WO2002029137A3 - Method and associated apparatus for tilting a substrate upon entry for metal deposition - Google Patents
Method and associated apparatus for tilting a substrate upon entry for metal deposition Download PDFInfo
- Publication number
- WO2002029137A3 WO2002029137A3 PCT/US2001/030058 US0130058W WO0229137A3 WO 2002029137 A3 WO2002029137 A3 WO 2002029137A3 US 0130058 W US0130058 W US 0130058W WO 0229137 A3 WO0229137 A3 WO 0229137A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- electrolyte solution
- tilting
- immersed
- entry
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20010979288 EP1470268A2 (en) | 2000-10-03 | 2001-09-26 | Method and associated apparatus for tilting a substrate upon entry for metal deposition |
JP2002532699A JP2004536217A (en) | 2000-10-03 | 2001-09-26 | Method and related apparatus for tilting a semiconductor substrate upon entry for metal deposition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/678,947 US6582578B1 (en) | 1999-04-08 | 2000-10-03 | Method and associated apparatus for tilting a substrate upon entry for metal deposition |
US09/678,947 | 2000-10-03 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2002029137A2 WO2002029137A2 (en) | 2002-04-11 |
WO2002029137A3 true WO2002029137A3 (en) | 2004-08-05 |
WO2002029137A9 WO2002029137A9 (en) | 2007-03-08 |
Family
ID=24724984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/030058 WO2002029137A2 (en) | 2000-10-03 | 2001-09-26 | Method and associated apparatus for tilting a substrate upon entry for metal deposition |
Country Status (6)
Country | Link |
---|---|
US (1) | US20030201184A1 (en) |
EP (1) | EP1470268A2 (en) |
JP (1) | JP2004536217A (en) |
CN (1) | CN100469948C (en) |
TW (1) | TW531770B (en) |
WO (1) | WO2002029137A2 (en) |
Cited By (1)
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---|---|---|---|---|
US8034539B2 (en) | 2002-12-10 | 2011-10-11 | Nikon Corporation | Exposure apparatus and method for producing device |
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US20040020780A1 (en) * | 2001-01-18 | 2004-02-05 | Hey H. Peter W. | Immersion bias for use in electro-chemical plating system |
JP4026750B2 (en) * | 2002-04-24 | 2007-12-26 | 東京エレクトロン株式会社 | Substrate processing equipment |
EP1672682A4 (en) * | 2003-10-08 | 2008-10-15 | Zao Nikon Co Ltd | Substrate transporting apparatus and method, exposure apparatus and method, and device producing method |
JP4642771B2 (en) * | 2003-10-22 | 2011-03-02 | ネックス システムズ インコーポレイテッド | Method and apparatus for fluid processing a workpiece |
US7645364B2 (en) * | 2004-06-30 | 2010-01-12 | Lam Research Corporation | Apparatus and method for plating semiconductor wafers |
KR100634446B1 (en) * | 2004-12-29 | 2006-10-16 | 삼성전자주식회사 | Wafer plating apparatus for improving process uniformity |
TW200641189A (en) * | 2005-02-25 | 2006-12-01 | Applied Materials Inc | Counter electrode encased in cation exchange membrane tube for electroplating cell |
US8172992B2 (en) * | 2008-12-10 | 2012-05-08 | Novellus Systems, Inc. | Wafer electroplating apparatus for reducing edge defects |
US9512538B2 (en) | 2008-12-10 | 2016-12-06 | Novellus Systems, Inc. | Plating cup with contoured cup bottom |
JP5126091B2 (en) * | 2009-02-02 | 2013-01-23 | ウシオ電機株式会社 | Work stage and exposure apparatus using the work stage |
TWI410531B (en) | 2010-05-07 | 2013-10-01 | Taiwan Semiconductor Mfg | Vertical plating equipment and plating method thereof |
US9017528B2 (en) | 2011-04-14 | 2015-04-28 | Tel Nexx, Inc. | Electro chemical deposition and replenishment apparatus |
