WO2000055388A3 - Method and apparatus for arc deposition - Google Patents

Method and apparatus for arc deposition Download PDF

Info

Publication number
WO2000055388A3
WO2000055388A3 PCT/US2000/003028 US0003028W WO0055388A3 WO 2000055388 A3 WO2000055388 A3 WO 2000055388A3 US 0003028 W US0003028 W US 0003028W WO 0055388 A3 WO0055388 A3 WO 0055388A3
Authority
WO
WIPO (PCT)
Prior art keywords
reactant
plasma
substrate
depositing
coating
Prior art date
Application number
PCT/US2000/003028
Other languages
French (fr)
Other versions
WO2000055388A2 (en
Inventor
Charles Dominic Iacovangelo
Keith Milton Borst
Elihu Calvin Jerabek
Patrick Peter Marzano
Barry Lee-Mean Yang
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Priority to EP00907176A priority Critical patent/EP1161574B1/en
Priority to DE60007287T priority patent/DE60007287T2/en
Priority to AT00907176T priority patent/ATE256763T1/en
Priority to JP2000605803A priority patent/JP4733273B2/en
Publication of WO2000055388A2 publication Critical patent/WO2000055388A2/en
Publication of WO2000055388A3 publication Critical patent/WO2000055388A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma

Abstract

A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant (12); introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate (20). This method is used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate (20). An apparatus (4) for depositing a UV filter coating on a polymeric substrate comprises a plasma generator (10) having an anode (19) and a cathode (13) to form a plasma, and a first inlet (12) for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate (20) by the plasma (50). Optionally, an injection nozzle (18) can be utilized to provide a controlled delivery of the first reactant into the plasma (50).
PCT/US2000/003028 1999-03-17 2000-02-04 Method and apparatus for arc deposition WO2000055388A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP00907176A EP1161574B1 (en) 1999-03-17 2000-02-04 Method and apparatus for arc deposition
DE60007287T DE60007287T2 (en) 1999-03-17 2000-02-04 METHOD AND DEVICE FOR COATING BY ARCH DISCHARGE
AT00907176T ATE256763T1 (en) 1999-03-17 2000-02-04 METHOD AND DEVICE FOR COATING BY ARC DISCHARGE
JP2000605803A JP4733273B2 (en) 1999-03-17 2000-02-04 Arc deposition method and apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/271,655 US6365016B1 (en) 1999-03-17 1999-03-17 Method and apparatus for arc plasma deposition with evaporation of reagents
US09/271,655 1999-03-17

Publications (2)

Publication Number Publication Date
WO2000055388A2 WO2000055388A2 (en) 2000-09-21
WO2000055388A3 true WO2000055388A3 (en) 2001-06-28

Family

ID=23036497

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/003028 WO2000055388A2 (en) 1999-03-17 2000-02-04 Method and apparatus for arc deposition

Country Status (6)

