WO2001097345A1 - Gas discharge laser long life electrodes - Google Patents
Gas discharge laser long life electrodes Download PDFInfo
- Publication number
- WO2001097345A1 WO2001097345A1 PCT/US2001/013202 US0113202W WO0197345A1 WO 2001097345 A1 WO2001097345 A1 WO 2001097345A1 US 0113202 W US0113202 W US 0113202W WO 0197345 A1 WO0197345 A1 WO 0197345A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser
- electrode
- discharge
- anode
- gas
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0381—Anodes or particular adaptations thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
- H01S3/0387—Helical shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0979—Gas dynamic lasers, i.e. with expansion of the laser gas medium to supersonic flow speeds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/2207—Noble gas ions, e.g. Ar+>, Kr+>
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Lasers (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01937186A EP1297594B1 (en) | 2000-06-09 | 2001-04-24 | Gas discharge laser long life electrodes |
AU2001262949A AU2001262949A1 (en) | 2000-06-09 | 2001-04-24 | Gas discharge laser long life electrodes |
JP2002511442A JP5433124B2 (en) | 2000-06-09 | 2001-04-24 | Long life electrode of gas discharge laser |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/590,961 | 2000-06-09 | ||
US09/590,961 US6466602B1 (en) | 2000-06-09 | 2000-06-09 | Gas discharge laser long life electrodes |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001097345A1 true WO2001097345A1 (en) | 2001-12-20 |
Family
ID=24364444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/013202 WO2001097345A1 (en) | 2000-06-09 | 2001-04-24 | Gas discharge laser long life electrodes |
Country Status (5)
Country | Link |
---|---|
US (1) | US6466602B1 (en) |
EP (1) | EP1297594B1 (en) |
JP (1) | JP5433124B2 (en) |
AU (1) | AU2001262949A1 (en) |
WO (1) | WO2001097345A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1330860A1 (en) * | 2000-11-01 | 2003-07-30 | Cymer, Inc. | Anode with porous insulating layer for discharge lasers |
EP1436866A2 (en) * | 2001-09-13 | 2004-07-14 | Cymer, Inc. | High rep-rate laser with improved electrodes |
CN102768926A (en) * | 2011-10-20 | 2012-11-07 | 中国科学院光电研究院 | Gas discharge electrode structure |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7856044B2 (en) | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6570901B2 (en) | 2000-02-24 | 2003-05-27 | Lambda Physik Ag | Excimer or molecular fluorine laser having lengthened electrodes |
US7230965B2 (en) * | 2001-02-01 | 2007-06-12 | Cymer, Inc. | Anodes for fluorine gas discharge lasers |
US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
US7339973B2 (en) * | 2001-09-13 | 2008-03-04 | Cymer, Inc. | Electrodes for fluorine gas discharge lasers |
US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
US7301980B2 (en) * | 2002-03-22 | 2007-11-27 | Cymer, Inc. | Halogen gas discharge laser electrodes |
US7079565B2 (en) * | 2002-12-20 | 2006-07-18 | Lambda Physik Ag | Systems and methods utilizing laser discharge electrodes with ceramic spoilers |
EP2259390A1 (en) * | 2003-07-29 | 2010-12-08 | Cymer, Inc. | Gas discharge laser electrode |
US7196342B2 (en) | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
WO2006071247A2 (en) * | 2004-03-30 | 2006-07-06 | California Institute Of Technology | Diagnostic assays including multiplexed lateral flow immunoassays with quantum dots |
JP4579002B2 (en) * | 2005-02-21 | 2010-11-10 | 株式会社小松製作所 | Pulse oscillation type discharge excitation laser equipment |
US7633989B2 (en) * | 2005-06-27 | 2009-12-15 | Cymer, Inc. | High pulse repetition rate gas discharge laser |
US7394083B2 (en) | 2005-07-08 | 2008-07-01 | Cymer, Inc. | Systems and methods for EUV light source metrology |
US7068697B1 (en) * | 2005-09-28 | 2006-06-27 | Cymer, Inc. | Adjustable flow guide to accommodate electrode erosion in a gas discharge laser |
US7679029B2 (en) | 2005-10-28 | 2010-03-16 | Cymer, Inc. | Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations |
US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
US7812329B2 (en) | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US8519366B2 (en) | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
JP5687488B2 (en) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | Extreme ultraviolet light generator |
US9246298B2 (en) * | 2012-06-07 | 2016-01-26 | Cymer, Llc | Corrosion resistant electrodes for laser chambers |
WO2015125286A1 (en) * | 2014-02-21 | 2015-08-27 | ギガフォトン株式会社 | Laser chamber |
KR102408834B1 (en) * | 2017-10-24 | 2022-06-13 | 사이머 엘엘씨 | Apparatus and method for extending electrode life in a laser chamber |
CN109411996A (en) * | 2018-11-29 | 2019-03-01 | 北京科益虹源光电技术有限公司 | A kind of excimer laser electrode structure and excimer laser |
JP7412562B2 (en) * | 2019-12-31 | 2024-01-12 | サイマー リミテッド ライアビリティ カンパニー | Undercut electrode for gas discharge laser chamber |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5646954A (en) * | 1996-02-12 | 1997-07-08 | Cymer, Inc. | Maintenance strategy control system and monitoring method for gas discharge lasers |
US5771258A (en) * | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
