WO2001096972A3 - Methods and apparatus for maintaining a pressure within an environmentally controlled chamber - Google Patents
Methods and apparatus for maintaining a pressure within an environmentally controlled chamber Download PDFInfo
- Publication number
- WO2001096972A3 WO2001096972A3 PCT/US2001/018992 US0118992W WO0196972A3 WO 2001096972 A3 WO2001096972 A3 WO 2001096972A3 US 0118992 W US0118992 W US 0118992W WO 0196972 A3 WO0196972 A3 WO 0196972A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pressure
- chamber
- controller
- coupled
- maintaining
- Prior art date
Links
- 238000009530 blood pressure measurement Methods 0.000 abstract 6
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2066—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using controlling means acting on the pressure source
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002511036A JP2004510221A (en) | 2000-06-14 | 2001-06-13 | Apparatus and method for maintaining pressure in a controlled environment chamber |
US10/311,131 US6916397B2 (en) | 2000-06-14 | 2001-06-13 | Methods and apparatus for maintaining a pressure within an environmentally controlled chamber |
EP01946310A EP1297397A2 (en) | 2000-06-14 | 2001-06-13 | Methods and apparatus for maintaining a pressure within an environmentally controlled chamber |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21140200P | 2000-06-14 | 2000-06-14 | |
US60/211,402 | 2000-06-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001096972A2 WO2001096972A2 (en) | 2001-12-20 |
WO2001096972A3 true WO2001096972A3 (en) | 2002-04-11 |
Family
ID=22786776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/018992 WO2001096972A2 (en) | 2000-06-14 | 2001-06-13 | Methods and apparatus for maintaining a pressure within an environmentally controlled chamber |
Country Status (5)
Country | Link |
---|---|
US (1) | US6916397B2 (en) |
EP (1) | EP1297397A2 (en) |
JP (1) | JP2004510221A (en) |
KR (1) | KR20030007938A (en) |
WO (1) | WO2001096972A2 (en) |
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WO2003009346A2 (en) | 2001-07-15 | 2003-01-30 | Applied Materials,Inc. | Processing system |
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US20070282480A1 (en) | 2003-11-10 | 2007-12-06 | Pannese Patrick D | Methods and systems for controlling a semiconductor fabrication process |
US8639365B2 (en) * | 2003-11-10 | 2014-01-28 | Brooks Automation, Inc. | Methods and systems for controlling a semiconductor fabrication process |
US7203563B2 (en) * | 2004-04-08 | 2007-04-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Automatic N2 purge system for 300 mm full automation fab |
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US7664618B2 (en) * | 2004-12-17 | 2010-02-16 | Korea Research Institute Of Standards And Science | Trend monitoring and diagnostic analysis method and system for failure protection and for predictive maintenance of a vacuum pump |
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US8246284B2 (en) * | 2009-03-05 | 2012-08-21 | Applied Materials, Inc. | Stacked load-lock apparatus and method for high throughput solar cell manufacturing |
US8657584B2 (en) * | 2010-02-16 | 2014-02-25 | Edwards Limited | Apparatus and method for tuning pump speed |
CN103046029B (en) * | 2011-10-13 | 2015-09-09 | 中国科学院微电子研究所 | Based on the atomic layer deposition apparatus that the self-adaptive pressure of simulated annealing controls |
DE102012010522A1 (en) * | 2012-05-25 | 2013-11-28 | Hydac Fluidtechnik Gmbh | Valve for valve arrangement |
US10847391B2 (en) | 2013-03-12 | 2020-11-24 | Applied Materials, Inc. | Semiconductor device manufacturing platform with single and twinned processing chambers |
WO2014150260A1 (en) | 2013-03-15 | 2014-09-25 | Applied Materials, Inc | Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations |
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US9435025B2 (en) | 2013-09-25 | 2016-09-06 | Applied Materials, Inc. | Gas apparatus, systems, and methods for chamber ports |
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US10199256B2 (en) | 2013-09-28 | 2019-02-05 | Applied Materials, Inc. | Methods and systems for improved mask processing |
KR101770970B1 (en) | 2013-09-30 | 2017-08-24 | 어플라이드 머티어리얼스, 인코포레이티드 | Transfer chamber gas purge apparatus, electronic device processing systems, and purge methods |
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US9575494B2 (en) * | 2013-11-14 | 2017-02-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Mechanisms for processing wafer |
