WO2002010831A3 - Differential interferometric scanning near-field confocal microscopy - Google Patents

Differential interferometric scanning near-field confocal microscopy Download PDF

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Publication number
WO2002010831A3
WO2002010831A3 PCT/US2001/041444 US0141444W WO0210831A3 WO 2002010831 A3 WO2002010831 A3 WO 2002010831A3 US 0141444 W US0141444 W US 0141444W WO 0210831 A3 WO0210831 A3 WO 0210831A3
Authority
WO
WIPO (PCT)
Prior art keywords
array
measurement
aperture
reference beam
return
Prior art date
Application number
PCT/US2001/041444
Other languages
French (fr)
Other versions
WO2002010831A2 (en
Inventor
Henry Allen Hill
Original Assignee
Zetetic Inst
Henry Allen Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zetetic Inst, Henry Allen Hill filed Critical Zetetic Inst
Priority to AU2001281361A priority Critical patent/AU2001281361A1/en
Priority to EP01959844A priority patent/EP1303778A2/en
Priority to JP2002515501A priority patent/JP2004505313A/en
Priority to MX2013000002A priority patent/MX2013000002A/en
Publication of WO2002010831A2 publication Critical patent/WO2002010831A2/en
Publication of WO2002010831A3 publication Critical patent/WO2002010831A3/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22Probes, their manufacture, or their related instrumentation, e.g. holders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00Methods or apparatus for measurement or analysis of nanostructures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/005Reproducing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1387Means for guiding the beam from the source to the record carrier or from the record carrier to the detector using the near-field effect
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/002Scanning microscopes
    • G02B21/0024Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052Optical details of the image generation
    • G02B21/0056Optical details of the image generation based on optical coherence, e.g. phase-contrast arrangements, interference arrangements
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2407Tracks or pits; Shape, structure or physical properties thereof
    • G11B7/24085Pits
    • G11B7/24088Pits for storing more than two values, i.e. multi-valued recording for data or prepits

Abstract

An interferometric optical microscopy system for imaging an object, the system including: a measurement beam mask array having an array of aperture pairs positioned to receive radiation emitted from the object in response to a measurement beam, radiation emerging from the array of aperture pairs defining a measurement return beam; a reference beam source array positioned to receive a reference beam, the reference beam source array comprising an array of elements each configured to radiate a portion of the reference beam, the radiated reference beam portions defining a reference return beam; and imaging optics positioned to direct the measurement and reference return beams to the photo-detector and configured to produce overlapping conjugate images of the array of reference elements and the array of apertures pairs, wherein the conjugate image for each aperture pair overlaps with the conjugate image of a corresponding reference element, wherein the imaging optics include a pinhole array positioned in the conjugate image plane, the pinhole array having an array of pinholes each aligned with a corresponding aperture pair image, and wherein the measurement and reference beams are derived from a common source.
PCT/US2001/041444 2000-07-27 2001-07-27 Differential interferometric scanning near-field confocal microscopy WO2002010831A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2001281361A AU2001281361A1 (en) 2000-07-27 2001-07-27 Differential interferometric scanning near-field confocal microscopy
EP01959844A EP1303778A2 (en) 2000-07-27 2001-07-27 Differential interferometric scanning near-field confocal microscopy
JP2002515501A JP2004505313A (en) 2000-07-27 2001-07-27 Differential interference scanning near-field confocal microscopy
MX2013000002A MX2013000002A (en) 2001-07-27 2001-07-27 Differential interferometric scanning near-field confocal microscopy.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22129500P 2000-07-27 2000-07-27
US0/221,295 2000-07-27

Publications (2)

Publication Number Publication Date
WO2002010831A2 WO2002010831A2 (en) 2002-02-07
WO2002010831A3 true WO2002010831A3 (en) 2002-10-31

Family

ID=22827205

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/041444 WO2002010831A2 (en) 2000-07-27 2001-07-27 Differential interferometric scanning near-field confocal microscopy

Country Status (5)

Country Link
US (1) US6775009B2 (en)
EP (1) EP1303778A2 (en)
JP (1) JP2004505313A (en)
AU (1) AU2001281361A1 (en)
WO (1) WO2002010831A2 (en)