Country Link
US (1) US6365016B1 (en)
EP (1) EP1161574B1 (en)
JP (1) JP4733273B2 (en)
AT (1) ATE256763T1 (en)
DE (1) DE60007287T2 (en)
WO (1) WO2000055388A2 (en)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
US6793775B2 (en) * 2001-03-13 2004-09-21 Mikhail I. Gouskov Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition
WO2002087787A1 (en) * 2001-04-30 2002-11-07 University Of Virginia Patent Foundation Method and apparatus for efficient application of substrate coating
JP4738636B2 (en) * 2001-05-29 2011-08-03 株式会社テクノ菱和 Explosion-proof dustless ionizer
JP2003011661A (en) * 2001-06-25 2003-01-15 Exatec Llc Panel and method for providing automobile fixed glazing
US6660538B2 (en) * 2001-10-29 2003-12-09 Energy Photovoltaics Non-contacting deposition control of chalcopyrite thin films
DE10153760A1 (en) * 2001-10-31 2003-05-22 Fraunhofer Ges Forschung Process for the production of a UV-absorbing transparent abrasion protection layer
FR2842536B1 (en) * 2002-07-19 2005-06-03 Commissariat Energie Atomique ELECTROLYTIC REACTOR
US6740586B1 (en) * 2002-11-06 2004-05-25 Advanced Technology Materials, Inc. Vapor delivery system for solid precursors and method of using same
US7163749B2 (en) * 2002-12-20 2007-01-16 General Electric Company Process for depositing finely dispersed organic-inorganic films and articles made therefrom
US6890656B2 (en) * 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
KR100977955B1 (en) * 2003-02-20 2010-08-24 사빅 이노베이티브 플라스틱스 아이피 비.브이. Apparatus and method for depositing large area coatings on planar surfaces
CA2460296C (en) * 2003-05-23 2012-02-14 Sulzer Metco Ag A hybrid method for the coating of a substrate by a thermal application of the coating
US7282244B2 (en) * 2003-09-05 2007-10-16 General Electric Company Replaceable plate expanded thermal plasma apparatus and method
US20110104381A1 (en) * 2004-01-15 2011-05-05 Stefan Laure Plasma Treatment of Large-Scale Components
US7390573B2 (en) * 2004-03-09 2008-06-24 Exatec Llc Plasma coating system for non-planar substrates
DE102004014618B3 (en) * 2004-03-23 2005-11-10 Eads Space Transportation Gmbh Electrothermal impulse engine
US7300617B2 (en) * 2004-05-13 2007-11-27 David Gerling Method of making fusion cast articles
JP5305900B2 (en) * 2005-04-11 2013-10-02 ドクトル・ラウレ・プラスマテヒノロギー・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング Apparatus and method for applying plasma coating
US9180423B2 (en) 2005-04-19 2015-11-10 SDCmaterials, Inc. Highly turbulent quench chamber
JP4122048B2 (en) * 2005-08-29 2008-07-23 松下電器産業株式会社 Vapor deposition head apparatus and vapor deposition coating method
JP2007191761A (en) * 2006-01-19 2007-08-02 Idemitsu Kosan Co Ltd Stacked structure, electrode for electric circuit using the same and method for producing the same
EP2007915A2 (en) * 2006-04-20 2008-12-31 Shell Erneuerbare Energien GmbH Thermal evaporation apparatus, use and method of depositing a material
CA2582312C (en) * 2006-05-05 2014-05-13 Sulzer Metco Ag A method for the manufacture of a coating
US7939181B2 (en) 2006-10-11 2011-05-10 Oerlikon Trading Ag, Trubbach Layer system with at least one mixed crystal layer of a multi-oxide