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US10119191B2 (en) | 2016-06-08 | 2018-11-06 | Applied Materials, Inc. | High flow gas diffuser assemblies, systems, and methods |
US10684159B2 (en) | 2016-06-27 | 2020-06-16 | Applied Materials, Inc. | Methods, systems, and apparatus for mass flow verification based on choked flow |
US10361099B2 (en) | 2017-06-23 | 2019-07-23 | Applied Materials, Inc. | Systems and methods of gap calibration via direct component contact in electronic device manufacturing systems |
WO2019178073A1 (en) * | 2018-03-12 | 2019-09-19 | North Carolina State University | Vascular development monitoring systems and uses thereof |
US11107709B2 (en) | 2019-01-30 | 2021-08-31 | Applied Materials, Inc. | Temperature-controllable process chambers, electronic device processing systems, and manufacturing methods |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1985002888A1 (en) * | 1983-12-27 | 1985-07-04 | Kabushiki Kaisha Tokuda Seisakusho | Method of and apparatus for controlling gas pressure |
US5626679A (en) * | 1991-09-02 | 1997-05-06 | Fuji Electric Co., Ltd. | Method and apparatus for preparing a silicon oxide film |
EP0843339A2 (en) * | 1996-11-18 | 1998-05-20 | Applied Materials, Inc. | Processing apparatus |
US5795328A (en) * | 1994-10-28 | 1998-08-18 | Iolab Corporation | Vacuum system and a method of operating a vacuum system |
US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
US6041817A (en) * | 1998-08-21 | 2000-03-28 | Fairchild Semiconductor Corp. | Processing system having vacuum manifold isolation |
US6066358A (en) * | 1995-11-21 | 2000-05-23 | Applied Materials, Inc. | Blanket-selective chemical vapor deposition using an ultra-thin nucleation layer |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
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US594049A (en) * | 1897-11-23 | Machine for making paper boxes | ||
JPS58124079A (en) * | 1982-01-20 | 1983-07-23 | Furukawa Electric Co Ltd:The | Pressure regulating method in vacuum pump |
US4728869A (en) * | 1985-12-18 | 1988-03-01 | Anicon, Inc. | Pulsewidth modulated pressure control system for chemical vapor deposition apparatus |
US4699570A (en) * | 1986-03-07 | 1987-10-13 | Itt Industries, Inc | Vacuum pump system |
WO2000060428A1 (en) * | 1999-04-07 | 2000-10-12 | Alcatel | System for regulating pressure in a vacuum chamber, vacuum pumping unit equipped with same |
JP3676983B2 (en) * | 2000-03-29 | 2005-07-27 | 株式会社日立国際電気 | Semiconductor manufacturing method, substrate processing method, and semiconductor manufacturing apparatus |
FR2808098B1 (en) * | 2000-04-20 | 2002-07-19 | Cit Alcatel | METHOD AND DEVICE FOR CONDITIONING THE ATMOSPHERE IN A PROCESS CHAMBER |
FR2807951B1 (en) * | 2000-04-20 | 2003-05-16 | Cit Alcatel | METHOD AND SYSTEM FOR PUMPING SEMICONDUCTOR EQUIPMENT TRANSFER CHAMBERS |
-
2001
- 2001-06-13 US US10/311,131 patent/US6916397B2/en not_active Expired - Lifetime
- 2001-06-13 KR KR1020027016818A patent/KR20030007938A/en active Search and Examination
- 2001-06-13 JP JP2002511036A patent/JP2004510221A/en active Pending
- 2001-06-13 EP EP01946310A patent/EP1297397A2/en not_active Withdrawn
- 2001-06-13 WO PCT/US2001/018992 patent/WO2001096972A2/en not_active Application Discontinuation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1985002888A1 (en) * | 1983-12-27 | 1985-07-04 | Kabushiki Kaisha Tokuda Seisakusho | Method of and apparatus for controlling gas pressure |
US5626679A (en) * | 1991-09-02 | 1997-05-06 | Fuji Electric Co., Ltd. | Method and apparatus for preparing a silicon oxide film |
US5795328A (en) * | 1994-10-28 | 1998-08-18 | Iolab Corporation | Vacuum system and a method of operating a vacuum system |
US6066358A (en) * | 1995-11-21 | 2000-05-23 | Applied Materials, Inc. | Blanket-selective chemical vapor deposition using an ultra-thin nucleation layer |
EP0843339A2 (en) * | 1996-11-18 | 1998-05-20 | Applied Materials, Inc. | Processing apparatus |
US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
US6041817A (en) * | 1998-08-21 | 2000-03-28 | Fairchild Semiconductor Corp. | Processing system having vacuum manifold isolation |
Also Published As
Publication number | Publication date |
---|---|
JP2004510221A (en) | 2004-04-02 |
US6916397B2 (en) | 2005-07-12 |
US20030209322A1 (en) | 2003-11-13 |
WO2001096972A2 (en) | 2001-12-20 |
KR20030007938A (en) | 2003-01-23 |
EP1297397A2 (en) | 2003-04-02 |
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