WO2001033677A3 - LONG WAVELENGTH PSEUDOMORPHIC InGaNPAsSb TYPE-I AND TYPE-II ACTIVE LAYERS FOR THE GAAS MATERIAL SYSTEM - Google Patents

LONG WAVELENGTH PSEUDOMORPHIC InGaNPAsSb TYPE-I AND TYPE-II ACTIVE LAYERS FOR THE GAAS MATERIAL SYSTEM Download PDF

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Publication number
WO2001033677A3
WO2001033677A3 PCT/US2000/041775 US0041775W WO0133677A3 WO 2001033677 A3 WO2001033677 A3 WO 2001033677A3 US 0041775 W US0041775 W US 0041775W WO 0133677 A3 WO0133677 A3 WO 0133677A3
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WO
WIPO (PCT)
Prior art keywords
light
type
active region
strain
devices
Prior art date
Application number
PCT/US2000/041775
Other languages
French (fr)
Other versions
WO2001033677A2 (en
WO2001033677A9 (en
Inventor
Shane Johnson
Philip Dowd
Wolfgang Braun
Yong-Hang Zhang
Chang-Zhi Guo
Original Assignee
Univ Arizona
Shane Johnson
Philip Dowd
Wolfgang Braun
Zhang Yong Hang
Guo Chang Zhi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Arizona, Shane Johnson, Philip Dowd, Wolfgang Braun, Zhang Yong Hang, Guo Chang Zhi filed Critical Univ Arizona
Priority to US10/129,061 priority Critical patent/US6859474B1/en
Priority to KR1020027005594A priority patent/KR20020059663A/en
Priority to JP2001535268A priority patent/JP2003513476A/en
Priority to EP00991716A priority patent/EP1228557A2/en
Publication of WO2001033677A2 publication Critical patent/WO2001033677A2/en
Publication of WO2001033677A3 publication Critical patent/WO2001033677A3/en
Publication of WO2001033677A9 publication Critical patent/WO2001033677A9/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
    • H01S5/32358—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers containing very small amounts, usually less than 1%, of an additional III or V compound to decrease the bandgap strongly in a non-linear way by the bowing effect
    • H01S5/32366—(In)GaAs with small amount of N
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/3422—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers comprising type-II quantum wells or superlattices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/3434—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer comprising at least both As and P as V-compounds

Abstract

The invention discloses improved structures of light-processing (e.g., light-emitting and light-absorbing/sensing) devices, in particular Vertical Cavity Surface Emitting Lasers (VCSELs), such as may find use in telecommunications applications. The disclosed VSCAL devices and production methods provide for an active region having a quantum well structure grown on GaAs-containing substrates, thus providing processing compatibility for light having wavelength in the range 1.0 to 1.6 νm. The active region structure combines strain-compensating barriers with different band alignments in the quantum wells to achieve a long emission wavelength while at the same time decreasing the strain in the structure. The improved functioning of the devices disclosed results from building them with multicomponent alloy layers having a large number of constituents. The invention discloses as a key constituent in the proposed alloy layers for the active region a substance, such as nitrogen (N), suitable for reducing bandgap energy (i.e., increasing light wavelength) associated with the layers, while at the same time lowering the lattice constant associated with the structure and hence lowering strain.
PCT/US2000/041775 1999-11-01 2000-11-01 LONG WAVELENGTH PSEUDOMORPHIC InGaNPAsSb TYPE-I AND TYPE-II ACTIVE LAYERS FOR THE GAAS MATERIAL SYSTEM WO2001033677A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US10/129,061 US6859474B1 (en) 1999-11-01 2000-11-01 Long wavelength pseudomorphic InGaNPAsSb type-I and type-II active layers for the gaas material system
KR1020027005594A KR20020059663A (en) 1999-11-01 2000-11-01 LONG WAVELENGTH PSEUDOMORPHIC InGaNPAsSb TYPE-I AND TYPE-II ACTIVE LAYERS FOR THE GAAS MATERIAL SYSTEM
JP2001535268A JP2003513476A (en) 1999-11-01 2000-11-01 Long wavelength pseudomorphic InGaNPAsSb type I and type II active layers for GaAs material systems
EP00991716A EP1228557A2 (en) 1999-11-01 2000-11-01 Long wavelength pseudomorphic inganpassb type-i and type-ii active layers for the gas material system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16281399P 1999-11-01 1999-11-01
US60/162,813 1999-11-01

Publications (3)

Publication Number Publication Date
WO2001033677A2 WO2001033677A2 (en) 2001-05-10
WO2001033677A3 true WO2001033677A3 (en) 2001-10-25
WO2001033677A9 WO2001033677A9 (en) 2002-08-15