US20100323126A1 (en) * 2007-02-26 2010-12-23 Dr. Laure Plasmatechnologie Gmnh Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts
US8575059B1 (en) 2007-10-15 2013-11-05 SDCmaterials, Inc. Method and system for forming plug and play metal compound catalysts
US8168268B2 (en) * 2008-12-12 2012-05-01 Ovishinsky Innovation, LLC Thin film deposition via a spatially-coordinated and time-synchronized process
DE102009010497A1 (en) * 2008-12-19 2010-08-05 J-Fiber Gmbh Multi-nozzle tubular plasma deposition burner for the production of preforms as semi-finished products for optical fibers
JP5507882B2 (en) * 2009-05-08 2014-05-28 国立大学法人茨城大学 Manufacturing method of zinc oxide transparent conductive film and manufacturing apparatus for carrying out this method
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US8803025B2 (en) 2009-12-15 2014-08-12 SDCmaterials, Inc. Non-plugging D.C. plasma gun
US9126191B2 (en) 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8043954B1 (en) 2010-03-30 2011-10-25 Primestar Solar, Inc. Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device
US8525019B2 (en) 2010-07-01 2013-09-03 Primestar Solar, Inc. Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules
US8580353B2 (en) * 2010-07-08 2013-11-12 Applied Vacuum Coating Technologies Co., Ltd. Method for treating surface of glass substrate and apparatus for performing same
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
US8541069B2 (en) * 2011-04-11 2013-09-24 United Technologies Corporation Method of guided non-line of sight coating
KR101879175B1 (en) * 2011-10-20 2018-08-20 삼성전자주식회사 Chemical Vapor Deposition Apparatus
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
EP3024571B1 (en) 2013-07-25 2020-05-27 Umicore AG & Co. KG Washcoats and coated substrates for catalytic converters
DE102013219199A1 (en) * 2013-09-24 2015-03-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. New weathering procedure for samples
JP2016536120A (en) 2013-10-22 2016-11-24 エスディーシーマテリアルズ， インコーポレイテッド Catalyst design for heavy duty diesel combustion engines
JP2016535664A (en) 2013-10-22 2016-11-17 エスディーシーマテリアルズ， インコーポレイテッド Lean NOx trap composition
WO2015143225A1 (en) 2014-03-21 2015-09-24 SDCmaterials, Inc. Compositions for passive nox adsorption (pna) systems
AT517694B1 (en) * 2015-11-12 2017-04-15 Inocon Tech Ges M B H Apparatus and method for applying a coating
JP7166759B2 (en) * 2015-12-04 2022-11-08 アプライド マテリアルズ インコーポレイテッド Advanced coating methods and materials to prevent arcing in HDP-CVD chambers
US10483465B2 (en) * 2016-05-10 2019-11-19 Applied Materials, Inc. Methods of operating a deposition apparatus, and deposition apparatus
DE102017003042B3 (en) 2017-03-29 2018-08-16 Rodenstock Gmbh Gradient hard layer with changing modulus of elasticity
US10612122B2 (en) * 2017-08-25 2020-04-07 Vladimir E. Belashchenko Plasma device and method for delivery of plasma and spray material at extended locations from an anode arc root attachment
US10707477B2 (en) * 2017-09-15 2020-07-07 Dyson Technology Limited High energy density multilayer battery cell with thermally processed components and method for making same