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CN109187719A (en) * 2018-11-13 2019-01-11 北京理工大学 Postposition is divided pupil confocal laser LIBS spectrum-mass spectrum micro imaging method and device
CN109270047A (en) * 2018-11-13 2019-01-25 北京理工大学 Femtosecond laser machined parameters confocal Raman spectra in-situ monitoring method and device

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6403124B1 (en) * 1997-04-16 2002-06-11 Sigma-Tau Industrie Farmaceutiche Riunite S.P.A. Storage and maintenance of blood products including red blood cells and platelets
JP2004505314A (en) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート Scanning interference near-field confocal microscopy with attenuated and compensated background amplitude
JP4178741B2 (en) * 2000-11-02 2008-11-12 株式会社日立製作所 Charged particle beam apparatus and sample preparation apparatus
US7129454B2 (en) * 2001-11-08 2006-10-31 Nanopoint, Inc. Precision optical intracellular near field imaging/spectroscopy technology
US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7869057B2 (en) 2002-09-09 2011-01-11 Zygo Corporation Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
US7084983B2 (en) * 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
KR20050098268A (en) * 2003-01-27 2005-10-11 제테틱 인스티튜트 Leak guided-wave modes used in interferometric confocal microscopy to measure properties of trenches
EP1588120A4 (en) 2003-01-27 2006-12-20 Zetetic Inst Interferometric confocal microscopy incorporating a pihnole array beam-splitter
US7164480B2 (en) * 2003-02-04 2007-01-16 Zetetic Institute Compensation for effects of mismatch in indices of refraction at a substrate-medium interface in non-confocal, confocal, and interferometric confocal microscopy
US7263259B2 (en) * 2003-02-07 2007-08-28 Zetetic Institute Multiple-source arrays fed by guided-wave structures and resonant guided-wave structure cavities
WO2004072695A2 (en) * 2003-02-13 2004-08-26 Zetetic Institute Transverse differential interferometric confocal microscopy
US7133139B2 (en) * 2003-02-19 2006-11-07 Zetetic Institute Longitudinal differential interferometric confocal microscopy
WO2004074881A2 (en) * 2003-02-19 2004-09-02 Zetetic Institute Method and apparatus for dark field interferometric confocal microscopy
US7106454B2 (en) 2003-03-06 2006-09-12 Zygo Corporation Profiling complex surface structures using scanning interferometry
US7324214B2 (en) 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
EP1609019A2 (en) 2003-04-01 2005-12-28 Zetetic Institute Method for constructing a catadioptric lens system
KR20050119672A (en) * 2003-04-01 2005-12-21 제테틱 인스티튜트 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
EP1608933A4 (en) * 2003-04-03 2007-03-21 Zetetic Inst Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry
WO2005008334A2 (en) 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
US7324209B2 (en) * 2003-07-07 2008-01-29 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
US7355722B2 (en) * 2003-09-10 2008-04-08 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
US7298494B2 (en) 2003-09-15 2007-11-20 Zygo Corporation Methods and systems for interferometric analysis of surfaces and related applications
US20050111007A1 (en) * 2003-09-26 2005-05-26 Zetetic Institute Catoptric and catadioptric imaging system with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
US7312877B2 (en) * 2003-10-01 2007-12-25 Zetetic Institute Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
DE10352040A1 (en) * 2003-11-07 2005-07-21 Carl Zeiss Sms Gmbh In position, shape and / or the optical properties changeable aperture and / or filter arrangement for optical devices, in particular microscopes
TW200538703A (en) * 2004-05-06 2005-12-01 Zetetic Inst Apparatus and methods for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks
WO2005114096A2 (en) * 2004-05-18 2005-12-01 Zygo Corporation Methods and systems for determining optical properties using low-coherence interference signals
US7298496B2 (en) * 2004-05-21 2007-11-20 Zetetic Institute Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry
US7161680B2 (en) * 2004-08-16 2007-01-09 Zetetic Institute Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
WO2006023612A2 (en) * 2004-08-19 2006-03-02 Zetetic Institute Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers
US7145663B2 (en) * 2004-09-20 2006-12-05 Zetetic Institute Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and/or adaptive catoptric surfaces
WO2006078718A1 (en) * 2005-01-20 2006-07-27 Zygo Corporation Interferometer for determining characteristics of an object surface
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
US7826063B2 (en) * 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
DE102005020542A1 (en) * 2005-05-03 2006-11-09 Carl Zeiss Jena Gmbh Device and method for reproducible adjustment of the pinhole opening and pinhole position in laser scanning microscopes
US7808023B2 (en) * 2005-08-24 2010-10-05 Aptina Imaging Corporation Method and apparatus providing integrated color pixel with buried sub-wavelength gratings in solid state imagers
WO2007044786A2 (en) 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
KR100640006B1 (en) * 2005-10-14 2006-11-01 한국전자통신연구원 Method and apparatus for optical clock signal extraction
US7799491B2 (en) * 2006-04-07 2010-09-21 Aptina Imaging Corp. Color filter array and imaging device containing such color filter array and method of fabrication
FR2902226B1 (en) * 2006-06-12 2010-01-29 Commissariat Energie Atomique OPTICAL COMPONENT OPERATING IN NEAR FIELD TRANSMISSION
TWI428559B (en) 2006-07-21 2014-03-01 Zygo Corp Compensation of systematic effects in low coherence interferometry
US7812964B2 (en) * 2006-11-15 2010-10-12 Zygo Corporation Distance measuring interferometer and encoder metrology systems for use in lithography tools
US7894075B2 (en) * 2006-12-11 2011-02-22 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
US7812965B2 (en) * 2006-12-11 2010-10-12 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
US7924435B2 (en) 2006-12-22 2011-04-12 Zygo Corporation Apparatus and method for measuring characteristics of surface features
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
US20080204580A1 (en) * 2007-02-28 2008-08-28 Micron Technology, Inc. Method, apparatus and system providing imaging device with color filter array
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
JP5222954B2 (en) 2007-11-13 2013-06-26 ザイゴ コーポレーション Interferometer using polarization scan
WO2009079334A2 (en) 2007-12-14 2009-06-25 Zygo Corporation Analyzing surface structure using scanning interferometry
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
AU2009230797B2 (en) * 2009-10-28 2011-06-09 Canon Kabushiki Kaisha Focus finding and alignment using a split linear mask
WO2011136857A2 (en) 2010-01-06 2011-11-03 Trustees Of Boston University Correlation confocal microscope
US9228829B2 (en) * 2013-10-31 2016-01-05 Industrial Technology Research Institute Method and system for measuring distance
JP6570427B2 (en) * 2015-11-06 2019-09-04 浜松ホトニクス株式会社 Image acquisition apparatus, image acquisition method, and spatial light modulation unit
CA3006467C (en) * 2015-12-11 2022-06-21 University Of Helsinki Properties of a surface and subsurface structures with white light interferometry using photonic jets
GB2552195A (en) 2016-07-13 2018-01-17 Univ Oxford Innovation Ltd Interferometric scattering microscopy
WO2019010325A1 (en) * 2017-07-06 2019-01-10 Kla-Tencor Corporation Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology
JP7159260B2 (en) * 2020-10-30 2022-10-24 ナノフォーム フィンランド オサケユイチアユルキネン Apparatus and method for characterizing surface and subsurface structures