US6208675B1 (en) * | 1998-08-27 | 2001-03-27 | Cymer, Inc. | Blower assembly for a pulsed laser system incorporating ceramic bearings |
Family Cites Families (31)
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DE2952046C2 (en) | 1979-12-22 | 1982-04-15 | Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn | Method and device for generating an electrical discharge in a gas flowing at supersonic speed |
IT1148956B (en) | 1982-06-15 | 1986-12-03 | Selenia Industire Elettroniche | PULSING GAS LASERS IN SEALED STRUCTURE |
US4774714A (en) | 1983-05-19 | 1988-09-27 | Laser Science, Inc. | Laser system with interchangeable modules and method for interchanging such modules |
US4686682A (en) | 1984-10-09 | 1987-08-11 | Mitsubishi Denki Kabushiki Kaisha | Discharge excitation type short pulse laser device |
NO853264L (en) | 1984-10-15 | 1986-04-16 | Siemens Ag | TRANSVERSAL EXCITED GAS WELDING AND PROCEDURE FOR ITS OPERATION. |
US4876693A (en) | 1984-12-26 | 1989-10-24 | Hughes Aircraft Company | Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers |
JPS62163382A (en) * | 1986-01-14 | 1987-07-20 | Nippon Kogaku Kk <Nikon> | Discharge-type laser |
JPS63217684A (en) * | 1987-03-06 | 1988-09-09 | Toshiba Corp | Pulse gas laser device |
US4860300A (en) * | 1987-06-03 | 1989-08-22 | Lambda Physik Forschungs- Und Entwicklungsgesellschaft Mb | Electrode for pulsed gas lasers |
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US5048041A (en) * | 1988-01-15 | 1991-09-10 | Cymer Laser Technologies | Compact excimer laser |
US4959840A (en) | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
JPH0716045B2 (en) * | 1988-12-12 | 1995-02-22 | 工業技術院長 | Corona preionizer |
IT1231783B (en) | 1989-05-12 | 1992-01-14 | Enea | LASER HEAD FOR TRANSVERSE DISCHARGE EXCITATION WITH THREE ELECTRODES |
DD291424A5 (en) * | 1989-12-29 | 1991-06-27 | Adw Zi Fuer Optik Und Spektroskopie,De | ARRANGEMENT FOR GENERATING A HOMOGENEOUS LASER BEAM PROFILE |
JPH04218985A (en) * | 1990-07-06 | 1992-08-10 | Mitsubishi Electric Corp | Excimer laser device |
JPH04305987A (en) * | 1991-04-02 | 1992-10-28 | Toshiba Corp | Gas laser oscillator |
DE4113241C2 (en) * | 1991-04-23 | 1994-08-11 | Lambda Physik Forschung | Pulsed gas discharge laser |
JPH0629600A (en) * | 1992-07-10 | 1994-02-04 | Nissin Electric Co Ltd | Pulse gas laser |
US5557629A (en) | 1992-08-28 | 1996-09-17 | Kabushiki Kaisha Komatsu Seisakusho | Laser device having an electrode with auxiliary conductor members |
JPH06112566A (en) * | 1992-09-30 | 1994-04-22 | Toshiba Corp | Method and device for oscillating pulse gas laser |
JP2631607B2 (en) * | 1992-10-07 | 1997-07-16 | 株式会社小松製作所 | Laser device |
JPH06152013A (en) * | 1992-11-12 | 1994-05-31 | Mitsubishi Electric Corp | Discharge excited laser |
DE4401892C2 (en) * | 1994-01-24 | 1999-06-02 | Lambda Physik Forschung | Electrode for a gas discharge laser and method for forming an electrode for a gas discharge laser |
DE4426723A1 (en) * | 1994-07-22 | 1996-01-25 | Atl Lasertechnik & Accessoires | Sliding discharge preionization for gas lasers |
JP2714357B2 (en) * | 1994-09-12 | 1998-02-16 | 株式会社東芝 | Excimer laser oscillation device |
JPH1041564A (en) * | 1996-07-19 | 1998-02-13 | Tadahiro Omi | Excimer laser oscillation device and aligner |
US6330261B1 (en) * | 1997-07-18 | 2001-12-11 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
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-
2000
- 2000-06-09 US US09/590,961 patent/US6466602B1/en not_active Expired - Lifetime
-
2001
- 2001-04-24 AU AU2001262949A patent/AU2001262949A1/en not_active Abandoned
- 2001-04-24 WO PCT/US2001/013202 patent/WO2001097345A1/en active Application Filing
- 2001-04-24 EP EP01937186A patent/EP1297594B1/en not_active Expired - Lifetime
- 2001-04-24 JP JP2002511442A patent/JP5433124B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5646954A (en) * | 1996-02-12 | 1997-07-08 | Cymer, Inc. | Maintenance strategy control system and monitoring method for gas discharge lasers |
US5771258A (en) * | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
US6208675B1 (en) * | 1998-08-27 | 2001-03-27 | Cymer, Inc. | Blower assembly for a pulsed laser system incorporating ceramic bearings |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1330860A1 (en) * | 2000-11-01 | 2003-07-30 | Cymer, Inc. | Anode with porous insulating layer for discharge lasers |
EP1330860A4 (en) * | 2000-11-01 | 2005-11-23 | Cymer Inc | Anode with porous insulating layer for discharge lasers |
EP1436866A2 (en) * | 2001-09-13 | 2004-07-14 | Cymer, Inc. | High rep-rate laser with improved electrodes |
EP1436866A4 (en) * | 2001-09-13 | 2009-10-28 | Cymer Inc | High rep-rate laser with improved electrodes |
CN102768926A (en) * | 2011-10-20 | 2012-11-07 | 中国科学院光电研究院 | Gas discharge electrode structure |
Also Published As
Publication number | Publication date |
---|---|
EP1297594B1 (en) | 2012-08-15 |
JP2004503946A (en) | 2004-02-05 |
US6466602B1 (en) | 2002-10-15 |
JP5433124B2 (en) | 2014-03-05 |
EP1297594A1 (en) | 2003-04-02 |
AU2001262949A1 (en) | 2001-12-24 |
EP1297594A4 (en) | 2006-03-08 |
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