspecting semiconductor device | |
JPH06273916A (en) | Method for inspecting phase shift mask and its device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): JP US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2001993826 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10169819 Country of ref document: US |
|
ENP | Entry into the national phase |
Ref country code: JP Ref document number: 2002 541373 Kind code of ref document: A Format of ref document f/p: F |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWP | Wipo information: published in national office |
Ref document number: 2001993826 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 2001993826 Country of ref document: EP |