WO2002031932A1 - Very narrow band, two chamber, high rep rate gas discharge laser system - Google Patents
Very narrow band, two chamber, high rep rate gas discharge laser system Download PDFInfo
- Publication number
- WO2002031932A1 WO2002031932A1 PCT/US2001/030164 US0130164W WO0231932A1 WO 2002031932 A1 WO2002031932 A1 WO 2002031932A1 US 0130164 W US0130164 W US 0130164W WO 0231932 A1 WO0231932 A1 WO 0231932A1
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- Prior art keywords
- laser
- pulse
- gas
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- discharge
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- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
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- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2333—Double-pass amplifiers
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
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Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020037004934A KR100850450B1 (en) | 2000-10-06 | 2001-09-25 | Very narrow band, two chamber, high rep rate gas discharge laser system |
AU2001296334A AU2001296334A1 (en) | 2000-10-06 | 2001-09-25 | Very narrow band, two chamber, high rep rate gas discharge laser system |
EP01977198A EP1323216A4 (en) | 2000-10-06 | 2001-09-25 | Very narrow band, two chamber, high rep rate gas discharge laser system |
Applications Claiming Priority (16)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/684,629 | 2000-10-06 | ||
US09/684,629 US6442181B1 (en) | 1998-07-18 | 2000-10-06 | Extreme repetition rate gas discharge laser |
US09/768,753 US6414979B2 (en) | 2000-06-09 | 2001-01-23 | Gas discharge laser with blade-dielectric electrode |
US09/768,753 | 2001-01-23 | ||
US09/771,789 US6539042B2 (en) | 1999-11-30 | 2001-01-29 | Ultra pure component purge system for gas discharge laser |
US09/771,789 | 2001-01-29 | ||
US09/794,782 US6532247B2 (en) | 2000-02-09 | 2001-02-27 | Laser wavelength control unit with piezoelectric driver |
US09/794,782 | 2001-02-27 | ||
US09/834,840 US6466601B1 (en) | 2001-04-13 | 2001-04-13 | Beam seal for line narrowed production laser |
US09/834,840 | 2001-04-13 | ||
US09/848,043 | 2001-05-03 | ||
US09/848,043 US6549551B2 (en) | 1999-09-27 | 2001-05-03 | Injection seeded laser with precise timing control |
US09/854,097 | 2001-05-11 | ||
US09/854,097 US6757316B2 (en) | 1999-12-27 | 2001-05-11 | Four KHz gas discharge laser |
US09/943,343 US6567450B2 (en) | 1999-12-10 | 2001-08-29 | Very narrow band, two chamber, high rep rate gas discharge laser system |
US09/943,343 | 2001-08-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002031932A1 true WO2002031932A1 (en) | 2002-04-18 |
Family
ID=27575502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/030164 WO2002031932A1 (en) | 2000-10-06 | 2001-09-25 | Very narrow band, two chamber, high rep rate gas discharge laser system |
Country Status (6)
Country | Link |
---|---|
US (1) | US6567450B2 (en) |
EP (1) | EP1323216A4 (en) |
JP (2) | JP2002198604A (en) |
KR (1) | KR100850450B1 (en) |
AU (1) | AU2001296334A1 (en) |
WO (1) | WO2002031932A1 (en) |
Cited By (11)
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WO2003021728A2 (en) | 2001-08-29 | 2003-03-13 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
EP1329772A2 (en) * | 2001-12-28 | 2003-07-23 | ASML Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
EP1339519A2 (en) * | 2000-06-19 | 2003-09-03 | Cymer, Inc. | FOUR KHz GAS DISCHARGE LASER |
EP1391017A1 (en) * | 2001-05-11 | 2004-02-25 | Cymer, Inc. | FOUR KHz GAS DISCHARGE LASER SYSTEM |
EP1421653A1 (en) * | 2001-08-29 | 2004-05-26 | Cymer, Inc. | Laser lithography light source with beam delivery |
EP1430573A1 (en) * | 2001-08-29 | 2004-06-23 | Cymer, Inc. | SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM |
EP1438772A2 (en) * | 2001-08-29 | 2004-07-21 | Cymer, Inc. | Line selected f 2? two chamber laser system |
EP1502334A1 (en) * | 2002-05-07 | 2005-02-02 | Cymer, Inc. | High power deep ultraviolet laser with long life optics |
US7026629B2 (en) | 2001-12-28 | 2006-04-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8502178B2 (en) | 2009-07-29 | 2013-08-06 | Gigaphoton Inc. | Extreme ultraviolet light source apparatus, method for controlling extreme ultraviolet light source apparatus, and recording medium with program recorded thereon |
CN103259159A (en) * | 2013-04-26 | 2013-08-21 | 中国科学院光电研究院 | Laser-device separated type double-cavity excimer laser device complete-device frame system |
Families Citing this family (137)
Publication number | Priority date | Publication date | Assignee | Title |
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US6865210B2 (en) * | 2001-05-03 | 2005-03-08 | Cymer, Inc. | Timing control for two-chamber gas discharge laser system |
US7856044B2 (en) | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
JP3389912B2 (en) * | 2000-02-08 | 2003-03-24 | ウシオ電機株式会社 | Gas laser device |
US6804284B1 (en) * | 2000-02-22 | 2004-10-12 | Tuilaser Ag | Optical element holding and extraction device |
AU2002258594A1 (en) | 2001-03-02 | 2002-09-19 | Corning Incorporated | Barium fluoride high repetition rate uv excimer laser |
WO2002071558A1 (en) * | 2001-03-02 | 2002-09-12 | Corning Incorporated | High repetition rate uv excimer laser |
US6801562B2 (en) * | 2001-03-02 | 2004-10-05 | Corning Incorporated | High repetition rate excimer laser system |
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Also Published As
Publication number | Publication date |
---|---|
US6567450B2 (en) | 2003-05-20 |
US20020044586A1 (en) | 2002-04-18 |
KR20030041151A (en) | 2003-05-23 |
AU2001296334A1 (en) | 2002-04-22 |
JP2002198604A (en) | 2002-07-12 |
KR100850450B1 (en) | 2008-08-07 |
EP1323216A1 (en) | 2003-07-02 |
JP2006261689A (en) | 2006-09-28 |
EP1323216A4 (en) | 2006-03-22 |
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