WO2001033615A3 - Method and apparatus for supercritical processing of multiple workpieces - Google Patents
Method and apparatus for supercritical processing of multiple workpieces Download PDFInfo
- Publication number
- WO2001033615A3 WO2001033615A3 PCT/US2000/041787 US0041787W WO0133615A3 WO 2001033615 A3 WO2001033615 A3 WO 2001033615A3 US 0041787 W US0041787 W US 0041787W WO 0133615 A3 WO0133615 A3 WO 0133615A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- supercritical processing
- transfer module
- robot
- entrance
- workpieces
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002387341A CA2387341A1 (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of multiple workpieces |
EP00991448A EP1234322A2 (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of multiple workpieces |
AU32672/01A AU3267201A (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of multiple workpieces |
JP2001535218A JP5073902B2 (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of multiple workpieces |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16312199P | 1999-11-02 | 1999-11-02 | |
US60/163,121 | 1999-11-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001033615A2 WO2001033615A2 (en) | 2001-05-10 |
WO2001033615A3 true WO2001033615A3 (en) | 2001-12-06 |
Family
ID=22588579
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/041787 WO2001033615A2 (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of multiple workpieces |
PCT/US2000/041853 WO2001046999A2 (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of a workpiece |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/041853 WO2001046999A2 (en) | 1999-11-02 | 2000-11-01 | Method and apparatus for supercritical processing of a workpiece |
Country Status (9)
Country | Link |
---|---|
US (2) | US7060422B2 (en) |
EP (2) | EP1234322A2 (en) |
JP (2) | JP4621400B2 (en) |
KR (2) | KR100744888B1 (en) |
CN (2) | CN1192417C (en) |
AU (2) | AU3267201A (en) |
CA (2) | CA2387373A1 (en) |
TW (1) | TW484169B (en) |
WO (2) | WO2001033615A2 (en) |
Cited By (3)
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US6736149B2 (en) | 1999-11-02 | 2004-05-18 | Supercritical Systems, Inc. | Method and apparatus for supercritical processing of multiple workpieces |
US7767145B2 (en) | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
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- 2000-11-01 WO PCT/US2000/041787 patent/WO2001033615A2/en active Application Filing
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Also Published As
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AU4902201A (en) | 2001-07-03 |
EP1243021A2 (en) | 2002-09-25 |
JP4621400B2 (en) | 2011-01-26 |
CN1399790A (en) | 2003-02-26 |
US20030150559A1 (en) | 2003-08-14 |
WO2001046999A2 (en) | 2001-06-28 |
JP2003513466A (en) | 2003-04-08 |
CN1387673A (en) | 2002-12-25 |
CA2387341A1 (en) | 2001-05-10 |
WO2001033615A2 (en) | 2001-05-10 |
US6926798B2 (en) | 2005-08-09 |
WO2001046999A3 (en) | 2002-07-11 |
KR100744888B1 (en) | 2007-08-01 |
EP1234322A2 (en) | 2002-08-28 |
KR100742473B1 (en) | 2007-07-25 |
TW484169B (en) | 2002-04-21 |
CA2387373A1 (en) | 2001-06-28 |
KR20020047314A (en) | 2002-06-21 |
CN1192417C (en) | 2005-03-09 |
US20030136514A1 (en) | 2003-07-24 |
AU3267201A (en) | 2001-05-14 |
JP5073902B2 (en) | 2012-11-14 |
JP2003518736A (en) | 2003-06-10 |
KR20020047315A (en) | 2002-06-21 |
US7060422B2 (en) | 2006-06-13 |
CN1175470C (en) | 2004-11-10 |
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