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4659429A (en) * 1983-08-03 1987-04-21 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
EP0491289B1 (en) * 1990-12-18 1996-04-03 Stefan Dr. Hell Double-confocal scanning microscope
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
WO1999063300A1 (en) * 1998-06-02 1999-12-09 Zetetic Institute Methods and apparatus for confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681451A (en) 1986-02-28 1987-07-21 Polaroid Corporation Optical proximity imaging method and apparatus
US5105403A (en) 1988-01-27 1992-04-14 Hitachi, Ltd. Optical information reading apparatus with waveguide and diffraction grating
US5105408A (en) 1988-05-12 1992-04-14 Digital Equipment Corporation Optical head with flying lens
DE69022318T2 (en) 1989-07-19 1996-05-15 Matsushita Electric Ind Co Ltd Flying optical head.
US5150338A (en) 1989-08-10 1992-09-22 Hewlett-Packard Company Optical disk reading and writing system having magnetic write head mounted on an air-bearing slider
JP2626115B2 (en) 1990-01-10 1997-07-02 松下電器産業株式会社 Optical head
US5004307A (en) 1990-04-12 1991-04-02 The Board Of Trustees Of The Leland Stanford Junior University Near field and solid immersion optical microscope
US5121256A (en) 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
US5125750A (en) 1991-03-14 1992-06-30 The Board Of Trustees Of The Leland Stanford Junior University Optical recording system employing a solid immersion lens
JPH0573980A (en) 1991-09-12 1993-03-26 Ricoh Co Ltd Optical head for optical disk drive device
JP2922698B2 (en) 1991-12-25 1999-07-26 京セラ株式会社 Slider for optical head
JP3135389B2 (en) 1992-10-23 2001-02-13 松下電器産業株式会社 Information reproducing method, information recording / reproducing method, information reproducing apparatus, recording medium, and optical head
US5349443A (en) 1992-11-25 1994-09-20 Polaroid Corporation Flexible transducers for photon tunneling microscopes and methods for making and using same
US5442443A (en) 1993-04-08 1995-08-15 Polaroid Corporation Stereoscopic photon tunneling microscope
JP3303436B2 (en) 1993-05-14 2002-07-22 キヤノン株式会社 Projection exposure apparatus and method for manufacturing semiconductor element
EP0722574B1 (en) 1993-10-04 1998-09-09 International Business Machines Corporation Near-field optical microscope
US5371588A (en) 1993-11-10 1994-12-06 University Of Maryland, College Park Surface profile and material mapper using a driver to displace the sample in X-Y-Z directions
US5497359A (en) 1994-08-30 1996-03-05 National Business Machines Corporation Optical disk data storage system with radiation-transparent air-bearing slider
DE69625292T2 (en) 1995-08-04 2003-09-04 Ibm Near field interferometric apparatus and method
US5602820A (en) 1995-08-24 1997-02-11 International Business Machines Corporation Method and apparatus for mass data storage
US5737084A (en) * 1995-09-29 1998-04-07 Takaoka Electric Mtg. Co., Ltd. Three-dimensional shape measuring apparatus
JPH09210629A (en) 1996-02-02 1997-08-12 Canon Inc Surface positioning detection device and device-manufacturing method using it
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
US5689480A (en) 1996-08-13 1997-11-18 The Board Of Trustees Of The Leland Stanford Junior University Magneto-optic recording system employing near field optics
US5666197A (en) 1996-08-21 1997-09-09 Polaroid Corporation Apparatus and methods employing phase control and analysis of evanescent illumination for imaging and metrology of subwavelength lateral surface topography
US5883872A (en) 1997-05-29 1999-03-16 The Board Of Trustees Of The Leland Stanford Junior University Near field magneto-optical recording system employing slit illumination
US6249352B1 (en) * 1999-09-30 2001-06-19 Trw Inc. Lateral shearing interferometer system with masked interference pattern
JP2004505312A (en) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート Control of subwavelength aperture array position and orientation in near-field microscopy
JP2004505314A (en) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート Scanning interference near-field confocal microscopy with attenuated and compensated background amplitude

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4659429A (en) * 1983-08-03 1987-04-21 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
EP0491289B1 (en) * 1990-12-18 1996-04-03 Stefan Dr. Hell Double-confocal scanning microscope
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
WO1999063300A1 (en) * 1998-06-02 1999-12-09 Zetetic Institute Methods and apparatus for confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109187719A (en) * 2018-11-13 2019-01-11 北京理工大学 Postposition is divided pupil confocal laser LIBS spectrum-mass spectrum micro imaging method and device
CN109270047A (en) * 2018-11-13 2019-01-25 北京理工大学 Femtosecond laser machined parameters confocal Raman spectra in-situ monitoring method and device

Also Published As

Publication number Publication date
US20020033953A1 (en) 2002-03-21
AU2001281361A1 (en) 2002-02-13
EP1303778A2 (en) 2003-04-23
US6775009B2 (en) 2004-08-10
WO2002010831A2 (en) 2002-02-07
JP2004505313A (en) 2004-02-19

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