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
DE3014258A1 (en) * 1980-04-14 1981-10-15 Heinrich Dr. 6236 Eschborn Winter Metal, metalloid or ceramic coating prodn. by plasma spraying - using cpds. of constituents in gas or vapour form as charge to improve structure
EP0293229A2 (en) * 1987-05-29 1988-11-30 Inco Limited Apparatus and process for coloring objects by plasma coating
EP0617142A1 (en) * 1993-03-26 1994-09-28 Shin-Etsu Chemical Co., Ltd. Preparation of silica thin films
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
EP0887437A2 (en) * 1997-06-26 1998-12-30 General Electric Company Protective coating by high rate arc plasma deposition
EP0887110A1 (en) * 1997-06-26 1998-12-30 General Electric Company Nozzle-injector for arc plasma deposition apparatus

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3312659A (en) 1967-04-04 Catalytic preparation of polycarbon- ates from bisphenol and a carbonate precursor
US3220973A (en) 1965-11-30 Cross-linked polycarbonate resinous compositions
US3161615A (en) 1957-02-05 1964-12-15 Gen Electric Resinous copolymeric polycarbonate of a mixture of dihydric phenols
US3313777A (en) 1959-12-18 1967-04-11 Eastman Kodak Co Linear polyesters and polyester-amides from 2, 2, 4, 4-tetraalkyl-1, 3-cyclobutanediols
US3312660A (en) 1962-07-03 1967-04-04 Union Carbide Corp Process for preparing polycarbonates by self-condensation of bisphenol dichloroformate
US3576656A (en) 1968-03-11 1971-04-27 Nasa Stabilized zinc oxide coating compositions
US3666614A (en) 1969-06-24 1972-05-30 Union Carbide Corp Glass-polycarbonate resin laminates
US3989672A (en) 1972-10-30 1976-11-02 General Electric Company Process for preparing aromatic carbonate polymers
US4210699A (en) 1978-11-01 1980-07-01 General Electric Company Abrasion resistant silicone coated polycarbonate article
US4224378A (en) 1978-11-01 1980-09-23 General Electric Company Abrasion resistant organopolysiloxane coated polycarbonate article
US4200681A (en) 1978-11-13 1980-04-29 General Electric Company Glass coated polycarbonate articles
US4194038A (en) 1979-01-25 1980-03-18 Allied Chemical Corporation Poly(ester-carbonates) from dicarboxylic acid chlorides
US4242381A (en) 1979-04-18 1980-12-30 General Electric Company Method of providing a polycarbonate article with a uniform and durable silica filled organopolysiloxane coating
JPS5691437A (en) * 1979-12-26 1981-07-24 Nippon Hoso Kyokai <Nhk> Preparation of metallized element
US4454275A (en) 1981-02-20 1984-06-12 General Electric Company Flame retardant copolyester-carbonate compositions
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
JPS61268356A (en) * 1985-01-09 1986-11-27 Nippon Denso Co Ltd Method for supporting alumina by catalyst carrier
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4842941A (en) 1987-04-06 1989-06-27 General Electric Company Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby
JPH0770058B2 (en) * 1987-04-16 1995-07-31 富士写真フイルム株式会社 Method and apparatus for manufacturing magnetic recording medium
NL8701530A (en) 1987-06-30 1989-01-16 Stichting Fund Ond Material METHOD FOR TREATING SURFACES OF SUBSTRATES USING A PLASMA AND REACTOR FOR CARRYING OUT THAT METHOD
JPH0832958B2 (en) 1987-08-24 1996-03-29 ゼネラル・エレクトリック・カンパニイ Method for manufacturing abrasion resistant plastic articles
US4927704A (en) 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5051308A (en) 1987-08-24 1991-09-24 General Electric Company Abrasion-resistant plastic articles
ATE65265T1 (en) * 1987-08-26 1991-08-15 Balzers Hochvakuum PROCESS FOR DEPOSITIONING COATINGS ON SUBSTRATES AND VACUUM COATING EQUIPMENT FOR CARRYING OUT THE PROCESS.
EP0334204B1 (en) * 1988-03-23 1995-04-19 Balzers Aktiengesellschaft Process and apparatus for coating articles
DE3821131A1 (en) 1988-06-23 1989-12-28 Bayer Ag METHOD FOR PRODUCING PLASTIC MOLDED BODIES WITH IMPROVED WEATHER RESISTANCE
US4948485A (en) 1988-11-23 1990-08-14 Plasmacarb Inc. Cascade arc plasma torch and a process for plasma polymerization
US5152866A (en) * 1989-01-13 1992-10-06 Hughes Aircraft Company Plasma/radiation assisted molecular beam epitaxy method
US5009922A (en) * 1989-03-02 1991-04-23 Ashahi Glass Company, Ltd. Method of forming a transparent conductive film
US5104634A (en) * 1989-04-20 1992-04-14 Hercules Incorporated Process for forming diamond coating using a silent discharge plasma jet process
BR9007196A (en) 1989-12-22 1991-12-10 Gen Electric COMPOSITION
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
DE69227109T2 (en) 1991-02-05 1999-02-18 Sun Smart Inc TRANSPARENT, UV-ABSORBING SUN PROTECTION AGENT AND METHOD FOR THE PRODUCTION THEREOF
US5156882A (en) 1991-12-30 1992-10-20 General Electric Company Method of preparing UV absorbant and abrasion-resistant transparent plastic articles
CH687111A5 (en) * 1992-05-26 1996-09-13 Balzers Hochvakuum A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method.
US5480722A (en) 1992-07-03 1996-01-02 Asahi Glass Company Ltd. Ultraviolet ray absorbent glass and method for preparing the same
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
US5302271A (en) * 1992-08-25 1994-04-12 Northeastern University Anodic vacuum arc deposition system
DE4235199C1 (en) 1992-10-19 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4236264C1 (en) 1992-10-27 1993-09-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De
US5298587A (en) 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method
DE69419357T2 (en) 1993-04-27 2000-03-23 Teijin Chemicals Ltd Modified aromatic polycarbonate resin and modified phenol for its manufacture
US5433786A (en) 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
US5691010A (en) * 1993-10-19 1997-11-25 Sanyo Electric Co., Ltd. Arc discharge plasma CVD method for forming diamond-like carbon films
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
DE69628441T2 (en) 1995-10-13 2004-04-29 Dow Global Technologies, Inc., Midland METHOD FOR PRODUCING COATED PLASTIC SURFACES
US5827580A (en) * 1996-03-27 1998-10-27 Regents Of The University Of California Low temperature formation of electrode having electrically conductive metal oxide surface
US5952061A (en) * 1996-12-27 1999-09-14 Stanley Electric Co., Ltd. Fabrication and method of producing silicon films
US5976636A (en) * 1998-03-19 1999-11-02 Industrial Technology Research Institute Magnetic apparatus for arc ion plating