US9005409B2 (en) | 2011-04-14 | 2015-04-14 | Tel Nexx, Inc. | Electro chemical deposition and replenishment apparatus |
US9221081B1 (en) | 2011-08-01 | 2015-12-29 | Novellus Systems, Inc. | Automated cleaning of wafer plating assembly |
US10066311B2 (en) | 2011-08-15 | 2018-09-04 | Lam Research Corporation | Multi-contact lipseals and associated electroplating methods |
US9988734B2 (en) | 2011-08-15 | 2018-06-05 | Lam Research Corporation | Lipseals and contact elements for semiconductor electroplating apparatuses |
US9228270B2 (en) | 2011-08-15 | 2016-01-05 | Novellus Systems, Inc. | Lipseals and contact elements for semiconductor electroplating apparatuses |
CN104272438B (en) | 2012-03-28 | 2018-01-12 | 诺发系统公司 | Method and apparatus for cleaning plated substrate retainer |
KR102092416B1 (en) | 2012-03-30 | 2020-03-24 | 노벨러스 시스템즈, 인코포레이티드 | Cleaning electroplating substrate holders using reverse current deplating |
US9746427B2 (en) | 2013-02-15 | 2017-08-29 | Novellus Systems, Inc. | Detection of plating on wafer holding apparatus |
US10416092B2 (en) | 2013-02-15 | 2019-09-17 | Lam Research Corporation | Remote detection of plating on wafer holding apparatus |
US9399827B2 (en) * | 2013-04-29 | 2016-07-26 | Applied Materials, Inc. | Microelectronic substrate electro processing system |
US9303329B2 (en) | 2013-11-11 | 2016-04-05 | Tel Nexx, Inc. | Electrochemical deposition apparatus with remote catholyte fluid management |
US10053793B2 (en) | 2015-07-09 | 2018-08-21 | Lam Research Corporation | Integrated elastomeric lipseal and cup bottom for reducing wafer sticking |
KR101927699B1 (en) * | 2016-10-31 | 2018-12-13 | 세메스 주식회사 | Apparatus and method for treating substrate |
TWI711724B (en) * | 2018-11-30 | 2020-12-01 | 台灣積體電路製造股份有限公司 | Electrochemical plating system, method for performing electrochemical plating process, and method of forming semiconductor substrate |
JP7058239B2 (en) * | 2019-03-14 | 2022-04-21 | 株式会社Kokusai Electric | Semiconductor device manufacturing methods, substrate processing devices and programs |
US11686208B2 (en) | 2020-02-06 | 2023-06-27 | Rolls-Royce Corporation | Abrasive coating for high-temperature mechanical systems |
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-
2001
- 2001-09-26 WO PCT/US2001/030058 patent/WO2002029137A2/en active Search and Examination
- 2001-09-26 EP EP20010979288 patent/EP1470268A2/en not_active Withdrawn
- 2001-09-26 JP JP2002532699A patent/JP2004536217A/en not_active Withdrawn
- 2001-09-26 CN CNB018152589A patent/CN100469948C/en not_active Expired - Fee Related
- 2001-10-03 TW TW090124451A patent/TW531770B/en active
-
2003
- 2003-04-28 US US10/424,479 patent/US20030201184A1/en not_active Abandoned
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PATENT ABSTRACTS OF JAPAN vol. 1998, no. 11 30 September 1998 (1998-09-30) * |
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PATENT ABSTRACTS OF JAPAN vol. 2002, no. 03 3 April 2002 (2002-04-03) * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8034539B2 (en) | 2002-12-10 | 2011-10-11 | Nikon Corporation | Exposure apparatus and method for producing device |
Also Published As
Publication number | Publication date |
---|---|
CN1623012A (en) | 2005-06-01 |
TW531770B (en) | 2003-05-11 |
JP2004536217A (en) | 2004-12-02 |
WO2002029137A2 (en) | 2002-04-11 |
WO2002029137A9 (en) | 2007-03-08 |
CN100469948C (en) | 2009-03-18 |
EP1470268A2 (en) | 2004-10-27 |
US20030201184A1 (en) | 2003-10-30 |
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