WO2001042727A3 - Method, apparatus, and composition for drying solid articles - Google Patents

Method, apparatus, and composition for drying solid articles Download PDF

Info

Publication number
WO2001042727A3
WO2001042727A3 PCT/US2000/033115 US0033115W WO0142727A3 WO 2001042727 A3 WO2001042727 A3 WO 2001042727A3 US 0033115 W US0033115 W US 0033115W WO 0142727 A3 WO0142727 A3 WO 0142727A3
Authority
WO
WIPO (PCT)
Prior art keywords
drying
fluid
solid articles
hydrofluoroether
flammable
Prior art date
Application number
PCT/US2000/033115
Other languages
French (fr)
Other versions
WO2001042727A2 (en
Inventor
Dean Bettcher
Christopher Kubinski
Thomas V Fugate
Original Assignee
Caltek Sales
Dean Bettcher
Christopher Kubinski
Thomas V Fugate
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Caltek Sales, Dean Bettcher, Christopher Kubinski, Thomas V Fugate filed Critical Caltek Sales
Priority to AU19507/01A priority Critical patent/AU1950701A/en
Publication of WO2001042727A2 publication Critical patent/WO2001042727A2/en
Publication of WO2001042727A3 publication Critical patent/WO2001042727A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

Disclosed herein is an apparatus, method and drying agent composition for drying solid articles such as semiconductor wafers. The dryer (10) comprises a process tank (12) and a drying fluid supply system (100). The process tank (12) includes a plurality of spray nozzles (15) to spray a non-flammable drying fluid to wet surfaces of the article for drying without the necessity of heat or other external means. The drying fluid comprises a non-flammable, environmentally compatible, and non-hazardous fluid including a drying agent of hydrofluoroether and a surfactant of isopropyl alcohol. Even without the benefit of heating, little if any solution or static charge remains after drying. The dryer (10) includes a drying fluid supply system (100) for providing the drying fluid to the plurality of spray nozzles. The drying agent composition comprises a mixture of hydrofluoroether and a tertiary alcohol such as tertiary butyl alcohol.
PCT/US2000/033115 1999-12-10 2000-12-06 Method, apparatus, and composition for drying solid articles WO2001042727A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU19507/01A AU1950701A (en) 1999-12-10 2000-12-06 Method, apparatus, and composition for drying solid articles

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US17285099P 1999-12-10 1999-12-10
US17285399P 1999-12-10 1999-12-10
US60/172,853 1999-12-10
US60/172,850 1999-12-10

Publications (2)

Publication Number Publication Date
WO2001042727A2 WO2001042727A2 (en) 2001-06-14
WO2001042727A3 true WO2001042727A3 (en) 2008-03-06

Family

ID=26868529

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/033115 WO2001042727A2 (en) 1999-12-10 2000-12-06 Method, apparatus, and composition for drying solid articles

Country Status (2)

Country Link
AU (1) AU1950701A (en)
WO (1) WO2001042727A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5159738B2 (en) 2009-09-24 2013-03-13 株式会社東芝 Semiconductor substrate cleaning method and semiconductor substrate cleaning apparatus

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710450A (en) * 1971-02-01 1973-01-16 Allied Chem Process and apparatus for removing liquids from solid surfaces
US5369891A (en) * 1992-08-24 1994-12-06 Tokyo Electron Limited Substrate drying apparatus
US5551165A (en) * 1995-04-13 1996-09-03 Texas Instruments Incorporated Enhanced cleansing process for wafer handling implements
US5950328A (en) * 1997-07-22 1999-09-14 Kimmon Quartz Co., Ltd. Drying method and drying equipment
US5974689A (en) * 1997-09-23 1999-11-02 Gary W. Farrell Chemical drying and cleaning system
US5985041A (en) * 1998-03-05 1999-11-16 Micron Technology, Inc. Method of rinsing and drying semiconductor wafers in a chamber with a movable side wall
US6048832A (en) * 1998-06-25 2000-04-11 Alliedsignal Inc. Compositions of 1-bromopropane, 4-methoxy-1,1,1,2,2,3,3,4,4-nonafluorobutane and an organic solvent
US6159917A (en) * 1998-12-16 2000-12-12 3M Innovative Properties Company Dry cleaning compositions containing hydrofluoroether
US6187107B1 (en) * 1997-06-24 2001-02-13 Promosol S.A. Mixture for drying solids by the movement of water
US6187954B1 (en) * 1999-07-15 2001-02-13 Seagate Technology Llc Synthesis of fluorinated amides

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710450A (en) * 1971-02-01 1973-01-16 Allied Chem Process and apparatus for removing liquids from solid surfaces
US5369891A (en) * 1992-08-24 1994-12-06 Tokyo Electron Limited Substrate drying apparatus
US5551165A (en) * 1995-04-13 1996-09-03 Texas Instruments Incorporated Enhanced cleansing process for wafer handling implements
US6187107B1 (en) * 1997-06-24 2001-02-13 Promosol S.A. Mixture for drying solids by the movement of water
US5950328A (en) * 1997-07-22 1999-09-14 Kimmon Quartz Co., Ltd. Drying method and drying equipment
US5974689A (en) * 1997-09-23 1999-11-02 Gary W. Farrell Chemical drying and cleaning system
US5985041A (en) * 1998-03-05 1999-11-16 Micron Technology, Inc. Method of rinsing and drying semiconductor wafers in a chamber with a movable side wall
US6048832A (en) * 1998-06-25 2000-04-11 Alliedsignal Inc. Compositions of 1-bromopropane, 4-methoxy-1,1,1,2,2,3,3,4,4-nonafluorobutane and an organic solvent
US6159917A (en) * 1998-12-16 2000-12-12 3M Innovative Properties Company Dry cleaning compositions containing hydrofluoroether
US6187954B1 (en) * 1999-07-15 2001-02-13 Seagate Technology Llc Synthesis of fluorinated amides

Also Published As

Publication number Publication date
WO2001042727A2 (en) 2001-06-14
AU1950701A (en) 2001-06-18

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