WO2002009141A3 - Automated electrode replacement apparatus for a plasma processing system - Google Patents

Automated electrode replacement apparatus for a plasma processing system Download PDF

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Publication number
WO2002009141A3
WO2002009141A3 PCT/US2001/022508 US0122508W WO0209141A3 WO 2002009141 A3 WO2002009141 A3 WO 2002009141A3 US 0122508 W US0122508 W US 0122508W WO 0209141 A3 WO0209141 A3 WO 0209141A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma processing
electrode
processing system
automated
replacement apparatus
Prior art date
Application number
PCT/US2001/022508
Other languages
French (fr)
Other versions
WO2002009141A2 (en
Inventor
Murray D Sirkis
Eric J Strang
Yu Wang Bibby
John E Cronin
Original Assignee
Tokyo Electron Ltd
Murray D Sirkis
Eric J Strang
Yu Wang Bibby
John E Cronin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Murray D Sirkis, Eric J Strang, Yu Wang Bibby, John E Cronin filed Critical Tokyo Electron Ltd
Priority to AU2001273536A priority Critical patent/AU2001273536A1/en
Publication of WO2002009141A2 publication Critical patent/WO2002009141A2/en
Publication of WO2002009141A3 publication Critical patent/WO2002009141A3/en
Priority to US10/346,186 priority patent/US6753498B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32605—Removable or replaceable electrodes or electrode systems

Abstract

A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152') that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
PCT/US2001/022508 2000-07-20 2001-07-19 Automated electrode replacement apparatus for a plasma processing system WO2002009141A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2001273536A AU2001273536A1 (en) 2000-07-20 2001-07-19 Automated electrode replacement apparatus for a plasma processing system
US10/346,186 US6753498B2 (en) 2000-07-20 2003-01-17 Automated electrode replacement apparatus for a plasma processing system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21973700P 2000-07-20 2000-07-20
US60/219,737 2000-07-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/346,186 Continuation US6753498B2 (en) 2000-07-20 2003-01-17 Automated electrode replacement apparatus for a plasma processing system

Publications (2)

Publication Number Publication Date
WO2002009141A2 WO2002009141A2 (en) 2002-01-31
WO2002009141A3 true WO2002009141A3 (en) 2002-06-20

Family

ID=22820568

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/022508 WO2002009141A2 (en) 2000-07-20 2001-07-19 Automated electrode replacement apparatus for a plasma processing system

Country Status (2)

Country Link
AU (1) AU2001273536A1 (en)
WO (1) WO2002009141A2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0095200A2 (en) * 1982-05-21 1983-11-30 Tegal Corporation Plasma reactor removeable insert
EP0575126A1 (en) * 1992-06-17 1993-12-22 Hughes Aircraft Company Plasma reactor head and electrode assembly
US5874705A (en) * 1994-07-19 1999-02-23 Ea Technology Limited Method of and apparatus for microwave-plasma production
WO2000007264A1 (en) * 1998-07-31 2000-02-10 Applied Materials, Inc. Rf electrode contact assembly for a detachable electrostatic chuck

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0095200A2 (en) * 1982-05-21 1983-11-30 Tegal Corporation Plasma reactor removeable insert
EP0575126A1 (en) * 1992-06-17 1993-12-22 Hughes Aircraft Company Plasma reactor head and electrode assembly
US5874705A (en) * 1994-07-19 1999-02-23 Ea Technology Limited Method of and apparatus for microwave-plasma production
WO2000007264A1 (en) * 1998-07-31 2000-02-10 Applied Materials, Inc. Rf electrode contact assembly for a detachable electrostatic chuck

Also Published As

Publication number Publication date
AU2001273536A1 (en) 2002-02-05
WO2002009141A2 (en) 2002-01-31

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