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/041775 WO2001033677A2 (en) 1999-11-01 2000-11-01 LONG WAVELENGTH PSEUDOMORPHIC InGaNPAsSb TYPE-I AND TYPE-II ACTIVE LAYERS FOR THE GAAS MATERIAL SYSTEM

Country Status (5)

Country Link
EP (1) EP1228557A2 (en)
JP (1) JP2003513476A (en)
KR (1) KR20020059663A (en)
CN (1) CN1384990A (en)
WO (1) WO2001033677A2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
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US6822995B2 (en) 2002-02-21 2004-11-23 Finisar Corporation GaAs/AI(Ga)As distributed bragg reflector on InP
US8168456B2 (en) 2004-10-01 2012-05-01 Finisar Corporation Vertical cavity surface emitting laser with undoped top mirror
US8451875B2 (en) 2004-10-01 2013-05-28 Finisar Corporation Vertical cavity surface emitting laser having strain reduced quantum wells

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US7058112B2 (en) * 2001-12-27 2006-06-06 Finisar Corporation Indium free vertical cavity surface emitting laser
US6922426B2 (en) * 2001-12-20 2005-07-26 Finisar Corporation Vertical cavity surface emitting laser including indium in the active region
JP3735047B2 (en) * 2000-07-31 2006-01-11 古河電気工業株式会社 Semiconductor laser device and manufacturing method thereof
US6803604B2 (en) * 2001-03-13 2004-10-12 Ricoh Company, Ltd. Semiconductor optical modulator, an optical amplifier and an integrated semiconductor light-emitting device
US6888873B2 (en) 2002-02-21 2005-05-03 Finisar Corporation Long wavelength VCSEL bottom mirror
US6711195B2 (en) * 2002-02-28 2004-03-23 Agilent Technologies, Inc. Long-wavelength photonic device with GaAsSb quantum-well layer
US6927412B2 (en) 2002-11-21 2005-08-09 Ricoh Company, Ltd. Semiconductor light emitter
JP5196750B2 (en) * 2006-08-25 2013-05-15 キヤノン株式会社 Oscillating element
JP2010034506A (en) * 2008-06-24 2010-02-12 Ricoh Co Ltd Surface emission type semiconductor laser, surface emission type laser array element, optical scanning device, and image forming device
EP2131458B1 (en) * 2008-06-03 2017-08-16 Ricoh Company, Ltd. Vertical cavity surface emitting laser (VCSEL), VCSEL array device, optical scanning apparatus, and image forming apparatus
DE102008048491A1 (en) 2008-09-23 2010-04-01 Meiko Maschinenbau Gmbh & Co.Kg Dishwasher with low-temperature rinsing
DE102009056933A1 (en) * 2009-12-04 2011-06-09 Giesecke & Devrient Gmbh Security element with color filter, value document with such a security element and production method of such a security element
US9306115B1 (en) 2015-02-10 2016-04-05 Epistar Corporation Light-emitting device
KR102030080B1 (en) * 2015-03-06 2019-10-08 에피스타 코포레이션 Light-emitting device
JP2020098890A (en) * 2018-12-19 2020-06-25 住友電気工業株式会社 Semiconductor laser
KR102120356B1 (en) * 2019-10-01 2020-06-09 에피스타 코포레이션 Light-emitting device
CN114552379B (en) * 2020-11-25 2023-08-08 上海禾赛科技有限公司 Resonant cavity, laser unit, laser and laser radar
CN114430002B (en) * 2022-04-06 2022-06-07 苏州长光华芯光电技术股份有限公司 High-efficiency active layer, semiconductor light-emitting device and preparation method

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EP0896406A2 (en) * 1997-08-08 1999-02-10 Matsushita Electric Industrial Co., Ltd. Semiconductor laser device, optical communication system using the same, and method for producing compound semiconductor

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6822995B2 (en) 2002-02-21 2004-11-23 Finisar Corporation GaAs/AI(Ga)As distributed bragg reflector on InP
US8168456B2 (en) 2004-10-01 2012-05-01 Finisar Corporation Vertical cavity surface emitting laser with undoped top mirror
US8451875B2 (en) 2004-10-01 2013-05-28 Finisar Corporation Vertical cavity surface emitting laser having strain reduced quantum wells

Also Published As

Publication number Publication date
WO2001033677A2 (en) 2001-05-10
EP1228557A2 (en) 2002-08-07
WO2001033677A9 (en) 2002-08-15
KR20020059663A (en) 2002-07-13
CN1384990A (en) 2002-12-11
JP2003513476A (en) 2003-04-08

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