WO2000045519A3 - Broad band controlled angle analog diffuser and associated method s - Google Patents
Broad band controlled angle analog diffuser and associated method s Download PDFInfo
- Publication number
- WO2000045519A3 WO2000045519A3 PCT/US2000/002333 US0002333W WO0045519A3 WO 2000045519 A3 WO2000045519 A3 WO 2000045519A3 US 0002333 W US0002333 W US 0002333W WO 0045519 A3 WO0045519 A3 WO 0045519A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- diffuser
- analog
- broad band
- controlled angle
- associated method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0231—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having microprismatic or micropyramidal shape
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/50—Transmitters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0236—Form or shape of the hologram when not registered to the substrate, e.g. trimming the hologram to alphanumerical shape
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
- G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU27461/00A AU2746100A (en) | 1999-02-01 | 2000-02-01 | Broad band controlled angle analog diffuser and associated method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/240,611 | 1999-02-01 | ||
US09/240,611 US6392808B1 (en) | 1994-02-28 | 1999-02-01 | Broad band controlled angle analog diffuser and associated methods |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000045519A2 WO2000045519A2 (en) | 2000-08-03 |
WO2000045519A3 true WO2000045519A3 (en) | 2007-05-10 |
Family
ID=22907225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/002333 WO2000045519A2 (en) | 1999-02-01 | 2000-02-01 | Broad band controlled angle analog diffuser and associated method s |
Country Status (3)
Country | Link |
---|---|
US (1) | US6392808B1 (en) |
AU (1) | AU2746100A (en) |
WO (1) | WO2000045519A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6744502B2 (en) * | 2001-09-28 | 2004-06-01 | Pe Corporation (Ny) | Shaped illumination geometry and intensity using a diffractive optical element |
AU2003222799A1 (en) | 2002-04-15 | 2003-10-27 | Carl Zeiss Smt Ag | Interferometric measuring device and projection illumination installation comprising one such measuring device |
AU2003281995A1 (en) * | 2003-04-11 | 2004-11-01 | Carl Zeiss Smt Ag | Diffuser, wavefront source, wavefront sensor and projection lighting facility |
CN100356198C (en) * | 2003-11-27 | 2007-12-19 | 北京光电技术研究所 | Diffusion target, laser beam diagnosing system utilizing the diffusion target and diagnosing method |
US7106517B2 (en) * | 2003-12-31 | 2006-09-12 | General Electric Company | Display optical films |
CN112424650B (en) * | 2018-07-20 | 2022-10-11 | 3M创新有限公司 | Optical film comprising polymeric optical reflector and discontinuous transparent coating |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5861990A (en) * | 1996-03-08 | 1999-01-19 | Kaiser Optical Systems | Combined optical diffuser and light concentrator |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4170396A (en) | 1975-04-14 | 1979-10-09 | Siemens Aktiengesellschaft | Optical component element |
US4427265A (en) * | 1980-06-27 | 1984-01-24 | Canon Kabushiki Kaisha | Diffusion plate |
US4455061A (en) | 1980-07-31 | 1984-06-19 | The Regents Of The University Of Minnesota | Multi-faceted holographic optical element and methods of making and using same |
US4410237A (en) | 1980-09-26 | 1983-10-18 | Massachusetts Institute Of Technology | Method and apparatus for shaping electromagnetic beams |
US4547037A (en) | 1980-10-16 | 1985-10-15 | Regents Of The University Of Minnesota | Holographic method for producing desired wavefront transformations |
US4682841A (en) | 1981-06-15 | 1987-07-28 | Afian Viktor V | Light radiation concentrator and method of making the same |
US5075800A (en) | 1989-12-04 | 1991-12-24 | Yeda Research And Development Co. Ltd. | Method of optimizing holographic optical elements |
US4979791A (en) | 1989-12-08 | 1990-12-25 | Amp Incorporated | Laser diode connector assembly |
JPH03213802A (en) * | 1990-01-18 | 1991-09-19 | Ricoh Co Ltd | Diffraction grating |
US5117476A (en) | 1990-01-19 | 1992-05-26 | Amp Incorporated | Optical transceiver package with insertable subassembly |
US5061025A (en) | 1990-04-13 | 1991-10-29 | Eastman Kodak Company | Hologon scanner with beam shaping stationary diffraction grating |
JP2525962B2 (en) | 1991-03-20 | 1996-08-21 | 富士通株式会社 | Method for optimizing holographic optical element and apparatus using hologram |
US5202775A (en) | 1991-11-04 | 1993-04-13 | University Of North Carolina | Radically symmetric hologram and method of fabricating the same |
US5310623A (en) * | 1992-11-27 | 1994-05-10 | Lockheed Missiles & Space Company, Inc. | Method for fabricating microlenses |
US5383000A (en) | 1992-11-24 | 1995-01-17 | General Signal Corporation | Partial coherence varier for microlithographic system |
US5315427A (en) | 1992-12-14 | 1994-05-24 | Xerox Corporation | Pair of binary diffraction optics for use in overfilled raster output scanning systems |
US5289298A (en) | 1992-12-22 | 1994-02-22 | Hughes Aircraft Company | Multiplex grating holographic floodlit center high mounted stoplight |
EP0618473A3 (en) * | 1993-03-31 | 1995-03-15 | Kuraray Co | Video device utilizing a two-dimensional diffraction grating. |
DE4314574C2 (en) * | 1993-04-29 | 1997-04-10 | Leica Lithographie Systeme Jen | Process for producing a Fresnel type stepped lens |
US5393634A (en) * | 1993-05-27 | 1995-02-28 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Continuous phase and amplitude holographic elements |
EP0714348A4 (en) | 1993-07-27 | 1998-05-06 | Physical Optics Corp | Light source destructuring and shaping device |
US5610733A (en) | 1994-02-28 | 1997-03-11 | Digital Optics Corporation | Beam-homogenizer |
EP0744644A1 (en) | 1995-05-23 | 1996-11-27 | Christian Körber | Apparatus for stereoscopic viewing |
US5631721A (en) | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
US5630661A (en) | 1996-02-06 | 1997-05-20 | Fox; Donald P. | Metal arc flashlight |
US6002520A (en) * | 1997-04-25 | 1999-12-14 | Hewlett-Packard Company | Illumination system for creating a desired irradiance profile using diffractive optical elements |
-
1999
- 1999-02-01 US US09/240,611 patent/US6392808B1/en not_active Expired - Lifetime
-
2000
- 2000-02-01 AU AU27461/00A patent/AU2746100A/en not_active Abandoned
- 2000-02-01 WO PCT/US2000/002333 patent/WO2000045519A2/en active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5861990A (en) * | 1996-03-08 | 1999-01-19 | Kaiser Optical Systems | Combined optical diffuser and light concentrator |
Also Published As
Publication number | Publication date |
---|---|
US6392808B1 (en) | 2002-05-21 |
AU2746100A (en) | 2000-08-18 |
WO2000045519A2 (en) | 2000-08-03 |
US20020024738A1 (en) | 2002-02-28 |
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