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
DE3014258A1 (en) * 1980-04-14 1981-10-15 Heinrich Dr. 6236 Eschborn Winter Metal, metalloid or ceramic coating prodn. by plasma spraying - using cpds. of constituents in gas or vapour form as charge to improve structure
EP0293229A2 (en) * 1987-05-29 1988-11-30 Inco Limited Apparatus and process for coloring objects by plasma coating
EP0617142A1 (en) * 1993-03-26 1994-09-28 Shin-Etsu Chemical Co., Ltd. Preparation of silica thin films
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
EP0887437A2 (en) * 1997-06-26 1998-12-30 General Electric Company Protective coating by high rate arc plasma deposition
EP0887110A1 (en) * 1997-06-26 1998-12-30 General Electric Company Nozzle-injector for arc plasma deposition apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
RAO N ET AL: "NANOPARTICLE FORMATION USING A PLASMA EXPANSION PROCESS", PLASMA CHEMISTRY AND PLASMA PROCESSING,US,PLENUM PRESS. NEW YORK, vol. 15, no. 4, 1 December 1995 (1995-12-01), pages 581 - 606, XP000539562, ISSN: 0272-4324 *

Also Published As

Publication number Publication date
ATE256763T1 (en) 2004-01-15
DE60007287T2 (en) 2004-10-21
DE60007287D1 (en) 2004-01-29
JP4733273B2 (en) 2011-07-27
JP2003518553A (en) 2003-06-10
EP1161574A1 (en) 2001-12-12
EP1161574B1 (en) 2003-12-17
US6365016B1 (en) 2002-04-02
WO2000055388A2 (en) 2000-09-21

Similar Documents

Publication Publication Date Title
WO2000055388A3 (en) Method and apparatus for arc deposition
US4863756A (en) Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma
EP1509332B2 (en) Application of a coating forming material onto at least one substrate
US4988422A (en) Process and apparatus for depositing coatings of high electrical resistance by cathode sputtering
CA2119561A1 (en) Apparatus for rapid plasma treatments and method
CA2107242A1 (en) An Evaporation System for Gas Jet Deposition on Thin Film Materials
JP4452333B2 (en) Surface coating method using apparatus equipped with sputter electrode
MX9701062A (en) Jet plasma deposition process and apparatus.
EP0931853A3 (en) Method of depositing barrier coatings by plasma assisted chemical vapour deposition
US4264642A (en) Deposition of thin film organic coatings by ion implantation
TW358963B (en) Method and apparatus for depositing deep UV photoresist films
CN1993490A (en) Apparatus for directing plasma flow to coat internal passageways
TW200605194A (en) Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
CA2207235A1 (en) Large-scale, low pressure plasma-ion deposition of diamondlike carbon films
US6171659B1 (en) Process for the formation of a coating on a substrate and device for the use this process
Mattox Physical vapor deposition (PVD) processes
EP1424405A3 (en) Method and apparatus for fabricating coated substrates
AU2003232015A1 (en) Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
TW200514145A (en) Method and apparatus for depositing materials with tunable optical properties and etching characteristics
JPH03183781A (en) Method and device for forming thin membrane
US20020104483A1 (en) Method of and apparatus for thin film deposition, especially under reactive conditions
KR20040031719A (en) Continuous surface-treating apparatus for film shape polymer and continuous surface-treating method thereof
KR100295618B1 (en) High vacuum magnetron sputtering method using ion beam
KR920002169B1 (en) Plasma discharge deposition process and a suitable apparatus therefor
RU93018049A (en) METHOD OF DRAWING VACUUM METALLIZED COATINGS ON DIELECTRIC SURFACES

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): BR CA CN JP KR MX SG

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
AK Designated states

Kind code of ref document: A3

Designated state(s): BR CA CN JP KR MX SG

AL Designated countries for regional patents

Kind code of ref document: A3

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

WWE Wipo information: entry into national phase

Ref document number: 2000907176

Country of ref document: EP

ENP Entry into the national phase

Ref country code: JP

Ref document number: 2000 605803

Kind code of ref document: A

Format of ref document f/p: F

WWP Wipo information: published in national office

Ref document number: 2000907176

Country of ref document: EP

WWG Wipo information: grant in national office

Ref document number: 2000907176

Country of ref document: EP